Specific Process Knowledge/Lithography/ZEP520A - Revision history

Thope at 19:57, 25 August 2025

2025-08-25T19:57:45Z

← Older revision		Revision as of 21:57, 25 August 2025
Line 3:		Line 3:
	This is a standard positive resist from ZEON. The resist is very expensive; DTU Nanolab has thus stopped buying this resist.		This is a standard positive resist from ZEON. The resist is very expensive; DTU Nanolab has thus stopped buying this resist.
	Use CSAR instead.		Use CSAR instead.

	~~Contact lithography@nanolab.dtu.dk if you wish to use this resist.~~

	== Spin Curves ==		== Spin Curves ==

Jmli at 19:34, 25 November 2019

2019-11-25T19:34:03Z

← Older revision		Revision as of 21:34, 25 November 2019
Line 1:		Line 1:


	This is a standard positive resist from ZEON. The resist is very expensive; DTU ~~Danchip~~ has thus stopped buying this resist.		This is a standard positive resist from ZEON. The resist is very expensive; DTU Nanolab has thus stopped buying this resist.
	Use CSAR instead.		Use CSAR instead.

	Contact lithography@~~danchip~~.dtu.dk if you wish to use this resist.		Contact lithography@nanolab.dtu.dk if you wish to use this resist.

	== Spin Curves ==		== Spin Curves ==
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	\|-		\|-
	\|-style="background:Black; color:White"		\|-style="background:Black; color:White"
	!colspan="7"\|ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 23-04-2014. Resist was mixed 13-01-2014, i.e. ~~approximatley~~ 3 months old.		!colspan="7"\|ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 23-04-2014. Resist was mixed 13-01-2014, i.e. approximately 3 months old.
	\|-		\|-

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	\|-		\|-
	\|-style="background:red; color:White"		\|-style="background:red; color:White"
	!colspan="7"\|ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. ~~approximatley~~ 6 days old.		!colspan="7"\|ZEON ZEP520A1:1 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximately 6 days old.
	\|-		\|-

Line 124:		Line 124:
	\|-		\|-
	\|-style="background:green; color:White"		\|-style="background:green; color:White"
	!colspan="7"\|ZEON ZEP520A1:2 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. ~~approximatley~~ 6 days old.		!colspan="7"\|ZEON ZEP520A1:2 in anisole spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 21-05-2014. Resist was mixed 15-05-2014, i.e. approximately 6 days old.
	\|-		\|-

Lgpe at 13:04, 18 February 2019

2019-02-18T13:04:11Z

← Older revision		Revision as of 15:04, 18 February 2019
Line 1:		Line 1:


	This is a standard positive resist from ZEON. The resist is ~~out of stock from the manufacturer and also~~ very expensive; DTU Danchip has thus stopped buying this resist. ~~As of August 2016 we have around 0.5L left.~~ Use CSAR instead.		This is a standard positive resist from ZEON. The resist is very expensive; DTU Danchip has thus stopped buying this resist.
			Use CSAR instead.

	Contact lithography@danchip.dtu.dk if you wish to use this resist.		Contact lithography@danchip.dtu.dk if you wish to use this resist.

Tigre: /* Process Flow */

2016-07-14T04:49:42Z

Process Flow

← Older revision		Revision as of 06:49, 14 July 2016
Line 4:		Line 4:

	Contact lithography@danchip.dtu.dk if you wish to use this resist.		Contact lithography@danchip.dtu.dk if you wish to use this resist.

	~~== Process Flow ==~~



	~~{\|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" style="width: 60%;"~~
	\|-

	\|-
	~~\|-style="background:Black; color:White"~~
	~~!Equipment~~
	~~!Process Parameters~~
	~~!Comments~~
	~~!Initials and date~~
	\|-

	\|-
	~~\|-style="background:WhiteSmoke; color:black; text-align:center"~~
	~~!colspan="4"\|Pretreatment~~
	\|-


	\|-
	~~\|-style="background:LightGrey; color:black"~~
	~~\|4" Si wafers~~
	~~\|No Pretreatment~~
	\|
	~~\|TIGRE, 23-04-2014~~
	\|-

	\|-
	~~\|-style="background:WhiteSmoke; color:black; text-align:center"~~
	~~!colspan="4"\|Spin Coat~~
	\|-


	\|-
	~~\|-style="background:LightGrey; color:black"~~
	~~\|Spin Coater Manual, LabSpin, A-5~~
	~~\|ZEP520A 1:1 or ZEP520A 1:2 E-beam resist~~
	~~60 sec at various spin speed.~~
	~~Acceleration 4000 s-2,~~
	~~softbake 2 min at 180 deg Celcius~~
	~~\|Resist poured directly from bottle or by use of disposable pipette<sup>1</sup>~~
	~~\|TIGRE, 23-04-2014, 21-05-2014~~
	\|-

	\|-
	~~\|-style="background:WhiteSmoke; color:black; text-align:center"~~
	~~!colspan="4"\|Characterization~~
	\|-

	\|-
	~~\|-style="background:LightGrey; color:black"~~
	~~\|Ellipsometer VASE B-1~~
	~~\|9 points measured on 100 mm wafer~~
	~~\|ZEP program used; measured at 70 deg only~~
	~~\|TIGRE, 23-04-2014, 21-05-2014~~
	\|-

	\|-
	~~\|-style="background:WhiteSmoke; color:black; text-align:center"~~
	~~!colspan="4"\|E-beam Exposure~~
	\|-


	\|-
	~~\|-style="background:LightGrey; color:black"~~
	~~\|JEOL 9500 E-beam writer, E-1~~
	~~\|Dosepattern 14nm - 100nm,~~
	~~dose 120-280 muC/cm2~~
	~~\|Virtual chip mark height detection<sup>2</sup>~~
	~~\| TIGRE~~
	\|-

	\|-
	~~\|-style="background:WhiteSmoke; color:black; text-align:center"~~
	~~!colspan="4"\|Development~~
	\|-

	\|-
	~~\|-style="background:LightGrey; color:black"~~
	~~\|Fumehood, D-3~~
	~~\|60 sec in N50,~~
	~~60 sec rinse in IPA,~~
	~~N2 Blow dry~~
	~~\|Agitation (by hand) while developing~~
	~~\| TIGRE, XX-04-2014~~
	\|-

	\|-
	~~\|-style="background:WhiteSmoke; color:black; text-align:center"~~
	~~!colspan="4"\|Characterization~~
	\|-

	\|-
	~~\|-style="background:LightGrey; color:black"~~
	~~\|Zeiss SEM Supra 60VP, D-3~~
	\|
	\|
	~~\| TIGRE, ??-04-2014~~
	\|-

	\|}

	1 The disposable pipettes are not cleanroom compatible and must therefore be handled with care inside the cleanroom. Each bag contain 10 pipettes; the bags must be opened inside a fumehood and each pipette must be cleaned with a N<sub>2</sub> gun before use.

	~~2 The e-beam writer measures the height of the substrate and adjust the focus accordingly. This requires no actual chip marks on the wafer. See e-beam writer manual.~~

	== Spin Curves ==		== Spin Curves ==

Tigre at 04:49, 14 July 2016

2016-07-14T04:49:01Z

← Older revision		Revision as of 06:49, 14 July 2016
Line 1:		Line 1:


	This is a standard positive resist from ZEON. The resist is out of stock from the manufacturer and also very expensive; DTU Danchip ~~will~~ thus ~~stop~~ buying this resist. As of August 2016 we have around 0.5L left. Use CSAR instead.		This is a standard positive resist from ZEON. The resist is out of stock from the manufacturer and also very expensive; DTU Danchip has thus stopped buying this resist. As of August 2016 we have around 0.5L left. Use CSAR instead.

	Contact lithography@danchip.dtu.dk if you wish to use this resist.		Contact lithography@danchip.dtu.dk if you wish to use this resist.

	== Process Flow ==		== Process Flow ==
	~~Test of ZEP resist; a positive e-beam resist from ZEON.~~

Tigre at 04:48, 14 July 2016

2016-07-14T04:48:32Z

← Older revision		Revision as of 06:48, 14 July 2016
Line 1:		Line 1:

	~~{\|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" width="95%"~~
	\|-

	\|-		This is a standard positive resist from ZEON. The resist is out of stock from the manufacturer and also very expensive; DTU Danchip will thus stop buying this resist. As of August 2016 we have around 0.5L left. Use CSAR instead.
	~~\|-style="background:silver; color:black"~~
	~~\|'''Resist'''~~
	~~\|'''Polarity'''~~
	~~\|'''Manufacturer'''~~
	~~\|'''Comments'''~~
	~~\|'''Technical reports'''~~
	~~\|'''Spinner'''~~
	~~\|'''Developer'''~~
	~~\|'''Rinse'''~~
	~~\|'''Remover'''~~
	~~\|'''Process flows (in docx-format)'''~~

	\|-


	\|-
	~~\|-style="background:LightGrey; color:black"~~
	~~\|'''[[Specific_Process_Knowledge/Lithography/ZEP520A\|ZEP520A]]'''~~
	~~\|Positive~~
	\|ZEON
	~~\|Positive~~ resist
	~~\|[[media:ZEP520A.pdf\|ZEP520A.pdf]], [[media:ZEP520A.xls\|ZEP520A spin curves on SSE Spinner]]~~
	\|[[Specific_Process_Knowledge/Lithography/Coaters#SSE Spinner\|SSE]], [[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1\|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin\|Spin Coater Labspin]]
	~~\|ZED-N50/Hexyl Acetate,n-amyl acetate, oxylene. [[media:JJAP-51-06FC05.pdf‎\|JJAP-51-06FC05.pdf‎]], [[media:JVB001037.pdf‎\|JVB001037.pdf‎]]~~
	~~\|IPA~~
	~~\|acetone/1165~~
	~~\|[[media:Process_Flow_ZEP.docx\|Process_Flow_ZEP.docx]], [[media:Process_Flow_ZEP_with_Al.docx‎\|Process_Flow_ZEP_with_Al.docx‎]]~~
	\|}


	~~If you have questions to~~ the ~~process or wish to use~~ this ~~e-beam~~ resist~~, please contact Tine Greibe at tigre@danchip~~.~~dtu~~.dk.

			Contact lithography@danchip.dtu.dk if you wish to use this resist.

	== Process Flow ==		== Process Flow ==

Tigre at 11:48, 4 July 2016

2016-07-04T11:48:33Z

← Older revision		Revision as of 13:48, 4 July 2016
Line 34:		Line 34:


	~~These tests are currently in progress and this page thus under construction.~~ If you have questions to the process or wish to use this e-beam resist, please contact Tine Greibe at tigre@danchip.dtu.dk.		If you have questions to the process or wish to use this e-beam resist, please contact Tine Greibe at tigre@danchip.dtu.dk.

Tigre at 08:01, 14 July 2014

2014-07-14T08:01:37Z

← Older revision		Revision as of 10:01, 14 July 2014
Line 1:		Line 1:

			{\|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" width="95%"
			\|-

			\|-
			\|-style="background:silver; color:black"
			\|'''Resist'''
			\|'''Polarity'''
			\|'''Manufacturer'''
			\|'''Comments'''
			\|'''Technical reports'''
			\|'''Spinner'''
			\|'''Developer'''
			\|'''Rinse'''
			\|'''Remover'''
			\|'''Process flows (in docx-format)'''

			\|-


			\|-
			\|-style="background:LightGrey; color:black"
			\|'''[[Specific_Process_Knowledge/Lithography/ZEP520A\|ZEP520A]]'''
			\|Positive
			\|ZEON
			\|Positive resist
			\|[[media:ZEP520A.pdf\|ZEP520A.pdf]], [[media:ZEP520A.xls\|ZEP520A spin curves on SSE Spinner]]
			\|[[Specific_Process_Knowledge/Lithography/Coaters#SSE Spinner\|SSE]], [[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1\|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin\|Spin Coater Labspin]]
			\|ZED-N50/Hexyl Acetate,n-amyl acetate, oxylene. [[media:JJAP-51-06FC05.pdf‎\|JJAP-51-06FC05.pdf‎]], [[media:JVB001037.pdf‎\|JVB001037.pdf‎]]
			\|IPA
			\|acetone/1165
			\|[[media:Process_Flow_ZEP.docx\|Process_Flow_ZEP.docx]], [[media:Process_Flow_ZEP_with_Al.docx‎\|Process_Flow_ZEP_with_Al.docx‎]]
			\|}


	These tests are currently in progress and this page thus under construction. If you have questions to the process or wish to use this e-beam resist, please contact Tine Greibe at tigre@danchip.dtu.dk.		These tests are currently in progress and this page thus under construction. If you have questions to the process or wish to use this e-beam resist, please contact Tine Greibe at tigre@danchip.dtu.dk.

Tigre: /* Process Flow */

2014-06-16T07:38:24Z

Process Flow

← Older revision		Revision as of 09:38, 16 June 2014
Line 106:		Line 106:
	\|}		\|}

	1 The disposable pipettes are not cleanroom compatible and must therefore be handled with care inside the cleanroom. Each bag contain 10 pipettes; ~~this~~ bags must be opened inside a fumehood and each pipette must be cleaned with a N<sub>2</sub> gun before use.		1 The disposable pipettes are not cleanroom compatible and must therefore be handled with care inside the cleanroom. Each bag contain 10 pipettes; the bags must be opened inside a fumehood and each pipette must be cleaned with a N<sub>2</sub> gun before use.

	2 The e-beam writer measures the height of the substrate and adjust the focus accordingly. This requires no actual chip marks on the wafer. See e-beam writer manual.		2 The e-beam writer measures the height of the substrate and adjust the focus accordingly. This requires no actual chip marks on the wafer. See e-beam writer manual.

Tigre: /* Process Flow */

2014-06-16T07:37:54Z

Process Flow

← Older revision		Revision as of 09:37, 16 June 2014
Line 106:		Line 106:
	\|}		\|}

	1 ~~Disposable pipettes~~		1 The disposable pipettes are not cleanroom compatible and must therefore be handled with care inside the cleanroom. Each bag contain 10 pipettes; this bags must be opened inside a fumehood and each pipette must be cleaned with a N<sub>2</sub> gun before use.
	The disposable pipettes are not cleanroom compatible and must therefore be handled with care inside the cleanroom. Each bag contain 10 pipettes; this bags must be opened inside a fumehood and each pipette must be cleaned with a N<sub>2</sub> gun before use.

	2 ~~Virtual chip mark detection~~		2 The e-beam writer measures the height of the substrate and adjust the focus accordingly. This requires no actual chip marks on the wafer. See e-beam writer manual.
	The e-beam writer measures the height of the substrate and adjust the focus accordingly. This requires no actual chip marks on the wafer. See e-beam writer manual.

	== Spin Curves ==		== Spin Curves ==

← Older revision		Revision as of 06:48, 14 July 2016
Line 1:		Line 1:

	~~{\|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" width="95%"~~
	\|-

	\|-		This is a standard positive resist from ZEON. The resist is out of stock from the manufacturer and also very expensive; DTU Danchip will thus stop buying this resist. As of August 2016 we have around 0.5L left. Use CSAR instead.
	~~\|-style="background:silver; color:black"~~
	~~\|'''Resist'''~~
	~~\|'''Polarity'''~~
	~~\|'''Manufacturer'''~~
	~~\|'''Comments'''~~
	~~\|'''Technical reports'''~~
	~~\|'''Spinner'''~~
	~~\|'''Developer'''~~
	~~\|'''Rinse'''~~
	~~\|'''Remover'''~~
	~~\|'''Process flows (in docx-format)'''~~

	\|-


	\|-
	~~\|-style="background:LightGrey; color:black"~~
	~~\|'''[[Specific_Process_Knowledge/Lithography/ZEP520A\|ZEP520A]]'''~~
	~~\|Positive~~
	\|ZEON
	~~\|Positive~~ resist
	~~\|[[media:ZEP520A.pdf\|ZEP520A.pdf]], [[media:ZEP520A.xls\|ZEP520A spin curves on SSE Spinner]]~~
	\|[[Specific_Process_Knowledge/Lithography/Coaters#SSE Spinner\|SSE]], [[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1\|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin\|Spin Coater Labspin]]
	~~\|ZED-N50/Hexyl Acetate,n-amyl acetate, oxylene. [[media:JJAP-51-06FC05.pdf‎\|JJAP-51-06FC05.pdf‎]], [[media:JVB001037.pdf‎\|JVB001037.pdf‎]]~~
	~~\|IPA~~
	~~\|acetone/1165~~
	~~\|[[media:Process_Flow_ZEP.docx\|Process_Flow_ZEP.docx]], [[media:Process_Flow_ZEP_with_Al.docx‎\|Process_Flow_ZEP_with_Al.docx‎]]~~
	\|}


	~~If you have questions to~~ the ~~process or wish to use~~ this ~~e-beam~~ resist~~, please contact Tine Greibe at tigre@danchip~~.~~dtu~~.dk.

			Contact lithography@danchip.dtu.dk if you wish to use this resist.

	== Process Flow ==		== Process Flow ==