https://labadviser.nanolab.dtu.dk//index.php?action=history&feed=atom&title=Specific_Process_Knowledge%2FLithography%2FStrip%2FplasmaAsher05 2026-05-07T14:25:42Z Revision history for this page on the wiki MediaWiki 1.43.3 https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/Strip/plasmaAsher05&diff=55054&oldid=prev 2026-01-12T10:21:08Z

<p><span class="autocomment">Plasma Asher 5</span></p> <table style="background-color: #fff; color: #202122;" data-mw="interface"> <col class="diff-marker" /> <col class="diff-content" /> <col class="diff-marker" /> <col class="diff-content" /> <tr class="diff-title" lang="en"> <td colspan="2" style="background-color: #fff; color: #202122; text-align: center;">← Older revision</td> <td colspan="2" style="background-color: #fff; color: #202122; text-align: center;">Revision as of 12:21, 12 January 2026</td> </tr><tr><td colspan="2" class="diff-lineno" id="mw-diff-left-l21">Line 21:</td> <td colspan="2" class="diff-lineno">Line 21:</td></tr> <tr><td class="diff-marker"></td><td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>The user manual, risk assessment, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&amp;view=view&amp;mach=531 LabManager] - &#039;&#039;&#039;requires login&#039;&#039;&#039;</div></td><td class="diff-marker"></td><td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>The user manual, risk assessment, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&amp;view=view&amp;mach=531 LabManager] - &#039;&#039;&#039;requires login&#039;&#039;&#039;</div></td></tr> <tr><td class="diff-marker"></td><td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><br></td><td class="diff-marker"></td><td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><br></td></tr> <tr><td class="diff-marker" data-marker="−"></td><td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div><del style="font-weight: bold; text-decoration: none;">=</del>==Process Information<del style="font-weight: bold; text-decoration: none;">=</del>==</div></td><td class="diff-marker" data-marker="+"></td><td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>==Process Information==</div></td></tr> <tr><td class="diff-marker"></td><td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>Plasma asher 5 is identical to plasma asher 4, see resist strip processing for plasma asher 4 [[Specific_Process_Knowledge/Lithography/Strip#Plasma_Asher_4|here]].</div></td><td class="diff-marker"></td><td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>Plasma asher 5 is identical to plasma asher 4, see resist strip processing for plasma asher 4 [[Specific_Process_Knowledge/Lithography/Strip#Plasma_Asher_4|here]].</div></td></tr> <tr><td class="diff-marker"></td><td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><br></td><td class="diff-marker"></td><td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><br></td></tr> </table>

Jehem https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/Strip/plasmaAsher05&diff=55051&oldid=prev 2026-01-12T10:18:52Z

<p>Created page with &quot;=Plasma Asher 5= <a href="/index.php?title=File:PA5_front.jpg" title="File:PA5 front.jpg">400px|thumb|Plasma asher 5 in cleanroom E-5.|right</a> Product name: PVA Tepla Gigabatch 380M&lt;br&gt; Year of purchase: 2024 The Plasma Asher 5 can be used for the following processes: *Photoresist stripping *Descumming *Surface cleaning *Removal of organic passivation layers and masks Furthermore plasma processing using CF&lt;sub&gt;4&lt;/sub&gt; in plasma asher 5 can be used for: *Etching of glass and ceramic *Etching of SiO&lt;sub&gt;2&lt;/sub&gt;, Si&lt;sub&gt;3...&quot;</p> <p><b>New page</b></p><div>=Plasma Asher 5=<br /> [[File:PA5 front.jpg|400px|thumb|Plasma asher 5 in cleanroom E-5.|right]]<br /> Product name: PVA Tepla Gigabatch 380M&lt;br&gt;<br /> Year of purchase: 2024<br /> <br /> The Plasma Asher 5 can be used for the following processes:<br /> *Photoresist stripping<br /> *Descumming<br /> *Surface cleaning<br /> *Removal of organic passivation layers and masks<br /> <br /> <br /> Furthermore plasma processing using CF&lt;sub&gt;4&lt;/sub&gt; in plasma asher 5 can be used for:<br /> *Etching of glass and ceramic<br /> *Etching of SiO&lt;sub&gt;2&lt;/sub&gt;, Si&lt;sub&gt;3&lt;/sub&gt;N&lt;sub&gt;4&lt;/sub&gt;, Si<br /> *Removal of polyimide layers<br /> <br /> <br /> Plasma asher 5 can be used for almost every material, but if you have any doubt if your materials are compatible/allowed in plasma asher 5, feel free to ask the lithography group at Nanolab.<br /> <br /> The user manual, risk assessment, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&amp;view=view&amp;mach=531 LabManager] - &#039;&#039;&#039;requires login&#039;&#039;&#039;<br /> <br /> ===Process Information===<br /> Plasma asher 5 is identical to plasma asher 4, see resist strip processing for plasma asher 4 [[Specific_Process_Knowledge/Lithography/Strip#Plasma_Asher_4|here]].<br /> <br /> <br /> &#039;&#039;&#039;Processes specifically only for plasma asher 5:&#039;&#039;&#039;&lt;br&gt;<br /> *[[Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using Plasma Asher |SiO&lt;sub&gt;2&lt;/sub&gt; etch using Plasma Asher 1]]<br /> *[[Specific Process Knowledge/Lithography/Descum#Plasma Asher 5|Descum using plasma asher 5]]<br /> &lt;br clear=&quot;all&quot; /&gt;</div>

Jehem