https://labadviser.nanolab.dtu.dk//index.php?action=history&feed=atom&title=Specific_Process_Knowledge%2FLithography%2FStrip%2FPlasmaAsher2 2026-07-13T10:17:05Z Revision history for this page on the wiki MediaWiki 1.43.3 https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/Strip/PlasmaAsher2&diff=50426&oldid=prev 2025-01-09T15:12:18Z

<p>Created page with &quot;<a href="/index.php?title=File:Plasma_Asher_6inch.jpg" title="File:Plasma Asher 6inch.jpg">300x300px|thumb|Plasma asher for removing AZ resist on 6&quot; wafers: positioned in E-5</a> The Plasma Asher 2 is the same as Plasma Asher 1 but has another loading system which is more convenient for batch loading of 6inch substrates. In this machine, only O2 and N2 gases are used for processes (in PlasmaAsher1, CF4 is used as well). The typical process parameters when operating the equipment: *Photeresist stripping Pressure: 0.8 - 1.0 mbar...&quot;</p> <p><b>New page</b></p><div>[[Image:Plasma_Asher_6inch.jpg|300x300px|thumb|Plasma asher for removing AZ resist on 6&quot; wafers: positioned in E-5]]<br /> <br /> The Plasma Asher 2 is the same as Plasma Asher 1 but has another loading system which is more convenient for batch loading of 6inch substrates. <br /> <br /> In this machine, only O2 and N2 gases are used for processes (in PlasmaAsher1, CF4 is used as well).<br /> <br /> The typical process parameters when operating the equipment:<br /> *Photeresist stripping<br /> Pressure: 0.8 - 1.0 mbar<br /> <br /> Gas: O2<br /> <br /> Power: 600 - 1000 watts<br /> <br /> Time: 5 -30 min., depending on photoresist type and thickness<br /> <br /> A typical process time for stripping of 1.5 um AZ5214e resist is 25 min for 6 wafers load in a boat, recipe 18. <br /> <br /> A Descum process in manual mode: O2:70, N2:70, power:150W, time:10 min <br /> <br /> Be sure to wait for cooling if the mashine has been used at 1000W right before. <br /> At a load at 2 Fused silica wafers resist removed 0.01-01,5um<br /> <br /> The other materials have not been tested yet.<br /> <br /> The user manual, user APV, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&amp;view=view&amp;mach=200 LabManager] - &#039;&#039;&#039;requires login&#039;&#039;&#039;<br /> <br /> ===Process Information===<br /> *[[Specific Process Knowledge/Lithography/Descum|Descum]]<br /> <br /> &lt;!-- TARAN 220-03-05<br /> ==III-V Plasma Asher==<br /> [[Image:III-V_asher.jpg|300x300px|thumb|Plasma asher for removing resist on III-V samples: positioned in A-5]]<br /> <br /> Diener Pico Plasma Asher for III-V materials.<br /> <br /> The user manual and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&amp;view=view&amp;mach=186 LabManager] - &#039;&#039;&#039;requires login&#039;&#039;&#039;<br /> --&gt;</div>

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