Specific Process Knowledge/Lithography/SU-8 - Revision history

Taran: /* Exposure */

2026-08-26T08:51:33Z

Exposure

← Older revision		Revision as of 10:51, 26 August 2026
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	'''Exposure in maskless aligner:'''<br>		'''Exposure in maskless aligner:'''<br>
	The required dose at 365 nm (MLA1) is higher than the optimal dose for ~~MA6-2~~, typically by a factor of approximately 1.4. For exposure at 375 nm (MLA2), the required dose is significantly higher than at 365 nm, by a factor of 5-10.		The required dose at 365 nm (MLA1) is higher than the optimal dose for mask aligner, typically by a factor of approximately 1.4. For exposure at 375 nm (MLA2), the required dose is significantly higher than at 365 nm, by a factor of 5-10.

	==Developing==		==Developing==

Taran: /* Exposure */

2026-08-26T08:39:45Z

Exposure

← Older revision		Revision as of 10:39, 26 August 2026
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	==Exposure==		==Exposure==
	Exposing SU-8 is done using light sources at 375 nm or lower. SU-8 is not (practically) sensitive to 405 nm light and above.		Exposing SU-8 is done using light sources at 375 nm or lower. SU-8 is not (practically) sensitive to 405 nm light and above.


	'''Exposure in mask aligner:'''<br>		'''Exposure in mask aligner:'''<br>
	Duration of the UV-exposure depends of resist thickness, and if the UV exposure becomes too long, the heating at the interface between the mask and resist can cause formation of "hard skin" at the surface of the SU-8; the so-called T-topping phenomena. The rule of thumb is, that if the exposure dose exceeds 250-300 mJ/cm<sup>2</sup>, it is recommended to do multiple exposures instead, with a waiting time of 15 - 20 s between the exposure steps, to allow the resist cool down.		Duration of the UV-exposure depends of resist thickness, and if the UV exposure becomes too long, the heating at the interface between the mask and resist can cause formation of "hard skin" at the surface of the SU-8; the so-called T-topping phenomena. The rule of thumb is, that if the exposure dose exceeds 250-300 mJ/cm<sup>2</sup>, it is recommended to do multiple exposures instead, with a waiting time of 15 - 20 s between the exposure steps, to allow the resist cool down.

			'''Exposure in maskless aligner:'''<br>
			The required dose at 365 nm (MLA1) is higher than the optimal dose for MA6-2, typically by a factor of approximately 1.4. For exposure at 375 nm (MLA2), the required dose is significantly higher than at 365 nm, by a factor of 5-10.

	==Developing==		==Developing==

Taran at 07:22, 26 August 2026

2026-08-26T07:22:08Z

← Older revision		Revision as of 09:22, 26 August 2026
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	'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/SU-8 click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/SU-8 click here]'''

	[[~~index.php?title=~~Category:Lithography\|Resist]]		[[Category:Lithography\|Resist]]
	[[~~index.php?title=~~Category:Resist\|SU-8]]		[[Category:Resist\|SU-8]]

	__TOC__		__TOC__

Jehem at 11:26, 20 April 2026

2026-04-20T11:26:28Z

← Older revision		Revision as of 13:26, 20 April 2026
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	{{~~:Specific Process Knowledge/Lithography/authors_generic~~}}		{{cc-nanolab}}

	'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/SU-8 click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/SU-8 click here]'''

Runku: then -> than

2025-11-04T07:57:38Z

then -> than

← Older revision		Revision as of 09:57, 4 November 2025
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	'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/SU-8 click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/SU-8 click here]'''

	[[Category:Lithography\|Resist]]		[[index.php?title=Category:Lithography\|Resist]]
	[[Category:Resist\|SU-8]]		[[index.php?title=Category:Resist\|SU-8]]

	__TOC__		__TOC__

	==Resist description==		==Resist description==
	SU-8 is an epoxy based negative i-line photoresist with a high contrast. More ~~then~~ 10:1 aspect ratio imaging with vertical sidewalls is one of the widely used properties of this resist. It also has high chemical, plasma and temperature resistance after curing which makes it well suited for permanent use applications.		SU-8 is an epoxy based negative i-line photoresist with a high contrast. More than 10:1 aspect ratio imaging with vertical sidewalls is one of the widely used properties of this resist. It also has high chemical, plasma and temperature resistance after curing which makes it well suited for permanent use applications.

	<span style="color:red">'''Note:''' Since the SU-8 is epoxy-based, users are required to take the mandatory epoxy safety course "Personlig sikkerhed ved arbejde med epoxy". Registration to this course can be found on [https://www.inside.dtu.dk/en/medarbejder/hr-og-arbejdsmiljoe/kompetenceudvikling/kursusoversigt_overside/kursusoversigt/arbejdsmiljoe-og-beredskabskurser/epoxy-kursus?fs=1 DTU Inside]</span> - '''requires login'''		<span style="color:red">'''Note:''' Since the SU-8 is epoxy-based, users are required to take the mandatory epoxy safety course "Personlig sikkerhed ved arbejde med epoxy". Registration to this course can be found on [https://www.inside.dtu.dk/en/medarbejder/hr-og-arbejdsmiljoe/kompetenceudvikling/kursusoversigt_overside/kursusoversigt/arbejdsmiljoe-og-beredskabskurser/epoxy-kursus?fs=1 DTU Inside]</span> - '''requires login'''
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	* Dispense manually from bottle/syringe for the thin resists or use a syringe dispense system for the thick resists		* Dispense manually from bottle/syringe for the thin resists or use a syringe dispense system for the thick resists
	* Use static dispense; approximately 1 ml of SU-8 per inch of substrate diameter		* Use static dispense; approximately 1 ml of SU-8 per inch of substrate diameter
	* For SU-8 layers thicker ~~then~~ 100 um use two-step spin coating procedure:		* For SU-8 layers thicker than 100 um use two-step spin coating procedure:
	** 5 second spread cycle 500 rpm, acceleration 100 rpm/s, following by:		** 5 second spread cycle 500 rpm, acceleration 100 rpm/s, following by:
	** thickness definition cycle with the final spin speed		** thickness definition cycle with the final spin speed
	** layer uniformity of the thick films can be improved by using a rotation cover (Gyrset), but remember the speed limitation is then 3000 rpm		** layer uniformity of the thick films can be improved by using a rotation cover (Gyrset), but remember the speed limitation is then 3000 rpm
	* For SU-8 layers thinner ~~then~~ 10 um the spread cycle can be omitted to improve the uniformity of the films		* For SU-8 layers thinner than 10 um the spread cycle can be omitted to improve the uniformity of the films

Taran: /* Resist description */

2025-09-02T11:19:39Z

Resist description

← Older revision		Revision as of 13:19, 2 September 2025
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	SU8 XFT75 instead of SU8 2075 [https://kayakuam.com/su8xft/ Product information]		SU8 XFT75 instead of SU8 2075 [https://kayakuam.com/su8xft/ Product information]

	And we will also try a new formulation SU8 3025.[https://kayakuam.com/products/su-8-3000/ Product information]		And we will also try a new formulation SU8 3025. [https://kayakuam.com/products/su-8-3000/ Product information]

Mmat at 21:46, 16 June 2025

2025-06-16T21:46:58Z

← Older revision		Revision as of 23:46, 16 June 2025
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	'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/SU-8 click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/SU-8 click here]'''

	[[~~index.php?title=~~Category:Lithography\|Resist]]		[[Category:Lithography\|Resist]]
	[[~~index.php?title=~~Category:Resist\|SU-8]]		[[Category:Resist\|SU-8]]

	__TOC__		__TOC__

Elkh: /* Spinning */

2025-04-07T10:06:20Z

Spinning

← Older revision		Revision as of 12:06, 7 April 2025
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	'''Spin curves:'''		'''Spin curves:'''
			Please notice that we do not have a spin curves for new formulations yet, but as soon as we have available data based on our experiments from cleanroom we will publish it.
	Spin curves for SU-8 2002 and SU-8 2005 (from the old KS Spinner):		Spin curves for SU-8 2002 and SU-8 2005 (from the old KS Spinner):
	[[File:SU8 spinCurves 2002 2005.png\|640px\|thumb\|right\|Spin curves for SU-8 2002 and SU-8 2005.]]		[[File:SU8 spinCurves 2002 2005.png\|640px\|thumb\|right\|Spin curves for SU-8 2002 and SU-8 2005.]]

Elkh: /* Resist description */

2025-04-07T09:28:58Z

Resist description

← Older revision		Revision as of 11:28, 7 April 2025
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	After an internal conversation we have decided to try new followings products:		After an internal conversation we have decided to try new followings products:

	SU8 3005 instead of SU8 2005 [https://kayakuam.com/products/su-8-3000/]		SU8 3005 instead of SU8 2005 [https://kayakuam.com/products/su-8-3000/ Product information]

	SU8 3035 instead of SU8 2035 [https://kayakuam.com/products/su-8-3000/]		SU8 3035 instead of SU8 2035 [https://kayakuam.com/products/su-8-3000/ Product information]

	SU8 XFT75 instead of SU8 2075 [https://kayakuam.com/su8xft/]		SU8 XFT75 instead of SU8 2075 [https://kayakuam.com/su8xft/ Product information]

	And we will also try a new formulation SU8 3025.[https://kayakuam.com/products/su-8-3000/]		And we will also try a new formulation SU8 3025.[https://kayakuam.com/products/su-8-3000/ Product information]

Elkh: /* Resist description */

2025-04-07T09:25:43Z

Resist description

← Older revision		Revision as of 11:25, 7 April 2025
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	After an internal conversation we have decided to try new followings products:		After an internal conversation we have decided to try new followings products:
	~~SU8 3005 instead of SU8 2005~~

	SU8 ~~3035~~ instead of SU8 ~~2035~~		SU8 3005 instead of SU8 2005 [https://kayakuam.com/products/su-8-3000/]

	SU8 ~~XFT75~~ instead of SU8 ~~2075~~		SU8 3035 instead of SU8 2035 [https://kayakuam.com/products/su-8-3000/]

	And we will also try a new formulation SU8 3025.		SU8 XFT75 instead of SU8 2075 [https://kayakuam.com/su8xft/]

			And we will also try a new formulation SU8 3025.[https://kayakuam.com/products/su-8-3000/]