https://labadviser.nanolab.dtu.dk//index.php?action=history&feed=atom&title=Specific_Process_Knowledge%2FLithography%2FEBeamLithography%2Fma-N_2400 2026-04-17T12:30:51Z Revision history for this page on the wiki MediaWiki 1.43.3 https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/EBeamLithography/ma-N_2400&diff=49901&oldid=prev 2024-05-31T09:45:08Z

<p>Created page with &quot;=Spin coating= ma-N 2400 can be spin coated on LabSpin 2 and 3 using the CSAR/PMMA bowlset. A spin curve for ma-N 2400.05 is provided below. Process parameters are: *Date: May 31st 2024 *Coater: LabSpin 2 *Substrate: 2&quot; Si *Acceleration: 1000 RPM/s *Time: 60 s *Baking temperature: 90C (setpoint at 100C) *Baking time: 60 s {| style=&quot;border: none; border-spacing: 0; margin: 1em auto; text-align: center;&quot; |- | <a href="/index.php?title=File:MaN2400spincurve.png" title="File:MaN2400spincurve.png">800px</a> |- | colspan=&quot;1&quot; style=&quot;t...&quot;</p> <p><b>New page</b></p><div>=Spin coating=<br /> ma-N 2400 can be spin coated on LabSpin 2 and 3 using the CSAR/PMMA bowlset. A spin curve for ma-N 2400.05 is provided below. Process parameters are:<br /> *Date: May 31st 2024<br /> *Coater: LabSpin 2<br /> *Substrate: 2&quot; Si<br /> *Acceleration: 1000 RPM/s<br /> *Time: 60 s<br /> *Baking temperature: 90C (setpoint at 100C)<br /> *Baking time: 60 s<br /> <br /> {| style=&quot;border: none; border-spacing: 0; margin: 1em auto; text-align: center;&quot;<br /> |-<br /> | [[image:maN2400spincurve.png|800px]]<br /> |- <br /> | colspan=&quot;1&quot; style=&quot;text-align: center;|<br /> ma-N 2400.05 spin curve.<br /> |}<br /> <br /> Resulting resist thickness can be determined as y = ax&lt;sup&gt;b&lt;/sup&gt;+c, where y is thickness [nm], x is spin speed [RPM], a = 1015400, b = -1.1 and c = 368.3.</div>

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