Specific Process Knowledge/Lithography/EBeamLithography/Nanobook - Revision history

Thope: /* Imaging */

2026-06-24T09:31:58Z

Imaging

← Older revision		Revision as of 11:31, 24 June 2026
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	The entire book is available for download as a 2.4 gigapixel composite SEM image viewable in PureRef.		The entire book is available for download as a [https://drive.google.com/file/d/10Qa4RgFeogYEqRzbjccWhI5WEIbZZIhM/view?usp=share_link 2.4 gigapixel composite SEM image] viewable in PureRef.

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Thope: /* Imaging */

2026-06-24T09:13:26Z

Imaging

← Older revision		Revision as of 11:13, 24 June 2026
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	SEM image ~~of a small fraction~~ of the book~~. Letter line width is 31 nm and letter height is about 116 nm~~.		Composite SEM image of the entire book.
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Thope: /* Imaging */

2026-06-24T09:12:53Z

Imaging

← Older revision		Revision as of 11:12, 24 June 2026
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	\| [[File:MobyDickSEM3.png\|400px]]		\| [[File:MobyDickSEM3.png\|400px]]
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			SEM image of a small fraction of the book. Letter line width is 31 nm and letter height is about 116 nm.
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			The entire book is available for download as a 2.4 gigapixel composite SEM image viewable in PureRef.

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			\| [[File:MobyDickTotal.png\|400px]]
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	SEM image of a small fraction of the book. Letter line width is 31 nm and letter height is about 116 nm.		SEM image of a small fraction of the book. Letter line width is 31 nm and letter height is about 116 nm.
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Thope: /* Exposure */

2026-06-18T12:10:37Z

Exposure

← Older revision		Revision as of 14:10, 18 June 2026
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	For this exposure we coated a 100 mm Si wafer with 70 nm ZEP 520A resist. To hit the relatively small feature size it is essential to work with a thin resist layer.		For this exposure we coated a 100 mm Si wafer with 70 nm ZEP 520A resist. To hit the relatively small feature size it is essential to work with a thin resist layer.

	The exposure was done on our state of the art JEOL 9500 FSZ exposure system. If you are interested in seeing the system in operation consider this video on our Youtube channel. Exposure was done at a low beam current of only 0.22 nA and a voltage of 100 keV. The DTU logo on the chip was however exposed at a much higher beam current.		The exposure was done on our state of the art JEOL 9500 FSZ exposure system. If you are interested in seeing the system in operation consider [https://youtu.be/2bFUO201DS4?si=1GJKJLrZCRnwPmRq this video on our Youtube channel]. Exposure was done at a low beam current of only 0.22 nA and a voltage of 100 keV. The DTU logo on the chip was however exposed at a much higher beam current.

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Thope: /* Intro */

2026-06-18T12:02:41Z

Intro

← Older revision		Revision as of 14:02, 18 June 2026
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	\| [[image:MDWaferImage.jpg\|~~300px~~]]		\| [[image:MDWaferImage.jpg\|500px]]
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Thope: /* Intro */

2026-06-18T12:02:32Z

Intro

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Thope: /* Intro */

2026-06-18T12:02:10Z

Intro

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Thope: /* Intro */

2026-06-18T12:01:51Z

Intro

← Older revision		Revision as of 14:01, 18 June 2026
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	In particular, you are holding a version of Moby Dick by Herman Melville that has been shrunk to a minute size and defined by our state of the art Electron Beam Lithography system onto a silicon wafer. Despite a length of roughly 1.300.000 characters (about 650 pages) this version of the book covers an area of just 0.046 mm^2. At this scale it can fit more than 9000 times on one face of a 1 euro coin! It is not a super convenient format for reading since this would require an expensive Scanning Electron Microscope but it demonstrates the scale of modern day semiconductor fabrication techniques.		In particular, you are holding a version of Moby Dick by Herman Melville that has been shrunk to a minute size and defined by our state of the art Electron Beam Lithography system onto a silicon wafer. Despite a length of roughly 1.300.000 characters (about 650 pages) this version of the book covers an area of just 0.046 mm^2. At this scale it can fit more than 9000 times on one face of a 1 euro coin! It is not a super convenient format for reading since this would require an expensive Scanning Electron Microscope but it demonstrates the scale of modern day semiconductor fabrication techniques.

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			Final chip with DTU logo and the Moby Dick book placed in the center of the circle. The circle is 2000 µm in diameter.
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	= How it was made =		= How it was made =

Thope: /* How was it made */

2026-06-17T20:57:41Z

How was it made

← Older revision		Revision as of 22:57, 17 June 2026
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	In particular, you are holding a version of Moby Dick by Herman Melville that has been shrunk to a minute size and defined by our state of the art Electron Beam Lithography system onto a silicon wafer. Despite a length of roughly 1.300.000 characters (about 650 pages) this version of the book covers an area of just 0.046 mm^2. At this scale it can fit more than 9000 times on one face of a 1 euro coin! It is not a super convenient format for reading since this would require an expensive Scanning Electron Microscope but it demonstrates the scale of modern day semiconductor fabrication techniques.		In particular, you are holding a version of Moby Dick by Herman Melville that has been shrunk to a minute size and defined by our state of the art Electron Beam Lithography system onto a silicon wafer. Despite a length of roughly 1.300.000 characters (about 650 pages) this version of the book covers an area of just 0.046 mm^2. At this scale it can fit more than 9000 times on one face of a 1 euro coin! It is not a super convenient format for reading since this would require an expensive Scanning Electron Microscope but it demonstrates the scale of modern day semiconductor fabrication techniques.

	= How was it made =		= How it was made =
	The process consists of a few steps		The process consists of a few steps

Thope: /* Pattern generation */

2026-06-17T20:56:19Z

Pattern generation

← Older revision		Revision as of 22:56, 17 June 2026
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	== Pattern generation ==		== Pattern generation ==
	Converting this amount of text is not easily done through any regular mask layout tool. Thus, a custom python script was developed which can take a simple text file and convert it to a GDS layout. [[~~File~~:MobyDick.gds \| The resulting GDS file can be downloaded here]] and viewed in any GDS editor. For the actual exposure a scale of 0.6 was applied to the pattern resulting in a pattern size of 192 x 240 µm^2. The target linewidth of the letters at this scale is just about 30 nm.		Converting this amount of text is not easily done through any regular mask layout tool. Thus, a custom python script was developed which can take a simple text file and convert it to a GDS layout. [[Media:MobyDick.gds \| The resulting GDS file can be downloaded here]] and viewed in any GDS editor. For the actual exposure a scale of 0.6 was applied to the pattern resulting in a pattern size of 192 x 240 µm^2. The target linewidth of the letters at this scale is just about 30 nm.

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