Specific Process Knowledge/Lithography/EBeamLithography/JEOLJobPreparation - Revision history

Elelop: /* SDF sequence section */

2025-06-03T08:07:12Z

SDF sequence section

← Older revision		Revision as of 10:07, 3 June 2025
Line 96:		Line 96:
	'''FFOCUS'''		'''FFOCUS'''

	Field Focus was added to the system in 2021. It allows the system to adjust beam focus individually for each writing field based on a sample surface height map generated with HEIMAP. If FFOCUS is omitted the HEIMAP matrix will be used to calculated a single average sample height and beam focus will be set to this value. If FFOCUS is used the HEIMAP data will be used to generate a surface map and each individual writing field will be exposed with a beam focus based on this surface map. This function can not be used with height data obtained from ~~SETWAFR~~ or CHIPAL.		Field Focus was added to the system in 2021. It allows the system to adjust beam focus individually for each writing field based on a sample surface height map generated with HEIMAP. If FFOCUS is omitted the HEIMAP matrix will be used to calculated a single average sample height and beam focus will be set to this value. If FFOCUS is used the HEIMAP data will be used to generate a surface map and each individual writing field will be exposed with a beam focus based on this surface map. This function can not be used with height data obtained from SETWFR or CHIPAL.

	'''RESIST [dose]'''		'''RESIST [dose]'''

Thope: /* Schedule File */

2024-07-31T22:52:30Z

Schedule File

← Older revision		Revision as of 00:52, 1 August 2024
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	ACC 100		ACC 100
	CALPRM '2na_ap4'		CALPRM '2na_ap4'
	DEFMODE 2		DEFMODE 2
			FFOCUS
	RESIST 240		RESIST 240
	SHOT A,16		SHOT A,16
Line 92:		Line 93:

	This parameter determines if the system writes in 2 deflector mode or 1 deflector mode. In 2 deflector mode the primary deflector positions the beam within the main writing field with the subdeflector positions the beam with each 4 x 4 µm subfield. Writing speed is significantly higher in 2 deflector mode and the system should always be used in mode 2.		This parameter determines if the system writes in 2 deflector mode or 1 deflector mode. In 2 deflector mode the primary deflector positions the beam within the main writing field with the subdeflector positions the beam with each 4 x 4 µm subfield. Writing speed is significantly higher in 2 deflector mode and the system should always be used in mode 2.

			'''FFOCUS'''

			Field Focus was added to the system in 2021. It allows the system to adjust beam focus individually for each writing field based on a sample surface height map generated with HEIMAP. If FFOCUS is omitted the HEIMAP matrix will be used to calculated a single average sample height and beam focus will be set to this value. If FFOCUS is used the HEIMAP data will be used to generate a surface map and each individual writing field will be exposed with a beam focus based on this surface map. This function can not be used with height data obtained from SETWAFR or CHIPAL.

	'''RESIST [dose]'''		'''RESIST [dose]'''

Thope: /* Beam current and condition files */

2024-04-16T09:44:36Z

Beam current and condition files

← Older revision		Revision as of 11:44, 16 April 2024
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	\| 6 \|\| 5 \|\| 6na_ap5		\| 6 \|\| 5 \|\| 6na_ap5
	\|-		\|-
	\| 10 \|\| 5 \|\| ~~10na_ap5~~		\| 10 \|\| 6 \|\| 10na_ap6
	\|-		\|-
	\| 12 \|\| 5 \|\| 12na_ap5		\| 12 \|\| 5 \|\| 12na_ap5

Thope: /* Available condition files */

2024-04-03T13:04:35Z

Available condition files

← Older revision		Revision as of 15:04, 3 April 2024
Line 400:		Line 400:
	It V1 mode it is customary to set M1 = (0,0) such that substrate height is detected at the center of the chip. In this way V1 mode can be used to exactly read out substrate height where the chip pattern will be written.		It V1 mode it is customary to set M1 = (0,0) such that substrate height is detected at the center of the chip. In this way V1 mode can be used to exactly read out substrate height where the chip pattern will be written.

	=~~Available~~ condition files=		=Beam current and condition files=
	The beam current can in principle be changed in very fine steps, it however requires recalibration of the Dynamic Focus and Dynamic Stigmation table. Hence, only a limited number of beam currents are available. The available beam currents and condition file name are listed below.		The beam current can in principle be changed in very fine steps, it however requires recalibration of the Dynamic Focus and Dynamic Stigmation table. Hence, only a limited number of beam currents are available. The available beam currents and condition file name are listed below.

Thope: /* Available condition files */

2024-04-03T12:54:08Z

Available condition files

← Older revision		Revision as of 14:54, 3 April 2024
Line 406:		Line 406:
	\|+ Condition files and beam current		\|+ Condition files and beam current
	\|-		\|-
	! ~~Typical beam~~ current [nA] !! Aperture !! Condition file		! Beam current [nA] !! Aperture !! Condition file
	\|-		\|-
	\| 0.12 \|\| 4 \|\| 0.12na_ap4		\| 0.12 \|\| 4 \|\| 0.12na_ap4
Line 412:		Line 412:
	\| 0.16 \|\| 4 \|\| 0.16na_ap4		\| 0.16 \|\| 4 \|\| 0.16na_ap4
	\|-		\|-
	\| 0.~~227~~ \|\| 4 \|\| 0.22na_ap4		\| 0.22 \|\| 4 \|\| 0.22na_ap4
	\|-		\|-
	\| 0.4 \|\| 4 \|\| 0.4na_ap4		\| 0.4 \|\| 4 \|\| 0.4na_ap4
Line 418:		Line 418:
	\| 0.5 \|\| 4 \|\| 0.5na_ap4		\| 0.5 \|\| 4 \|\| 0.5na_ap4
	\|-		\|-
	\| 0.~~815~~ \|\| 4 \|\| 0.8na_ap4		\| 0.8 \|\| 4 \|\| 0.8na_ap4
	\|-		\|-
	\| 1.4 \|\| 4 \|\| 1.4na_ap4		\| 1.4 \|\| 4 \|\| 1.4na_ap4

Thope: /* Available condition files */

2024-04-03T12:53:44Z

Available condition files

@@ Line 435: / Line 435: @@
 |-
 | 6 || 5 || 6na_ap5
 |}

Thope: /* Available condition files */

2024-04-03T12:49:49Z

Available condition files

← Older revision		Revision as of 14:49, 3 April 2024
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	\|-		\|-
	\| 2.7 \|\| 4 \|\| 2.7na_ap4		\| 2.7 \|\| 4 \|\| 2.7na_ap4
			\|-
			\| 3.8 \|\| 5 \|\| 3.8na_ap5
	\|-		\|-
	\| 4 \|\| 4 \|\| 4na_ap4		\| 4 \|\| 4 \|\| 4na_ap4
	\|-
	~~\| 3.8 \|\| 5 \|\| 3.8na_ap5~~
	\|-		\|-
	\| 5 \|\| 5 \|\| 5na_ap5		\| 5 \|\| 5 \|\| 5na_ap5

Thope: /* Available condition files */

2024-04-03T12:49:08Z

Available condition files

@@ Line 402: / Line 402: @@
 =Available condition files=
 The beam current can in principle be changed in very fine steps, it however requires recalibration of the Dynamic Focus and Dynamic Stigmation table. Hence, only a limited number of beam currents are available. The available beam currents and condition file name are listed below.
 {| class="wikitable"
@@ Line 420: / Line 419: @@
 |-
 | 0.815 || 4 || 0.8na_ap4
 |}

Thope: /* Available condition files */

2024-04-03T12:45:54Z

Available condition files

← Older revision		Revision as of 14:45, 3 April 2024
Line 408:		Line 408:
	\|-		\|-
	! Typical beam current [nA] !! Aperture !! Condition file		! Typical beam current [nA] !! Aperture !! Condition file
			\|-
			\| 0.12 \|\| 4 \|\| 0.12na_ap4
			\|-
			\| 0.16 \|\| 4 \|\| 0.16na_ap4
	\|-		\|-
	\| 0.227 \|\| 4 \|\| 0.22na_ap4		\| 0.227 \|\| 4 \|\| 0.22na_ap4
			\|-
			\| 0.4 \|\| 4 \|\| 0.4na_ap4
			\|-
			\| 0.5 \|\| 4 \|\| 0.5na_ap4
			\|-
			\| 0.815 \|\| 4 \|\| 0.8na_ap4
	\|}		\|}

Thope: /* Available condition files */

2024-04-03T12:44:25Z

Available condition files

← Older revision		Revision as of 14:44, 3 April 2024
Line 407:		Line 407:
	\|+ Condition files and beam current		\|+ Condition files and beam current
	\|-		\|-
	! ~~Beam~~ current !! Aperture !! Condition file		! Typical beam current [nA] !! Aperture !! Condition file
	\|-		\|-
	\| 0.22 \|\| 4 \|\| 0.22na_ap4		\| 0.227 \|\| 4 \|\| 0.22na_ap4
	\|}		\|}