Specific Process Knowledge/Lithography/EBeamLithography/FilePreparation - Revision history

Thope: /* Alignment and global mark detection */

2025-01-02T12:19:12Z

Alignment and global mark detection

← Older revision		Revision as of 14:19, 2 January 2025
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	[[File:markorientation.jpg\|300px]]		[[File:markorientation.jpg\|300px]]

	note 2: Always add 10% to the current in this command to make sure you work well below ~~100~~ MHz and thus will not be affected if the current fluctuates above the base current.		note 2: Always add 5% to the current in this command to make sure you work well below 200 MHz and thus will not be affected if the current fluctuates above the base current.

	== Dose variation ==		== Dose variation ==

Thope: /* Calibration during writing (PATH) */

2022-12-16T10:34:41Z

Calibration during writing (PATH)

← Older revision		Revision as of 12:34, 16 December 2022
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	</pre>		</pre>

	The full list of calibration *[[Specific_Process_Knowledge/Lithography/EBeamLithography/FilePreparation/Pathlist\|paths are available here.]]		The full list of calibration [[Specific_Process_Knowledge/Lithography/EBeamLithography/FilePreparation/Pathlist\|paths are available here.]]

	== Alignment and global mark detection ==		== Alignment and global mark detection ==

Thope: /* Calibration during writing (PATH) */

2022-12-16T10:34:27Z

Calibration during writing (PATH)

← Older revision		Revision as of 12:34, 16 December 2022
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	</pre>		</pre>

	The full list of calibration *[[~~LabAdviser/~~Specific_Process_Knowledge/Lithography/EBeamLithography/FilePreparation/Pathlist\|paths are available here.]]		The full list of calibration *[[Specific_Process_Knowledge/Lithography/EBeamLithography/FilePreparation/Pathlist\|paths are available here.]]

	== Alignment and global mark detection ==		== Alignment and global mark detection ==

Thope: /* Calibration during writing (PATH) */

2022-12-16T10:33:27Z

Calibration during writing (PATH)

← Older revision		Revision as of 12:33, 16 December 2022
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	</pre>		</pre>

	The full list of calibration [[~~https:~~/~~/labadviser.nanolab.dtu.dk/index.php?title=~~Specific_Process_Knowledge/Lithography/EBeamLithography/FilePreparation/~~Paths~~\|paths are available here.]]		The full list of calibration *[[LabAdviser/Specific_Process_Knowledge/Lithography/EBeamLithography/FilePreparation/Pathlist\|paths are available here.]]

	== Alignment and global mark detection ==		== Alignment and global mark detection ==

Thope: /* Calibration during writing (PATH) */

2022-12-16T10:30:26Z

Calibration during writing (PATH)

← Older revision		Revision as of 12:30, 16 December 2022
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	DIRE01 INITIAL: PDEFBE, SUBDEFBE, CURRENT		DIRE01 INITIAL: PDEFBE, SUBDEFBE, CURRENT
	CYCLIC: CURRNT (every 5 minutes without interupting the writing of a field)		CYCLIC: CURRNT (every 5 minutes without interupting the writing of a field)
			</pre>

	</~~pre>~~		The full list of calibration [[https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/EBeamLithography/FilePreparation/Paths\|paths are available here.]]

	== Alignment and global mark detection ==		== Alignment and global mark detection ==

Thope at 15:03, 14 September 2022

2022-09-14T15:03:34Z

← Older revision		Revision as of 17:03, 14 September 2022
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	For pattern exposure on the JEOL 9500 tool the pattern must be stored in JEOLs own proprietary JEOL52v3.0 format, also known as V30. At DTU Nanolab we use Beamer to generate the V30 file from the original design file. We recommend using GDS as the original file format although Beamer can read multiple formats. In addition to the a pattern file exposure requires a Schedule file (SDF) and a Jobdeck file (JDF). These are text files where the user defines exposure conditions. Before pattern writing these three files (V30, SDF and JDF) are compiled into a final magazine file (MGN) which fully defines the exposure job.		For pattern exposure on the JEOL 9500 tool the pattern must be stored in JEOLs own proprietary JEOL52v3.0 format, also known as V30. At DTU Nanolab we use Beamer to generate the V30 file from the original design file. We recommend using GDS as the original file format although Beamer can read multiple formats. In addition to the a pattern file exposure requires a Schedule file (SDF) and a Jobdeck file (JDF). These are text files where the user defines exposure conditions. Before pattern writing these three files (V30, SDF and JDF) are compiled into a final magazine file (MGN) which fully defines the exposure job.

			== Conversion from GDS to V30 in Beamer ==

			Beamer has a lot of different modules and can be used to manipulate a design considerably. In this section we will only look at how to import a design file and export it to V30.

			Beamer uses a node based workflow and each task is defined by a node with its own set of parameter. For this simple example we will only use the "Import" and "Export" nodes.

			== Basic SDF conten ==

			== Basic JDF content ==

	~~= Preparing a GDS file =~~

	If the layout is asymmetric, the conversion might result in an offset of the final layout onto the wafer. It is therefore recommended to symmetrise the layout, e.g. by inserting small structures in the corners of a rectangle that covers the layout.		If the layout is asymmetric, the conversion might result in an offset of the final layout onto the wafer. It is therefore recommended to symmetrise the layout, e.g. by inserting small structures in the corners of a rectangle that covers the layout.

Thope at 14:28, 14 September 2022

2022-09-14T14:28:52Z

← Older revision		Revision as of 16:28, 14 September 2022
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	For pattern exposure on the JEOL 9500 tool the pattern must be stored in JEOLs own proprietary JEOL52v3.0 format, also known as V30. At DTU Nanolab we use Beamer to generate the V30 file from the original design file. We recommend using GDS as the original file format although Beamer can read multiple formats. In addition to the a pattern file exposure requires a Schedule file (SDF) and a Jobdeck file (JDF). These are text files where the user defines exposure conditions. Before pattern writing these three files (V30, SDF and JDF) are compiled into a final magazine file (MGN) which fully defines the exposure job.		For pattern exposure on the JEOL 9500 tool the pattern must be stored in JEOLs own proprietary JEOL52v3.0 format, also known as V30. At DTU Nanolab we use Beamer to generate the V30 file from the original design file. We recommend using GDS as the original file format although Beamer can read multiple formats. In addition to the a pattern file exposure requires a Schedule file (SDF) and a Jobdeck file (JDF). These are text files where the user defines exposure conditions. Before pattern writing these three files (V30, SDF and JDF) are compiled into a final magazine file (MGN) which fully defines the exposure job.

	~~<br clear="all" />~~

	= Preparing a GDS file =		= Preparing a GDS file =

Thope at 14:27, 14 September 2022

2022-09-14T14:27:41Z

← Older revision		Revision as of 16:27, 14 September 2022
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	'''Feedback to this page''': '''[mailto:e-beam@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography click here]'''		'''Feedback to this page''': '''[mailto:e-beam@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography click here]'''

	= ~~Introduction~~ =		= File preparation for exposure on JEOL 9500 =


	[[Image:Conversion.png\|600px\|right\|]]		[[Image:Conversion.png\|600px\|right\|]]

	~~An e-beam~~ exposure ~~requires a v30-file, which contains information~~ on the pattern to ~~write,~~ a ~~jobdeck~~ file (~~jdf-file~~), and a ~~schedule~~ file (~~sdf-file~~). ~~The sdf- and jdf-file contain information about size and position of substrate, dose, current, and shot step~~. ~~The sdf-file~~, ~~jdf-file~~ and ~~v30-file~~ are compiled to a magazine-file (~~mgn~~) on the ~~9500 computer.~~		For pattern exposure on the JEOL 9500 tool the pattern must be stored in JEOLs own proprietary JEOL52v3.0 format, also known as V30. At DTU Nanolab we use Beamer to generate the V30 file from the original design file. We recommend using GDS as the original file format although Beamer can read multiple formats. In addition to the a pattern file exposure requires a Schedule file (SDF) and a Jobdeck file (JDF). These are text files where the user defines exposure conditions. Before pattern writing these three files (V30, SDF and JDF) are compiled into a final magazine file (MGN) which fully defines the exposure job.


	~~When a magazine-file is prepared, the actual shot time can be estimated by the e-beam computer (9500)~~.


	<br clear="all" />		<br clear="all" />

Lgpe: /* Troubleshooting */

2021-07-14T10:24:29Z

Troubleshooting

← Older revision		Revision as of 12:24, 14 July 2021
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	# The order of commands might be wrong in either the sdf- or jdf-file; check the order of commands in the templates in the directory home/eb0/jeoleb/job/templates		# The order of commands might be wrong in either the sdf- or jdf-file; check the order of commands in the templates in the directory home/eb0/jeoleb/job/templates
	# The sdf- or jdf-files might have been opened in a text-program different from SuperEdi, e.g. notepad; this can corrupt the files and add linefeeds or tokens at line-ends. This can be checked in SuperEdi. In most cases, the problem can be solved by opening the sdf- and jdf-file in SuperEdi and save it again while setting the line endings to UNIX.		# The sdf- or jdf-files might have been opened in a text-program different from SuperEdi, e.g. notepad; this can corrupt the files and add linefeeds or tokens at line-ends. This can be checked in SuperEdi. In most cases, the problem can be solved by opening the sdf- and jdf-file in SuperEdi and save it again while setting the line endings to UNIX.

			# If none of the above works find a template home/eb0/jeoleb/job/templates and re-write your information into it, do NOT copy for the reasons of the last point above.

	# The path writing requires a scan speed larger than 100MHz; increase the shot pitch (SHOT) in the sdf-file and compile again.		# The path writing requires a scan speed larger than 100MHz; increase the shot pitch (SHOT) in the sdf-file and compile again.

Jmli at 19:23, 25 November 2019

2019-11-25T19:23:57Z

← Older revision		Revision as of 21:23, 25 November 2019
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	'''Feedback to this page''': '''[mailto:e-beam@~~danchip~~.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.~~danchip~~.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography click here]'''		'''Feedback to this page''': '''[mailto:e-beam@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography click here]'''

	= Introduction =		= Introduction =