Specific Process Knowledge/Lithography/EBeamLithography/EBLsubstratePrep - Revision history

Elelop at 14:25, 4 February 2026

2026-02-04T14:25:31Z

← Older revision		Revision as of 16:25, 4 February 2026
Line 159:		Line 159:
	\|-		\|-
	\|-style="background:LightGrey; color:black"		\|-style="background:LightGrey; color:black"
	\|'''~~[[Specific_Process_Knowledge/Lithography/mrEBL6000\|~~mr EBL 6000.1]]'''		\|'''mr EBL 6000.1'''
	\|Negative		\|Negative
	\|[http://http://www.microresist.de/home_en.htm MicroResist]		\|[http://http://www.microresist.de/home_en.htm MicroResist]

Elelop at 14:07, 4 February 2026

2026-02-04T14:07:24Z

← Older revision		Revision as of 16:07, 4 February 2026
Line 184:		Line 184:
	\|		\|
	\|[[media:Process Flow HSQ.docx\|process flow HSQ]]		\|[[media:Process Flow HSQ.docx\|process flow HSQ]]
	~~[[Specific_Process_Knowledge/Lithography/EBeamLithography/High_resolution_patterning_with_HSQ\|High resolution patterning with HSQ]]~~

	\|-		\|-

Mmat at 15:32, 17 June 2025

2025-06-17T15:32:41Z

← Older revision		Revision as of 17:32, 17 June 2025
Line 1:		Line 1:
	= Resist coating =		= Resist coating =
	An appropriate EBL resist must naturally be applied to the substrate. DTU Nanolab supplies a number of standard resists, please consult the table below. The default positive EBL resist is AR-P 6200.09 (CSAR). CSAR is installed on [[Specific_Process_Knowledge/Lithography/Coaters#Spin Coater: Gamma E-beam and UV\|Spin Coater: Gamma E-beam and UV]] for spin coating of 2", 4" and 6" substrates. For other substrate sizes (i.e. chips) or other resists [[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters\|Spin Coater: LabSpin 02/03]] have to be used instead. The standard resist bottles are stored in the chemical cupboard in E-4.		An appropriate EBL resist must naturally be applied to the substrate. DTU Nanolab supplies a number of standard resists, please consult the table below. The default positive EBL resist is AR-P 6200.09 (CSAR). CSAR is installed on [[Specific_Process_Knowledge/Lithography/Coaters#Spin Coater: Gamma E-beam and UV\|Spin Coater: Gamma E-beam and UV]] for spin coating of 2", 4" and 6" substrates. For other substrate sizes (i.e. chips) or other resists [[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters\|Spin Coater: LabSpin 02/03]] have to be used instead. The standard resist bottles are stored in the chemical cupboard in E-4.

	<p style="color:red;">Contrary to most UV resist it is in general not advisable to use HMDS priming when coating with EBL resists. There can of course be exceptions to this but we do not recommend HMDS priming when using the DTU Nanolab supplied EBL resists.</p>

	We recommend all groups or users to have their own bottle of e-beam resist inside the cleanroom. Please follow the [[Specific Process Knowledge/Lithography/EBeamLithography/ResistBottles\|user resist bottles in the cleanroom guide.]]		We recommend all groups or users to have their own bottle of e-beam resist inside the cleanroom. Please follow the [[Specific Process Knowledge/Lithography/EBeamLithography/ResistBottles\|user resist bottles in the cleanroom guide.]]

Mmat: /* User supplied resists */

2025-06-17T13:58:26Z

User supplied resists

← Older revision		Revision as of 15:58, 17 June 2025
Line 147:		Line 147:
	\|-		\|-
	\|-style="background:WhiteSmoke; color:black"		\|-style="background:WhiteSmoke; color:black"
	\|'''[[		\|'''[[Specific Process Knowledge/Lithography/EBeamLithography/AR-P 617\|Copolymer AR-P 617]]'''
	Specific Process Knowledge/Lithography/EBeamLithography/AR-P 617\|Copolymer AR-P 617]]'''
	\|Positive		\|Positive
	\|[http://www.allresist.com AllResist]		\|[http://www.allresist.com AllResist]

Mmat: /* User supplied resists */

2025-06-17T13:58:17Z

User supplied resists

← Older revision		Revision as of 15:58, 17 June 2025
Line 147:		Line 147:
	\|-		\|-
	\|-style="background:WhiteSmoke; color:black"		\|-style="background:WhiteSmoke; color:black"
	\|'''[[~~Specific_Process_Knowledge~~/Lithography/~~ARP617~~\|Copolymer AR-P 617]]'''		\|'''[[
			Specific Process Knowledge/Lithography/EBeamLithography/AR-P 617\|Copolymer AR-P 617]]'''
	\|Positive		\|Positive
	\|[http://www.allresist.com AllResist]		\|[http://www.allresist.com AllResist]

Mmat: /* User supplied resists */

2025-06-17T13:56:02Z

User supplied resists

← Older revision		Revision as of 15:56, 17 June 2025
Line 107:		Line 107:
	==User supplied resists==		==User supplied resists==
	It is possible to obtain permission to user other resists at DTU Nanolab, users must however provide these resists and possibly developers themselves. A non-exhaustive list of user supplied EBL resist used at DTU Nanolab and some process guidelines can be found in the table below.		It is possible to obtain permission to user other resists at DTU Nanolab, users must however provide these resists and possibly developers themselves. A non-exhaustive list of user supplied EBL resist used at DTU Nanolab and some process guidelines can be found in the table below.
			<br>

	{\|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" width="95%"		{\|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" width="95%"
	\|-		\|-

Mmat: /* DTU Nanolab supplied EBL resists */

2025-06-17T13:55:46Z

DTU Nanolab supplied EBL resists

← Older revision		Revision as of 15:55, 17 June 2025
Line 102:		Line 102:

	\|}		\|}
			<br>
			<br>

	==User supplied resists==		==User supplied resists==

Mmat: /* DTU Nanolab supplied EBL resists */

2025-06-17T13:55:17Z

DTU Nanolab supplied EBL resists

← Older revision		Revision as of 15:55, 17 June 2025
Line 7:		Line 7:

	==DTU Nanolab supplied EBL resists==		==DTU Nanolab supplied EBL resists==
			<br>

	{\|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" width="95%"		{\|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" width="95%"
	\|-		\|-

Mmat: /* Resist coating */

2025-06-17T13:54:45Z

Resist coating

← Older revision		Revision as of 15:54, 17 June 2025
Line 2:		Line 2:
	An appropriate EBL resist must naturally be applied to the substrate. DTU Nanolab supplies a number of standard resists, please consult the table below. The default positive EBL resist is AR-P 6200.09 (CSAR). CSAR is installed on [[Specific_Process_Knowledge/Lithography/Coaters#Spin Coater: Gamma E-beam and UV\|Spin Coater: Gamma E-beam and UV]] for spin coating of 2", 4" and 6" substrates. For other substrate sizes (i.e. chips) or other resists [[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters\|Spin Coater: LabSpin 02/03]] have to be used instead. The standard resist bottles are stored in the chemical cupboard in E-4.		An appropriate EBL resist must naturally be applied to the substrate. DTU Nanolab supplies a number of standard resists, please consult the table below. The default positive EBL resist is AR-P 6200.09 (CSAR). CSAR is installed on [[Specific_Process_Knowledge/Lithography/Coaters#Spin Coater: Gamma E-beam and UV\|Spin Coater: Gamma E-beam and UV]] for spin coating of 2", 4" and 6" substrates. For other substrate sizes (i.e. chips) or other resists [[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters\|Spin Coater: LabSpin 02/03]] have to be used instead. The standard resist bottles are stored in the chemical cupboard in E-4.

			<p style="color:red;">Contrary to most UV resist it is in general not advisable to use HMDS priming when coating with EBL resists. There can of course be exceptions to this but we do not recommend HMDS priming when using the DTU Nanolab supplied EBL resists.</p>

	We recommend all groups or users to have their own bottle of e-beam resist inside the cleanroom. Please follow the [[Specific Process Knowledge/Lithography/EBeamLithography/ResistBottles\|user resist bottles in the cleanroom guide.]]		We recommend all groups or users to have their own bottle of e-beam resist inside the cleanroom. Please follow the [[Specific Process Knowledge/Lithography/EBeamLithography/ResistBottles\|user resist bottles in the cleanroom guide.]]

Mmat: /* User supplied resists */

2025-06-17T13:51:42Z

User supplied resists

← Older revision		Revision as of 15:51, 17 June 2025
Line 189:		Line 189:
	\|-		\|-
	\|-style="background:LightGrey; color:black"		\|-style="background:LightGrey; color:black"
	\|'''~~[[Specific_Process_Knowledge/Lithography/ARN7500\|~~AR-N 7500]]'''		\|'''AR-N 7500 <br> (not "New" Series)'''
	\|Negative		\|Negative
	\|[http://www.allresist.com AllResist]		\|[http://www.allresist.com AllResist]
	\|[https://www.allresist.com/wp-content/uploads/sites/2/2020/03/AR-N7500_english_Allresist_product-information.pdf AR-N 7500 ~~info~~]		\|[https://www.allresist.com/wp-content/uploads/sites/2/2020/03/AR-N7500_english_Allresist_product-information.pdf AR-N 7500]
	\|[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters\|Spin Coater: LabSpin 02/03]]		\|[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters\|Spin Coater: LabSpin 02/03]]
	\|a = 17126, b = -0.435		\|a = 17126, b = -0.435