Specific Process Knowledge/Lithography/EBeamLithography/2D detection system - Revision history

Thope: /* SETWFR and CHIPAL setup */

2025-08-13T19:28:45Z

SETWFR and CHIPAL setup

← Older revision		Revision as of 21:28, 13 August 2025
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	== SETWFR and CHIPAL setup ==		== SETWFR and CHIPAL setup ==

	The alignment procedure is setup using the same subprograms as usual. The only difference is that we select a different scan type. Thus, in the "Scan Condition Settings" window, in the "Scan Type" pane, we select "Arbitrary shape" instead of the usual "Cross mark". This enables the "2D" pane of the settings window. In the "2D" pane we can now set a scan size, which should be similar to the feature size or slightly larger. With the "Reference" button we can select the reference image file previously generated.		The alignment procedure is setup using the same subprograms as usual. The only difference is that we select a different scan type. Thus, in the "Scan Condition Settings" window, in the "Scan Type" pane, we select "Arbitrary shape" instead of the usual "Cross mark". This enables the "2D" pane of the settings window. In the "2D" pane we can now set a scan size, which should be similar to the feature size or slightly larger. With the "Reference" button we can select the reference image file previously generated. In this example we use a cross but as the "Arbitrary shape" scan type suggests, an arbitrary shape can be used.

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Thope: /* Reference images */

2025-08-13T19:26:58Z

Reference images

← Older revision		Revision as of 21:26, 13 August 2025
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	'''ebimg mkref PQRef1000mu.tiff PQRef1000mu.ref.gz'''		'''ebimg mkref PQRef1000mu.tiff PQRef1000mu.ref.gz'''

	This will generate the actual reference image file with the correct scaling. This file should be moved to		After entering this command a window will open, showing the reference mark with a green cross indicating the center. For a symmetric mark this green cross will be in the center. It is possible to change the center point of the mark by moving the green mark with the mouse, this could be useful if an asymmetric mark is used. However, for a symmetric mark simply press "ESC" to close the window. This will generate the actual reference image file with the correct scaling. This file should be moved to

	'''/home/eb0/jeoleb/prm/mark'''		'''/home/eb0/jeoleb/prm/mark'''

Thope: /* Reference images */

2025-08-13T19:19:41Z

Reference images

← Older revision		Revision as of 21:19, 13 August 2025
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	The dimension is given in nanometer. In the example the actual command is		The dimension is given in nanometer. In the example the actual command is

	'''ebimg setsize PQRef1000mu.png PQRef1000mu.tiff 1000000'''		'''ebimg setsize PQRef1000mu.png PQRef1000mu.tiff 1000000'''

	This will generate a TIFF file with a scale of 1000 µm. Next, this must be converted with yet another command to a .ref.gz file. The command is		This will generate a TIFF file with a scale of 1000 µm. Next, this must be converted with yet another command to a .ref.gz file. The command is

	'''ebimg mkref inputimage.tiff outputimage.ref.gz'''		'''ebimg mkref inputimage.tiff outputimage.ref.gz'''

	In our case it will be		In our case it will be

	'''ebimg mkref PQRef1000mu.tiff PQRef1000mu.ref.gz'''		'''ebimg mkref PQRef1000mu.tiff PQRef1000mu.ref.gz'''

	This will generate the actual reference image file with the correct scaling. This file should be moved to		This will generate the actual reference image file with the correct scaling. This file should be moved to

	'''/home/eb0/jeoleb/prm/mark'''		'''/home/eb0/jeoleb/prm/mark'''

Thope: /* Reference images */

2025-08-13T19:19:11Z

Reference images

← Older revision		Revision as of 21:19, 13 August 2025
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	The system must know the scale of the mark it is looking for, hence one must assign a physical dimension to the reference mark. The reference image must also be converted to a TIFF image. Both dimension assignment and conversion to TIFF is done with a command in a terminal window. In this example the actual mark is 1000 x 1000 µm and the input image is a PNG file called "PQRef1000mu.png". The command is:		The system must know the scale of the mark it is looking for, hence one must assign a physical dimension to the reference mark. The reference image must also be converted to a TIFF image. Both dimension assignment and conversion to TIFF is done with a command in a terminal window. In this example the actual mark is 1000 x 1000 µm and the input image is a PNG file called "PQRef1000mu.png". The command is:

	'''ebimg setsize inputimage.png outputimage.tiff dimension'''		'''ebimg setsize inputimage.png outputimage.tiff dimension'''

Thope: /* SETWFR and CHIPAL setup */

2025-08-13T19:18:13Z

SETWFR and CHIPAL setup

← Older revision		Revision as of 21:18, 13 August 2025
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	Finally, in the "Gain" pane we can setup the gain parameters. Notice that it is possible to switch between "BE" and "SE", i.e. backscattered electrons and secondary electrons. Depending on the layer stack and materials there can be a big difference in the contrast and this is the only way on the system to use secondary electrons for alignment.		Finally, in the "Gain" pane we can setup the gain parameters. Notice that it is possible to switch between "BE" and "SE", i.e. backscattered electrons and secondary electrons. Depending on the layer stack and materials there can be a big difference in the contrast and this is the only way on the system to use secondary electrons for alignment.

	It can be difficult to get these gain settings right. The best option is to move the stage to the mark location, turn on SEM mode, find working settings manually and copy these to the scan conditions.		It can be difficult to get these gain settings right. The best option is to move the stage to the mark location, turn on SEM mode, find working settings manually and copy these to the scan conditions using the "Applies to another subprogram..." feature.

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Thope: /* SETWFR and CHIPAL setup */

2025-08-13T19:17:34Z

SETWFR and CHIPAL setup

← Older revision		Revision as of 21:17, 13 August 2025
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	Finally, in the "Gain" pane we can setup the gain parameters. Notice that it is possible to switch between "BE" and "SE", i.e. backscattered electrons and secondary electrons. Depending on the layer stack and materials there can be a big difference in the contrast and this is the only way on the system to use secondary electrons for alignment.		Finally, in the "Gain" pane we can setup the gain parameters. Notice that it is possible to switch between "BE" and "SE", i.e. backscattered electrons and secondary electrons. Depending on the layer stack and materials there can be a big difference in the contrast and this is the only way on the system to use secondary electrons for alignment.

	It can be difficult to get these gain settings right. The best option is to move the stage to the mark location, turn on SEM mode ~~and fine~~ working settings and ~~then~~ copy these to the scan conditions.		It can be difficult to get these gain settings right. The best option is to move the stage to the mark location, turn on SEM mode, find working settings manually and copy these to the scan conditions.

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Thope: /* Execution */

2025-08-13T19:16:33Z

Execution

← Older revision		Revision as of 21:16, 13 August 2025
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	== Execution ==		== Execution ==
	Execution is like usual by either running SETWFR or CHIPAL. During execution the system will make imagescans with the chosen detector and compare the resulting image with the reference file. If the match is accepted, the system will continue to the next mark. Below is the result of our example.		Execution is like usual by either running SETWFR or CHIPAL or the usual commands for automatic execution. During execution the system will make imagescans with the chosen detector and compare the resulting image with the reference file. If the match is accepted, the system will continue to the next mark. Below is the result of our example.

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Thope at 18:48, 13 August 2025

2025-08-13T18:48:05Z

← Older revision		Revision as of 20:48, 13 August 2025
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	~~=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png\|200px]]=~~

	== Introduction ==		== Introduction ==
	In addition to alignment by beam scanning the JEOL 9500 system also has a 2D alignment feature. The working principle of this is that the system will take a SEM image of a specified location and compare the SEM image to a reference image. By comparison of these the system will determine an offset and use this for alignment.		In addition to alignment by beam scanning the JEOL 9500 system also has a 2D alignment feature. The working principle of this is that the system will take a SEM image of a specified location and compare the SEM image to a reference image. By comparison of these the system will determine an offset and use this for alignment.

Thope: /* Execution */

2025-08-13T18:46:36Z

Execution

← Older revision		Revision as of 20:46, 13 August 2025
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	== Execution ==		== Execution ==
			Execution is like usual by either running SETWFR or CHIPAL. During execution the system will make imagescans with the chosen detector and compare the resulting image with the reference file. If the match is accepted, the system will continue to the next mark. Below is the result of our example.

			{\| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;"
			\|-
			\| [[image:2Droughscan.png\|400px]] \|\| [[image:2Dfinescan.png\|400px]]
			\|-
			\| colspan="2" style="text-align:enter;\|
			Imagescans obtained during alignment. Rough alignment scan (left) is 1000 µm while fine scan (right) is 10 µm. The green cross indicates the center as determined by the system.
			\|}

Thope: /* SETWFR and CHIPAL setup */

2025-08-13T18:44:30Z

SETWFR and CHIPAL setup

← Older revision		Revision as of 20:44, 13 August 2025
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	\| colspan="1" style="text-align:enter;\|		\| colspan="1" style="text-align:enter;\|
	Gain settings used for image scan. Unlike the usual "Cross mark" scan type, the "SE" detector is now available for alignment.		Gain settings used for image scan. Unlike the usual "Cross mark" scan type, the "SE" detector is now available for alignment.
	\|}


	~~{\| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;"~~
	\|-
	~~\| [[image:2Droughscan.png\|400px]] \|\| [[image:2Dfinescan.png\|400px]]~~
	\|-
	~~\| colspan="2" style="text-align:enter;\|~~
	~~Imagescans obtained during alignment. Rough alignment scan (left) is 1000 µm while fine scan (right) is 10 µm. The green cross indicates the center as determined by the system.~~
	\|}		\|}