Specific Process Knowledge/Lithography/Development/manualTMAH developer - Revision history

Jehem: /* Equipment performance and process related parameters */

2026-03-11T07:47:34Z

Equipment performance and process related parameters

← Older revision		Revision as of 09:47, 11 March 2026
Line 81:		Line 81:
	! scope=row style="text-align: left;" \| Substrate batch size		! scope=row style="text-align: left;" \| Substrate batch size
	\| 1		\| 1
			\|-
			! scope=row style="text-align: left;" \| Media flow rates
			\|
			*AZ 726 MIF (TMAH): 300 ml/min
			*Process DI water: 400 ml/min
			*Backside rinse DI water: 140 ml/min
			*Process Nitrogen: 20 l/min
	\|}		\|}
	<br clear="all" />		<br clear="all" />


	=Process information=		=Process information=

2026-02-18T14:17:55Z

← Older revision		Revision as of 16:17, 18 February 2026
Line 1:		Line 1:
			{{cc-nanolab}}

	=Developer: TMAH Manual 02=		=Developer: TMAH Manual 02=
	[[file:Developer_TMAH_manual_02.jpg\|400px\|right\|thumb\|Developer: TMAH Manual 02 is located in E-4.]]		[[file:Developer_TMAH_manual_02.jpg\|400px\|right\|thumb\|Developer: TMAH Manual 02 is located in E-4.]]

2026-02-18T13:22:34Z

Process information

← Older revision		Revision as of 15:22, 18 February 2026
Line 86:		Line 86:
	All recipes use the following structure:		All recipes use the following structure:
	#Pressurize the TMAH canister		#Pressurize the TMAH canister
			#Pre-wet substrate at high RPM
	#Dispense puddle while rotating substrate slowly		#Dispense puddle while rotating substrate slowly
	#Puddle development with agitation of substrate		#Puddle development with agitation of substrate

2026-01-16T10:02:21Z

Developer: TMAH Manual 02

← Older revision		Revision as of 12:02, 16 January 2026
Line 8:		Line 8:

	{\| class="wikitable"		{\| class="wikitable"
	! style="text-align:left" \| Product:		! style="text-align:left" \| Product
	\| style="padding-left: 10px" \| Laurell EDC-650-HZB-23NP		\| style="padding-left: 10px" \| Laurell EDC-650-HZB-23NP
	\|-		\|-
	! style="text-align:left" \| Year of purchase:		! style="text-align:left" \| Year of purchase
	\| style="padding-left: 10px" \| 2016		\| style="padding-left: 10px" \| 2016
	\|-		\|-
	! style="text-align:left" \| Tool modification:		! style="text-align:left" \| Tool modification
	\| style="padding-left: 10px" \|		\| style="padding-left: 10px" \|
	Converted from e-beam solvent developer to UV TMAH developer in 2024<br>		Converted from e-beam solvent developer to UV TMAH developer in 2024<br>
	Added media flow controllers for developer, rinse and ~~dry~~ media in 2025		Added media flow controllers for developer, rinse and drying media in 2025
	\|-		\|-
	! style="text-align:left" \| Location:		! style="text-align:left" \| Location
	\| style="padding-left: 10px" \| Cleanroom E-4		\| style="padding-left: 10px" \| Cleanroom E-4
	\|}		\|}

2026-01-16T10:01:02Z

Developer: TMAH Manual 02

← Older revision		Revision as of 12:01, 16 January 2026
Line 15:		Line 15:
	\|-		\|-
	! style="text-align:left" \| Tool modification:		! style="text-align:left" \| Tool modification:
	\| style="padding-left: 10px" \| ~~Modified~~ from e-beam solvent developer to UV TMAH developer in 2024		\| style="padding-left: 10px" \|
			Converted from e-beam solvent developer to UV TMAH developer in 2024<br>
			Added media flow controllers for developer, rinse and dry media in 2025
	\|-		\|-
	! style="text-align:left" \| Location:		! style="text-align:left" \| Location:

2026-01-14T08:52:58Z

Developer: TMAH Manual 02

← Older revision		Revision as of 10:52, 14 January 2026
Line 22:		Line 22:

	'''User manual'''<br>		'''User manual'''<br>
	The user manual and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=~~324~~ LabManager] - '''requires login'''		The user manual and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=341 LabManager] - '''requires login'''

	'''Tool training'''<br>		'''Tool training'''<br>

2026-01-14T08:50:33Z

Developer: TMAH Manual 02

← Older revision		Revision as of 10:50, 14 January 2026
Line 20:		Line 20:
	\| style="padding-left: 10px" \| Cleanroom E-4		\| style="padding-left: 10px" \| Cleanroom E-4
	\|}		\|}


	'''User manual'''<br>		'''User manual'''<br>
	The user manual and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=324 LabManager] - '''requires login'''		The user manual and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=324 LabManager] - '''requires login'''


	'''Tool training'''<br>		'''Tool training'''<br>

2026-01-14T08:49:54Z

Developer: TMAH Manual 02

← Older revision		Revision as of 10:49, 14 January 2026
Line 6:		Line 6:

	Single substrates are loaded manually into the tool, but the developer dispense, puddle time, agitation, rinse and drying is controlled by the tool.		Single substrates are loaded manually into the tool, but the developer dispense, puddle time, agitation, rinse and drying is controlled by the tool.


	{\| class="wikitable"		{\| class="wikitable"

2026-01-14T08:49:27Z

Developer: TMAH Manual 02

← Older revision		Revision as of 10:49, 14 January 2026
Line 4:		Line 4:
	'''Tool description'''<br>		'''Tool description'''<br>
	The Developer: TMAH manual 02 is a semi-automatic and programmable single substrate developer system, which can be used for development of resists on chips, 50 mm, 100 mm and 150 mm substrates. The development is done using AZ 726 MIF, which is a 2.38% TMAH solution with wetting agent.		The Developer: TMAH manual 02 is a semi-automatic and programmable single substrate developer system, which can be used for development of resists on chips, 50 mm, 100 mm and 150 mm substrates. The development is done using AZ 726 MIF, which is a 2.38% TMAH solution with wetting agent.

			Single substrates are loaded manually into the tool, but the developer dispense, puddle time, agitation, rinse and drying is controlled by the tool.


	{\| class="wikitable"		{\| class="wikitable"
Line 18:		Line 21:
	\| style="padding-left: 10px" \| Cleanroom E-4		\| style="padding-left: 10px" \| Cleanroom E-4
	\|}		\|}


	'''User manual'''<br>		'''User manual'''<br>
	The user manual and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=324 LabManager] - '''requires login'''		The user manual and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=324 LabManager] - '''requires login'''


	'''Tool training'''<br>		'''Tool training'''<br>

2026-01-14T08:36:25Z

Process information

← Older revision		Revision as of 10:36, 14 January 2026
Line 90:		Line 90:

	'''Multi puddle'''<br>		'''Multi puddle'''<br>
	~~Multipuddle~~ recipes repeat steps 2-4 for the given number of puddles.		Multi puddle recipes repeat steps 2-4 for the given number of puddles.

	==Process recipes==		==Process recipes==

← Older revision		Revision as of 12:02, 16 January 2026
Line 8:		Line 8:

	{\| class="wikitable"		{\| class="wikitable"
	! style="text-align:left" \| Product:		! style="text-align:left" \| Product
	\| style="padding-left: 10px" \| Laurell EDC-650-HZB-23NP		\| style="padding-left: 10px" \| Laurell EDC-650-HZB-23NP
	\|-		\|-
	! style="text-align:left" \| Year of purchase:		! style="text-align:left" \| Year of purchase
	\| style="padding-left: 10px" \| 2016		\| style="padding-left: 10px" \| 2016
	\|-		\|-
	! style="text-align:left" \| Tool modification:		! style="text-align:left" \| Tool modification
	\| style="padding-left: 10px" \|		\| style="padding-left: 10px" \|
	Converted from e-beam solvent developer to UV TMAH developer in 2024<br>		Converted from e-beam solvent developer to UV TMAH developer in 2024<br>
	Added media flow controllers for developer, rinse and ~~dry~~ media in 2025		Added media flow controllers for developer, rinse and drying media in 2025
	\|-		\|-
	! style="text-align:left" \| Location:		! style="text-align:left" \| Location
	\| style="padding-left: 10px" \| Cleanroom E-4		\| style="padding-left: 10px" \| Cleanroom E-4
	\|}		\|}