Jehem at 14:17, 18 February 2026

2026-02-18T14:17:43Z

← Older revision		Revision as of 16:17, 18 February 2026
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			{{cc-nanolab}}

	=Developer: E-beam 02=		=Developer: E-beam 02=
	[[File:Developer ebeam v1.jpg\|400px\|right\|thumb\|Developer: E-beam 02 is located in E-4.]]		[[File:Developer ebeam v1.jpg\|400px\|right\|thumb\|Developer: E-beam 02 is located in E-4.]]

Jehem at 09:12, 14 January 2026

2026-01-14T09:12:21Z

Show changes

Jehem at 11:02, 12 January 2026

2026-01-12T11:02:18Z

← Older revision		Revision as of 13:02, 12 January 2026
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	==Developer: E-beam 02==		=Developer: E-beam 02=
	[[Image:IMG 2464.JPG\|400px\|right\|thumb\|Developer: E-beam 02 is located in E-4.]]		[[Image:IMG 2464.JPG\|400px\|right\|thumb\|Developer: E-beam 02 is located in E-4.]]

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	The user manual, user APV, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=324 LabManager] - '''requires login'''		The user manual, user APV, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=324 LabManager] - '''requires login'''

	===Process information===		=Process information=
	All recipes use the following structure:		All recipes use the following structure:
	#Pressurize the developer canister		#Pressurize the developer canister
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	*21 A 5x60		*21 A 5x60

	=== Equipment performance and process related parameters ===		=Equipment performance and process related parameters=

	{\|border="1" cellspacing="1" cellpadding="10" style="text-align:left;"		{\|border="1" cellspacing="1" cellpadding="10" style="text-align:left;"

Jehem: Created page with "==Developer: E-beam 02== Developer: E-beam 02 is located in E-4. Developer: E-beam 02 is a manually operated, single substrate puddle developer. It uses the ZED-N50 or AR 600-50 developers and IPA for rinsing. The substrates are loaded manually one by one into the developer. Developer dispense, puddle time, IPA rinse, and drying is then performed automatically by the equipment. '''[https://www.youtube.com/watch?v=btinNzYnLnY Tra..."

2026-01-12T08:55:39Z

Created page with "==Developer: E-beam 02== 400px|right|thumb|Developer: E-beam 02 is located in E-4. Developer: E-beam 02 is a manually operated, single substrate puddle developer. It uses the ZED-N50 or AR 600-50 developers and IPA for rinsing. The substrates are loaded manually one by one into the developer. Developer dispense, puddle time, IPA rinse, and drying is then performed automatically by the equipment. '''[https://www.youtube.com/watch?v=btinNzYnLnY Tra..."

New page

==Developer: E-beam 02==
[[Image:IMG 2464.JPG|400px|right|thumb|Developer: E-beam 02 is located in E-4.]]

Developer: E-beam 02 is a manually operated, single substrate puddle developer. It uses the ZED-N50 or AR 600-50 developers and IPA for rinsing. The substrates are loaded manually one by one into the developer. Developer dispense, puddle time, IPA rinse, and drying is then performed automatically by the equipment.

'''[https://www.youtube.com/watch?v=btinNzYnLnY Training video]''' (for Developer: TMAH Manual, but it is the same model)

The user manual, user APV, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=324 LabManager] - '''requires login'''

===Process information===
All recipes use the following structure:
#Pressurize the developer canister
#Dispense puddle while rotating substrate slowly
#Puddle development while not rotating
#Agitate substrate once per 15 seconds by rotating slowly for 1 second
#Spin off developer
#Clean substrate with IPA
#Dry substrate and chamber with nitrogen

Multi-puddle recipes repeat steps 2-5 for the given number of puddles.

'''Process recipes'''<br>
N50 recipes have the letter "N" in them. AR-600-50 recipes have the letter "A" in them. The number is the development time in seconds:
*01 Rinse
*02 N 15
*03 N 30
*04 N 60
*05 N 90
*06 N 120
*07 N 180
*08 N 300
*09 N 600
*10 N 2x60
*11 N 5x60
*12 A 15
*13 A 30
*14 A 60
*15 A 90
*16 A 120
*17 A 180
*18 A 300
*19 A 600
*20 A 2x60
*21 A 5x60

=== Equipment performance and process related parameters ===

{|border="1" cellspacing="1" cellpadding="10" style="text-align:left;"

|-
!style="background:silver; color:black;" align="center" width="60"|Purpose
|style="background:LightGrey; color:black"|
|style="background:WhiteSmoke; color:black"|
Development of:
*CSAR
*ZEP520A

|-
!style="background:silver; color:black;" width="60"|Developer
|style="background:LightGrey; color:black"|
|style="background:WhiteSmoke; color:black"|
*AR 600-50
*ZED N-50
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Method
|style="background:LightGrey; color:black"|Development
|style="background:WhiteSmoke; color:black"|
Puddle
|-
|style="background:LightGrey; color:black"|Handling
|style="background:WhiteSmoke; color:black"|
*Chip chuck for chips
*Non-vacuum chuck for 2" wafers
*Non-vacuum chuck for 100 mm and 150 mm wafers
*Non-vacuum chuck for 200 mm wafers
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Process parameters
|style="background:LightGrey; color:black"|Temperature
|style="background:WhiteSmoke; color:black"|
Room temperature
|-
|style="background:LightGrey; color:black"|Agitation
|style="background:WhiteSmoke; color:black"|
1 second rotational agitation at 30 rpm every 15 seconds
|-
|style="background:LightGrey; color:black"|Rinse
|style="background:WhiteSmoke; color:black"|
IPA
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
|style="background:LightGrey; color:black"|Substrate size
|style="background:WhiteSmoke; color:black"|
*Chips
*2" wafers
*100 mm wafers
*150 mm wafers
*200 mm wafers
|-
| style="background:LightGrey; color:black"|Allowed materials
|style="background:WhiteSmoke; color:black"|
*All cleanroom approved materials
*Film, or pattern, of all materials except Type IV
|-
|style="background:LightGrey; color:black"|Batch size
|style="background:WhiteSmoke; color:black"|
1
|-
|}
<br clear="all" />

Specific Process Knowledge/Lithography/Development/manualEbeam developer - Revision history

Jehem at 14:17, 18 February 2026

Jehem at 09:12, 14 January 2026

Jehem at 11:02, 12 January 2026