Specific Process Knowledge/Lithography/Development/DUV developer - Revision history

Jehem at 07:21, 13 March 2026

2026-03-13T07:21:04Z

← Older revision		Revision as of 09:21, 13 March 2026
Line 103:		Line 103:


	The development process will be performed by the customer together with the ~~Photolith~~ group of DTU Nanolab. In case you would like to do DUV lithography please contact Lithography team, who will consult you and run your wafers together with you.		The development process will be performed by the customer together with the Lithography group of DTU Nanolab. In case you would like to do DUV lithography please contact Lithography team, who will consult you and run your wafers together with you.

	Here you can find a [[media:250nm_ines_and_pillars_after_developing_i_60sec.pdf\| chart‎]] demonstrating a dependence between 250 nm line width/pillars diameter and exposure dose.		Here you can find a [[media:250nm_ines_and_pillars_after_developing_i_60sec.pdf\| chart‎]] demonstrating a dependence between 250 nm line width/pillars diameter and exposure dose.

Jehem at 14:14, 12 March 2026

2026-03-12T14:14:38Z

Show changes

Jehem: /* Equipment performance and process related parameters */

2026-03-11T12:27:43Z

Equipment performance and process related parameters

← Older revision		Revision as of 14:27, 11 March 2026
Line 87:		Line 87:
	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	*AZ 726 MIF (TMAH): 500 ml/min		*AZ 726 MIF (TMAH): 500 ml/min
	*~~Process~~ DI water: 350 ml/min (with BSR+CR active)		*Topside rinse DI water: 350 ml/min (with BSR+CR active)
	*Backside rinse DI water: 45 ml/min (with TSR+CR active)		*Backside rinse DI water: 45 ml/min (with TSR+CR active)
	*Process Nitrogen: 50 l/min		*Process Nitrogen: 50 l/min

Jehem: /* Equipment performance and process related parameters */

2026-03-11T10:44:22Z

Equipment performance and process related parameters

← Older revision		Revision as of 12:44, 11 March 2026
Line 87:		Line 87:
	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	*AZ 726 MIF (TMAH): 500 ml/min		*AZ 726 MIF (TMAH): 500 ml/min
	*Process DI water: ~~400~~ ml/min		*Process DI water: 350 ml/min (with BSR+CR active)
	*Backside rinse DI water: 60 ml/min		*Backside rinse DI water: 45 ml/min (with TSR+CR active)
	*Process Nitrogen: 50 l/min		*Process Nitrogen: 50 l/min
	\|-		\|-
	\|}		\|}
	<br clear="all" />		<br clear="all" />

Jehem: /* Equipment performance and process related parameters */

2026-03-11T08:17:34Z

Equipment performance and process related parameters

← Older revision		Revision as of 10:17, 11 March 2026
Line 83:		Line 83:
	1 - 25		1 - 25
	\|-		\|-
			!style="background:silver; color:black;" width="60"\|Media flow rates
			\|style="background:LightGrey; color:black"\|
			\|style="background:WhiteSmoke; color:black"\|
			*AZ 726 MIF (TMAH): 500 ml/min
			*Process DI water: 400 ml/min
			*Backside rinse DI water: 60 ml/min
			*Process Nitrogen: 50 l/min
			\|-
	\|}		\|}
	<br clear="all" />		<br clear="all" />

Jehem at 14:18, 18 February 2026

2026-02-18T14:18:18Z

← Older revision		Revision as of 16:18, 18 February 2026
Line 1:		Line 1:
			{{cc-nanolab}}

	=Developer: TMAH Stepper=		=Developer: TMAH Stepper=
	[[Image:SUSS_DEV.JPG\|400px\|right\|thumb\|The Developer-TMAH-Stepper is placed in F-3.]]		[[Image:SUSS_DEV.JPG\|400px\|right\|thumb\|The Developer-TMAH-Stepper is placed in F-3.]]

Jehem at 11:29, 12 January 2026

2026-01-12T11:29:02Z

← Older revision		Revision as of 13:29, 12 January 2026
Line 1:		Line 1:
	==Developer: TMAH Stepper==		=Developer: TMAH Stepper=
	[[Image:SUSS_DEV.JPG\|400px\|right\|thumb\|The Developer-TMAH-Stepper is placed in F-3.]]		[[Image:SUSS_DEV.JPG\|400px\|right\|thumb\|The Developer-TMAH-Stepper is placed in F-3.]]

Line 8:		Line 8:

	<br clear="all" />		<br clear="all" />
	===Process information===		=Process information=
	[[Image:140 250 nm tilt22 (1).jpg\|400px\|right\|thumb\|The SEM picture of 250 nm pillars and lines. Exposure dose is 140 J/m2.]]		[[Image:140 250 nm tilt22 (1).jpg\|400px\|right\|thumb\|The SEM picture of 250 nm pillars and lines. Exposure dose is 140 J/m2.]]
	The development process will be performed by the customer together with the Photolith group of DTU Nanolab. In case you would like to do DUV lithography please contact Lithography team, who will consult you and run your wafers together with you.		The development process will be performed by the customer together with the Photolith group of DTU Nanolab. In case you would like to do DUV lithography please contact Lithography team, who will consult you and run your wafers together with you.
Line 14:		Line 14:
	Here you can find a [[media:250nm_ines_and_pillars_after_developing_i_60sec.pdf\| chart‎]] demonstrating a dependence between 250 nm line width/pillars diameter and exposure dose.		Here you can find a [[media:250nm_ines_and_pillars_after_developing_i_60sec.pdf\| chart‎]] demonstrating a dependence between 250 nm line width/pillars diameter and exposure dose.

	===Standard processes===		=Standard processes=

	Post-exposure bake sequences:		Post-exposure bake sequences:
Line 37:		Line 37:
	<br clear="all" />		<br clear="all" />

	===Equipment performance and process related parameters===		=Equipment performance and process related parameters=

	{\|border="1" cellspacing="1" cellpadding="10" style="text-align:left;"		{\|border="1" cellspacing="1" cellpadding="10" style="text-align:left;"

Jehem: /* Process information */

2025-03-05T12:25:13Z

Process information

← Older revision		Revision as of 14:25, 5 March 2025
Line 9:		Line 9:
	<br clear="all" />		<br clear="all" />
	===Process information===		===Process information===
	[[Image:140 250 nm tilt22 (1).jpg\|~~350x350px~~\|right\|thumb\|The SEM picture of 250 nm pillars and lines. Exposure dose is 140 J/m2.]]		[[Image:140 250 nm tilt22 (1).jpg\|400px\|right\|thumb\|The SEM picture of 250 nm pillars and lines. Exposure dose is 140 J/m2.]]
	The development process will be performed by the customer together with the Photolith group of DTU Nanolab. In case you would like to do DUV lithography please contact Lithography team, who will consult you and run your wafers together with you.		The development process will be performed by the customer together with the Photolith group of DTU Nanolab. In case you would like to do DUV lithography please contact Lithography team, who will consult you and run your wafers together with you.

	Here you can find a [[media:250nm_ines_and_pillars_after_developing_i_60sec.pdf\| chart‎]] demonstrating a dependence between 250 nm line width/pillars diameter and exposure dose.		Here you can find a [[media:250nm_ines_and_pillars_after_developing_i_60sec.pdf\| chart‎]] demonstrating a dependence between 250 nm line width/pillars diameter and exposure dose.

	===Standard processes===		===Standard processes===

Jehem: /* Developer: TMAH Stepper */

2025-03-05T12:23:56Z

Developer: TMAH Stepper

← Older revision		Revision as of 14:23, 5 March 2025
Line 1:		Line 1:
	==Developer: TMAH Stepper==		==Developer: TMAH Stepper==
	[[Image:SUSS_DEV.JPG\|~~300x300px~~\|right\|thumb\|The Developer-TMAH-Stepper is placed in F-3]]		[[Image:SUSS_DEV.JPG\|400px\|right\|thumb\|The Developer-TMAH-Stepper is placed in F-3.]]

	This developer is dedicated for development of DUV resists. The developer is fully automatic and can run up to 25 substrates in a batch 4", 6", and 8" size (8" requires tool change). The machine is equipped with 1 developer line, in our case 2,38% TMAH in water (AZ 726 MIF), 1 topside rinse line with water, 1 backside rinse line with water and 1 N2 line for drying.		This developer is dedicated for development of DUV resists. The developer is fully automatic and can run up to 25 substrates in a batch 4", 6", and 8" size (8" requires tool change). The machine is equipped with 1 developer line, in our case 2,38% TMAH in water (AZ 726 MIF), 1 topside rinse line with water, 1 backside rinse line with water and 1 N2 line for drying.

Jehem: /* Equipment performance and process related parameters */

2023-02-03T10:21:51Z

Equipment performance and process related parameters

← Older revision		Revision as of 12:21, 3 February 2023
Line 39:		Line 39:
	===Equipment performance and process related parameters===		===Equipment performance and process related parameters===

	{\| border="2" cellspacing="0" cellpadding="2"		{\|border="1" cellspacing="1" cellpadding="10" style="text-align:left;"

	!style="background:silver; color:black;" width="60"\|Purpose		!style="background:silver; color:black;" width="60"\|Purpose