Jehem: Created page with "=Plasma Asher 3: Descum= Product name: Diener Pico Plasma Asher
Year of purchase: 2014 The user manual(s), quality control procedure(s) and results and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=423 LabManager] - '''requires login''' Plasma Asher 3 is specifically used for controlled descum process after lithography. Please note that you only can process a single 100 mm wafer, or one small sample, at a t..."

2026-01-12T10:13:46Z

Created page with "=Plasma Asher 3: Descum= Product name: Diener Pico Plasma Asher<br> Year of purchase: 2014 The user manual(s), quality control procedure(s) and results and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=423 LabManager] - '''requires login''' Plasma Asher 3 is specifically used for controlled descum process after lithography. Please note that you only can process a single 100 mm wafer, or one small sample, at a t..."

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=Plasma Asher 3: Descum=
Product name: Diener Pico Plasma Asher<br>
Year of purchase: 2014

The user manual(s), quality control procedure(s) and results and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=423 LabManager] - '''requires login'''

Plasma Asher 3 is specifically used for controlled descum process after lithography. Please note that you only can process a single 100 mm wafer, or one small sample, at a time.
The plasma asher is equipped with 2 gaslines: oxygen and nitrogen, but all standard processes use only oxygen (as recommended by Diener).

'''Process parameters'''<br>
You can manipulate two different descum process development parameters: you can either change power or chamber pressure.

==Power testing - AZ MiR 701==
[[image:AZMIR701_power_settings.png|400px|thumb|Descum results for different power settings]]

'''Recipe settings:'''
*Resist: AZ MiR 701
*O2 flow: 5 sccm
*N2 flow: 0
*Pressure: 0.2 mbar
*Power: Varied

{| class="wikitable" style="text-align: center;"
|+ style="caption-side: top; text-align: left;" | Experiment parameters
|-
! !! Forward/reverse !! C2/C1 !! Power
|-
| style="text-align: left;" | '''recipe 1''' || 50/0 || 52/31 || 50%
|-
| style="text-align: left;" | '''recipe 2''' || 100/0 || 53/31 || 100%
|-
| style="text-align: left;" | '''recipe 3''' || 20/0 || 51/34 || 20%
|}

==Pressure testing - AZ MiR 701==
[[image:AZMIR701_pressure_settings.png|400px|thumb|Descum results for different pressure settings]]

'''Recipe settings:'''
*Resist: AZ MiR 701
*O2 flow: varied
*N2 flow: 0
*Pressure: varied
*Power: V100% (100 W)

{| class="wikitable" style="text-align: center;"
|+ style="caption-side: top; text-align: left;" | Experiment parameters
|-
! !! Forward/reverse !! C2/C1 !! Oxygen !! Pressure
|-
| style="text-align: left;" | '''recipe 1''' || 100/0 || 52/31 || 5 || 0.2
|-
| style="text-align: left;" | '''recipe 2''' || 100/0 || 37/38 || 45 || 0.8
|}

==Pressure testing - AZ 5214E==
[[image:AZ5214E_pressure_settings.png|400px|thumb|Descum results for different pressure settings]]

'''Recipe settings:'''
*Resist: AZ 5214E
*O2 flow: varied
*N2 flow: 0
*Pressure: varied
*Power: V100% (100 W)

{| class="wikitable" style="text-align: center;"
|+ style="caption-side: top; text-align: left;" | Experiment parameters
|-
! !! Forward/reverse !! C2/C1 !! Oxygen !! Pressure
|-
| style="text-align: left;" | '''recipe 1''' || 100/0 || 52/31 || 17 || 0.4
|-
| style="text-align: left;" | '''recipe 2''' || 100/0 || 37/39 || 45 || 0.8
|}
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Specific Process Knowledge/Lithography/Descum/plasmaAsher03 - Revision history