Jehem: Created page with "''Jitka Urbánková & Jesper Hanberg, December 2019'' Descum results plasma asher 2 - recipe 1 This tool has been decomissioned 2024-12-02. The user manual(s), quality control procedure(s) and results and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=200 LabManager] - '''requires login''' Descum of AZ Mir 701 resist on 100mm silicon wafer. F..."

2024-12-11T12:13:08Z

Created page with "''Jitka Urbánková & Jesper Hanberg, December 2019'' 640px|thumb|Descum results plasma asher 2 - recipe 1 This tool has been decomissioned 2024-12-02. The user manual(s), quality control procedure(s) and results and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=200 LabManager] - '''requires login''' Descum of AZ Mir 701 resist on 100mm silicon wafer. F..."

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''Jitka Urbánková & Jesper Hanberg, December 2019''
[[image:descum_graf.jpg|640px|thumb|Descum results plasma asher 2 - recipe 1]]

This tool has been decomissioned 2024-12-02.

The user manual(s), quality control procedure(s) and results and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=200 LabManager] - '''requires login'''

Descum of AZ Mir 701 resist on 100mm silicon wafer. Five wafers were placed vertically in chamber.

'''recipe 1:'''
*O2 flow: 100 ml/min
*N2 flow: 100 ml/min
*Power: 150 W
{| {{table}}
| align="center" |
{|border="1" cellspacing="1" cellpadding="10" style="text-align:left;"

|- style="background:LightGrey"
|'''Ashing time (min)'''|| 1|| 2 || 3 || 4 || 6 || 7 || 8 || 9 || 10 || 12 || 14 || 15 || 20
|-
|'''Etched Thickness (nm)'''|| 8,7 || 5,1 || 12,5 || 6,2 || 31,8 || 86,0 || 25,7 || 46,8 || 38,3 || 49,7 || 59,4 || 140,1 || 360,7
|-
|'''Initial temperature (°C)'''|| 28 || 21 || 31 || 21 || 22 || 28 || 25 || 24 || 21 || 24 || 24 || 22 || 22
|-
|}
|}

[[image:graf_descum-recipe2.png|640px|thumb|Descum results plasma asher 2 - recipe 2]]

'''recipe 2:'''
*O2 flow: 500 ml/min
*N2 flow: 0 ml/min
*Power: 200 W
{| {{table}}
| align="center" |
{|border="1" cellspacing="1" cellpadding="10" style="text-align:left;"

|- style="background:LightGrey"
|'''Ashing time (min)'''|| 1 ||2 ||3 ||4 ||5 ||6 ||7 ||8 ||10 ||12 ||15 ||20
|-
|'''Etched Thickness (nm)'''||8,1 ||9,4 ||16,8 ||55,2 ||44,0 ||47,5 ||42,5 ||55,1 ||85,3 ||122,4 ||184,8 ||305,9
|-
|'''Initial temperature (°C)'''||22 ||21 ||21 ||22 ||22 ||22 ||21 ||21 ||20 ||21 ||21 ||22
|-
|}
|}

A linear time dependence was observed after etching 7 minutes or more (recipe 2).

Specific Process Knowledge/Lithography/Descum/PlasmaAsher2 - Revision history