Specific Process Knowledge/Lithography/Coaters/labspin05 - Revision history

Meenadh: /* Equipment performance and process related parameters */

2026-09-15T11:37:56Z

Equipment performance and process related parameters

← Older revision		Revision as of 13:37, 15 September 2026
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	\|style="background:LightGrey; color:black"\|		\|style="background:LightGrey; color:black"\|
	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	*Spin coating of epoxy based resists		*Spin coating of epoxy-based resists
	**SU-8 series		**SU-8 series
	**SU-8 3000 series		**SU-8 3000 series
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	**mr-DWL series		**mr-DWL series
	*Spin coating of other resists		*Spin coating of other resists
			*EBR of round substartes
	\|-		\|-
	!style="background:silver; color:black;" align="center" width="60"\|Resist		!style="background:silver; color:black;" align="center" width="60"\|Resist

Meenadh: /* Spin Coater: LabSpin 05 */

2026-09-15T11:36:31Z

Spin Coater: LabSpin 05

← Older revision		Revision as of 13:36, 15 September 2026
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	[[Image:Labspin_5.JPG\|400px\|thumb\|Spin coater: LabSpin 05 is located in PolyFabLab in building 347]]		[[Image:Labspin_5.JPG\|400px\|thumb\|Spin coater: LabSpin 05 is located in PolyFabLab in building 347]]

	Spin Coater: LabSpin 05 is a model LabSpin6 TT spin coater from SUSS. It's primary purpose is spin coating of SU-8 resist. It was installed in PolyFabLab in 2026.		Spin Coater: LabSpin 05 is a model LabSpin6 TT spin coater from SUSS. It's primary purpose is spin coating of SU-8 resist and EBR (Edge Bead Removal) of resist on round substrates. The EBR nozzle is either fixed for 4" or 6" wafers, depending on the user's request, as it needs manual adjustment. It was installed in PolyFabLab in 2026.

	The user manual, user APV, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=579 LabManager] - '''requires login'''		The user manual, user APV, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=579 LabManager] - '''requires login'''

Meenadh at 11:14, 15 September 2026

2026-09-15T11:14:36Z

← Older revision		Revision as of 13:14, 15 September 2026
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	==Spin Coater: LabSpin 05==		==Spin Coater: LabSpin 05==
	[[Image:~~Labspin_2~~.JPG\|400px\|thumb\|Spin coater: LabSpin 04 is located in PolyFabLab in building 347]]		[[Image:Labspin_5.JPG\|400px\|thumb\|Spin coater: LabSpin 05 is located in PolyFabLab in building 347]]

	Spin Coater: LabSpin 05 is a model LabSpin6 TT spin coater from SUSS. It's primary purpose is spin coating of SU-8 resist. It was installed in PolyFabLab in 2026.		Spin Coater: LabSpin 05 is a model LabSpin6 TT spin coater from SUSS. It's primary purpose is spin coating of SU-8 resist. It was installed in PolyFabLab in 2026.

Meenadh at 11:05, 15 September 2026

2026-09-15T11:05:40Z

← Older revision		Revision as of 13:05, 15 September 2026
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	==Spin Coater: LabSpin 04==		==Spin Coater: LabSpin 05==
	[[Image:Labspin_2.JPG\|400px\|thumb\|Spin coater: LabSpin 04 is located in PolyFabLab in building 347]]		[[Image:Labspin_2.JPG\|400px\|thumb\|Spin coater: LabSpin 04 is located in PolyFabLab in building 347]]

	Spin Coater: LabSpin 04 is a model LabSpin6 TT spin coater from SUSS. It's primary purpose is spin coating of SU-8 resist. It was installed in PolyFabLab in ~~2025~~.		Spin Coater: LabSpin 05 is a model LabSpin6 TT spin coater from SUSS. It's primary purpose is spin coating of SU-8 resist. It was installed in PolyFabLab in 2026.

	The user manual, user APV, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=~~547~~ LabManager] - '''requires login'''		The user manual, user APV, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=579 LabManager] - '''requires login'''

	'''Training video (same tool in Cleanroom 346): [https://www.youtube.com/watch?v=_neUkDsQhsM LabSpin02 + 03]'''		'''Training video (same tool in Cleanroom 346): [https://www.youtube.com/watch?v=_neUkDsQhsM LabSpin02 + 03]'''

Meenadh: Created page with "==Spin Coater: LabSpin 04== Spin coater: LabSpin 04 is located in PolyFabLab in building 347 Spin Coater: LabSpin 04 is a model LabSpin6 TT spin coater from SUSS. It's primary purpose is spin coating of SU-8 resist. It was installed in PolyFabLab in 2025. The user manual, user APV, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=547 LabManager] - '''requires login''' '''Tr..."

2026-09-15T11:02:44Z

Created page with "==Spin Coater: LabSpin 04== 400px|thumb|Spin coater: LabSpin 04 is located in PolyFabLab in building 347 Spin Coater: LabSpin 04 is a model LabSpin6 TT spin coater from SUSS. It's primary purpose is spin coating of SU-8 resist. It was installed in PolyFabLab in 2025. The user manual, user APV, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=547 LabManager] - '''requires login''' '''Tr..."

New page

==Spin Coater: LabSpin 04==
[[Image:Labspin_2.JPG|400px|thumb|Spin coater: LabSpin 04 is located in PolyFabLab in building 347]]

Spin Coater: LabSpin 04 is a model LabSpin6 TT spin coater from SUSS. It's primary purpose is spin coating of SU-8 resist. It was installed in PolyFabLab in 2025.

The user manual, user APV, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=547 LabManager] - '''requires login'''

'''Training video (same tool in Cleanroom 346): [https://www.youtube.com/watch?v=_neUkDsQhsM LabSpin02 + 03]'''

===Process information===
Useful information about resist dispense can be found [[Specific_Process_Knowledge/Lithography/Coaters/Spin_Coater:_RCD8_processing#Dispense|here]].

=== Equipment performance and process related parameters ===

{|border="1" cellspacing="1" cellpadding="10" style="text-align:left;"

!style="background:silver; color:black;" align="center" width="60"|Purpose
|style="background:LightGrey; color:black"|
|style="background:WhiteSmoke; color:black"|
*Spin coating of epoxy based resists
**SU-8 series
**SU-8 3000 series
**SU-8 XFT series
**mr-DWL series
*Spin coating of other resists
|-
!style="background:silver; color:black;" align="center" width="60"|Resist
|style="background:LightGrey; color:black"|
|style="background:WhiteSmoke; color:black"|
* manual dispense
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="1"|Performance
|style="background:LightGrey; color:black"|Coating thickness
|style="background:WhiteSmoke; color:black"|
* SU-8 resists: 0.1-200 µm
Coating thickness range is dependent on specific resist formulation
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameters
|style="background:LightGrey; color:black"|Spin speed
|style="background:WhiteSmoke; color:black"|
100 - 8000 rpm
|-
|style="background:LightGrey; color:black"|Spin acceleration
|style="background:WhiteSmoke; color:black"|
200 - 4000 rpm/s (wrongly labelled 1/s^2 in the software)
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
|style="background:LightGrey; color:black"|Substrate size
|style="background:WhiteSmoke; color:black"|
* chips, 5mm and up
* 100 mm wafers
* 150 mm wafers
|-
| style="background:LightGrey; color:black"|Allowed materials
|style="background:WhiteSmoke; color:black"|
All PolyFabLab materials <br>
See Cross Contamination Sheet in LabManager
|-
|style="background:LightGrey; color:black"|Batch
|style="background:WhiteSmoke; color:black"|
1
|-
|}

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