Specific Process Knowledge/Lithography/Coaters/Spin Coater: RCD8 processing - Revision history

Taran at 11:23, 20 April 2026

2026-04-20T11:23:38Z

← Older revision		Revision as of 13:23, 20 April 2026
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Taran: /* Dispense */

2025-11-03T09:15:12Z

Dispense

← Older revision		Revision as of 11:15, 3 November 2025
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	=Dispense=		=Dispense=

	Resist dispense on the Spin Coater: RCD8 can only be done manually, as the motorized media arm was decommissioned in 2024. Manual dispense is done by administering the resist directly onto the substrate, after it has been loaded into the machine but before the recipe has been started. In most cases, it is done by pushing the resist out of a prefilled syringe. Thin resists can be dispensed by pouring the resist directly from a bottle, but that is more difficult to control.		Resist dispense on the Spin Coater: RCD8 can only be done manually, as the motorized media arm was decommissioned in 2024. Manual dispense is done by administering the resist directly onto the substrate, after it has been loaded into the machine but before the recipe has been started. In most cases, it is done by pushing the resist out of a prefilled syringe (dispense cartridge). Thin resists can be dispensed by pouring the resist directly from a bottle, but that is more difficult to control.

	The volume dispensed from a syringe may be estimated by measuring the distance the resist level is displaced during a dispense, and calculating the corresponding volume using the diameter of the syringe (23 mm). A displacement of 10 mm corresponds to a dispensed volume of 4 ml. This calculation can also be used to mark the syringe with appropriately spaced guide lines in order to dispense a specific volume. 4-5 ml is an appropriate volume for a 100 mm wafer.		The volume dispensed from a syringe may be estimated by measuring the distance the resist level is displaced during a dispense, and calculating the corresponding volume using the diameter of the syringe (23 mm). A displacement of 10 mm corresponds to a dispensed volume of 4 ml. This calculation can also be used to mark the syringe with appropriately spaced guide lines in order to dispense a specific volume. 4-5 ml is an appropriate volume for a 100 mm wafer.

Taran: /* Dispense */

2025-08-30T07:06:46Z

Dispense

← Older revision		Revision as of 09:06, 30 August 2025
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	Resist dispense on the Spin Coater: RCD8 can only be done manually, as the motorized media arm was decommissioned in 2024. Manual dispense is done by administering the resist directly onto the substrate, after it has been loaded into the machine but before the recipe has been started. In most cases, it is done by pushing the resist out of a prefilled syringe. Thin resists can be dispensed by pouring the resist directly from a bottle, but that is more difficult to control.		Resist dispense on the Spin Coater: RCD8 can only be done manually, as the motorized media arm was decommissioned in 2024. Manual dispense is done by administering the resist directly onto the substrate, after it has been loaded into the machine but before the recipe has been started. In most cases, it is done by pushing the resist out of a prefilled syringe. Thin resists can be dispensed by pouring the resist directly from a bottle, but that is more difficult to control.

	The volume dispensed from a syringe may be estimated by measuring the distance the resist level is displaced during a dispense, and calculating the corresponding volume using the diameter of the syringe (23 mm). A displacement of 10 mm corresponds to a dispensed volume of 4 ml. This calculation can also be used to mark the syringe with appropriately spaced guide lines in order to dispense a specific volume.		The volume dispensed from a syringe may be estimated by measuring the distance the resist level is displaced during a dispense, and calculating the corresponding volume using the diameter of the syringe (23 mm). A displacement of 10 mm corresponds to a dispensed volume of 4 ml. This calculation can also be used to mark the syringe with appropriately spaced guide lines in order to dispense a specific volume. 4-5 ml is an appropriate volume for a 100 mm wafer.

	==Tips and tricks for dispensing thick resist==		==Tips and tricks for dispensing thick resist==

Taran: /* Spin coating */

2025-08-30T07:00:10Z

Spin coating

← Older revision		Revision as of 09:00, 30 August 2025
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	=Spin coating=		=Spin coating=
	Spin coating on Spin Coater: RCD8 consists of a selection of the following steps:		Spin coating on Spin Coater: RCD8 consists of a selection of the following steps:
	~~#Optional: Acceleration to a low spin speed if dynamic dispense is used~~
	#Resist dispense		#Resist dispense
			#(Recipe start)
	#Optional: Closing the Gyrset (if used)		#Optional: Closing the Gyrset (if used)
	#Optional: Resist spreading at low spin speed		#Optional: Resist spreading at low spin speed
	#Spin-off		#Spin-off
	#Deceleration		#Deceleration
	#Opening Gyrset		#Opening Gyrset (if used)


	The wafer is first centered on the chuck and held in place by vacuum (or pins in the case of the non-vacuum chuck). ~~If static dispense is used,~~ the ~~spindle remains static during the ensuing~~ resist ~~dispense. In the case of dynamic dispense~~, the ~~spindle~~ is ~~accelerated to a low spin speed before the resist is dispensed~~. ~~Using too high~~ spin ~~speed during dispense can cause surface wetting issues, while a too~~ low spin speed ~~causes the resist to flow onto the backside of the wafer. The resist~~ may be ~~dispensed manually, or automatically using~~ the ~~syringe dispense system on~~ the ~~media arm. After dispense~~, ~~a short spin at low spin speed may be used~~ in order to spread the resist over the wafer surface before spin-off.		The wafer is first centered on the chuck and held in place by vacuum (or pins in the case of the non-vacuum chuck). After the resist has been dispensed, the recipe is started. A short spin at low spin speed may be used as the first step of the recipe, in order to spread the resist over the wafer surface before spin-off.

	The spin-off cycle determines the thickness of the resist coating. The thickness is primarily a function of the spin-off speed and the spin-off time, both following an inverse power-law.		The spin-off cycle determines the thickness of the resist coating. The thickness is primarily a function of the spin-off speed and the spin-off time, both following an inverse power-law.

Taran: /* Dispense */

2025-08-29T08:59:17Z

Dispense

← Older revision		Revision as of 10:59, 29 August 2025
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	=Dispense=		=Dispense=

	Resist dispense on the Spin Coater: RCD8 can only be done manually, as the motorized media arm was decommissioned in 2024. Manual dispense is done by administering the resist directly onto the substrate, after it has been loaded into the machine but before the recipe has been started. It can be ~~done~~ by pouring the resist directly from a bottle ~~(for thin resists such as the AZ resists or SU-8 3005) or by pushing it out of a prefilled syringe (for thick resists like SU-8 3035 and XFT 75)~~.		Resist dispense on the Spin Coater: RCD8 can only be done manually, as the motorized media arm was decommissioned in 2024. Manual dispense is done by administering the resist directly onto the substrate, after it has been loaded into the machine but before the recipe has been started. In most cases, it is done by pushing the resist out of a prefilled syringe. Thin resists can be dispensed by pouring the resist directly from a bottle, but that is more difficult to control.

	The volume dispensed from a syringe may be estimated by measuring the distance the resist level is displaced during a dispense, and calculating the corresponding volume using the diameter of the syringe (23 mm). A displacement of 10 mm corresponds to a dispensed volume of 4 ml. This calculation can also be used to mark the syringe with appropriately spaced guide lines in order to dispense a specific volume.		The volume dispensed from a syringe may be estimated by measuring the distance the resist level is displaced during a dispense, and calculating the corresponding volume using the diameter of the syringe (23 mm). A displacement of 10 mm corresponds to a dispensed volume of 4 ml. This calculation can also be used to mark the syringe with appropriately spaced guide lines in order to dispense a specific volume.
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	'''Filling the syringe:'''<br>		'''Filling the syringe:'''<br>
	Syringes should be filled the day before spin coating, ~~and~~ should be stored vertical in order to allow bubbles to settle at the top. A syringe consists of an end cap, the syringe barrel ~~itself (30 ml or 55 ml, can be red or transparent)~~, and a piston that seals of the syringe after filling. To fill a syringe, bring all parts to a fume hood along with the resist bottle. It is recommended to clean all parts with ~~the~~ nitrogen gun (these parts are ~~normal~~ labware, and ~~thus~~ not supplied particle free). Put the end cap on the syringe barrel and open the resist bottle. Hold the syringe at a slight angle and start pouring the resist from the bottle. Start gently and be patient; the flow of resist can quickly become too fast and too wide for the syringe. ~~Let~~ the resist flow down the ~~side~~ of the syringe to minimize bubble formation, ~~but~~ avoid the top ~~couple of~~ cm of the syringe. ~~Stop~~ pouring before it's too late; the viscous resist will continue to flow ~~after~~ you have lowered the bottle. ~~Leave a couple~~ of ~~cm at~~ the ~~top~~ to ~~make sure there is room for~~ the ~~piston~~. When you have put down the resist bottle, insert the piston and push it all the way down to the surface of the resist in the syringe. Wipe any resist from the end of the syringe~~. If resist dripped on the outside of the bottle, wipe it off but avoid wiping the opening of the bottle (due to risk of contaminating the remaining resist)~~. Finally, label your syringe and store it in the chemical cabinet (in E-4).		Syringes should be filled the day before spin coating, especially for thick resists like SU-8 3035 or XFT 75. They should be stored vertical in order to allow bubbles to settle at the top.

			A syringe consists of an end cap, the syringe barrel, and a piston that seals off the syringe after filling. To fill a syringe, bring all the necessary parts to a fume hood, along with the resist bottle. It is recommended to clean all parts with a nitrogen gun (these parts are standard labware and therefore not supplied particle-free). Put the end cap on the syringe barrel and open the resist bottle. Hold the syringe at a slight angle and slowly start pouring the resist from the bottle. Start gently and be patient; the flow of resist can quickly become too fast and too wide for the syringe. Allow the resist to flow down along the inner wall of the syringe to minimize bubble formation, taking care to avoid the top few cm of the syringe. You'll need some free space at the top for the piston; so, please stop pouring the resist before it's too late, as the viscous resist will continue to flow once you have lowered the bottle. If the resist drips on the outside of the bottle, wipe it off, but avoid wiping the opening of the bottle (due to risk of contaminating the remaining resist). When you have put down the resist bottle, insert the piston and push it all the way down to the surface of the resist in the syringe. Wipe any resist from the end of the syringe. Finally, label your syringe and store it in the chemical cabinet (in E-4).

	'''Dispensing from the syringe:'''<br>		'''Dispensing from the syringe:'''<br>
	Start by removing the end cap from the syringe. For the first dispense, remove any air in the tip of the syringe by dispensing the first drop somewhere outside the substrate. Start the dispense in the center of the wafer, keeping the tip of the syringe as close to the substrate as possible (so the dispensed resist forms a continuous puddle, rather than strings that bunch up and trap air). Make sure the dispensed resist puddle is in the center of the substrate, otherwise ~~all of the resist may flow to one side during spinning~~, ~~causing the other side~~ of the substrate to not be covered, even though ~~enough~~ resist was dispensed. During ~~the dispense~~, the position of the puddle can be controlled by moving the tip ~~of the syringe~~ while continuing the ~~dispense~~. Towards the end of the dispense, move the tip to the edge of the puddle. Stop the dispense but keep the tip at the last spot to allow the last resist to finish flowing. Now, lift the tip a couple of cm up, then down again and up again, in order to break the thin string of resist that forms between the tip and the puddle.		Start by removing the end cap from the syringe. For the first dispense, remove any air in the tip of the syringe by dispensing the first drop somewhere outside the substrate. Start the dispense in the center of the wafer, keeping the tip of the syringe as close to the substrate as possible (so the dispensed resist forms a continuous puddle, rather than strings that bunch up and trap air). Make sure the dispensed resist puddle is in the center of the substrate; otherwise, some of the substrate may not be covered during spinning, even though a lot of resist was dispensed. During dispensing, the position of the puddle can be controlled by moving the syringe tip while continuing the dispensing process. Towards the end of the dispense, move the tip to the edge of the puddle. Stop the dispense, but keep the tip at the last spot to allow the last resist to finish flowing. Now, lift the tip a couple of cm up, then down again and up again, in order to break the thin string of resist that forms between the tip and the puddle.

	'''Bubbles in the resist film after coating:'''<br>		'''Bubbles in the resist film after coating:'''<br>

Taran: /* Tips and tricks for dispensing thick resist */

2025-08-27T13:40:23Z

Tips and tricks for dispensing thick resist

← Older revision		Revision as of 15:40, 27 August 2025
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	'''Dispensing from the syringe:'''<br>		'''Dispensing from the syringe:'''<br>
	Start by removing the end cap from the syringe. For the first dispense, remove any air in the tip of the syringe by dispensing the first drop somewhere outside the substrate. Start the dispense in the center of the wafer, keeping the tip of the syringe as close to the substrate as possible (so the dispensed resist forms a continuous puddle, rather than strings that bunch up and trap air). Make sure the dispensed resist puddle is in the center of the substrate, otherwise all of the resist may flow to one side during ~~the spin~~, causing the other side of the substrate to not be covered, even though enough resist was dispensed. During the dispense, the position of the puddle can be controlled by moving the tip of the syringe while continuing the dispense. Towards the end of the dispense, move the tip to the edge of the puddle. Stop the dispense but keep the tip at the last spot to allow the last resist to finish flowing. Now, lift the tip a couple of cm up, then down again and up again, in order to break the thin string of resist that forms between the tip and the puddle.		Start by removing the end cap from the syringe. For the first dispense, remove any air in the tip of the syringe by dispensing the first drop somewhere outside the substrate. Start the dispense in the center of the wafer, keeping the tip of the syringe as close to the substrate as possible (so the dispensed resist forms a continuous puddle, rather than strings that bunch up and trap air). Make sure the dispensed resist puddle is in the center of the substrate, otherwise all of the resist may flow to one side during spinning, causing the other side of the substrate to not be covered, even though enough resist was dispensed. During the dispense, the position of the puddle can be controlled by moving the tip of the syringe while continuing the dispense. Towards the end of the dispense, move the tip to the edge of the puddle. Stop the dispense but keep the tip at the last spot to allow the last resist to finish flowing. Now, lift the tip a couple of cm up, then down again and up again, in order to break the thin string of resist that forms between the tip and the puddle.

	'''Bubbles in the resist film after coating:'''<br>		'''Bubbles in the resist film after coating:'''<br>

Taran: /* Tips and tricks for dispensing thick resist */

2025-08-27T13:37:45Z

Tips and tricks for dispensing thick resist

← Older revision		Revision as of 15:37, 27 August 2025
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	'''Filling the syringe:'''<br>		'''Filling the syringe:'''<br>
	Syringes should be filled the day before spin coating, and should be stored vertical in order to allow bubbles to settle at the top. A syringe consists of an end cap, the syringe barrel itself (30 ml or 55 ml, can be red or transparent), and a piston that seals of the syringe after filling. To fill a syringe, bring all parts to a fume hood along with the resist bottle. It is recommended to clean all parts with the nitrogen gun (these parts are normal labware, and thus not ~~delivered~~ particle free). Put the end cap on the syringe barrel and open the resist bottle. Hold the syringe at a slight angle and start pouring the resist from the bottle. Start gently and be patient; the flow of resist can quickly become too fast and too wide for the syringe. Let the resist flow down the side of the syringe to minimize bubble formation, but avoid the top couple of cm of the syringe. Stop pouring before it's too late; the viscous resist will continue to flow after you have lowered the bottle. Leave a couple of cm at the top to make sure there is room for the piston. When you have put down the resist bottle, insert the piston and push it all the way down to the surface of the resist in the syringe. Wipe any resist from the end of the syringe. If resist dripped on the outside of the bottle, wipe it off but avoid wiping the opening of the bottle (due to risk of contaminating the remaining resist). Finally, label your syringe and store it in the chemical cabinet (in E-4).		Syringes should be filled the day before spin coating, and should be stored vertical in order to allow bubbles to settle at the top. A syringe consists of an end cap, the syringe barrel itself (30 ml or 55 ml, can be red or transparent), and a piston that seals of the syringe after filling. To fill a syringe, bring all parts to a fume hood along with the resist bottle. It is recommended to clean all parts with the nitrogen gun (these parts are normal labware, and thus not supplied particle free). Put the end cap on the syringe barrel and open the resist bottle. Hold the syringe at a slight angle and start pouring the resist from the bottle. Start gently and be patient; the flow of resist can quickly become too fast and too wide for the syringe. Let the resist flow down the side of the syringe to minimize bubble formation, but avoid the top couple of cm of the syringe. Stop pouring before it's too late; the viscous resist will continue to flow after you have lowered the bottle. Leave a couple of cm at the top to make sure there is room for the piston. When you have put down the resist bottle, insert the piston and push it all the way down to the surface of the resist in the syringe. Wipe any resist from the end of the syringe. If resist dripped on the outside of the bottle, wipe it off but avoid wiping the opening of the bottle (due to risk of contaminating the remaining resist). Finally, label your syringe and store it in the chemical cabinet (in E-4).

	'''Dispensing from the syringe:'''<br>		'''Dispensing from the syringe:'''<br>

Taran: /* Tips and tricks for dispensing thick resist */

2025-08-27T13:36:59Z

Tips and tricks for dispensing thick resist

← Older revision		Revision as of 15:36, 27 August 2025
Line 35:		Line 35:

	'''Filling the syringe:'''<br>		'''Filling the syringe:'''<br>
	Syringes should be filled the day before spin coating, and should be stored vertical in order to allow bubbles to settle at the top.		Syringes should be filled the day before spin coating, and should be stored vertical in order to allow bubbles to settle at the top. A syringe consists of an end cap, the syringe barrel itself (30 ml or 55 ml, can be red or transparent), and a piston that seals of the syringe after filling. To fill a syringe, bring all parts to a fume hood along with the resist bottle. It is recommended to clean all parts with the nitrogen gun (these parts are normal labware, and thus not delivered particle free). Put the end cap on the syringe barrel and open the resist bottle. Hold the syringe at a slight angle and start pouring the resist from the bottle. Start gently and be patient; the flow of resist can quickly become too fast and too wide for the syringe. Let the resist flow down the side of the syringe to minimize bubble formation, but avoid the top couple of cm of the syringe. Stop pouring before it's too late; the viscous resist will continue to flow after you have lowered the bottle. Leave a couple of cm at the top to make sure there is room for the piston. When you have put down the resist bottle, insert the piston and push it all the way down to the surface of the resist in the syringe. Wipe any resist from the end of the syringe. If resist dripped on the outside of the bottle, wipe it off but avoid wiping the opening of the bottle (due to risk of contaminating the remaining resist). Finally, label your syringe and store it in the chemical cabinet (in E-4).

	'''Dispensing from the syringe:'''<br>		'''Dispensing from the syringe:'''<br>
			Start by removing the end cap from the syringe. For the first dispense, remove any air in the tip of the syringe by dispensing the first drop somewhere outside the substrate. Start the dispense in the center of the wafer, keeping the tip of the syringe as close to the substrate as possible (so the dispensed resist forms a continuous puddle, rather than strings that bunch up and trap air). Make sure the dispensed resist puddle is in the center of the substrate, otherwise all of the resist may flow to one side during the spin, causing the other side of the substrate to not be covered, even though enough resist was dispensed. During the dispense, the position of the puddle can be controlled by moving the tip of the syringe while continuing the dispense. Towards the end of the dispense, move the tip to the edge of the puddle. Stop the dispense but keep the tip at the last spot to allow the last resist to finish flowing. Now, lift the tip a couple of cm up, then down again and up again, in order to break the thin string of resist that forms between the tip and the puddle.

			'''Bubbles in the resist film after coating:'''<br>
			Bubbles in the resist after coating can successfully be popped (using e.g. an Eppendorf pipette tip), either while still on the chuck or after moving to the hotplate. Sometimes bubbles appear in the film during the first stage of softbaking. These can also be popped.
	<!--		<!--
	Text below was in the original section "Automatic dispense" TARAN 27-08-2025		Text below was in the original section "Automatic dispense" TARAN 27-08-2025

Taran: /* Auxiliary recipes */

2025-08-27T13:00:15Z

Auxiliary recipes

← Older revision		Revision as of 15:00, 27 August 2025
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	*'''1 DCH Gyrset cleaning'''		*'''1 DCH Gyrset cleaning'''
	Gyrset down; 10s @ 100rpm; 1s @ 0rpm; 10s @ -30rpm; 20s @ 1500rpm; Gyrset up.		Gyrset down; 10s @ 100rpm; 1s @ 0rpm; 10s @ -30rpm; 20s @ 1500rpm; Gyrset up.
			<!--
	*'''1 DCH predispense'''		*'''1 DCH predispense'''
	0.2s dispense at cup (arm position 0mm).		0.2s dispense at cup (arm position 0mm).
			-->

	==Manual dispense templates==		==Manual dispense templates==

Taran: /* Recipes */

2025-08-27T12:59:27Z

Recipes

← Older revision		Revision as of 14:59, 27 August 2025
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	*'''1 TMPLT man disp Gyrset sprd'''		*'''1 TMPLT man disp Gyrset sprd'''
	Gyrset down; spread step; spin-off; deceleration; Gyrset up.		Gyrset down; spread step; spin-off; deceleration; Gyrset up.
			<!--
	==Automatic dispense templates==		==Automatic dispense templates==
	*'''1 TMPLT aut disp SU8'''		*'''1 TMPLT aut disp SU8'''
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	*'''1 TMPLT aut disp Gyrset sprd'''		*'''1 TMPLT aut disp Gyrset sprd'''
	Dispense; Gyrset down; spread step; spin-off; deceleration; Gyrset up.		Dispense; Gyrset down; spread step; spin-off; deceleration; Gyrset up.
			-->

	=Processing results=		=Processing results=