Specific Process Knowledge/Lithography/Aligners/MAvsMLA - Revision history

Taran: /* Tools used in the investigation */

2026-06-23T07:24:26Z

Tools used in the investigation

← Older revision		Revision as of 09:24, 23 June 2026
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	**100mm Si, SSP <100>		**100mm Si, SSP <100>
	*Resist		*Resist
	**AZ 5214E (image reversal, but processed positive)		**[[Specific_Process_Knowledge/Lithography/5214E\|AZ 5214E]] (image reversal, but processed positive)
	**AZ MiR 701 (positive)		**[[Specific_Process_Knowledge/Lithography/MiR\|AZ MiR 701]] (positive)
	**AZ nLOF 2020 (negative)		**[[Specific_Process_Knowledge/Lithography/nLOF\|AZ nLOF 2020]] (negative)
	*Spin coating (incl. HMDS)		*Spin coating (incl. HMDS)
	**Spin ~~Caoter~~: Gamma UV		**[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_UV\|Spin Coater: Gamma UV]]
	*Exposure		*Exposure
	**Aligner: MA6-2		**[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_MA6-2\|Aligner: MA6-2]]
	**Aligner: MA6-1 (in PolyFabLab)		**[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_MA6-1\|Aligner: MA6-1]] (in PolyFabLab)
	**Aligner: Maskless 02 ~~(MLA2)~~		**[[Specific Process Knowledge/Lithography/UVExposure#Aligner: Maskless 02\|Aligner: Maskless 02]]
	**Aligner: Maskless 01 ~~(MLA1)~~		**[[Specific Process Knowledge/Lithography/UVExposure#Aligner: Maskless 01\|Aligner: Maskless 01]]
	*Development (incl. PEB, if relevant)		*Development (incl. PEB, if relevant)
	**Developer: TMAH UV-lithography		**[[Specific_Process_Knowledge/Lithography/Development/UV_developer\|Developer: TMAH UV-lithography]]
	*Inspection		*Inspection
	**Microscope Olympus MX63		**[[Specific_Process_Knowledge/Characterization/Optical_microscope\|Microscope Olympus MX63]]
	**SEM Supra 1		**[[Specific_Process_Knowledge/Characterization/SEM_Supra_1\|SEM Supra 1]]
	**SEM Supra 3		**[[Specific_Process_Knowledge/Characterization/SEM_Supra_3\|SEM Supra 3]]
	<br clear="all" />		<br clear="all" />

Taran at 07:08, 23 June 2026

2026-06-23T07:08:15Z

← Older revision		Revision as of 09:08, 23 June 2026
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	Mask design used in the investigation: [[Media:LithoTestAlign 2025 v10.gds\|LithoTestAlign_2025_v10.gds]]		Mask design used in the investigation: [[Media:LithoTestAlign 2025 v10.gds\|LithoTestAlign_2025_v10.gds]]
			<br clear="all" />

			=Tools used in the investigation=
			*Wafers
			**100mm Si, SSP <100>
			*Resist
			**AZ 5214E (image reversal, but processed positive)
			**AZ MiR 701 (positive)
			**AZ nLOF 2020 (negative)
			*Spin coating (incl. HMDS)
			**Spin Caoter: Gamma UV
			*Exposure
			**Aligner: MA6-2
			**Aligner: MA6-1 (in PolyFabLab)
			**Aligner: Maskless 02 (MLA2)
			**Aligner: Maskless 01 (MLA1)
			*Development (incl. PEB, if relevant)
			**Developer: TMAH UV-lithography
			*Inspection
			**Microscope Olympus MX63
			**SEM Supra 1
			**SEM Supra 3
			<br clear="all" />

	=Data from the investigation=		=Data from the investigation=

Taran: /* AZ nLOF 2020 */

2026-06-18T12:51:04Z

AZ nLOF 2020

← Older revision		Revision as of 14:51, 18 June 2026
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	==AZ nLOF 2020==		==AZ nLOF 2020==
			<br clear="all" />
	===Resolution (AZ nLOF 2020)===		===Resolution (AZ nLOF 2020)===
	<br clear="all" />		<br clear="all" />

	'''Resolution at optimal processing conditions for 2µm AZ nLOF 2020 using different exposure equipment:'''		'''Resolution at optimal processing conditions for 2µm AZ nLOF 2020 using different exposure equipment:'''
	{\| class="wikitable"		{\| class="wikitable"
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	===Resist profile (AZ nLOF 2020)===		===Resist profile (AZ nLOF 2020)===
	<br clear="all" />		<br clear="all" />

	====Linewidth and sidewall angle vs exposure dose (AZ nLOF 2020)====		====Linewidth and sidewall angle vs exposure dose (AZ nLOF 2020)====
	<br clear="all" />		<br clear="all" />

	'''Result of image analysis of SEM images of 2µm triplets:'''		'''Result of image analysis of SEM images of 2µm triplets:'''

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	====Linewidth and sidewall angle vs defocus parameter (AZ nLOF 2020)====		====Linewidth and sidewall angle vs defocus parameter (AZ nLOF 2020)====
	<br clear="all" />		<br clear="all" />

	'''Result of image analysis of SEM images of 2µm triplets:'''		'''Result of image analysis of SEM images of 2µm triplets:'''

Taran: /* AZ MiR 701 */

2026-06-18T12:49:29Z

AZ MiR 701

← Older revision		Revision as of 14:49, 18 June 2026
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	==AZ MiR 701==		==AZ MiR 701==
			<br clear="all" />
	===Resolution (AZ MiR 701)===		===Resolution (AZ MiR 701)===
	* Table with optimal parameters and resolution for different aligners		<br clear="all" />
	* SEM pictures
	'''Resolution at optimal processing conditions for 1.5µm AZ MiR 701 using different exposure equipment:'''		'''Resolution at optimal processing conditions for 1.5µm AZ MiR 701 using different exposure equipment:'''
	{\| class="wikitable"		{\| class="wikitable"

Taran: /* Resist profile (AZ 5214E) */

2026-06-18T12:48:54Z

Resist profile (AZ 5214E)

← Older revision		Revision as of 14:48, 18 June 2026
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	====Linewidth and sidewall angle vs defocus parameter (AZ 5214E)====		====Linewidth and sidewall angle vs defocus parameter (AZ 5214E)====
	<br clear="all" />		<br clear="all" />

	'''Result of image analysis of SEM images of 2µm triplets:'''		'''Result of image analysis of SEM images of 2µm triplets:'''

Taran: /* Data from the investigation */

2026-06-18T12:47:27Z

Data from the investigation

← Older revision		Revision as of 14:47, 18 June 2026
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	<!-- <span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png\|200px]]		<!-- <span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png\|200px]]
	-->		-->
			<br clear="all" />
	==AZ 5214E==		==AZ 5214E==
			<br clear="all" />
	===Resolution (AZ 5214E)===		===Resolution (AZ 5214E)===
	<br clear="all" />		<br clear="all" />

Taran at 12:46, 18 June 2026

2026-06-18T12:46:07Z

← Older revision		Revision as of 14:46, 18 June 2026
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	===Resist profile (AZ 5214E)===		===Resist profile (AZ 5214E)===
	<br clear="all" />		<br clear="all" />

	====Linewidth and sidewall angle vs exposure dose (AZ 5214E)====		====Linewidth and sidewall angle vs exposure dose (AZ 5214E)====
	<br clear="all" />		<br clear="all" />

	'''Result of image analysis of SEM images of 2µm triplets:'''		'''Result of image analysis of SEM images of 2µm triplets:'''

Taran at 12:43, 18 June 2026

2026-06-18T12:43:06Z

← Older revision		Revision as of 14:43, 18 June 2026
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	{{cc-nanolab}}		{{cc-nanolab}}

	'''Feedback to this page''': '''[mailto:~~labadviser~~@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/Aligners/MAvsMLA click here]'''		'''Feedback to this page''': '''[mailto:taran@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/Aligners/MAvsMLA click here]'''

	[[Category:Equipment\|Lithography exposure]]		[[Category:Equipment\|Lithography exposure]]
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	=Mask Aligner vs Maskless Aligner=		=Mask Aligner vs Maskless Aligner=

	Slides presented at NNUM in Uppsala ~~2026~~: [[Media:MA6 vs MLA 2026 v09.pdf\|'''MA6 vs MLA 2026_v09''']]		In the first half of 2026, a rather thorough investigation of the differences between exposure using mask aligner and maskless aligner was conducted. The result was presented as an advanced lithography tutorial at the 2026 Nordic Nanolab User Meeting in Uppsala, Sweden.

			Slides presented at NNUM in Uppsala: [[Media:MA6 vs MLA 2026 v09.pdf\|'''MA6 vs MLA 2026_v09''']]

	Mask design used in the investigation: [[Media:LithoTestAlign 2025 v10.gds\|LithoTestAlign_2025_v10.gds]]		Mask design used in the investigation: [[Media:LithoTestAlign 2025 v10.gds\|LithoTestAlign_2025_v10.gds]]

	=Data from the investigation=		=Data from the investigation=
	<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png\|200px]]		<!-- <span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png\|200px]]
			-->

			==AZ 5214E==

	~~==AZ 5214E==~~
	===Resolution (AZ 5214E)===		===Resolution (AZ 5214E)===
	<br clear="all" />		<br clear="all" />

Taran: /* Linewidth and sidewall angle vs defocus parameter (AZ nLOF 2020) */

2026-06-18T12:24:00Z

Linewidth and sidewall angle vs defocus parameter (AZ nLOF 2020)

← Older revision		Revision as of 14:24, 18 June 2026
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	\|[[Image:W06 MLA1 nLOF D220 F-14_03.jpg\|280px]]		\|[[Image:W06 MLA1 nLOF D220 F-14_03.jpg\|280px]]
	\|[[Image:W06 MLA1 nLOF D220 F-7_03.jpg\|280px]]		\|[[Image:W06 MLA1 nLOF D220 F-7_03.jpg\|280px]]
	\|[[Image:W06 MLA1 nLOF D220 F-~~4_04~~.jpg\|280px]]		\|[[Image:W06 MLA1 nLOF D220 F-4_2_03.jpg\|280px]]
	\|[[Image:W06 MLA1 nLOF D220 F-1_03.jpg\|280px]]		\|[[Image:W06 MLA1 nLOF D220 F-1_03.jpg\|280px]]
	\|[[Image:W06 MLA1 nLOF D220 F6_03.jpg\|280px]]		\|[[Image:W06 MLA1 nLOF D220 F6_03.jpg\|280px]]

Taran: /* Resolution (AZ nLOF 2020) */

2026-06-18T12:12:30Z

Resolution (AZ nLOF 2020)

← Older revision		Revision as of 14:12, 18 June 2026
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	220mJ/cm<sup>2</sup>, Defoc -4		220mJ/cm<sup>2</sup>, Defoc -4
	\|[[Image:W06 MLA1 nLOF D220 F-4_02.jpg\|400px]]		\|[[Image:W06 MLA1 nLOF D220 F-4_02.jpg\|400px]]
	\|[[Image:W06 MLA1 nLOF D220 F-~~4_01~~.jpg\|400px]]		\|[[Image:W06 MLA1 nLOF D220 F-4_2_01.jpg\|400px]]
	\|[[Image:W06 MLA1 nLOF D220 F-4_03.jpg\|400px]]		\|[[Image:W06 MLA1 nLOF D220 F-4_03.jpg\|400px]]

← Older revision		Revision as of 14:24, 18 June 2026
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	\|[[Image:W06 MLA1 nLOF D220 F-14_03.jpg\|280px]]		\|[[Image:W06 MLA1 nLOF D220 F-14_03.jpg\|280px]]
	\|[[Image:W06 MLA1 nLOF D220 F-7_03.jpg\|280px]]		\|[[Image:W06 MLA1 nLOF D220 F-7_03.jpg\|280px]]
	\|[[Image:W06 MLA1 nLOF D220 F-~~4_04~~.jpg\|280px]]		\|[[Image:W06 MLA1 nLOF D220 F-4_2_03.jpg\|280px]]
	\|[[Image:W06 MLA1 nLOF D220 F-1_03.jpg\|280px]]		\|[[Image:W06 MLA1 nLOF D220 F-1_03.jpg\|280px]]
	\|[[Image:W06 MLA1 nLOF D220 F6_03.jpg\|280px]]		\|[[Image:W06 MLA1 nLOF D220 F6_03.jpg\|280px]]