Specific Process Knowledge/Lithography/Aligners/MAvsMLA - Revision history

Taran: /* AZ 5214E */

2026-06-15T14:24:36Z

AZ 5214E

← Older revision		Revision as of 16:24, 15 June 2026
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	==AZ 5214E==		==AZ 5214E==
	===Resolution===		===Resolution===
	'''Resolution at optimal conditions for different exposure equipment:'''		'''Resolution at optimal processing conditions for different exposure equipment:'''
	{\| class="wikitable"		{\| class="wikitable"
	\|+		\|+
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	===Yield===		===Yield===

	The yield is measured by inspecting all 116 lithographic resolution test structures in an optical microscope and recording the smallest resolved dots and lines.		The yield is measured by inspecting all 116 lithographic resolution test structures in an optical microscope and recording the smallest resolved dots and lines.
	<br clear="all" />		<br clear="all" />
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	===Resist profile===		===Resist profile===

	====Linewidth and sidewall angle vs exposure dose====		====Linewidth and sidewall angle vs exposure dose====

	'''SEM images of 2µm triplets as a function of exposure dose:'''		'''SEM images of 2µm triplets as a function of exposure dose:'''
	{\|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"		{\|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
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	\|}		\|}
			<br clear="all" />

	{\|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"		{\|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
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	\|}		\|}
			<br clear="all" />

	'''Result of image analysis of SEM images of 2µm triplets:'''		'''Result of image analysis of SEM images of 2µm triplets:'''
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	! width="510" \|		! width="510" \|

	\|+~~'''Width of 2µm line and sidewall angle vs. exposure dose for 1.5µm AZ 5214E.'''~~		\|+
	\|- border="0" align="center"		\|- border="0" align="center"
	\|[[Image:5214E_Linewidth vs dose.jpg\|500px]]		\|[[Image:5214E_Linewidth vs dose.jpg\|500px]]
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	\|- align="center"		\|- align="center"
	\| colspan="2" \| Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).		\| colspan="2" \| Width of 2µm line and sidewall angle vs. exposure dose for 1.5µm AZ 5214E. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
	\|}		\|}
	<br clear="all" />		<br clear="all" />

			====Linewidth and sidewall angle vs defocus parameter====

	~~====Linewidth and sidewall angle vs defocus parameter====~~
	'''SEM images as a function of defocus parameter for Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>:'''		'''SEM images as a function of defocus parameter for Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>:'''
	{\|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"		{\|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
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	\|}		\|}
			<br clear="all" />

	'''Result of image analysis of SEM images of 2µm triplets:'''		'''Result of image analysis of SEM images of 2µm triplets:'''
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	! width="510" \|		! width="510" \|

	\|+~~'''Linewidth and sidewall angle vs. defocus value for 1.5µm AZ 5214E exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>.'''~~		\|+
	\|- border="0" align="center"		\|- border="0" align="center"
	\|[[Image:5214E_Profile vs defoc.jpg\|500px]]		\|[[Image:5214E_Profile vs defoc.jpg\|500px]]

	\|- align="center"		\|- align="center"
	\| Blue circles: Width of 2µm line. <br>Orange Squares: Sidewall angle.		\| Linewidth and sidewall angle vs. defocus value for 1.5µm AZ 5214E exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. <br>Orange Squares: Sidewall angle.

	\|}		\|}

Taran: /* Resolution */

2026-06-15T14:16:52Z

Resolution

← Older revision		Revision as of 16:16, 15 June 2026
Line 19:		Line 19:
	==AZ 5214E==		==AZ 5214E==
	===Resolution===		===Resolution===
			'''Resolution at optimal conditions for different exposure equipment:'''
	{\| class="wikitable"		{\| class="wikitable"
	\|+		\|+
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	\|}		\|}
			<br clear="all" />

	'''SEM images of different size structures:'''		'''SEM images of different size structures:'''

Taran: /* Resist profile (linewidth and sidewall angle) */

2026-06-15T13:14:50Z

Resist profile (linewidth and sidewall angle)

← Older revision		Revision as of 15:14, 15 June 2026
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	<br clear="all" />		<br clear="all" />

	===Resist profile ~~(linewidth and sidewall angle)~~===		===Resist profile===
	====Linewidth and sidewall angle vs exposure dose====		====Linewidth and sidewall angle vs exposure dose====
	'''SEM images of 2µm triplets as a function of exposure dose:'''		'''SEM images of 2µm triplets as a function of exposure dose:'''

Taran: /* Linewidth and sidewall angle vs defocus parameter */

2026-06-15T13:06:00Z

Linewidth and sidewall angle vs defocus parameter

← Older revision		Revision as of 15:06, 15 June 2026
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	====Linewidth and sidewall angle vs defocus parameter====		====Linewidth and sidewall angle vs defocus parameter====
	'''SEM images as a function of defocus parameter for Aligner: Maskless 02 (MLA2):'''		'''SEM images as a function of defocus parameter for Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>:'''
	{\|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"		{\|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
	\|-		\|-

Taran: /* Resist profile (linewidth and sidewall angle) */

2026-06-15T13:03:44Z

Resist profile (linewidth and sidewall angle)

← Older revision		Revision as of 15:03, 15 June 2026
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	===Resist profile (linewidth and sidewall angle)===		===Resist profile (linewidth and sidewall angle)===
			====Linewidth and sidewall angle vs exposure dose====
	'''SEM images of 2µm triplets as a function of exposure dose:'''		'''SEM images of 2µm triplets as a function of exposure dose:'''
	{\|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"		{\|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
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			====Linewidth and sidewall angle vs defocus parameter====
	'''SEM images as a function of defocus parameter for Aligner: Maskless 02 (MLA2):'''		'''SEM images as a function of defocus parameter for Aligner: Maskless 02 (MLA2):'''
	{\|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"		{\|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
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	\|-style="background:WhiteSmoke; color:black"		\|-style="background:WhiteSmoke; color:black"
	\|2µm triplets		\|2µm triplets
	\|[[Image:~~W14 MA62 5214E vac D85_H6B_01~~.jpg\|280px]]		\|[[Image:W33 MLA2 5214 F-8 D95_101.jpg\|280px]]
	\|[[Image:~~W14 MA62 5214E vac D90_H4B_01~~.jpg\|280px]]		\|[[Image:W33 MLA2 5214 F-1 D95_01.jpg\|280px]]
	\|[[Image:~~W14 MA62 5214E vac D95_F3B_01~~.jpg\|280px]]		\|[[Image:W33 MLA2 5214 F2 D95_01.jpg\|280px]]
	\|[[Image:~~W14 MA62 5214E vac D100_B4T_01~~.jpg\|280px]]		\|[[Image:W33 MLA2 5214 F5 D95_01.jpg\|280px]]
	\|[[Image:~~W14 MA62 5214E vac D105_C6T_01~~.jpg\|280px]]		\|[[Image:W33 MLA2 5214 F12 D95_101.jpg\|280px]]

	\|-		\|-
	\|-style="background:WhiteSmoke; color:black"		\|-style="background:WhiteSmoke; color:black"
	\|Lines		\|Lines
	\|[[Image:~~W14 MA62 5214E vac D85_H6B_01~~.jpg\|280px]]		\|[[Image:W33 MLA2 5214 F-8 D95_102.jpg\|280px]]
	\|[[Image:~~W14 MA62 5214E vac D90_H4B_01~~.jpg\|280px]]		\|[[Image:W33 MLA2 5214 F-1 D95_02.jpg\|280px]]
	\|[[Image:~~W14 MA62 5214E vac D95_F3B_01~~.jpg\|280px]]		\|[[Image:W33 MLA2 5214 F2 D95_1_02.jpg\|280px]]
	\|[[Image:~~W14 MA62 5214E vac D100_B4T_01~~.jpg\|280px]]		\|[[Image:W33 MLA2 5214 F5 D95_02.jpg\|280px]]
	\|[[Image:~~W14 MA62 5214E vac D105_C6T_01~~.jpg\|280px]]		\|[[Image:W33 MLA2 5214 F12 D95_102.jpg\|280px]]

	\|}		\|}


			'''Result of image analysis of SEM images of 2µm triplets:'''
	{\| cellpadding="2" style="border: 2px solid darkgray;" align="left"		{\| cellpadding="2" style="border: 2px solid darkgray;" align="left"
	! width="510" \|		! width="510" \|

Taran: /* Resist profile (linewidth and sidewall angle) */

2026-06-15T12:57:55Z

Resist profile (linewidth and sidewall angle)

@@ Line 187: / Line 187: @@
 ===Resist profile (linewidth and sidewall angle)===
 '''SEM images of 2µm triplets as a function of exposure dose:'''
 {|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
@@ Line 212: / Line 213: @@
 |}
 {|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
@@ Line 235: / Line 237: @@
 |}
 '''Result of image analysis of SEM images of 2µm triplets:'''
@@ Line 250: / Line 253: @@
 |}
 <br clear="all" />
 {| cellpadding="2" style="border: 2px solid darkgray;" align="left"
@@ Line 260: / Line 299: @@
 |- align="center"
 | Blue circles: Width of 2µm line. <br>Orange Squares: Sidewall angle.
 |}
 <br clear="all" />

Taran: /* Resist profile (linewidth and sidewall angle) */

2026-06-15T12:51:11Z

Resist profile (linewidth and sidewall angle)

← Older revision		Revision as of 14:51, 15 June 2026
Line 187:		Line 187:

	===Resist profile (linewidth and sidewall angle)===		===Resist profile (linewidth and sidewall angle)===
	'''SEM images of 2µm triplets:'''		'''SEM images of 2µm triplets as a function of exposure dose:'''
	{\|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"		{\|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
	\|-		\|-

Taran: /* Resolution */

2026-06-15T12:50:13Z

Resolution

← Older revision		Revision as of 14:50, 15 June 2026
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	\|[[Image:W32 PFL 5214 D100 vac C6B_02.jpg\|400px]]		\|[[Image:W32 PFL 5214 D100 vac C6B_02.jpg\|400px]]
	\|[[Image:W32 PFL 5214 D100 vac C6B_01.jpg\|400px]]		\|[[Image:W32 PFL 5214 D100 vac C6B_01.jpg\|400px]]
	\|[[Image:W32 PFL 5214 D100 vac C6B_03.jpg\|~~4050px~~]]		\|[[Image:W32 PFL 5214 D100 vac C6B_03.jpg\|400px]]

	\|}		\|}

Taran: /* Resolution */

2026-06-15T12:49:47Z

Resolution

← Older revision		Revision as of 14:49, 15 June 2026
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	\|}		\|}
	<br clear="all" />		<br clear="all" />

			'''SEM images from different exposure equipment:'''

	{\|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"		{\|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
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	\|-style="background:silver; color:black"		\|-style="background:silver; color:black"
	!		!
	~~!1µm triplets~~
	!2µm triplets		!2µm triplets
	~~!4µm triplets~~
	!Lines		!Lines
	!Trenches		!Trenches
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	\|Aligner: MA6-2		\|Aligner: MA6-2
	100mJ/cm<sup>2</sup>, vacuum contact		100mJ/cm<sup>2</sup>, vacuum contact
	\|		\|[[Image:W14 MA62 5214E vac D100_B4T_01.jpg\|400px]]
	\|[[Image:W14 MA62 5214E vac D100_B4T_01.jpg\|~~300px~~]]		\|[[Image:W14 MA62 5214E vac D100_B4T_02.jpg\|400px]]
	\|		\|[[Image:W14 MA62 5214E vac D100_B4T_03.jpg\|400px]]
	\|[[Image:W14 MA62 5214E vac D100_B4T_02.jpg\|~~300px~~]]
	\|[[Image:W14 MA62 5214E vac D100_B4T_03.jpg\|~~300px~~]]

	\|-		\|-
	\|-style="background:WhiteSmoke; color:black"		\|-style="background:WhiteSmoke; color:black"
	\|Aligner: MA6-1		\|Aligner: MA6-1
	100mJ/cm<sup>2</sup>, vacuum contact		100mJ/cm<sup>2</sup>, vacuum contact <br>(probably over-exposed)
	(probably over-exposed)		\|[[Image:W32 PFL 5214 D100 vac C6B_01.jpg\|400px]]
	~~\|[[Image:W32 PFL 5214 D100 vac C6B_02.jpg\|290px]]~~		\|[[Image:W32 PFL 5214 D100 vac C6B_04.jpg\|400px]]
	\|[[Image:W32 PFL 5214 D100 vac C6B_01.jpg\|~~290px]]~~		\|[[Image:W32 PFL 5214 D100 vac C6B_05.jpg\|400px]]
	~~\|[[Image:W32 PFL 5214 D100 vac C6B_03.jpg\|290px~~]]
	\|[[Image:W32 PFL 5214 D100 vac C6B_04.jpg\|~~290px~~]]
	\|[[Image:W32 PFL 5214 D100 vac C6B_05.jpg\|~~290px~~]]

	\|-		\|-
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	\|Aligner: Maskless 02 (MLA2)		\|Aligner: Maskless 02 (MLA2)
	90mJ/cm<sup>2</sup>, defoc 2		90mJ/cm<sup>2</sup>, defoc 2
	\|		\|[[Image:W13 mla2 5214E D90 F2_05.jpg\|400px]]
	\|[[Image:W13 mla2 5214E D90 F2_05.jpg\|~~300px~~]]		\|[[Image:W13 mla2 5214E D90 F2_01.jpg\|400px]]
	\|		\|[[Image:W13 mla2 5214E D90 F2_02.jpg\|400px]]
	\|[[Image:W13 mla2 5214E D90 F2_01.jpg\|~~300px~~]]
	\|[[Image:W13 mla2 5214E D90 F2_02.jpg\|~~300px~~]]

	\|}		\|}

			'''SEM images of different size structures:'''

			{\|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
			\|-

			\|-
			\|-style="background:silver; color:black"
			!
			!1µm triplets
			!2µm triplets
			!4µm triplets
			\|-

			\|-
			\|-style="background:WhiteSmoke; color:black"
			\|Aligner: MA6-1
			100mJ/cm<sup>2</sup>, vacuum contact <br>(probably over-exposed)
			\|[[Image:W32 PFL 5214 D100 vac C6B_02.jpg\|400px]]
			\|[[Image:W32 PFL 5214 D100 vac C6B_01.jpg\|400px]]
			\|[[Image:W32 PFL 5214 D100 vac C6B_03.jpg\|4050px]]

			\|}
	<br clear="all" />		<br clear="all" />

Taran: /* Resist profile (linewidth and sidewall angle) */

2026-06-15T12:44:07Z

Resist profile (linewidth and sidewall angle)

← Older revision		Revision as of 14:44, 15 June 2026
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	===Resist profile (linewidth and sidewall angle)===		===Resist profile (linewidth and sidewall angle)===
			'''SEM images of 2µm triplets:'''
	{\|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"		{\|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
	\|-		\|-