Specific Process Knowledge/Etch/Wet Chromium Etch - Revision history

Mbec: /* Wet etching of Chromium */

2026-06-30T09:57:44Z

Wet etching of Chromium

← Older revision		Revision as of 11:57, 30 June 2026
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	==Wet etching of Chromium==		==Wet etching of Chromium==
	[[~~Image~~:~~Fumehood1-2~~.~~jpg~~\|300x300px\|thumb\|Fume ~~hood 01 or 02 (for acids and bases)~~ in cleanroom D-3 can be used for wet chromium etching.]]		[[File:Si etch 3.png\|300x300px \|thumb\| Work space in Fume Hood 06 in cleanroom D-3 can be used for wet chromium etching - workspace should be booked.]]
	Wet etching of chromium at DTU Nanolab is done making your own set up in a beaker in a fume hood - preferably in D-3. Make sure no other setup is present in the fume hood before you start. You can see the APV [http://labmanager.dtu.dk/d4Show.php?id=4748&mach=368 here].

	We use the following solution to etch chromium:		We use the following solution to etch chromium:

	# Commercial chromium etch (Chrome Etch 18). You can see the KBA (needs login) [https://kemibrug.dk/Kemikalier/Action?id=RCU2MHolYzIlODIlN2UlYzIlODB2JWMyJTgxJTdleiVjMiU4N0RZeiVjMiU4OXYlN2UlYzIlODElYzIlODhESk5HTklNVGQlYzIlODclN2N2JWMyJTgzJTdlJWMyJTg4diVjMiU4OSU3ZSVjMiU4NCVjMiU4MyVjMiU4OCU1ZVlSSQ==#K here]		# Commercial chromium etch (Chrome Etch 18). You can see the KBA (needs login to kemibrug) [https://kemibrug.dk/Kemikalier/Action?id=RCU2MHolYzIlODIlN2UlYzIlODB2JWMyJTgxJTdleiVjMiU4N0RZeiVjMiU4OXYlN2UlYzIlODElYzIlODhESk5HTklNVGQlYzIlODclN2N2JWMyJTgzJTdlJWMyJTg4diVjMiU4OSU3ZSVjMiU4NCVjMiU4MyVjMiU4OCU1ZVlSSQ==#K here]

	The etch rate depends on the level of surface oxidation of the chromium metal, but the standard procedure (etch at room temperature: ~22°C) the Etch rate is around 150 nm/min.		The etch rate depends on the level of surface oxidation of the chromium metal, but the standard procedure (etch at room temperature: ~22°C) the Etch rate is around 150 nm/min.

			'''Etch in Fume hood'''
			Wet etching of chromium in fume hood at DTU Nanolab is done making your own set up in a beaker in a fume hood - preferably fume hood 6 for Si etch 3 in D-3

			You can see the APV [https://labmanager.dtu.dk/d4mb/show.php?dokId=4748&mach=368&chpr=0 here].

	PECVD SiO2 and LPCVD SiN coated wafers have been immersed in Cr etch 18 for 10min. Thickness wise: absolutely no changes (roughness after etch not measured)		PECVD SiO2 and LPCVD SiN coated wafers have been immersed in Cr etch 18 for 10min. Thickness wise: absolutely no changes (roughness after etch not measured)

	Normally the etch is reused (if you etch Molybdenum never reuse), but if you need to dispose it, collect it in a bottle marked X waste.		Normally the etch is reused (if you etch Molybdenum never reuse), but if you need to dispose it, collect it in a bottle marked X waste.

			'''Etching of Chromium in Acid 1 wetbench 11'''
			[[File:Wetbench 11.png\|300x300px\|thumb\|Acid 1 Wetbench 11 in cleanroom D-3 can be used for wet chromium etching of 6" and 8" wafers, after agreement with wetchemistry group.]]

			Always make an agreement with Wetchemistry group before training

			The bath is for 6" and 8" wafers.

			You can see the APV [https://labmanager.dtu.dk/d4mb/show.php?dokId=21726&mach=580 here].

	===Overview of the chromium etch process===		===Overview of the chromium etch process===

Mbec: /* Overview of the chromium etch process */

2026-06-30T08:55:39Z

Overview of the chromium etch process

← Older revision		Revision as of 10:55, 30 June 2026
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	\|-style="background:silver; color:black"		\|-style="background:silver; color:black"
	!		!
	! Chromium etch 1		! Chromium etch in Fume hood
			! Chromium etch Acid 1 wetbench 11
	\|-		\|-

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	\|		\|
	Etch of chromium		Etch of chromium
			\|
			Etch of Chromium 6" and 8" wafers
	\|-		\|-

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	!Link to safety APV and KBA		!Link to safety APV and KBA
	\|[http://labmanager.dtu.dk/d4Show.php?id=4748&mach=368 see fumehood APV/manual here].		\|[http://labmanager.dtu.dk/d4Show.php?id=4748&mach=368 see fumehood APV/manual here].
			[https://kemibrug.dk/Kemikalier/Action?id=RCU2MHolYzIlODIlN2UlYzIlODB2JWMyJTgxJTdleiVjMiU4N0RZeiVjMiU4OXYlN2UlYzIlODElYzIlODhESk5HTklNVGQlYzIlODclN2N2JWMyJTgzJTdlJWMyJTg4diVjMiU4OSU3ZSVjMiU4NCVjMiU4MyVjMiU4OCU1ZVlSSQ==#K see Chrome Etch 18 KBA here]
			\|[https://labmanager.dtu.dk/d4mb/show.php?dokId=21726&mach=580 see Wetbench 11 APV/manual here].
	[https://kemibrug.dk/Kemikalier/Action?id=RCU2MHolYzIlODIlN2UlYzIlODB2JWMyJTgxJTdleiVjMiU4N0RZeiVjMiU4OXYlN2UlYzIlODElYzIlODhESk5HTklNVGQlYzIlODclN2N2JWMyJTgzJTdlJWMyJTg4diVjMiU4OSU3ZSVjMiU4NCVjMiU4MyVjMiU4OCU1ZVlSSQ==#K see Chrome Etch 18 KBA here]		[https://kemibrug.dk/Kemikalier/Action?id=RCU2MHolYzIlODIlN2UlYzIlODB2JWMyJTgxJTdleiVjMiU4N0RZeiVjMiU4OXYlN2UlYzIlODElYzIlODhESk5HTklNVGQlYzIlODclN2N2JWMyJTgzJTdlJWMyJTg4diVjMiU4OSU3ZSVjMiU4NCVjMiU4MyVjMiU4OCU1ZVlSSQ==#K see Chrome Etch 18 KBA here]
	\|-		\|-
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	\|-style="background:WhiteSmoke; color:black"		\|-style="background:WhiteSmoke; color:black"
	!Chemical solution		!Chemical solution
			\|Chrome Etch 18
	\|Chrome Etch 18		\|Chrome Etch 18
	\|-		\|-
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	!Process temperature		!Process temperature
	\|Room temperature		\|Room temperature
			\|Room temperature
	\|-		\|-

	\|-style="background:WhiteSmoke; color:black"		\|-style="background:WhiteSmoke; color:black"
	!Possible masking materials		!Possible masking materials
			\|Photoresist (1.5 µm AZ5214E)
	\|Photoresist (1.5 µm AZ5214E)		\|Photoresist (1.5 µm AZ5214E)
	\|-		\|-
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	\|-style="background:LightGrey; color:black"		\|-style="background:LightGrey; color:black"
	!Etch rate		!Etch rate
			\|~ 150 nm/min at 22°C
	\|~ 150 nm/min at 22°C		\|~ 150 nm/min at 22°C
	\|-		\|-
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	!Batch size		!Batch size
	\|1-7 4" wafers at a time		\|1-7 4" wafers at a time
			\|Up to 5 6" or 8" wafers at a time
	\|-		\|-

	\|-style="background:LightGrey; color:black"		\|-style="background:LightGrey; color:black"
	!Size of substrate		!Size of substrate
	\|Any size and number that can go inside the beaker in use		\|Any size and number that can go inside the beaker in use
			\|6" and 8"
	\|-		\|-

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	\|No restrictions.		\|No restrictions.
	Make a note on the beaker of which materials have been processed.		Make a note on the beaker of which materials have been processed.
			\|
			See the [https://labmanager.dtu.dk/function.php?module=XcMachineaction&view=edit&MachID=580 Cross Contamination Sheet] for Acid 1
	\|-		\|-
	\|}		\|}

Mbec at 13:47, 29 June 2026

2026-06-29T13:47:51Z

← Older revision		Revision as of 15:47, 29 June 2026
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	'''All measurements on this page has been made by Nanolab staff.'''		'''All measurements on this page has been made by Nanolab staff.'''

	~~[[index.php?title=Category:Equipment\|Etch Wet Chromium]]~~
	~~[[index.php?title=Category:Etch (Wet) bath\|Chromium]]~~

	==Wet etching of Chromium==		==Wet etching of Chromium==

Mbec at 09:29, 4 February 2026

2026-02-04T09:29:53Z

← Older revision		Revision as of 11:29, 4 February 2026
Line 12:		Line 12:
	==Wet etching of Chromium==		==Wet etching of Chromium==
	[[Image:Fumehood1-2.jpg\|300x300px\|thumb\|Fume hood 01 or 02 (for acids and bases) in cleanroom D-3 can be used for wet chromium etching.]]		[[Image:Fumehood1-2.jpg\|300x300px\|thumb\|Fume hood 01 or 02 (for acids and bases) in cleanroom D-3 can be used for wet chromium etching.]]
	Wet etching of chromium at DTU Nanolab is done making your own set up in a beaker in a fume hood - preferably in D-3. You can see the APV [http://labmanager.dtu.dk/d4Show.php?id=4748&mach=368 here].		Wet etching of chromium at DTU Nanolab is done making your own set up in a beaker in a fume hood - preferably in D-3. Make sure no other setup is present in the fume hood before you start. You can see the APV [http://labmanager.dtu.dk/d4Show.php?id=4748&mach=368 here].

	We use the following solution to etch chromium:		We use the following solution to etch chromium:

Hvje: /* Wet etching of Chromium */

2025-10-22T13:06:39Z

Wet etching of Chromium

← Older revision		Revision as of 15:06, 22 October 2025
Line 7:		Line 7:
	'''All measurements on this page has been made by Nanolab staff.'''		'''All measurements on this page has been made by Nanolab staff.'''

	[[Category:Equipment\|Etch Wet Chromium]]		[[index.php?title=Category:Equipment\|Etch Wet Chromium]]
	[[Category:Etch (Wet) bath\|Chromium]]		[[index.php?title=Category:Etch (Wet) bath\|Chromium]]

	==Wet etching of Chromium==		==Wet etching of Chromium==
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	PECVD SiO2 and LPCVD SiN coated wafers have been immersed in Cr etch 18 for 10min. Thickness wise: absolutely no changes (roughness after etch not measured)		PECVD SiO2 and LPCVD SiN coated wafers have been immersed in Cr etch 18 for 10min. Thickness wise: absolutely no changes (roughness after etch not measured)

	Normally the etch is reused (if you etch Molybdenum never reuse), but if you need to dispose it, collect it in a bottle marked O waste.		Normally the etch is reused (if you etch Molybdenum never reuse), but if you need to dispose it, collect it in a bottle marked X waste.

	===Overview of the chromium etch process===		===Overview of the chromium etch process===

Mmat at 21:46, 16 June 2025

2025-06-16T21:46:36Z

← Older revision		Revision as of 23:46, 16 June 2025
Line 7:		Line 7:
	'''All measurements on this page has been made by Nanolab staff.'''		'''All measurements on this page has been made by Nanolab staff.'''

	[[~~index.php?title=~~Category:Equipment\|Etch Wet Chromium]]		[[Category:Equipment\|Etch Wet Chromium]]
	[[~~index.php?title=~~Category:Etch (Wet) bath\|Chromium]]		[[Category:Etch (Wet) bath\|Chromium]]

	==Wet etching of Chromium==		==Wet etching of Chromium==

Mbec: /* Wet etching of Chromium */

2025-03-31T11:28:49Z

Wet etching of Chromium

← Older revision		Revision as of 13:28, 31 March 2025
Line 22:		Line 22:
	PECVD SiO2 and LPCVD SiN coated wafers have been immersed in Cr etch 18 for 10min. Thickness wise: absolutely no changes (roughness after etch not measured)		PECVD SiO2 and LPCVD SiN coated wafers have been immersed in Cr etch 18 for 10min. Thickness wise: absolutely no changes (roughness after etch not measured)

	Normally the etch is reused, but if you need to dispose it, collect it in a bottle marked O waste.		Normally the etch is reused (if you etch Molybdenum never reuse), but if you need to dispose it, collect it in a bottle marked O waste.

	===Overview of the chromium etch process===		===Overview of the chromium etch process===

Hvje: /* Wet etching of Chromium */

2025-03-24T13:40:09Z

Wet etching of Chromium

← Older revision		Revision as of 15:40, 24 March 2025
Line 7:		Line 7:
	'''All measurements on this page has been made by Nanolab staff.'''		'''All measurements on this page has been made by Nanolab staff.'''

	[[Category: Equipment\|Etch Wet Chromium]]		[[index.php?title=Category:Equipment\|Etch Wet Chromium]]
	[[Category: Etch (Wet) bath\|Chromium]]		[[index.php?title=Category:Etch (Wet) bath\|Chromium]]

	==Wet etching of Chromium==		==Wet etching of Chromium==
Line 19:		Line 19:

	The etch rate depends on the level of surface oxidation of the chromium metal, but the standard procedure (etch at room temperature: ~22°C) the Etch rate is around 150 nm/min.		The etch rate depends on the level of surface oxidation of the chromium metal, but the standard procedure (etch at room temperature: ~22°C) the Etch rate is around 150 nm/min.

			PECVD SiO2 and LPCVD SiN coated wafers have been immersed in Cr etch 18 for 10min. Thickness wise: absolutely no changes (roughness after etch not measured)

	Normally the etch is reused, but if you need to dispose it, collect it in a bottle marked O waste.		Normally the etch is reused, but if you need to dispose it, collect it in a bottle marked O waste.

Mbec: /* Wet etching of Chromium */

2023-02-17T12:32:01Z

Wet etching of Chromium

← Older revision		Revision as of 14:32, 17 February 2023
Line 16:		Line 16:
	We use the following solution to etch chromium:		We use the following solution to etch chromium:

	# Commercial chromium etch (Chrome Etch 18). You can see the KBA [https://kemibrug.dk/Kemikalier/Action?id=RCU2MHolYzIlODIlN2UlYzIlODB2JWMyJTgxJTdleiVjMiU4N0RZeiVjMiU4OXYlN2UlYzIlODElYzIlODhESk5HTklNVGQlYzIlODclN2N2JWMyJTgzJTdlJWMyJTg4diVjMiU4OSU3ZSVjMiU4NCVjMiU4MyVjMiU4OCU1ZVlSSQ==#K here]		# Commercial chromium etch (Chrome Etch 18). You can see the KBA (needs login) [https://kemibrug.dk/Kemikalier/Action?id=RCU2MHolYzIlODIlN2UlYzIlODB2JWMyJTgxJTdleiVjMiU4N0RZeiVjMiU4OXYlN2UlYzIlODElYzIlODhESk5HTklNVGQlYzIlODclN2N2JWMyJTgzJTdlJWMyJTg4diVjMiU4OSU3ZSVjMiU4NCVjMiU4MyVjMiU4OCU1ZVlSSQ==#K here]

	The etch rate depends on the level of surface oxidation of the chromium metal, but the standard procedure (etch at room temperature: ~22°C) the Etch rate is around 150 nm/min.		The etch rate depends on the level of surface oxidation of the chromium metal, but the standard procedure (etch at room temperature: ~22°C) the Etch rate is around 150 nm/min.

Mbec: /* Wet etching of Chromium */

2023-02-17T10:24:45Z

Wet etching of Chromium

← Older revision		Revision as of 12:24, 17 February 2023
Line 19:		Line 19:

	The etch rate depends on the level of surface oxidation of the chromium metal, but the standard procedure (etch at room temperature: ~22°C) the Etch rate is around 150 nm/min.		The etch rate depends on the level of surface oxidation of the chromium metal, but the standard procedure (etch at room temperature: ~22°C) the Etch rate is around 150 nm/min.

			Normally the etch is reused, but if you need to dispose it, collect it in a bottle marked O waste.

	===Overview of the chromium etch process===		===Overview of the chromium etch process===