Specific Process Knowledge/Etch/Wet Aluminium Etch - Revision history

Mbec at 09:32, 4 February 2026

2026-02-04T09:32:04Z

← Older revision		Revision as of 11:32, 4 February 2026
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	'''All links to Kemibrug (SDS) and Labmanager Including APV requires login.		'''All links to Kemibrug (SDS) and Labmanager Including APV requires login.

	'''All measurements on this page has been made by Nanolab staff.		'''All measurements on this page has been made by Nanolab staff.

	[[Category: Equipment\|Etch Wet Aluminium Etch]]		[[Category: Equipment\|Etch Wet Aluminium Etch]]

Nisoer: /* Wet Aluminium Etch */

2023-09-13T06:36:54Z

Wet Aluminium Etch

← Older revision		Revision as of 08:36, 13 September 2023
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	<br>		<br>
	The first solution is always available ready made in the Aluminium Etch bath. The second solution can be mixed manually or bought pre-mixed and ready for use. Please contact DTU Nanolab if you need to use the Aluminum etch 80-15-3-2 etch mixture. Since it is used only very rarely it will probably have to be ordered when needed. The table below summarizes possibilities and parameter for the two etch mixtures.		The first solution is always available ready made in the Aluminium Etch bath. The second solution can be mixed manually or bought pre-mixed and ready for use. Please contact DTU Nanolab if you need to use the Aluminum etch 80-15-3-2 etch mixture. Since it is used only very rarely it will probably have to be ordered when needed. The table below summarizes possibilities and parameter for the two etch mixtures.
			contact Wetchem if change off bath or want to use it in a beaker.

Nisoer: /* Comparing the two solutions */

2023-09-13T06:34:56Z

Comparing the two solutions

← Older revision		Revision as of 08:34, 13 September 2023
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	!Location		!Location
	\|Bath inside Wet Bench 05 in D-3		\|Bath inside Wet Bench 05 in D-3
	\|~~Beaker in Fumehood 1 or 2~~ in D-3		\|Bath inside Wet Bench 05 in D-3
	\|-		\|-

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	!Batch size		!Batch size
	\|1-25 wafers at a time		\|1-25 wafers at a time
	\|~~Flexible~~		\|1-25 wafers at a time
	\|-		\|-

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	\|4" wafers		\|4" wafers
	6" wafers		6" wafers
	\|~~Any size that fits in beaker~~		\|4" wafers
			6" wafers
	\|-		\|-

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	See the [http://labmanager.dtu.dk/function.php?module=XcMachineaction&view=edit&MachID=381 Cross Contamination Sheet] for Aluminium Etch bath		See the [http://labmanager.dtu.dk/function.php?module=XcMachineaction&view=edit&MachID=381 Cross Contamination Sheet] for Aluminium Etch bath
	\|		\|
	~~Any material allowed in cleanroom~~		See the [http://labmanager.dtu.dk/function.php?module=XcMachineaction&view=edit&MachID=381 Cross Contamination Sheet] for Aluminium Etch bath
	\|-		\|-
	\|}		\|}

Nisoer at 11:28, 7 September 2023

2023-09-07T11:28:52Z

← Older revision		Revision as of 13:28, 7 September 2023
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	[[Category: Etch (Wet) bath\|Aluminium]]		[[Category: Etch (Wet) bath\|Aluminium]]

	Wet etching of aluminium can be done using many different acids and bases. Using dilute phosphoric acid gives reasonably good control and compatibility with photoresists. Etching with dilute phosphoric acid is suitable for etching pure aluminium. If the aluminium is alloyed with other metals, other etchants may be better suited. Previously, aluminium with 1,5% silicon was used at DTU Nanolab. This alloy is no longer in use at DTU Nanolab but a suitable etchant (~~PES 77~~-19-04) for this alloy is included below.		Wet etching of aluminium can be done using many different acids and bases. Using dilute phosphoric acid gives reasonably good control and compatibility with photoresists. Etching with dilute phosphoric acid is suitable for etching pure aluminium. If the aluminium is alloyed with other metals, other etchants may be better suited. Previously, aluminium with 1,5% silicon was used at DTU Nanolab. This alloy is no longer in use at DTU Nanolab but a suitable etchant (Aluminum etch 80-15-3-2) for this alloy is included below.

	=Wet Aluminium Etch=		=Wet Aluminium Etch=

Nisoer: /* Comparing the two solutions */

2023-09-07T11:28:07Z

Comparing the two solutions

← Older revision		Revision as of 13:28, 7 September 2023
Line 52:		Line 52:
	[https://kemibrug.dk/Kemikalier/Action?id=RCU2MHolYzIlODIlN2UlYzIlODB2JWMyJTgxJTdleiVjMiU4N0RZeiVjMiU4OXYlN2UlYzIlODElYzIlODhES0xFTEZMVGQlYzIlODclN2N2JWMyJTgzJTdlJWMyJTg4diVjMiU4OSU3ZSVjMiU4NCVjMiU4MyVjMiU4OCU1ZVlSSQ==#K Kemibrug SDS: Phosphoric acid >25%]		[https://kemibrug.dk/Kemikalier/Action?id=RCU2MHolYzIlODIlN2UlYzIlODB2JWMyJTgxJTdleiVjMiU4N0RZeiVjMiU4OXYlN2UlYzIlODElYzIlODhES0xFTEZMVGQlYzIlODclN2N2JWMyJTgzJTdlJWMyJTg4diVjMiU4OSU3ZSVjMiU4NCVjMiU4MyVjMiU4OCU1ZVlSSQ==#K Kemibrug SDS: Phosphoric acid >25%]
	\|		\|
	https://kemibrug.dk/Kemikalier/Action?id=RCU2MHolYzIlODIlN2UlYzIlODB2JWMyJTgxJTdleiVjMiU4N0RZeiVjMiU4OXYlN2UlYzIlODElYzIlODhETkZLR0tOS1RkJWMyJTg3JTdjdiVjMiU4MyU3ZSVjMiU4OHYlYzIlODklN2UlYzIlODQlYzIlODMlYzIlODglNWVZUkk=#K Kemibrug SDS: Phosphoric acid etch slution]		[https://kemibrug.dk/Kemikalier/Action?id=RCU2MHolYzIlODIlN2UlYzIlODB2JWMyJTgxJTdleiVjMiU4N0RZeiVjMiU4OXYlN2UlYzIlODElYzIlODhETkZLR0tOS1RkJWMyJTg3JTdjdiVjMiU4MyU3ZSVjMiU4OHYlYzIlODklN2UlYzIlODQlYzIlODMlYzIlODglNWVZUkk=#K Kemibrug SDS: Phosphoric acid etch slution]
	\|-		\|-

Nisoer: /* Wet Aluminium Etch */

2023-09-07T11:27:33Z

Wet Aluminium Etch

← Older revision		Revision as of 13:27, 7 September 2023
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	# H<sub>2</sub>O : H<sub>3</sub>PO<sub>4</sub> (1:2) at 50°C		# H<sub>2</sub>O : H<sub>3</sub>PO<sub>4</sub> (1:2) at 50°C
	# Pre-mixed etch solution: ~~PES 77~~-19-04 at 20°C		# Pre-mixed etch solution: Aluminum etch 80-15-3-2 at 20°C

	<br>		<br>
	The first solution is always available ready made in the Aluminium Etch bath. The second solution can be mixed manually or bought pre-mixed and ready for use. Please contact DTU Nanolab if you need to use the ~~PES 77~~-19-04 etch mixture. Since it is used only very rarely it will probably have to be ordered when needed. The table below summarizes possibilities and parameter for the two etch mixtures.		The first solution is always available ready made in the Aluminium Etch bath. The second solution can be mixed manually or bought pre-mixed and ready for use. Please contact DTU Nanolab if you need to use the Aluminum etch 80-15-3-2 etch mixture. Since it is used only very rarely it will probably have to be ordered when needed. The table below summarizes possibilities and parameter for the two etch mixtures.


Line 31:		Line 31:
	!		!
	! Aluminium Etch		! Aluminium Etch
	! Etch with ~~PES 77~~-19-4		! Etch with Aluminum etch 80-15-3-2
	\|-		\|-

Line 52:		Line 52:
	[https://kemibrug.dk/Kemikalier/Action?id=RCU2MHolYzIlODIlN2UlYzIlODB2JWMyJTgxJTdleiVjMiU4N0RZeiVjMiU4OXYlN2UlYzIlODElYzIlODhES0xFTEZMVGQlYzIlODclN2N2JWMyJTgzJTdlJWMyJTg4diVjMiU4OSU3ZSVjMiU4NCVjMiU4MyVjMiU4OCU1ZVlSSQ==#K Kemibrug SDS: Phosphoric acid >25%]		[https://kemibrug.dk/Kemikalier/Action?id=RCU2MHolYzIlODIlN2UlYzIlODB2JWMyJTgxJTdleiVjMiU4N0RZeiVjMiU4OXYlN2UlYzIlODElYzIlODhES0xFTEZMVGQlYzIlODclN2N2JWMyJTgzJTdlJWMyJTg4diVjMiU4OSU3ZSVjMiU4NCVjMiU4MyVjMiU4OCU1ZVlSSQ==#K Kemibrug SDS: Phosphoric acid >25%]
	\|		\|
	[https://kemibrug.dk/Kemikalier/Action?id=~~RCU2MHolYzIlODIlN2UlYzIlODB2JWMyJTgxJTdleiVjMiU4N0RZeiVjMiU4OXYlN2UlYzIlODElYzIlODhESkpGTktIVGQlYzIlODclN2N2JWMyJTgzJTdlJWMyJTg4diVjMiU4OSU3ZSVjMiU4NCVjMiU4MyVjMiU4OCU1ZVlSSQ=~~=#K Kemibrug SDS: Phosphoric acid etch slution]		https://kemibrug.dk/Kemikalier/Action?id=RCU2MHolYzIlODIlN2UlYzIlODB2JWMyJTgxJTdleiVjMiU4N0RZeiVjMiU4OXYlN2UlYzIlODElYzIlODhETkZLR0tOS1RkJWMyJTg3JTdjdiVjMiU4MyU3ZSVjMiU4OHYlYzIlODklN2UlYzIlODQlYzIlODMlYzIlODglNWVZUkk=#K Kemibrug SDS: Phosphoric acid etch slution]
	\|-		\|-

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	!Chemical solution		!Chemical solution
	\|H<sub>2</sub>O:H<sub>3</sub>PO<sub>4</sub> 1:2		\|H<sub>2</sub>O:H<sub>3</sub>PO<sub>4</sub> 1:2
	\|~~PES 77~~-19-04:		\|Aluminum etch 80-15-3-2:
	77 vol% H<sub>3</sub>PO<sub>4</sub> 85%		60-90 vol% H<sub>3</sub>PO<sub>4</sub> 85%

	19 vol% CH<sub>3</sub>COOH 100%		5-20 vol% CH<sub>3</sub>COOH 100%

	4 vol% HNO<sub>3</sub> 70%		1-5 vol% HNO<sub>3</sub> 70%
	\|-		\|-

Mbec: /* Comparing the two solutions */

2023-01-31T13:20:11Z

Comparing the two solutions

← Older revision		Revision as of 15:20, 31 January 2023
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	\|-style="background:LightGrey; color:black"		\|-style="background:LightGrey; color:black"
	!Location		!Location
	\|~~[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=381 Aluminium Etch] bath~~ inside ~~[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=413~~ Wet Bench 05] in D-3		\|Bath inside Wet Bench 05 in D-3
	\|Beaker in Fumehood ~~[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=368 01]~~ or ~~[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=369 02]~~ in D-3		\|Beaker in Fumehood 1 or 2 in D-3
	\|-		\|-

Hvje at 13:03, 31 January 2023

2023-01-31T13:03:33Z

← Older revision		Revision as of 15:03, 31 January 2023
Line 1:		Line 1:
	'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Wet_Aluminium_Etch click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Wet_Aluminium_Etch click here]'''

			'''Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.

			'''All links to Kemibrug (SDS) and Labmanager Including APV requires login.

			'''All measurements on this page has been made by Nanolab staff.

	[[Category: Equipment\|Etch Wet Aluminium Etch]]		[[Category: Equipment\|Etch Wet Aluminium Etch]]

Jmli at 14:51, 25 November 2019

2019-11-25T14:51:30Z

← Older revision		Revision as of 16:51, 25 November 2019
Line 4:		Line 4:
	[[Category: Etch (Wet) bath\|Aluminium]]		[[Category: Etch (Wet) bath\|Aluminium]]

	Wet etching of aluminium can be done using many different acids and bases. Using dilute phosphoric acid gives reasonably good control and compatibility with photoresists. Etching with dilute phosphoric acid is suitable for etching pure aluminium. If the aluminium is alloyed with other metals, other etchants may be better suited. Previously, aluminium with 1,5% silicon was used at DTU Nanolab. This alloy is no longer in use at DTU ~~Danchip~~ but a suitable etchant (PES 77-19-04) for this alloy is included below.		Wet etching of aluminium can be done using many different acids and bases. Using dilute phosphoric acid gives reasonably good control and compatibility with photoresists. Etching with dilute phosphoric acid is suitable for etching pure aluminium. If the aluminium is alloyed with other metals, other etchants may be better suited. Previously, aluminium with 1,5% silicon was used at DTU Nanolab. This alloy is no longer in use at DTU Nanolab but a suitable etchant (PES 77-19-04) for this alloy is included below.

	=Wet Aluminium Etch=		=Wet Aluminium Etch=
Line 15:		Line 15:

	<br>		<br>
	The first solution is always available ready made in the Aluminium Etch bath. The second solution can be mixed manually or bought pre-mixed and ready for use. Please contact DTU ~~Danchip~~ if you need to use the PES 77-19-04 etch mixture. Since it is used only very rarely it will probably have to be ordered when needed. The table below summarizes possibilities and parameter for the two etch mixtures.		The first solution is always available ready made in the Aluminium Etch bath. The second solution can be mixed manually or bought pre-mixed and ready for use. Please contact DTU Nanolab if you need to use the PES 77-19-04 etch mixture. Since it is used only very rarely it will probably have to be ordered when needed. The table below summarizes possibilities and parameter for the two etch mixtures.

Jmli at 14:50, 25 November 2019

2019-11-25T14:50:27Z

← Older revision		Revision as of 16:50, 25 November 2019
Line 4:		Line 4:
	[[Category: Etch (Wet) bath\|Aluminium]]		[[Category: Etch (Wet) bath\|Aluminium]]

	Wet ~~ethcing~~ of aluminium can be done using many different acids and bases. Using dilute phosphoric acid gives reasonably good control and compatibility with photoresists. Etching with dilute phosphoric acid is suitable for etching pure aluminium. If the aluminium is alloyed with other metals, other etchants may be better suited. Previously, aluminium with 1,5% silicon was used at DTU Nanolab. This alloy is no longer in use at DTU Danchip but a suitable etchant (PES 77-19-04) for this alloy is included below.		Wet etching of aluminium can be done using many different acids and bases. Using dilute phosphoric acid gives reasonably good control and compatibility with photoresists. Etching with dilute phosphoric acid is suitable for etching pure aluminium. If the aluminium is alloyed with other metals, other etchants may be better suited. Previously, aluminium with 1,5% silicon was used at DTU Nanolab. This alloy is no longer in use at DTU Danchip but a suitable etchant (PES 77-19-04) for this alloy is included below.

	=Wet Aluminium Etch=		=Wet Aluminium Etch=