Prakus: Created page with " == Etching of Titanium nitride with resist as masking material - on 6" carrier wafer == This recipe was adapted from Evgeniy Shkondin recipe from 2018. This recipe is still under investigation. {| border="2" cellspacing="2" cellpadding="3" !Parameter !A Etch with carrier |- |Coil Power [W] |500 |- |Platen Power [W] |10 |- |Platen temperature [^oC] |0 |- |Cl₂ flow [sccm] |5 |- |Ar flow [sccm] |5 |- |Pressure [mTorr] |10 |- |} {| border="2" cel..."

2025-08-29T10:54:35Z

Created page with " == Etching of Titanium nitride with resist as masking material - on 6" carrier wafer == This recipe was adapted from Evgeniy Shkondin recipe from 2018. This recipe is still under investigation. {| border="2" cellspacing="2" cellpadding="3" !Parameter !A Etch with carrier |- |Coil Power [W] |500 |- |Platen Power [W] |10 |- |Platen temperature [oC] |0 |- |Cl2 flow [sccm] |5 |- |Ar flow [sccm] |5 |- |Pressure [mTorr] |10 |- |} {| border="2" cel..."

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== Etching of Titanium nitride with resist as masking material - on 6" carrier wafer ==

This recipe was adapted from Evgeniy Shkondin recipe from 2018. This recipe is still under investigation.

{| border="2" cellspacing="2" cellpadding="3"
!Parameter
!A Etch with carrier
|-
|Coil Power [W]
|500
|-
|Platen Power [W]
|10
|-
|Platen temperature [oC]
|0
|-
|Cl2 flow [sccm]
|5
|-
|Ar flow [sccm]
|5
|-
|Pressure [mTorr]
|10
|-
|}

{| border="2" cellspacing="2" cellpadding="3"
!Results
!Test on wafer with 20% load, ''by prakus @Nanolab''
!Test by eves @nanolab
|-
|Etch rate of TiN
|'''## nm/min (2025)'''
| 
|-
|Selectivity to resist [TiN : AZ resist]
|'''#:#'''
| 
|-
|Wafer uniformity (100mm)
|'''?'''
| 
|-
|Profile [o]
|?
| 
|-
|Wafer uniformity map (click on the image to view a larger image)
|coming soon
| 
|-
|SEM profile images
|coming soon
| 
|-
|}

Specific Process Knowledge/Etch/Titanium Nitride/ICP metal - Revision history