Specific Process Knowledge/Etch/III-V ICP/GaN - Revision history

Bghe at 11:53, 31 March 2025

2025-03-31T11:53:30Z

← Older revision		Revision as of 13:53, 31 March 2025
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	'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/III-V_ICP/GaN click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/III-V_ICP/GaN click here]'''
	<!--Checked for updates on 11/2-2019 - ok/jmli -->		<!--Checked for updates on 11/2-2019 - ok/jmli -->
			<!-- reviewed by bghe 31/3 2025-->

	===GaN etching using III-V ICP===		===GaN etching using III-V ICP===

Bghe at 13:43, 18 August 2021

2021-08-18T13:43:33Z

← Older revision		Revision as of 15:43, 18 August 2021
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	'''Feedback to this page''': '''[mailto:labadviser@~~danchip~~.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.~~danchip~~.dtu.dk/index.php/Specific_Process_Knowledge/Etch/III-V_ICP/GaN click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/III-V_ICP/GaN click here]'''
	<!--Checked for updates on 11/2-2019 - ok/jmli -->		<!--Checked for updates on 11/2-2019 - ok/jmli -->

Jmli at 10:35, 11 February 2019

2019-02-11T10:35:22Z

← Older revision		Revision as of 12:35, 11 February 2019
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	'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/III-V_ICP/GaN click here]'''		'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/III-V_ICP/GaN click here]'''
			<!--Checked for updates on 11/2-2019 - ok/jmli -->

	===GaN etching using III-V ICP===		===GaN etching using III-V ICP===

Bghe at 09:10, 28 January 2019

2019-01-28T09:10:31Z

← Older revision		Revision as of 11:10, 28 January 2019
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	===GaN etching===		===GaN etching using III-V ICP===

	{\| border="1" cellspacing="2" cellpadding="3"		{\| border="1" cellspacing="2" cellpadding="3"

Bghe: /* GaN etching */

2017-01-17T14:48:39Z

GaN etching

← Older revision		Revision as of 16:48, 17 January 2017
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	\|-		\|-
	\|}		\|}


	{\| border="1" cellspacing="2" cellpadding="3"		{\| border="1" cellspacing="2" cellpadding="3"

Bghe: /* GaN etching */

2017-01-17T14:48:19Z

GaN etching

← Older revision		Revision as of 16:48, 17 January 2017
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	\|-		\|-
	\|}		\|}


	{\| border="1" cellspacing="2" cellpadding="3" align="left"		{\| border="1" cellspacing="2" cellpadding="3" align="left"

Bghe: /* GaN etching */

2017-01-17T14:48:02Z

GaN etching

← Older revision		Revision as of 16:48, 17 January 2017
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	\|~ 90 <sup>o</sup>		\|~ 90 <sup>o</sup>
	\|-		\|-
			\|}

			{\| border="1" cellspacing="2" cellpadding="3" align="left"
			\|colspan="2" align="center"\| '''Results (GaN Etch for Si check)'''
			\|-
			\|Si etch rate
			\|~200 nm/min (bghe 2017-01-17) full 4" wafer
	\|}		\|}

Bghe: /* GaN etching */

2017-01-17T14:46:38Z

GaN etching

← Older revision		Revision as of 16:46, 17 January 2017
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	\|'''Recipe'''		\|'''Recipe'''
	\|'''GaN Etch'''		\|'''GaN Etch'''
			\|'''GaN Etch for Si check'''
	\|-		\|-
	\|Cl<sub>2</sub> flow		\|Cl<sub>2</sub> flow
	\|30 sccm		\|30 sccm
			\|27 sccm
	\|-		\|-
	\|Ar flow		\|Ar flow
	\|10 sccm		\|10 sccm
			\|3 sccm
			\|-
			\|BCl3 flow
			\|0 sccm
			\|3 sccm
	\|-		\|-
	\|Platen power		\|Platen power
	\|200 W		\|200 W
			\|75 W
	\|-		\|-
	\|Coil power		\|Coil power
	\|600 W		\|600 W
			\|400 W
	\|-		\|-
	\|Pressure		\|Pressure
	\|2 mTorr		\|2 mTorr
			\|4 mTorr
	\|-		\|-
	\|Platen chiller temperature		\|Platen chiller temperature
			\|20 <sup>o</sup>C
	\|20 <sup>o</sup>C		\|20 <sup>o</sup>C
	\|-		\|-

Jmli at 09:42, 1 August 2016

2016-08-01T09:42:00Z

← Older revision		Revision as of 11:42, 1 August 2016
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	'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/III-V_ICP/GaN click here]'''		'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/III-V_ICP/GaN click here]'''


	===GaN etching===		===GaN etching===

Bghe: Created page with "'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etc..."

2014-06-19T12:27:56Z

Created page with "'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etc..."

New page

'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/III-V_ICP/GaN click here]'''

===GaN etching===

{| border="1" cellspacing="2" cellpadding="3"
|'''Recipe'''
|'''GaN Etch'''
|-
|Cl2 flow
|30 sccm
|-
|Ar flow
|10 sccm
|-
|Platen power
|200 W
|-
|Coil power
|600 W
|-
|Pressure
|2 mTorr
|-
|Platen chiller temperature
|20 oC
|-
|}

{| border="1" cellspacing="2" cellpadding="3" align="left"
|colspan="2" align="center"| '''Results (GaN Etch)'''
|-
|GaN etch rate
|550-580 nm/min
|-
|SiO2 etch rate
|110-120 nm/min
|-
|Sidewall angle
|~ 90 o
|-
|}

{| border="0" align="left"
|
|-
|}

{| border="1" cellspacing="2" cellpadding="3"
![[image:GaN_result.jpg|300x300px|thumb|left|Result of GaN etching. Oleksii Kopylov, DTU Photonics, 2011. ]]
|-
|}