Specific Process Knowledge/Etch/III-V ICP - Revision history

Mmat at 14:22, 16 June 2025

2025-06-16T14:22:01Z

← Older revision		Revision as of 16:22, 16 June 2025
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			{{cc-nanolab}}

	'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Etch/III-V_ICP click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Etch/III-V_ICP click here]'''
	<br> ~~{{CC1}}~~		<br>
	[[Image:III-VICP.jpg \|300x300px\|thumb\|The SPTS III/V ICP in the DTU Nanolab cleanroom B-1]]		[[Image:III-VICP.jpg \|300x300px\|thumb\|The SPTS III/V ICP in the DTU Nanolab cleanroom B-1]]

2023-02-10T08:35:44Z

← Older revision		Revision as of 10:35, 10 February 2023
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	'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Etch/III-V_ICP click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Etch/III-V_ICP click here]'''
			<br> {{CC1}}
	[[Image:III-VICP.jpg \|300x300px\|thumb\|The SPTS III/V ICP in the DTU Nanolab cleanroom B-1]]		[[Image:III-VICP.jpg \|300x300px\|thumb\|The SPTS III/V ICP in the DTU Nanolab cleanroom B-1]]

2022-12-19T15:11:02Z

2022-12-19T15:10:51Z

2020-11-17T08:37:45Z

Additional information

← Older revision		Revision as of 10:37, 17 November 2020
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	== Additional information ==		== Additional information ==

	'''~~Wafer bonding~~'''		=== Endpoint detection ===
			The III-V ICP is equipped with two endpoint detection systems - an optical endpoint detection system and a laser interferometric system. Click [[Specific Process Knowledge/Etch/OES \|'''here''']] to access the page common to all dry etch tools that are equipped with an optical endpoint detection system.


			=== Wafer bonding ===

	To find information on how to bond wafers or chips to a carrier wafer, click [[Specific Process Knowledge/Etch/DryEtchProcessing/Bonding\| here]].		To find information on how to bond wafers or chips to a carrier wafer, click [[Specific Process Knowledge/Etch/DryEtchProcessing/Bonding\| here]].

2020-03-25T07:29:53Z

The III-V ICP

← Older revision		Revision as of 09:29, 25 March 2020
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	Name: PRO ICP <br>		Name: PRO ICP <br>
	Vendor: STS (now SPTS) <br>		Vendor: STS (now SPTS) <br>
	The III-V ICP is a state-of-the-art etch tool. The combination of advanced hardware and software enables you to either use the optimized standard processes or to tailor etch processes for your specific needs. The tool can be used for etching of different materials, but is primarily intented for etching of III-V materials.		The III-V ICP is a state-of-the-art etch tool. The combination of advanced hardware and software enables you to either use the optimized standard processes or to tailor etch processes for your specific needs. The tool can be used for etching of different materials, but is primarily intented for etching of III-V materials. There are two endpoint systems connected to the system. An Optical End Point System (OES) and a LASER End Point system (LEP). Information on these can be found here: [[Specific Process Knowledge/Etch/DryEtchProcessing]]

	'''The user manual, user APV and contact information can be found in LabManager:'''		'''The user manual, user APV and contact information can be found in LabManager:'''

2019-11-25T09:22:55Z

← Older revision		Revision as of 11:22, 25 November 2019
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	'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Etch/III-V_ICP click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Etch/III-V_ICP click here]'''

	[[Image:III-VICP.jpg \|300x300px\|thumb\|The SPTS III/V ICP in the ~~STU~~ Nanolab cleanroom B-1]]		[[Image:III-VICP.jpg \|300x300px\|thumb\|The SPTS III/V ICP in the DTU Nanolab cleanroom B-1]]

	== The III-V ICP ==		== The III-V ICP ==

2019-11-25T09:22:37Z

← Older revision		Revision as of 11:22, 25 November 2019
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	'''Feedback to this page''': '''[mailto:labadviser@~~danchip~~.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.~~danchip~~.dtu.dk/index.php?title=Specific_Process_Knowledge/Etch/III-V_ICP click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Etch/III-V_ICP click here]'''

	[[Image:III-VICP.jpg \|300x300px\|thumb\|The SPTS III/V ICP in the ~~Danchip~~ cleanroom B-1]]		[[Image:III-VICP.jpg \|300x300px\|thumb\|The SPTS III/V ICP in the STU Nanolab cleanroom B-1]]

	== The III-V ICP ==		== The III-V ICP ==
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	'''The user manual, user APV and contact information can be found in LabManager:'''		'''The user manual, user APV and contact information can be found in LabManager:'''

	Equipment info in [http://www.labmanager~~.danchip~~.dtu.dk/function.php?module=Machine&view=view&mach=268\| LabManager]		Equipment info in [http://www.labmanager.dtu.dk/function.php?module=Machine&view=view&mach=268\| LabManager]

	==Process information==		==Process information==

2018-05-08T07:27:43Z

The III-V ICP

← Older revision		Revision as of 09:27, 8 May 2018
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	== The III-V ICP ==		== The III-V ICP ==

			Name: PRO ICP <br>
			Vendor: STS (now SPTS) <br>
	The III-V ICP is a state-of-the-art etch tool. The combination of advanced hardware and software enables you to either use the optimized standard processes or to tailor etch processes for your specific needs. The tool can be used for etching of different materials, but is primarily intented for etching of III-V materials.		The III-V ICP is a state-of-the-art etch tool. The combination of advanced hardware and software enables you to either use the optimized standard processes or to tailor etch processes for your specific needs. The tool can be used for etching of different materials, but is primarily intented for etching of III-V materials.

2017-06-27T09:23:50Z

Process information

← Older revision		Revision as of 11:23, 27 June 2017
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	*[[/GaN \| GaN etch ]]		*[[/GaN \| GaN etch ]]
	*[[/SiO2\|SiO2 etch]]		*[[/SiO2\|SiO2 etch]]
			*[[Specific Process Knowledge/Etch/Aluminum Oxide/Al2O3 Etch with III-V ICP\|Al2O3 etch]]

	==An overview of the performance of the III-V ICP and some process related parameters==		==An overview of the performance of the III-V ICP and some process related parameters==