Jmli at 06:36, 4 April 2025

2025-04-04T06:36:37Z

← Older revision		Revision as of 08:36, 4 April 2025
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	<!--Checked for updates on 24/8-2021. ok/ jmli-->		<!--Checked for updates on 24/8-2021. ok/ jmli-->
			<!--Checked for updates on 4/4-2025 - ok/jmli -->

	== The Sinano3.31 recipe ==		== The Sinano3.31 recipe ==

Jmli at 14:16, 24 August 2021

2021-08-24T14:16:48Z

← Older revision		Revision as of 16:16, 24 August 2021
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	<!--Checked for updates on 10/7-2019 - ok/jmli -->		<!--Checked for updates on 10/7-2019 - ok/jmli -->
	<!-- Ok, jmli 20170627 -->		<!-- Ok, jmli 20170627 -->
			<!--Checked for updates on 24/8-2021. ok/ jmli-->

	== The Sinano3.31 recipe ==		== The Sinano3.31 recipe ==
	<!-- revised 1/6-2015 by jmli -->		<!-- revised 1/6-2015 by jmli -->

Jmli at 08:51, 10 July 2019

2019-07-10T08:51:09Z

← Older revision		Revision as of 10:51, 10 July 2019
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	<!-- Ok, jmli 20170627 -->		<!-- Ok, jmli 20170627 -->
	== The Sinano3.31 recipe ==		== The Sinano3.31 recipe ==

Jmli at 09:45, 27 June 2017

2017-06-27T09:45:51Z

← Older revision		Revision as of 11:45, 27 June 2017
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	== The Sinano3.31 recipe ==		== The Sinano3.31 recipe ==
	<!-- revised 1/6-2015 by jmli -->		<!-- revised 1/6-2015 by jmli -->

Jmli: /* The Sinano3.31 recipe */

2015-06-01T12:14:02Z

The Sinano3.31 recipe

← Older revision		Revision as of 14:14, 1 June 2015
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	== The Sinano3.31 recipe ==		== The Sinano3.31 recipe ==
			<!-- revised 1/6-2015 by jmli -->
	{\| border="2" cellpadding="2" cellspacing="1"		{\| border="2" cellpadding="2" cellspacing="1"
	\|+ '''Recipe Sinano3.31'''		\|+ '''Recipe Sinano3.31'''

Jml: Created page with "== The Sinano3.31 recipe == {| border="2" cellpadding="2" cellspacing="1" |+ '''Recipe Sinano3.31''' |- ! rowspan="6" align="center"| Recipe | Gas | BCl₃ 5 sccm, ..."

2012-12-11T12:44:54Z

Created page with "== The Sinano3.31 recipe == {| border="2" cellpadding="2" cellspacing="1" |+ '''Recipe Sinano3.31''' |- ! rowspan="6" align="center"| Recipe | Gas | BCl<sub>3</sub> 5 sccm, ..."

New page

== The Sinano3.31 recipe ==

{| border="2" cellpadding="2" cellspacing="1"
|+ '''Recipe Sinano3.31'''
|-
! rowspan="6" align="center"| Recipe
| Gas
| BCl<sub>3</sub> 5 sccm, HBR 15 sccm
|-
| Pressure
| 2 mTorr, Strike 3 secs @ 5 mTorr
|-
| Power
| 900 W CP, 75 W PP
|-
| Temperature
| 50 degs
|-
| Hardware
| 100 mm Spacers
|-
| Time
| 60, 120 and 180 secs
|-
! rowspan="5" align="center"| Conditions
| Run ID
| 452, 453 and 454
|-
| Conditioning
| Sequence: Oxygen clean, MU tests, processes, no oxygen between runs
|-
| Mask
| 190 nm zep
|-
|}

<gallery caption="The results of the Sinano3.31 recipe" widths="250" heights="200" perrow="5">
image:WF_2E03_mar23_2011-030a.jpg|The 30 nm trenches etched 60 seconds
image:WF_2E03_mar23_2011-060a.jpg|The 60 nm trenches etched 60 seconds
image:WF_2E03_mar23_2011-090a.jpg|The 90 nm trenches etched 60 seconds
image:WF_2E03_mar23_2011-120a.jpg|The 120 nm trenches etched 60 seconds
image:WF_2E03_mar23_2011-150a.jpg|The 150 nm trenches etched 60 seconds

image:WF_2E03_mar23_2011-030b.jpg|The 30 nm trenches etched 120 seconds
image:WF_2E03_mar23_2011-060b.jpg|The 60 nm trenches etched 120 seconds
image:WF_2E03_mar23_2011-090b.jpg|The 90 nm trenches etched 120 seconds
image:WF_2E03_mar23_2011-120b.jpg|The 120 nm trenches etched 120 seconds
image:WF_2E03_mar23_2011-150b.jpg|The 150 nm trenches etched 120 seconds

image:WF_2E03_mar23_2011-030c.jpg|The 30 nm trenches etched 180 seconds
image:WF_2E03_mar23_2011-060c.jpg|The 60 nm trenches etched 180 seconds
image:WF_2E03_mar23_2011-090c.jpg|The 90 nm trenches etched 180 seconds
image:WF_2E03_mar23_2011-120c.jpg|The 120 nm trenches etched 180 seconds
image:WF_2E03_mar23_2011-150c.jpg|The 150 nm trenches etched 180 seconds

</gallery>

{| {{table}}
|+ After 60 seconds
| align="center" style="background:#f0f0f0;"|'''Nominal trench line width'''
| align="center" style="background:#f0f0f0;"|''''''
| align="center" style="background:#f0f0f0;"|''''''
| align="center" style="background:#f0f0f0;"|'''30'''
| align="center" style="background:#f0f0f0;"|'''60'''
| align="center" style="background:#f0f0f0;"|'''90'''
| align="center" style="background:#f0f0f0;"|'''120'''
| align="center" style="background:#f0f0f0;"|'''150'''
| align="center" style="background:#f0f0f0;"|'''Average'''
| align="center" style="background:#f0f0f0;"|'''Std. dev.'''
|-
| Etch rate||nm/min||||81||107||111||116||122||107||16
|-
| Sidewall angle||degs||||83||83||81||82||77||81||3
|-
| CD loss||nm/edge||||-4||-13||-12||-12||-29||-14||9
|-
| CD loss foot||nm/edge||||1||0||1||-1||-2||0||2
|-
| Bowing||||||6||5||10||8||18||9||5
|-
| Bottom curvature||||||-6||-5||-2||-3||3||-3||3
|-
| Zep etch rate||nm/min||||||||||||||81||
|-
|
|}

{| {{table}}
|+ After 120 seconds
| align="center" style="background:#f0f0f0;"|'''Nominal trench line width'''
| align="center" style="background:#f0f0f0;"|''''''
| align="center" style="background:#f0f0f0;"|'''30'''
| align="center" style="background:#f0f0f0;"|'''60'''
| align="center" style="background:#f0f0f0;"|'''90'''
| align="center" style="background:#f0f0f0;"|'''120'''
| align="center" style="background:#f0f0f0;"|'''150'''
| align="center" style="background:#f0f0f0;"|'''Average'''
| align="center" style="background:#f0f0f0;"|'''Std. dev.'''
|-
| Etch rate||nm/min||77||101||112||119||119||106||18
|-
| Sidewall angle||degs||85||84||84||82||82||83||1
|-
| CD loss||nm/edge||-4||-17||-14||-10||-23||-13||7
|-
| CD loss foot||nm/edge||2||-4||0||2||4||1||3
|-
| Bowing||||9||11||14||15||9||12||3
|-
| Bottom curvature||||-28||-4||-2||2||3||-6||13
|-
| Zep etch rate||nm/min||||||||||||56||
|-
|
|}

{| {{table}}
|+ after 180 seconds
| align="center" style="background:#f0f0f0;"|'''Nominal trench line width'''
| align="center" style="background:#f0f0f0;"|''''''
| align="center" style="background:#f0f0f0;"|'''30'''
| align="center" style="background:#f0f0f0;"|'''60'''
| align="center" style="background:#f0f0f0;"|'''90'''
| align="center" style="background:#f0f0f0;"|'''150'''
| align="center" style="background:#f0f0f0;"|'''Average'''
| align="center" style="background:#f0f0f0;"|'''Std. dev.'''
|-
| Etch rate||nm/min||49||97||105||111||91||28
|-
| Sidewall angle||degs||76||83||82||80||80||3
|-
| CD loss||nm/edge||18||7||14||3||10||7
|-
| CD loss foot||nm/edge||23||20||28||30||25||5
|-
| Bowing||||-2||10||-4||-5||0||7
|-
| Bottom curvature||||-28||-9||-2||1||-9||13
|-
| Zep etch rate||nm/min||||||||||53||
|-
|
|}