Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/isotropic - Revision history

Jmli at 06:34, 4 April 2025

2025-04-04T06:34:30Z

← Older revision		Revision as of 08:34, 4 April 2025
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	<!--Checked for updates on 11/2-2019 - ok/jmli -->		<!--Checked for updates on 11/2-2019 - ok/jmli -->
	<!--Checked for updates on 24/8-2021. ok/ jmli-->		<!--Checked for updates on 24/8-2021. ok/ jmli-->
			<!--Checked for updates on 4/4-2025 - ok/jmli -->

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2021-08-24T14:20:23Z

← Older revision		Revision as of 16:20, 24 August 2021
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	= Isotropic etching in silicon on the ICP Metal Etch =		= Isotropic etching in silicon on the ICP Metal Etch =
	<!--Checked for updates on 11/2-2019 - ok/jmli -->		<!--Checked for updates on 11/2-2019 - ok/jmli -->
			<!--Checked for updates on 24/8-2021. ok/ jmli-->

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2019-08-13T08:41:40Z

Isotropic etching in silicon on the ICP Metal Etch

← Older revision		Revision as of 10:41, 13 August 2019
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	\|-		\|-
	\|-		\|-
	! no name, tested by Lior Shiv@Capres 2019-17-12 <!--Recipe Name -->		! no name, tested by Lior Shiv@Capres 2019-07-12 <!--Recipe Name -->
	\| A <!--Step -->		\| A <!--Step -->
	\| 20 <!--Temperature -->		\| 20 <!--Temperature -->

2019-08-13T08:40:57Z

Isotropic etching in silicon on the ICP Metal Etch

← Older revision		Revision as of 10:40, 13 August 2019
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	\| 3 <!--Platen power -->		\| 3 <!--Platen power -->
	\| [[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/isotropic/isoslow1\|'''Click HERE!''' ]] <!-- link processes -->		\| [[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/isotropic/isoslow1\|'''Click HERE!''' ]] <!-- link processes -->
	\| NA <!--Keywords -->		\| Note: Lior Shiv got very high etch rate for this recipe >1.5µm/min 2019-07-12 <!--Keywords -->
	\|-		\|-
	\|-		\|-
	! no name, tested by Lior Shiv@Capres 2019-~~017~~-12 <!--Recipe Name -->		! no name, tested by Lior Shiv@Capres 2019-17-12 <!--Recipe Name -->
	\| A <!--Step -->		\| A <!--Step -->
	\| 20 <!--Temperature -->		\| 20 <!--Temperature -->

2019-08-13T08:39:31Z

Isotropic etching in silicon on the ICP Metal Etch

@@ Line 52: / Line 52: @@
 | NA           <!--Keywords  -->
 |-
 |}

2019-07-11T10:48:47Z

Isotropic etching in silicon on the ICP Metal Etch

← Older revision		Revision as of 12:48, 11 July 2019
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	\| 20 <!--Temperature -->		\| 20 <!--Temperature -->
	\| - <!--Process time (needed if ramping is enabled) -->		\| - <!--Process time (needed if ramping is enabled) -->
	\| 20 <!--Pressure -->		\| 10 <!--Pressure -->
	\| - <!--Process chamber setup -->		\| - <!--Process chamber setup -->
	\| 90 <!--SF6 flow -->		\| 90 <!--SF6 flow -->

2019-07-11T10:43:07Z

Isotropic etching in silicon on the ICP Metal Etch

← Older revision		Revision as of 12:43, 11 July 2019
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	\| 20 <!--Temperature -->		\| 20 <!--Temperature -->
	\| - <!--Process time (needed if ramping is enabled) -->		\| - <!--Process time (needed if ramping is enabled) -->
	\| 90 <!--Pressure -->		\| 20 <!--Pressure -->
	\| - <!--Process chamber setup -->		\| - <!--Process chamber setup -->
	\| 50 <!--SF6 flow -->		\| 90 <!--SF6 flow -->
	\| 0 <!--O2 flow -->		\| 0 <!--O2 flow -->
	\| 0 <!--C4F8 flow -->		\| 0 <!--C4F8 flow -->

2019-02-11T10:33:18Z

← Older revision		Revision as of 12:33, 11 February 2019
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	= Isotropic etching in silicon on the ICP Metal Etch =		= Isotropic etching in silicon on the ICP Metal Etch =
			<!--Checked for updates on 11/2-2019 - ok/jmli -->

2016-06-24T08:57:31Z

Isotropic etching in silicon on the ICP Metal Etch

← Older revision		Revision as of 10:57, 24 June 2016
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	! width="40" \| Coil		! width="40" \| Coil
	! width="40" \| Platen		! width="40" \| Platen
	! width="40" \| SEM images		! width="80" \| SEM images of different runs
	! width="40" \| Keywords		! width="40" \| Keywords
	\|-		\|-
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	\| 400 <!--Coil power -->		\| 400 <!--Coil power -->
	\| 3 <!--Platen power -->		\| 3 <!--Platen power -->
	\| [[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/isotropic/isoslow1\|Click ]] <!-- link processes -->		\| [[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/isotropic/isoslow1\|'''Click HERE!''' ]] <!-- link processes -->
	\| NA <!--Keywords -->		\| NA <!--Keywords -->
	\|-		\|-
	\|}		\|}

2016-06-24T08:54:10Z

Isotropic etching in silicon on the ICP Metal Etch

← Older revision		Revision as of 10:54, 24 June 2016
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	! width="40" \| Coil		! width="40" \| Coil
	! width="40" \| Platen		! width="40" \| Platen
	! width="40" \| ~~Runs~~		! width="40" \| SEM images
	! width="40" \| Keywords		! width="40" \| Keywords
	\|-		\|-
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	\| 400 <!--Coil power -->		\| 400 <!--Coil power -->
	\| 3 <!--Platen power -->		\| 3 <!--Platen power -->
	\| [[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/isotropic/isoslow1\|1 ]] <!-- link processes -->		\| [[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/isotropic/isoslow1\|Click ]] <!-- link processes -->
	\| NA <!--Keywords -->		\| NA <!--Keywords -->
	\|-		\|-
	\|}		\|}