Specific Process Knowledge/Etch/ICP Metal Etcher/silicon - Revision history

Jmli at 08:28, 4 September 2025

2025-09-04T08:28:18Z

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	== Silicon etching on the ICP Metal Etcher ==		== Silicon etching on the ICP Metal Etcher ==

Jmli at 14:38, 2 February 2023

2023-02-02T14:38:08Z

← Older revision		Revision as of 16:38, 2 February 2023
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	== Silicon etching on the ICP Metal Etcher ==		== Silicon etching on the ICP Metal Etcher ==
			<!--Page reviewed by jmli 2/2-2023 -->
			{{Template:Author-jmli1}}

	In the primary silicon etcher at Nanolab, the [[Specific Process Knowledge/Etch/DRIE-Pegasus\|DRIE-Pegasus]], silicon is etched using a fluorine based plasma (with SF<sub>6</sub> as etch gas). Silicon is also etched by chlorine and bromine.		In the primary silicon etcher at Nanolab, the [[Specific Process Knowledge/Etch/DRIE-Pegasus\|DRIE-Pegasus]], silicon is etched using a fluorine based plasma (with SF<sub>6</sub> as etch gas). Silicon is also etched by chlorine and bromine.

Jmli at 09:08, 9 August 2022

2022-08-09T09:08:01Z

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	== Silicon etching on the ICP Metal Etcher ==		== Silicon etching on the ICP Metal Etcher ==

Jmli at 16:13, 25 November 2019

2019-11-25T16:13:35Z

← Older revision		Revision as of 18:13, 25 November 2019
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	== Silicon etching on the ICP Metal Etcher ==		== Silicon etching on the ICP Metal Etcher ==

	In the primary silicon etcher at ~~Danchip~~, the [[Specific Process Knowledge/Etch/DRIE-Pegasus\|DRIE-Pegasus]], silicon is etched using a fluorine based plasma (with SF<sub>6</sub> as etch gas). Silicon is also etched by chlorine and bromine.		In the primary silicon etcher at Nanolab, the [[Specific Process Knowledge/Etch/DRIE-Pegasus\|DRIE-Pegasus]], silicon is etched using a fluorine based plasma (with SF<sub>6</sub> as etch gas). Silicon is also etched by chlorine and bromine.

	*[[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano\|Chlorine/Bromine etch of nanostructures in silicon]]		*[[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano\|Chlorine/Bromine etch of nanostructures in silicon]]

	*[[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/isotropic\| Isotropic etching in silicon]]		*[[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/isotropic\| Isotropic etching in silicon]]

Jmli at 11:53, 30 July 2018

2018-07-30T11:53:31Z

← Older revision		Revision as of 13:53, 30 July 2018
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	== Silicon etching on the ICP Metal Etcher ==		== Silicon etching on the ICP Metal Etcher ==

Jmli: /* Silicon etching on the ICP Metal Etcher */

2016-06-24T08:31:45Z

Silicon etching on the ICP Metal Etcher

← Older revision		Revision as of 10:31, 24 June 2016
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	*[[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano\|Chlorine/Bromine etch of nanostructures in silicon]]		*[[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano\|Chlorine/Bromine etch of nanostructures in silicon]]

			*[[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/isotropic\| Isotropic etching in silicon]]

Jmli at 09:17, 2 February 2016

2016-02-02T09:17:40Z

← Older revision		Revision as of 11:17, 2 February 2016
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	== Silicon etching on the ICP Metal Etcher ==		== Silicon etching on the ICP Metal Etcher ==

Jmli at 14:34, 3 October 2013

2013-10-03T14:34:27Z

← Older revision		Revision as of 16:34, 3 October 2013
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	== Silicon etching on the ICP Metal Etcher ==		== Silicon etching on the ICP Metal Etcher ==

Jmli at 14:34, 3 October 2013

2013-10-03T14:34:18Z

← Older revision		Revision as of 16:34, 3 October 2013
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	== Silicon etching on the ICP Metal Etcher ==		== Silicon etching on the ICP Metal Etcher ==

Jml: /* Silicon etching on the ICP Metal Etcher */

2012-12-11T12:36:20Z

Silicon etching on the ICP Metal Etcher

← Older revision		Revision as of 14:36, 11 December 2012
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	== Silicon etching on the ICP Metal Etcher ==		== Silicon etching on the ICP Metal Etcher ==

	In the primary silicon etcher at Danchip, the [[Specific Process Knowledge/Etch/DRIE-Pegasus~~\|DRIE-Pegasus (Silicon Etch)~~\|DRIE-Pegasus]], silicon is etched using a fluorine based plasma (with SF<sub>6</sub> as etch gas). Silicon is also etched by chlorine and bromine.		In the primary silicon etcher at Danchip, the [[Specific Process Knowledge/Etch/DRIE-Pegasus\|DRIE-Pegasus]], silicon is etched using a fluorine based plasma (with SF<sub>6</sub> as etch gas). Silicon is also etched by chlorine and bromine.

	*[[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano\|Chlorine/Bromine etch of nanostructures in silicon]]		*[[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano\|Chlorine/Bromine etch of nanostructures in silicon]]