Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300 - Revision history

Mmat: /* Deposition */

2025-06-20T14:43:18Z

Deposition

← Older revision		Revision as of 16:43, 20 June 2025
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	**[[/IBSD of Si\|Deposition of Si]]		**[[/IBSD of Si\|Deposition of Si]]
	<br>		<br>
	~~<br>~~
	==An overview of the performance of IBE/IBSD Ionfab 300 and some process related parameters==		==An overview of the performance of IBE/IBSD Ionfab 300 and some process related parameters==

Mmat: /* Etch */

2025-06-20T14:43:09Z

Etch

← Older revision		Revision as of 16:43, 20 June 2025
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	**[[/IBE blazed gratings\|Etching of blazed gratings]]		**[[/IBE blazed gratings\|Etching of blazed gratings]]
	<br>		<br>
	~~<br>~~
	==Deposition==		==Deposition==
	'''<p style="color:red;">Deposition has been decommissioned on the system.</p>'''		'''<p style="color:red;">Deposition has been decommissioned on the system.</p>'''

Mmat: /* Process information */

2025-06-20T14:43:00Z

Process information

← Older revision		Revision as of 16:43, 20 June 2025
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	**[[/IBE Au etch#IBE Au etch with Ti mask\|Au etch with Ti as masking material]]		**[[/IBE Au etch#IBE Au etch with Ti mask\|Au etch with Ti as masking material]]
	**[[/IBE blazed gratings\|Etching of blazed gratings]]		**[[/IBE blazed gratings\|Etching of blazed gratings]]
			<br>
			<br>
	==Deposition==		==Deposition==
	'''<p style="color:red;">Deposition has been decommissioned on the system.</p>'''		'''<p style="color:red;">Deposition has been decommissioned on the system.</p>'''
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	**[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/IBSD of SiO2\|Deposition of SiO2]]		**[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/IBSD of SiO2\|Deposition of SiO2]]
	**[[/IBSD of Si\|Deposition of Si]]		**[[/IBSD of Si\|Deposition of Si]]
			<br>
			<br>
	==An overview of the performance of IBE/IBSD Ionfab 300 and some process related parameters==		==An overview of the performance of IBE/IBSD Ionfab 300 and some process related parameters==

Mmat: /* IBE/IBSD Ionfab 300: Milling and Dry Etching */

2025-06-20T14:42:38Z

IBE/IBSD Ionfab 300: Milling and Dry Etching

← Older revision		Revision as of 16:42, 20 June 2025
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	<!-- give the link to the equipment info page in LabManager: -->		<!-- give the link to the equipment info page in LabManager: -->
	[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=267 IBE/IBSD Ionfab 300+ in LabManager]		[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=267 IBE/IBSD Ionfab 300+ in LabManager]
			<br>
	<br>		<br>

Mmat: /* IBE/IBSD Ionfab 300: Milling and Dry Etching */

2025-06-20T14:42:29Z

IBE/IBSD Ionfab 300: Milling and Dry Etching

← Older revision		Revision as of 16:42, 20 June 2025
Line 26:		Line 26:
	<!-- give the link to the equipment info page in LabManager: -->		<!-- give the link to the equipment info page in LabManager: -->
	[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=267 IBE/IBSD Ionfab 300+ in LabManager]		[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=267 IBE/IBSD Ionfab 300+ in LabManager]
			<br>

	=Process information=		=Process information=

Mmat at 14:42, 20 June 2025

2025-06-20T14:42:17Z

← Older revision		Revision as of 16:42, 20 June 2025
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	[[Category: Thin Film Deposition\|IBE]]		[[Category: Thin Film Deposition\|IBE]]
	<br> {{CC-bghe1}}		<br> {{CC-bghe1}}
			<br>
			<br>
	==IBE/IBSD Ionfab 300: ~~milling~~ and ~~dry etching =~~=		=IBE/IBSD Ionfab 300: Milling and Dry Etching =
	[[Image:IBE_IBSD_udstyret_i_RR1.jpg\|300x300px\|thumb\|IBE and IBSD: positioned in cleanroom A-1, {{photo1}}]]		[[Image:IBE_IBSD_udstyret_i_RR1.jpg\|300x300px\|thumb\|IBE and IBSD: positioned in cleanroom A-1, {{photo1}}]]

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	[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=267 IBE/IBSD Ionfab 300+ in LabManager]		[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=267 IBE/IBSD Ionfab 300+ in LabManager]

	==Process information==		=Process information=
	===Etch===		==Etch==
	*[http://www.semicore.com/reference/sputtering-yields-reference Compare sputter rates in different materials]		*[http://www.semicore.com/reference/sputtering-yields-reference Compare sputter rates in different materials]
	*[[/IBE process trends\|Some general process trends]]		*[[/IBE process trends\|Some general process trends]]
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	**[[/IBE blazed gratings\|Etching of blazed gratings]]		**[[/IBE blazed gratings\|Etching of blazed gratings]]

	===Deposition ~~(deposition~~ has been decommissioned on the system~~)===~~		==Deposition==
			'''<p style="color:red;">Deposition has been decommissioned on the system.</p>'''

	*[[/Crystal Settings\|Crystal Thickness Monitor Settings]]		*[[/Crystal Settings\|Crystal Thickness Monitor Settings]]
	*Results from the acceptance test:		*Results from the acceptance test:
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	\|-		\|-
	\|}		\|}
			<br>

Mmat at 12:16, 17 June 2025

2025-06-17T12:16:25Z

← Older revision		Revision as of 14:16, 17 June 2025
Line 45:		Line 45:
	*[[/Crystal Settings\|Crystal Thickness Monitor Settings]]		*[[/Crystal Settings\|Crystal Thickness Monitor Settings]]
	*Results from the acceptance test:		*Results from the acceptance test:
	**[[/IBSD of TiO2\|Deposition of TiO2]]		**[[Specific Process Knowledge/Thin film deposition/Deposition of Titanium Oxide/IBSD of TiO2\|Deposition of TiO2]]
	**[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/IBSD of SiO2\|Deposition of SiO2]]		**[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/IBSD of SiO2\|Deposition of SiO2]]
	**[[/IBSD of Si\|Deposition of Si]]		**[[/IBSD of Si\|Deposition of Si]]

Bghe: /* Process information */

2025-05-02T12:49:02Z

Process information

← Older revision		Revision as of 14:49, 2 May 2025
Line 41:		Line 41:
	**[[/IBE Au etch#IBE Au etch with Ti mask\|Au etch with Ti as masking material]]		**[[/IBE Au etch#IBE Au etch with Ti mask\|Au etch with Ti as masking material]]
	**[[/IBE blazed gratings\|Etching of blazed gratings]]		**[[/IBE blazed gratings\|Etching of blazed gratings]]
	**[[/HfO2 etch\|HfO2 etch in deep trenches]]

	===Deposition (deposition has been decommissioned on the system)===		===Deposition (deposition has been decommissioned on the system)===

Shuya: /* Process information */

2023-10-20T12:07:40Z

Process information

← Older revision		Revision as of 14:07, 20 October 2023
Line 41:		Line 41:
	**[[/IBE Au etch#IBE Au etch with Ti mask\|Au etch with Ti as masking material]]		**[[/IBE Au etch#IBE Au etch with Ti mask\|Au etch with Ti as masking material]]
	**[[/IBE blazed gratings\|Etching of blazed gratings]]		**[[/IBE blazed gratings\|Etching of blazed gratings]]
			**[[/HfO2 etch\|HfO2 etch in deep trenches]]

	===Deposition (deposition has been decommissioned on the system)===		===Deposition (deposition has been decommissioned on the system)===

Bghe: /* IBE/IBSD Ionfab 300: milling and dry etching */

2023-03-24T11:59:11Z

IBE/IBSD Ionfab 300: milling and dry etching

← Older revision		Revision as of 13:59, 24 March 2023
Line 9:		Line 9:
	[[Image:IBE_IBSD_udstyret_i_RR1.jpg\|300x300px\|thumb\|IBE and IBSD: positioned in cleanroom A-1, {{photo1}}]]		[[Image:IBE_IBSD_udstyret_i_RR1.jpg\|300x300px\|thumb\|IBE and IBSD: positioned in cleanroom A-1, {{photo1}}]]

	IBE/IBSD Ionfab 300 was ~~manufactored~~ by Oxford Instruments Plasma Technology. It was installed at Nanolab in 2011.		IBE/IBSD Ionfab 300 was manufactured by Oxford Instruments Plasma Technology [https://plasma.oxinst.com/products/ion-beam/ionfab]. It was installed at Nanolab in 2011. It was originally installed with the capability of doing both IBE and IBSD. In 2022 we have decommissioned the IBSD part.

← Older revision		Revision as of 14:16, 17 June 2025
Line 45:		Line 45:
	*[[/Crystal Settings\|Crystal Thickness Monitor Settings]]		*[[/Crystal Settings\|Crystal Thickness Monitor Settings]]
	*Results from the acceptance test:		*Results from the acceptance test:
	**[[/IBSD of TiO2\|Deposition of TiO2]]		**[[Specific Process Knowledge/Thin film deposition/Deposition of Titanium Oxide/IBSD of TiO2\|Deposition of TiO2]]
	**[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/IBSD of SiO2\|Deposition of SiO2]]		**[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/IBSD of SiO2\|Deposition of SiO2]]
	**[[/IBSD of Si\|Deposition of Si]]		**[[/IBSD of Si\|Deposition of Si]]