Specific Process Knowledge/Etch/Etching of Titanium - Revision history

Mbec at 13:43, 28 March 2025

2025-03-28T13:43:06Z

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	==Etching of Titanium==		==Etching of Titanium==

2024-04-18T12:36:51Z

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	\|		\|
	*smaller pieces on a carrier wafer		*smaller pieces on a carrier wafer
	*<nowiki>#</nowiki>1 100mm wafers (~~when set up to 100mm wafers~~)		*<nowiki>#</nowiki>1 100mm wafers (if you place it/bond it on a 150 mm carrier wafer)
	*<nowiki>#</nowiki>1 150mm wafers ~~(when set up to 150mm wafers)~~		*<nowiki>#</nowiki>1 150mm wafers
	\|		\|
	Smaller pieces glued to carrier wafer		Smaller pieces glued to carrier wafer

2023-02-06T15:10:22Z

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2020-01-27T08:15:41Z

Comparison of Titanium Etch Methodes

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	\|-style="background:WhiteSmoke; color:black"		\|-style="background:WhiteSmoke; color:black"
	!Generel description		!Generel description
	\|BHF:Etch of titanium with or without photoresist mask.		\|BHF Etch of titanium with or without photoresist mask.
	\|Cold RCA1~~: Etch~~ of titanium (as stripper or with eagle resist).		\|Cold RCA1 mix etch of titanium (as stripper or with eagle resist).
	\|Dry plasma etch of Ti		\|Dry plasma etch of Ti
	\|Sputtering of Ti - pure physical etch		\|Sputtering of Ti - pure physical etch

2016-08-01T07:35:44Z

← Older revision		Revision as of 09:35, 1 August 2016
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	==Etching of Titanium==		==Etching of Titanium==

2013-04-10T10:25:53Z

Comparison of Titanium Etch Metodes

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	==Comparison of Titanium Etch ~~Metodes~~==		==Comparison of Titanium Etch Methodes==

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2013-03-12T14:11:10Z

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2013-03-12T14:10:38Z

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	==Etching of Titanium==		==Etching of Titanium==

2013-03-12T14:08:34Z

Comparison of Titanium Etch Metodes

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	Ething of Titanium can be done either wet or dry. For wet etching please see below on this page. Dry etching can be done either with [[Specific Process Knowledge/Etch/ICP Metal Etcher\|ICP]] using Chlorine chemistry or with [[Specific Process Knowledge/Etch/IBE/IBSD Ionfab 300\|IBE]] by sputtering with Ar ions.

2013-03-12T14:08:20Z

Dry etching of titanium

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	Ething of Titanium can be done either wet or dry. For wet etching please see below on this page. Dry etching can be done either with [[Specific Process Knowledge/Etch/ICP Metal Etcher\|ICP]] using Chlorine chemistry or with [[Specific Process Knowledge/Etch/IBE/IBSD Ionfab 300\|IBE]] by sputtering with Ar ions.		Ething of Titanium can be done either wet or dry. For wet etching please see below on this page. Dry etching can be done either with [[Specific Process Knowledge/Etch/ICP Metal Etcher\|ICP]] using Chlorine chemistry or with [[Specific Process Knowledge/Etch/IBE/IBSD Ionfab 300\|IBE]] by sputtering with Ar ions.

	~~== Dry etching of titanium ==~~

	~~See the [[Specific Process Knowledge/Etch/ICP Metal Etcher\|ICP Metal Etch]] page.~~