Specific Process Knowledge/Etch/Etching of Molybdenum - Revision history

Bghe at 13:43, 28 March 2025

2025-03-28T13:43:25Z

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Bghe at 13:41, 28 March 2025

2025-03-28T13:41:01Z

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2025-03-28T13:37:04Z

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Mbec: /* Comparison of Molybdenum Etch Methods */

2025-03-28T13:27:26Z

Comparison of Molybdenum Etch Methods

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	\|-style="background:silver; color:black"		\|-style="background:silver; color:black"
	!		!
	![[Specific Process Knowledge/Etch/Wet ~~Molybdæn~~ Etch\|Mo wet etch]]		![[Specific Process Knowledge/Etch/Wet Chromium Etch\|Mo wet etch]]
	!~~[[Specific_Process_Knowledge/Etch/~~Dry etch]]		! Dry etch

	\|-		\|-

Mbec at 13:10, 28 March 2025

2025-03-28T13:10:42Z

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	==Comparison of Molybdenum Etch Methods==		==Comparison of Molybdenum Etch Methods==

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==Comparison of Molybdenum Etch Methods==

{|border="1" cellspacing="1" cellpadding="3" style="text-align:left;"
|-

|-
|-style="background:silver; color:black"
!
![[Specific Process Knowledge/Etch/Wet Molybdæn Etch|Mo wet etch]]
![[Specific_Process_Knowledge/Etch/Dry etch]]

|-
|-style="background:WhiteSmoke; color:black"
!Generel description
|Wet etch of Mo using Chrome etch 18
|Dry etch of Mo
|-

|-
|-style="background:LightGrey; color:black"
!Etch rate range
|
* 120 nm etch after 30 sec (not tested yet)
|
* (not tested yet)
|-

|-
|-style="background:WhiteSmoke; color:black"
!Etch profile
|
*Isotropic
|
*Anisotropic (not tested yet)
|-

|-style="background:LightGrey; color:black"
!Masking material
|
*AZ resist as a mask (hard baked at 120C for 120sec) led to an under etch of 2ish µm

|
*Not tested yet
|-

|-
|-style="background:WhiteSmoke; color:black"
!Substrate size
|
*Any size and number that can go inside the beaker in use
|

|-

|-
|-style="background:LightGrey; color:black"
!'''Allowed materials'''
|
No restrictions cross contamination wise as long as you use the right beaker and make sure that they are safe to enter in the chemicals
|

|-

|}