Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cpoly2 - Revision history

Jmli at 06:42, 4 April 2025

2025-04-04T06:42:46Z

← Older revision		Revision as of 08:42, 4 April 2025
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	<!--Checked for updates on 11/2-2019 - ok/jmli -->		<!--Checked for updates on 11/2-2019 - ok/jmli -->
	<!--Page reviewed by jmli 9/8-2022 -->		<!--Page reviewed by jmli 9/8-2022 -->
			<!--Checked for updates on 4/4-2025 - ok/jmli -->

	{\| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"		{\| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"

Jmli at 09:12, 9 August 2022

2022-08-09T09:12:24Z

← Older revision		Revision as of 11:12, 9 August 2022
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	<!--Checked for updates on 11/2-2019 - ok/jmli -->		<!--Checked for updates on 11/2-2019 - ok/jmli -->
			<!--Page reviewed by jmli 9/8-2022 -->

	{\| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"		{\| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"
	\|+ '''Process runs'''		\|+ '''Process runs'''

Jmli at 20:23, 25 November 2019

2019-11-25T20:23:32Z

← Older revision		Revision as of 22:23, 25 November 2019
Line 23:		Line 23:
	\| Pegasus/jmli		\| Pegasus/jmli
	\| 10 minute TDESC clean + 45 sec barc etch		\| 10 minute TDESC clean + 45 sec barc etch
	\| ~~danchip~~/jml/showerhead/Cpoly2, 20 cycles or 2:08 minutes		\| nanolab/jml/showerhead/Cpoly2, 20 cycles or 2:08 minutes
	\| S004729		\| S004729
	\| New showerhead		\| New showerhead

Jmli at 10:36, 11 February 2019

2019-02-11T10:36:03Z

← Older revision		Revision as of 12:36, 11 February 2019
Line 1:		Line 1:
			<!--Checked for updates on 11/2-2019 - ok/jmli -->
	{\| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"		{\| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"
	\|+ '''Process runs'''		\|+ '''Process runs'''

Jmli at 12:30, 17 January 2017

2017-01-17T12:30:01Z

← Older revision		Revision as of 14:30, 17 January 2017
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	{\| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"		{\| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"
	\|+ '''Process runs'''		\|+ '''Process runs'''

Jmli at 12:54, 11 December 2014

2014-12-11T12:54:34Z

← Older revision		Revision as of 14:54, 11 December 2014
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	\| Pegasus/jmli		\| Pegasus/jmli
	\| 10 minute TDESC clean + 45 sec barc etch		\| 10 minute TDESC clean + 45 sec barc etch
	\| danchip/showerhead/~~polySi etch DUV mask~~, 20 cycles or 2:08 minutes		\| danchip/jml/showerhead/Cpoly2, 20 cycles or 2:08 minutes
	\| S004729		\| S004729
	\| New showerhead		\| New showerhead

Jmli: Created page with " {| border="2" cellpadding="0" cellspacing="0" style="text-align:center;" |+ '''Process runs''' |- ! rowspan="2" width="40"| Date ! colspan="4" width="120"| Substrate Informat..."

2014-12-11T12:41:53Z

Created page with " {| border="2" cellpadding="0" cellspacing="0" style="text-align:center;" |+ '''Process runs''' |- ! rowspan="2" width="40"| Date ! colspan="4" width="120"| Substrate Informat..."

New page

{| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"
|+ '''Process runs'''
|-
! rowspan="2" width="40"| Date
! colspan="4" width="120"| Substrate Information
! colspan="4" | Process Information
! rowspan="2" width="500" |SEM Images
|-
! width="30" | Wafer info
! width="40" | Mask
! width="40" | Material/ Exposed area
! width="40" | Tool / Operator
! width="40" | Conditioning
! width="40" | Recipe
! width="40" | Wafer ID
! width="40" | Comments
|-
| 3/12-2014
| 1/4 6" Wafer with 210 nm oxide and 1800 nm polysilicon CB on oxide carrier
| standard stepper mask (50 nm barc + 320 nm krf)
| Si / 50+ %
| Pegasus/jmli
| 10 minute TDESC clean + 45 sec barc etch
| danchip/showerhead/polySi etch DUV mask, 20 cycles or 2:08 minutes
| S004729
| New showerhead
|
[[file:S004729-01.jpg|150px|frameless ]]
[[file:S004729-02.jpg|150px|frameless ]]
[[file:S004729-03.jpg|150px|frameless ]]

|-
|}