Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessD/original - Revision history

Jmli at 08:32, 4 September 2025

2025-09-04T08:32:52Z

← Older revision		Revision as of 10:32, 4 September 2025
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	<!--Page reviewed by jmli 28/4-2023 -->		<!--Page reviewed by jmli 28/4-2023 -->
	{{Author-jmli1}}		{{Author-jmli1}}
			<!--Checked for updates on 4/9-2025 - ok/jmli -->

	{\| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"		{\| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"

Jmli at 10:27, 28 April 2023

2023-04-28T10:27:30Z

← Older revision		Revision as of 12:27, 28 April 2023
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	<!--Checked for updates on 11/2-2019 - ok/jmli -->		<!--Checked for updates on 11/2-2019 - ok/jmli -->
	<!--Page reviewed by jmli 9/8-2022 -->		<!--Page reviewed by jmli 9/8-2022 -->
			<!--Page reviewed by jmli 28/4-2023 -->
			{{Author-jmli1}}

	{\| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"		{\| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"

Jmli at 09:13, 9 August 2022

2022-08-09T09:13:49Z

← Older revision		Revision as of 11:13, 9 August 2022
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	<!--Checked for updates on 11/2-2019 - ok/jmli -->		<!--Checked for updates on 11/2-2019 - ok/jmli -->
			<!--Page reviewed by jmli 9/8-2022 -->

	{\| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"		{\| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"
	\|+ '''Process runs'''		\|+ '''Process runs'''

Jmli at 20:19, 25 November 2019

2019-11-25T20:19:09Z

← Older revision		Revision as of 22:19, 25 November 2019
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	\| Pegasus/jmli		\| Pegasus/jmli
	\| 10 minute TDESC clean		\| 10 minute TDESC clean
	\| ~~danchip~~/jml/showerhead/prD, 110 cycles or 8:04 minutes		\| nanolab/jml/showerhead/prD, 110 cycles or 8:04 minutes
	\| S004584		\| S004584
	! Old showerhead		! Old showerhead
Line 37:		Line 37:
	\| Pegasus/jmli		\| Pegasus/jmli
	\| 10 minute TDESC clean + 45 sec barc etch		\| 10 minute TDESC clean + 45 sec barc etch
	\| ~~danchip~~/jml/showerhead/polySi etch DUV mask, 20 cycles or 3:02 minutes		\| nanolab/jml/showerhead/polySi etch DUV mask, 20 cycles or 3:02 minutes
	\| S004675		\| S004675
	! New showerhead		! New showerhead

Jmli at 10:36, 11 February 2019

2019-02-11T10:36:57Z

← Older revision		Revision as of 12:36, 11 February 2019
Line 1:		Line 1:
			<!--Checked for updates on 11/2-2019 - ok/jmli -->
	{\| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"		{\| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"
	\|+ '''Process runs'''		\|+ '''Process runs'''

Jmli at 12:27, 17 January 2017

2017-01-17T12:27:41Z

← Older revision		Revision as of 14:27, 17 January 2017
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	{\| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"		{\| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"
	\|+ '''Process runs'''		\|+ '''Process runs'''

Jmli at 16:27, 18 December 2014

2014-12-18T16:27:11Z

← Older revision		Revision as of 18:27, 18 December 2014
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	\|		\|
	[[file:S004584-1.jpg\|150px\|frameless]]		[[file:S004584-1.jpg\|150px\|frameless]]
	~~[[file:S004584-2.jpg\|150px\|frameless]]~~
	[[file:S004584-3.jpg\|150px\|frameless]]		[[file:S004584-3.jpg\|150px\|frameless]]

Jmli at 16:26, 18 December 2014

2014-12-18T16:26:54Z

← Older revision		Revision as of 18:26, 18 December 2014
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	! Old showerhead		! Old showerhead
	\|		\|
			[[file:S004584-1.jpg\|150px\|frameless]]
			[[file:S004584-2.jpg\|150px\|frameless]]
			[[file:S004584-3.jpg\|150px\|frameless]]

	\|-		\|-

Jmli at 16:21, 18 December 2014

2014-12-18T16:21:52Z

← Older revision		Revision as of 18:21, 18 December 2014
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	\|-		\|-
	\| 20/11-2014		\| 20/11-2014
	\| 6" Wafer with ~~210 nm oxide and 1800 nm polysilicon~~		\| 4" Wafer with AZ resist
	\| ~~standard stepper mask (50 nm barc + 320 nm krf)~~		\| Travka50 pattern
	\| Si / 50+ %		\| Si / 50+ %
	\| Pegasus/jmli		\| Pegasus/jmli
	\| 10 minute TDESC clean ~~+ 45 sec barc etch~~		\| 10 minute TDESC clean
	\| danchip/jml/showerhead/~~polySi etch DUV mask~~, 20 cycles or 3:02 minutes		\| danchip/jml/showerhead/prD, 110 cycles or 8:04 minutes
	\| ~~S004675~~		\| S004584
	! Old showerhead		! Old showerhead
	\|		\|
	~~[[file:S00459305.jpg\|150px\|frameless ]]~~
	~~[[file:S00459306.jpg\|150px\|frameless ]]~~
	~~[[file:S00459307.jpg\|150px\|frameless ]]~~
	~~[[file:S00459308.jpg\|150px\|frameless ]]~~
	~~[[file:s004593-01.jpg\|150px\|frameless ]]~~
	~~[[file:s004593-02.jpg\|150px\|frameless ]]~~
	~~[[file:s004593-03.jpg\|150px\|frameless ]]~~
	\|-		\|-
	\| 1/12-2014		\| 1/12-2014

Jmli: Created page with " {| border="2" cellpadding="0" cellspacing="0" style="text-align:center;" |+ '''Process runs''' |- ! rowspan="2" width="40"| Date ! colspan="4" width="120"| Substrate Informat..."

2014-12-18T16:10:35Z

Created page with " {| border="2" cellpadding="0" cellspacing="0" style="text-align:center;" |+ '''Process runs''' |- ! rowspan="2" width="40"| Date ! colspan="4" width="120"| Substrate Informat..."

New page

{| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"
|+ '''Process runs'''
|-
! rowspan="2" width="40"| Date
! colspan="4" width="120"| Substrate Information
! colspan="4" | Process Information
! rowspan="2" width="500" |SEM Images
|-
! width="30" | Wafer info
! width="40" | Mask
! width="40" | Material/ Exposed area
! width="40" | Tool / Operator
! width="40" | Conditioning
! width="40" | Recipe
! width="40" | Wafer ID
! width="40" | Comments
|-
| 20/11-2014
| 6" Wafer with 210 nm oxide and 1800 nm polysilicon
| standard stepper mask (50 nm barc + 320 nm krf)
| Si / 50+ %
| Pegasus/jmli
| 10 minute TDESC clean + 45 sec barc etch
| danchip/jml/showerhead/polySi etch DUV mask, 20 cycles or 3:02 minutes
| S004675
! Old showerhead
|
[[file:S00459305.jpg|150px|frameless ]]
[[file:S00459306.jpg|150px|frameless ]]
[[file:S00459307.jpg|150px|frameless ]]
[[file:S00459308.jpg|150px|frameless ]]
[[file:s004593-01.jpg|150px|frameless ]]
[[file:s004593-02.jpg|150px|frameless ]]
[[file:s004593-03.jpg|150px|frameless ]]
|-
| 1/12-2014
| 1/4 6" Wafer with 210 nm oxide and 1800 nm polysilicon crystalbonded on carrier
| standard stepper mask (50 nm barc + 320 nm krf)
| Si / 50+ %
| Pegasus/jmli
| 10 minute TDESC clean + 45 sec barc etch
| danchip/jml/showerhead/polySi etch DUV mask, 20 cycles or 3:02 minutes
| S004675
! New showerhead
|

|-
|}

← Older revision		Revision as of 18:27, 18 December 2014
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	\|		\|
	[[file:S004584-1.jpg\|150px\|frameless]]		[[file:S004584-1.jpg\|150px\|frameless]]
	~~[[file:S004584-2.jpg\|150px\|frameless]]~~
	[[file:S004584-3.jpg\|150px\|frameless]]		[[file:S004584-3.jpg\|150px\|frameless]]