Specific Process Knowledge/Etch/DRIE-Pegasus/picoscope - Revision history

Jmli at 08:37, 4 September 2025

2025-09-04T08:37:55Z

← Older revision		Revision as of 10:37, 4 September 2025
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	[[Category: Equipment \|Etch DRIE]]		[[Category: Equipment \|Etch DRIE]]
	<!--corona content 17/3-202 jmli -->		<!--corona content 17/3-202 jmli -->
			{{Author-jmli1}}
			<!--Checked for updates on 4/9-2025 - ok/jmli -->

	= Process optimization using the Picoscope =		= Process optimization using the Picoscope =
	~~{{Author-jmli1}}~~

	Before going into details on why it makes sense to optimize the processes using the picoscope process monitoring, we need to have a look at how monitoring processes is usually done.		Before going into details on why it makes sense to optimize the processes using the picoscope process monitoring, we need to have a look at how monitoring processes is usually done.

Jmli: /* Process D4 */

2023-06-28T08:39:50Z

Process D4

← Older revision		Revision as of 10:39, 28 June 2023
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	=== Process D4 ===		=== Process D4 ===

	After a few years in its original configuration, we decided to ~~upgrade Pegasus 1 with the~~ [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange\|~~High flow plenum~~]] ~~upgrade~~ to improve the fast switching performance. As a result, the original recipe Process D was changed to Process D4 with faster cycles. The process parameters are listed in the table below.		After a few years in its original configuration, we decided to [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange\|'''upgrade Pegasus 1''']] to improve the fast switching performance. As a result, the original recipe Process D was changed to Process D4 with faster cycles. The process parameters are listed in the table below.

	{\| {{table}}		{\| {{table}}

Jmli: /* New recipes */

2023-05-01T14:41:01Z

New recipes

← Older revision		Revision as of 16:41, 1 May 2023
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	: https://doi.org/10.1016/j.mee.2018.01.034		: https://doi.org/10.1016/j.mee.2018.01.034

	; Bingdong Chang et al.: DREM2: a facile fabrication strategy for freestanding three dimensional silicon micro- and nanostructures by a modified Bosch etch process		; Bingdong Chang et al.: DREM2: A facile fabrication strategy for freestanding three dimensional silicon micro- and nanostructures by a modified Bosch etch process
	: 2018 J. Micromech. Microeng. 28 105012		: 2018 J. Micromech. Microeng. 28 105012
	: https://doi.org/10.1088/1361-6439/aad0c4		: https://doi.org/10.1088/1361-6439/aad0c4

Jmli at 10:13, 28 April 2023

2023-04-28T10:13:19Z

← Older revision		Revision as of 12:13, 28 April 2023
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	<!--corona content 17/3-202 jmli -->		<!--corona content 17/3-202 jmli -->
	= Process optimization using the Picoscope =		= Process optimization using the Picoscope =
			{{Author-jmli1}}

	Before going into details on why it makes sense to optimize the processes using the picoscope process monitoring, we need to have a look at how monitoring processes is usually done.		Before going into details on why it makes sense to optimize the processes using the picoscope process monitoring, we need to have a look at how monitoring processes is usually done.

Jmli: /* New recipes */

2023-04-26T14:42:11Z

New recipes

← Older revision		Revision as of 16:42, 26 April 2023
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	: 2020, Microelectronic Engineering, Volume 223, 15 February, 111228		: 2020, Microelectronic Engineering, Volume 223, 15 February, 111228
	: https://doi.org/10.1016/j.mee.2020.111228		: https://doi.org/10.1016/j.mee.2020.111228

	*[[Media:Grassfree1.pdf ]]

	*[[Media:3DnanoSi.pdf ]]
	*[[Media:CORE1.pdf ]]
	*[[Media:DREM1.pdf ]]

Jmli: /* New recipes */

2023-04-26T14:27:27Z

New recipes

← Older revision		Revision as of 16:27, 26 April 2023
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	: https://doi.org/10.1016/j.mee.2020.111228		: https://doi.org/10.1016/j.mee.2020.111228

	*[[Media:Grassfree1.pdf \| ]]		*[[Media:Grassfree1.pdf ]]

	*[[Media:3DnanoSi.pdf \| ]]		*[[Media:3DnanoSi.pdf ]]
	*[[Media:CORE1.pdf \| ]]		*[[Media:CORE1.pdf ]]
	*[[Media:DREM1.pdf ~~\| Bingdong Chang et al.: DREM: Infinite etch selectivity and optimized scallop size distribution with conventional photoresists in an adapted multiplexed Bosch DRIE process~~]]		*[[Media:DREM1.pdf ]]

Jmli: /* New recipes */

2023-04-26T14:26:47Z

New recipes

← Older revision		Revision as of 16:26, 26 April 2023
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	; Bingdong Chang et al.: DREM: Infinite etch selectivity and optimized scallop size distribution with conventional photoresists in an adapted multiplexed Bosch DRIE process		; Bingdong Chang et al.: DREM: Infinite etch selectivity and optimized scallop size distribution with conventional photoresists in an adapted multiplexed Bosch DRIE process
	: Microelectronic Engineering Volume 191, 5 May ~~2018~~, Pages 77-83		: 2018 Microelectronic Engineering Volume 191, 5 May, Pages 77-83
	: https://doi.org/10.1016/j.mee.2018.01.034		: https://doi.org/10.1016/j.mee.2018.01.034
	* Bingdong Chang et al.: DREM2: a facile fabrication strategy for freestanding three dimensional silicon micro- and nanostructures by a modified Bosch etch process: https://doi.org/10.1088/1361-6439/aad0c4
	* Vy Thi Hoang Nguyen et al.: The CORE Sequence: A Nanoscale Fluorocarbon-Free Silicon Plasma Etch Process Based on SF6/O2 Cycles with Excellent 3D Profile Control at Room Temperature: https://doi.org/10.1149/2162-8777/ab61ed		; Bingdong Chang et al.: DREM2: a facile fabrication strategy for freestanding three dimensional silicon micro- and nanostructures by a modified Bosch etch process
	* Bingdong Chang et al.: Large Area Three-Dimensional Photonic Crystal Membranes: Single-Run Fabrication and Applications with Embedded Planar Defects:		: 2018 J. Micromech. Microeng. 28 105012
	https://doi.org/10.1002/adom.201801176		: https://doi.org/10.1088/1361-6439/aad0c4
	* Chantal Silvestre et al.: Deep reactive ion etching of ‘grass-free’ widely-spaced periodic 2D arrays, using sacrificial structures: https://doi.org/10.1016/j.mee.2020.111228
			; Vy Thi Hoang Nguyen et al.: The CORE Sequence: A Nanoscale Fluorocarbon-Free Silicon Plasma Etch Process Based on SF6/O2 Cycles with Excellent 3D Profile Control at Room Temperature
			: 2020 ECS J. Solid State Sci. Technol. 9 024002
			: https://doi.org/10.1149/2162-8777/ab61ed

			; Bingdong Chang et al.: Large Area Three-Dimensional Photonic Crystal Membranes: Single-Run Fabrication and Applications with Embedded Planar Defects
			: 2019, Advanced Optical Materials Volume 7, Issue 2, pp. 1801176
			: https://doi.org/10.1002/adom.201801176

			; Chantal Silvestre et al.: Deep reactive ion etching of ‘grass-free’ widely-spaced periodic 2D arrays, using sacrificial structures
			: 2020, Microelectronic Engineering, Volume 223, 15 February, 111228
			: https://doi.org/10.1016/j.mee.2020.111228

	*[[Media:Grassfree1.pdf \| ]]		*[[Media:Grassfree1.pdf \| ]]

Jmli: /* New recipes */

2023-04-26T14:20:38Z

New recipes

← Older revision		Revision as of 16:20, 26 April 2023
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	It was professor [https://www.dtu.dk/service/telefonbog/person?id=103402&cpid=191195&tab=1 Henri Jansen] at DTU Nanolab who came up with the idea of adding the Picoscope to the Pegasi tools. Since then his group has researched a lot into its possibilities. Below is a list of publications in which the Picoscope plays a crucial role:		It was professor [https://www.dtu.dk/service/telefonbog/person?id=103402&cpid=191195&tab=1 Henri Jansen] at DTU Nanolab who came up with the idea of adding the Picoscope to the Pegasi tools. Since then his group has researched a lot into its possibilities. Below is a list of publications in which the Picoscope plays a crucial role:
	* Bingdong Chang et al.: DREM: Infinite etch selectivity and optimized scallop size distribution with conventional photoresists in an adapted multiplexed Bosch DRIE process: https://doi.org/10.1016/j.mee.2018.01.034
			; Bingdong Chang et al.: DREM: Infinite etch selectivity and optimized scallop size distribution with conventional photoresists in an adapted multiplexed Bosch DRIE process
			: Microelectronic Engineering Volume 191, 5 May 2018, Pages 77-83
			: https://doi.org/10.1016/j.mee.2018.01.034
	* Bingdong Chang et al.: DREM2: a facile fabrication strategy for freestanding three dimensional silicon micro- and nanostructures by a modified Bosch etch process: https://doi.org/10.1088/1361-6439/aad0c4		* Bingdong Chang et al.: DREM2: a facile fabrication strategy for freestanding three dimensional silicon micro- and nanostructures by a modified Bosch etch process: https://doi.org/10.1088/1361-6439/aad0c4
	* Vy Thi Hoang Nguyen et al.: The CORE Sequence: A Nanoscale Fluorocarbon-Free Silicon Plasma Etch Process Based on SF6/O2 Cycles with Excellent 3D Profile Control at Room Temperature: https://doi.org/10.1149/2162-8777/ab61ed		* Vy Thi Hoang Nguyen et al.: The CORE Sequence: A Nanoscale Fluorocarbon-Free Silicon Plasma Etch Process Based on SF6/O2 Cycles with Excellent 3D Profile Control at Room Temperature: https://doi.org/10.1149/2162-8777/ab61ed

Jmli: /* New recipes */

2023-04-26T14:18:55Z

New recipes

← Older revision		Revision as of 16:18, 26 April 2023
Line 289:		Line 289:
	* Bingdong Chang et al.: DREM: Infinite etch selectivity and optimized scallop size distribution with conventional photoresists in an adapted multiplexed Bosch DRIE process: https://doi.org/10.1016/j.mee.2018.01.034		* Bingdong Chang et al.: DREM: Infinite etch selectivity and optimized scallop size distribution with conventional photoresists in an adapted multiplexed Bosch DRIE process: https://doi.org/10.1016/j.mee.2018.01.034
	* Bingdong Chang et al.: DREM2: a facile fabrication strategy for freestanding three dimensional silicon micro- and nanostructures by a modified Bosch etch process: https://doi.org/10.1088/1361-6439/aad0c4		* Bingdong Chang et al.: DREM2: a facile fabrication strategy for freestanding three dimensional silicon micro- and nanostructures by a modified Bosch etch process: https://doi.org/10.1088/1361-6439/aad0c4
	*~~[[Media:DREM2.pdf \| ]]~~		* Vy Thi Hoang Nguyen et al.: The CORE Sequence: A Nanoscale Fluorocarbon-Free Silicon Plasma Etch Process Based on SF6/O2 Cycles with Excellent 3D Profile Control at Room Temperature: https://doi.org/10.1149/2162-8777/ab61ed
	*[[Media:CORE1.pdf \| Vy Thi Hoang Nguyen et al.: The CORE Sequence: A Nanoscale Fluorocarbon-Free Silicon Plasma Etch Process Based on SF6/O2 Cycles with Excellent 3D Profile Control at Room Temperature ]]		* Bingdong Chang et al.: Large Area Three-Dimensional Photonic Crystal Membranes: Single-Run Fabrication and Applications with Embedded Planar Defects:
	*~~[[Media:3DnanoSi.pdf \|~~ Bingdong Chang et al.: Large Area Three-Dimensional Photonic Crystal Membranes: Single-Run Fabrication and Applications with Embedded Planar Defects]]		https://doi.org/10.1002/adom.201801176
	*[[Media:~~Grassfree1~~.~~pdf \|~~ Chantal Silvestre et al.: Deep reactive ion etching of ‘grass-free’ widely-spaced periodic 2D arrays, using sacrificial structures]]		* Chantal Silvestre et al.: Deep reactive ion etching of ‘grass-free’ widely-spaced periodic 2D arrays, using sacrificial structures: https://doi.org/10.1016/j.mee.2020.111228

			*[[Media:Grassfree1.pdf \| ]]

			*[[Media:3DnanoSi.pdf \| ]]
			*[[Media:CORE1.pdf \| ]]
	*[[Media:DREM1.pdf \| Bingdong Chang et al.: DREM: Infinite etch selectivity and optimized scallop size distribution with conventional photoresists in an adapted multiplexed Bosch DRIE process]]		*[[Media:DREM1.pdf \| Bingdong Chang et al.: DREM: Infinite etch selectivity and optimized scallop size distribution with conventional photoresists in an adapted multiplexed Bosch DRIE process]]

Jmli: /* New recipes */

2023-04-26T14:15:03Z

New recipes

← Older revision		Revision as of 16:15, 26 April 2023
Line 288:		Line 288:
	It was professor [https://www.dtu.dk/service/telefonbog/person?id=103402&cpid=191195&tab=1 Henri Jansen] at DTU Nanolab who came up with the idea of adding the Picoscope to the Pegasi tools. Since then his group has researched a lot into its possibilities. Below is a list of publications in which the Picoscope plays a crucial role:		It was professor [https://www.dtu.dk/service/telefonbog/person?id=103402&cpid=191195&tab=1 Henri Jansen] at DTU Nanolab who came up with the idea of adding the Picoscope to the Pegasi tools. Since then his group has researched a lot into its possibilities. Below is a list of publications in which the Picoscope plays a crucial role:
	* Bingdong Chang et al.: DREM: Infinite etch selectivity and optimized scallop size distribution with conventional photoresists in an adapted multiplexed Bosch DRIE process: https://doi.org/10.1016/j.mee.2018.01.034		* Bingdong Chang et al.: DREM: Infinite etch selectivity and optimized scallop size distribution with conventional photoresists in an adapted multiplexed Bosch DRIE process: https://doi.org/10.1016/j.mee.2018.01.034
	*~~[[Media:DREM1.pdf \| Bingdong Chang et al.: DREM: Infinite etch selectivity and optimized scallop size distribution with conventional photoresists in an adapted multiplexed Bosch DRIE process]]~~		* Bingdong Chang et al.: DREM2: a facile fabrication strategy for freestanding three dimensional silicon micro- and nanostructures by a modified Bosch etch process: https://doi.org/10.1088/1361-6439/aad0c4
	*[[Media:DREM2.pdf \| Bingdong Chang et al.: DREM2: a facile fabrication strategy for freestanding three dimensional silicon micro- and nanostructures by a modified Bosch etch process]]		*[[Media:DREM2.pdf \| ]]
	*[[Media:CORE1.pdf \| Vy Thi Hoang Nguyen et al.: The CORE Sequence: A Nanoscale Fluorocarbon-Free Silicon Plasma Etch Process Based on SF6/O2 Cycles with Excellent 3D Profile Control at Room Temperature ]]		*[[Media:CORE1.pdf \| Vy Thi Hoang Nguyen et al.: The CORE Sequence: A Nanoscale Fluorocarbon-Free Silicon Plasma Etch Process Based on SF6/O2 Cycles with Excellent 3D Profile Control at Room Temperature ]]
	*[[Media:3DnanoSi.pdf \| Bingdong Chang et al.: Large Area Three-Dimensional Photonic Crystal Membranes: Single-Run Fabrication and Applications with Embedded Planar Defects]]		*[[Media:3DnanoSi.pdf \| Bingdong Chang et al.: Large Area Three-Dimensional Photonic Crystal Membranes: Single-Run Fabrication and Applications with Embedded Planar Defects]]
	*[[Media:Grassfree1.pdf \| Chantal Silvestre et al.: Deep reactive ion etching of ‘grass-free’ widely-spaced periodic 2D arrays, using sacrificial structures]]		*[[Media:Grassfree1.pdf \| Chantal Silvestre et al.: Deep reactive ion etching of ‘grass-free’ widely-spaced periodic 2D arrays, using sacrificial structures]]

			*[[Media:DREM1.pdf \| Bingdong Chang et al.: DREM: Infinite etch selectivity and optimized scallop size distribution with conventional photoresists in an adapted multiplexed Bosch DRIE process]]

← Older revision		Revision as of 16:15, 26 April 2023
Line 288:		Line 288:
	It was professor [https://www.dtu.dk/service/telefonbog/person?id=103402&cpid=191195&tab=1 Henri Jansen] at DTU Nanolab who came up with the idea of adding the Picoscope to the Pegasi tools. Since then his group has researched a lot into its possibilities. Below is a list of publications in which the Picoscope plays a crucial role:		It was professor [https://www.dtu.dk/service/telefonbog/person?id=103402&cpid=191195&tab=1 Henri Jansen] at DTU Nanolab who came up with the idea of adding the Picoscope to the Pegasi tools. Since then his group has researched a lot into its possibilities. Below is a list of publications in which the Picoscope plays a crucial role:
	* Bingdong Chang et al.: DREM: Infinite etch selectivity and optimized scallop size distribution with conventional photoresists in an adapted multiplexed Bosch DRIE process: https://doi.org/10.1016/j.mee.2018.01.034		* Bingdong Chang et al.: DREM: Infinite etch selectivity and optimized scallop size distribution with conventional photoresists in an adapted multiplexed Bosch DRIE process: https://doi.org/10.1016/j.mee.2018.01.034
	*~~[[Media:DREM1.pdf \| Bingdong Chang et al.: DREM: Infinite etch selectivity and optimized scallop size distribution with conventional photoresists in an adapted multiplexed Bosch DRIE process]]~~		* Bingdong Chang et al.: DREM2: a facile fabrication strategy for freestanding three dimensional silicon micro- and nanostructures by a modified Bosch etch process: https://doi.org/10.1088/1361-6439/aad0c4
	*[[Media:DREM2.pdf \| Bingdong Chang et al.: DREM2: a facile fabrication strategy for freestanding three dimensional silicon micro- and nanostructures by a modified Bosch etch process]]		*[[Media:DREM2.pdf \| ]]
	*[[Media:CORE1.pdf \| Vy Thi Hoang Nguyen et al.: The CORE Sequence: A Nanoscale Fluorocarbon-Free Silicon Plasma Etch Process Based on SF6/O2 Cycles with Excellent 3D Profile Control at Room Temperature ]]		*[[Media:CORE1.pdf \| Vy Thi Hoang Nguyen et al.: The CORE Sequence: A Nanoscale Fluorocarbon-Free Silicon Plasma Etch Process Based on SF6/O2 Cycles with Excellent 3D Profile Control at Room Temperature ]]
	*[[Media:3DnanoSi.pdf \| Bingdong Chang et al.: Large Area Three-Dimensional Photonic Crystal Membranes: Single-Run Fabrication and Applications with Embedded Planar Defects]]		*[[Media:3DnanoSi.pdf \| Bingdong Chang et al.: Large Area Three-Dimensional Photonic Crystal Membranes: Single-Run Fabrication and Applications with Embedded Planar Defects]]
	*[[Media:Grassfree1.pdf \| Chantal Silvestre et al.: Deep reactive ion etching of ‘grass-free’ widely-spaced periodic 2D arrays, using sacrificial structures]]		*[[Media:Grassfree1.pdf \| Chantal Silvestre et al.: Deep reactive ion etching of ‘grass-free’ widely-spaced periodic 2D arrays, using sacrificial structures]]

			*[[Media:DREM1.pdf \| Bingdong Chang et al.: DREM: Infinite etch selectivity and optimized scallop size distribution with conventional photoresists in an adapted multiplexed Bosch DRIE process]]