Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano12 - Revision history

Jmli at 08:27, 4 September 2025

2025-09-04T08:27:22Z

← Older revision		Revision as of 10:27, 4 September 2025
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	<!--Checked for updates on 30/7-2018 - ok/jmli -->		<!--Checked for updates on 30/7-2018 - ok/jmli -->
	<!--Checked for updates on 5/10-2020 - ok/jmli -->		<!--Checked for updates on 5/10-2020 - ok/jmli -->
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	== The nano1.2 recipe ==		== The nano1.2 recipe ==
	{{Template:Author-jmli1}}		{{Template:Author-jmli1}}

2023-02-02T14:17:35Z

The nano1.2 recipe

← Older revision		Revision as of 16:17, 2 February 2023
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	== The nano1.2 recipe ==		== The nano1.2 recipe ==
			{{Template:Author-jmli1}}
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	{\| border="2" cellpadding="2" cellspacing="1"		{\| border="2" cellpadding="2" cellspacing="1"

2020-10-05T06:29:56Z

← Older revision		Revision as of 08:29, 5 October 2020
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	'''Feedback to this page''': '''[mailto:labadviser@~~danchip~~.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.~~danchip~~.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/nanoetch/nano12 click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/nanoetch/nano12 click here]'''
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	== The nano1.2 recipe ==		== The nano1.2 recipe ==

2018-07-30T11:42:15Z

← Older revision		Revision as of 13:42, 30 July 2018
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	'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/nanoetch/nano12 click here]'''		'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/nanoetch/nano12 click here]'''
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	== The nano1.2 recipe ==		== The nano1.2 recipe ==

2016-02-03T14:25:24Z

← Older revision		Revision as of 16:25, 3 February 2016
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	'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/nanoetch/nano12 click here]'''		'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/nanoetch/nano12 click here]'''
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2013-10-22T10:34:07Z

← Older revision		Revision as of 12:34, 22 October 2013
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			'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/nanoetch/nano12 click here]'''


	== The nano1.2 recipe ==		== The nano1.2 recipe ==

2011-05-10T12:35:01Z

The nano1.2 recipe

← Older revision		Revision as of 14:35, 10 May 2011
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	\| align="center" style="background:#f0f0f0;"\|'''Std'''		\| align="center" style="background:#f0f0f0;"\|'''Std'''
	\|-		\|-
	\| ER\|\|nm/min\|\|241\|\|285\|\|307\|\|325\|\|335\|\|299\|\|37		\| Etch rates\|\|nm/min\|\|241\|\|285\|\|307\|\|325\|\|335\|\|299\|\|37
	\|-		\|-
	\| SA\|\|degs\|\|92\|\|92\|\|92\|\|91\|\|91\|\|92\|\|0		\| Sidewall angle \|\|degs\|\|92\|\|92\|\|92\|\|91\|\|91\|\|92\|\|0
	\|-		\|-
	\| ~~base~~\|\|nm/edge\|\|-5\|\|-8\|\|-18\|\|-18\|\|-34\|\|-17\|\|11		\| CD loss \|\|nm/edge\|\|-5\|\|-8\|\|-18\|\|-18\|\|-34\|\|-17\|\|11
	\|-		\|-
	\| foot\|\|nm/edge\|\|-5\|\|-8\|\|-18\|\|-18\|\|-4\|\|-10\|\|7		\| CD loss foot\|\|nm/edge\|\|-5\|\|-8\|\|-18\|\|-18\|\|-4\|\|-10\|\|7
	\|-		\|-
	\| Bowing\|\|\|\|19\|\|11\|\|11\|\|14\|\|10\|\|13\|\|4		\| Bowing\|\|\|\|19\|\|11\|\|11\|\|14\|\|10\|\|13\|\|4
	\|-		\|-
	\| ~~Curve~~\|\|\|\|-48\|\|-46\|\|-43\|\|-40\|\|-40\|\|-44\|\|4		\| Curvature \|\|\|\|-48\|\|-46\|\|-43\|\|-40\|\|-40\|\|-44\|\|4
	\|-		\|-
	\| ~~zep~~\|\|nm/min\|\|\|\|\|\|\|\|\|\|\|\|95\|\|		\| Zep etch rate\|\|nm/min\|\|\|\|\|\|\|\|\|\|\|\|95\|\|
	\|-		\|-
	\|		\|

2011-05-10T11:51:57Z

The nano1.2 recipe

@@ Line 44: / Line 44: @@
 C4F8 52 sccm, SF6 38 sccm, 4 mTorr, Strike 3 secs @ 15 mTorr, 800 W CP, 50 W PP, -10 degs, 120 secs
 </gallery>
 == Comments ==
 Lower temperature certainly looks like a step in the right direction.  Confirms that the process was too etch aggressive previously, hence the isotropic profiles.

2011-05-04T13:23:48Z

The nano1.2 recipe

← Older revision		Revision as of 15:23, 4 May 2011
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	\|-		\|-
	\| Mask		\| Mask
	\| ~~1dfhj10~~ nm zep etched down to ~~6dgh4~~ nm		\| 343 nm zep etched down to 154 nm
	\|-		\|-
	\|}		\|}
Line 44:		Line 44:
	C4F8 52 sccm, SF6 38 sccm, 4 mTorr, Strike 3 secs @ 15 mTorr, 800 W CP, 50 W PP, -10 degs, 120 secs		C4F8 52 sccm, SF6 38 sccm, 4 mTorr, Strike 3 secs @ 15 mTorr, 800 W CP, 50 W PP, -10 degs, 120 secs
	</gallery>		</gallery>


	== Comments ==		== Comments ==

	Lower temperature certainly looks like a step in the right direction. Confirms that the process was too etch aggressive previously, hence the isotropic profiles.		Lower temperature certainly looks like a step in the right direction. Confirms that the process was too etch aggressive previously, hence the isotropic profiles.

2011-03-31T07:44:11Z

The nano1.2 recipe

← Older revision		Revision as of 09:44, 31 March 2011
Line 44:		Line 44:
	C4F8 52 sccm, SF6 38 sccm, 4 mTorr, Strike 3 secs @ 15 mTorr, 800 W CP, 50 W PP, -10 degs, 120 secs		C4F8 52 sccm, SF6 38 sccm, 4 mTorr, Strike 3 secs @ 15 mTorr, 800 W CP, 50 W PP, -10 degs, 120 secs
	</gallery>		</gallery>


			== Comments ==

			Lower temperature certainly looks like a step in the right direction. Confirms that the process was too etch aggressive previously, hence the isotropic profiles.