Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano11 - Revision history

Jmli at 10:00, 4 September 2025

2025-09-04T10:00:52Z

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2023-06-28T10:32:35Z

← Older revision		Revision as of 12:32, 28 June 2023
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	== The nano1.1 recipe ==		== The nano1.1 recipe ==

2020-10-05T06:30:24Z

← Older revision		Revision as of 08:30, 5 October 2020
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	'''Feedback to this page''': '''[mailto:labadviser@~~danchip~~.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.~~danchip~~.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/nanoetch/nano11 click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/nanoetch/nano11 click here]'''
	<!--Checked for updates on 30/7-2018 - ok/jmli -->		<!--Checked for updates on 30/7-2018 - ok/jmli -->
			<!--Checked for updates on 5/10-2020 - ok/jmli -->

	== The nano1.1 recipe ==		== The nano1.1 recipe ==

2018-07-30T11:41:51Z

← Older revision		Revision as of 13:41, 30 July 2018
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	'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/nanoetch/nano11 click here]'''		'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/nanoetch/nano11 click here]'''
	<!--Checked for updates on 3/2-~~2016~~ - ok/jmli -->		<!--Checked for updates on 30/7-2018 - ok/jmli -->


	== The nano1.1 recipe ==		== The nano1.1 recipe ==

2016-02-03T14:25:14Z

← Older revision		Revision as of 16:25, 3 February 2016
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	'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/nanoetch/nano11 click here]'''		'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/nanoetch/nano11 click here]'''
			<!--Checked for updates on 3/2-2016 - ok/jmli -->

2013-10-22T10:33:49Z

← Older revision		Revision as of 12:33, 22 October 2013
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			'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/nanoetch/nano11 click here]'''


	== The nano1.1 recipe ==		== The nano1.1 recipe ==

2011-05-10T12:34:07Z

The nano1.1 recipe

← Older revision		Revision as of 14:34, 10 May 2011
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	\| align="center" style="background:#f0f0f0;"\|'''Std'''		\| align="center" style="background:#f0f0f0;"\|'''Std'''
	\|-		\|-
	\| ER\|\|nm/min\|\|183\|\|218\|\|232\|\|249\|\|256\|\|228\|\|29		\| Etch rates\|\|nm/min\|\|183\|\|218\|\|232\|\|249\|\|256\|\|228\|\|29
	\|-		\|-
	\| SA\|\|degs\|\|95\|\|94\|\|94\|\|93\|\|93\|\|94\|\|1		\| Sidewall angle\|\|degs\|\|95\|\|94\|\|94\|\|93\|\|93\|\|94\|\|1
	\|-		\|-
	\| ~~base~~\|\|nm/edge\|\|-2\|\|-4\|\|-16\|\|-15\|\|-27\|\|-13\|\|10		\| Cd loss \|\|nm/edge\|\|-2\|\|-4\|\|-16\|\|-15\|\|-27\|\|-13\|\|10
	\|-		\|-
	\| foot\|\|nm/edge\|\|-2\|\|-4\|\|-16\|\|-15\|\|3\|\|-7\|\|9		\| CD loss foot\|\|nm/edge\|\|-2\|\|-4\|\|-16\|\|-15\|\|3\|\|-7\|\|9
	\|-		\|-
	\| Bowing\|\|\|\|36\|\|40\|\|49\|\|48\|\|40\|\|42\|\|6		\| Bowing\|\|\|\|36\|\|40\|\|49\|\|48\|\|40\|\|42\|\|6
	\|-		\|-
	\| ~~Curve~~\|\|\|\|-55\|\|-50\|\|-39\|\|-39\|\|-42\|\|-45\|\|7		\| Curvature\|\|\|\|-55\|\|-50\|\|-39\|\|-39\|\|-42\|\|-45\|\|7
	\|-		\|-
	\| zep\|\|nm/min\|\|\|\|\|\|\|\|\|\|\|\|172\|\|		\| zep\|\|nm/min\|\|\|\|\|\|\|\|\|\|\|\|172\|\|

2011-05-10T11:51:23Z

The nano1.1 recipe

@@ Line 45: / Line 45: @@
 </gallery>
 == Comments ==
 The lower coil power run may still be isotropic-looking either because of a lack of deposition in the process, or because the bias increases as the coil power is decreased, hence the wafer would have received a more phyisically-aggressive process.  Lower temp, lower coil + lower platen may be worth a look.

2011-03-31T07:44:57Z

The nano1.1 recipe

← Older revision		Revision as of 09:44, 31 March 2011
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	C4F8 52 sccm, SF6 38 sccm, 4 mTorr, Strike 3 secs @ 15 mTorr, 600 W CP, 50 W PP, 10 degs, 120 secs		C4F8 52 sccm, SF6 38 sccm, 4 mTorr, Strike 3 secs @ 15 mTorr, 600 W CP, 50 W PP, 10 degs, 120 secs
	</gallery>		</gallery>


			== Comments ==

			The lower coil power run may still be isotropic-looking either because of a lack of deposition in the process, or because the bias increases as the coil power is decreased, hence the wafer would have received a more phyisically-aggressive process. Lower temp, lower coil + lower platen may be worth a look.

2011-03-28T09:35:34Z

The nano1.1 recipe

← Older revision		Revision as of 11:35, 28 March 2011
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	<gallery caption="The results of the nano1.0 recipe" widths="250" heights="200" perrow="3">		<gallery caption="The results of the nano1.1 recipe" widths="250" heights="200" perrow="3">
	image:WF_2C4_feb2011_030.jpg \|The 30 nm trenches		image:WF_2C4_feb2011_030.jpg \|The 30 nm trenches
	image:WF_2C4_feb2011_060.jpg\|The 60 nm trenches		image:WF_2C4_feb2011_060.jpg\|The 60 nm trenches