Specific Process Knowledge/Etch/DRIE-Pegasus/StandardRecipes - Revision history

Jmli at 08:28, 4 September 2025

2025-09-04T08:28:28Z

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	== Overview of the standard processes: Processes A, B, C, D and SOI ==		== Overview of the standard processes: Processes A, B, C, D and SOI ==

Jmli at 14:39, 2 February 2023

2023-02-02T14:39:22Z

← Older revision		Revision as of 16:39, 2 February 2023
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	== Overview of the standard processes: Processes A, B, C, D and SOI ==		== Overview of the standard processes: Processes A, B, C, D and SOI ==
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	The instrument was accepted on the basis of the performance of 5 processes. Below is a general comparison - to find more detailed information, go the web page for each process		The instrument was accepted on the basis of the performance of 5 processes. Below is a general comparison - to find more detailed information, go the web page for each process

Jmli at 07:01, 5 October 2020

2020-10-05T07:01:54Z

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	[mailto:~~plasma~~@~~danchip~~.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.~~danchip~~.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/StandardRecipes click here]'''		[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/StandardRecipes click here]'''
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	== Overview of the standard processes: Processes A, B, C, D and SOI ==		== Overview of the standard processes: Processes A, B, C, D and SOI ==

Jmli at 11:44, 30 July 2018

2018-07-30T11:44:35Z

← Older revision		Revision as of 13:44, 30 July 2018
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	== Overview of the standard processes: Processes A, B, C, D and SOI ==		== Overview of the standard processes: Processes A, B, C, D and SOI ==

Jmli at 15:16, 3 February 2016

2016-02-03T15:16:39Z

← Older revision		Revision as of 17:16, 3 February 2016
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	'''Feedback to this page:		'''Feedback to this page:
	[mailto:plasma@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/StandardRecipes click here]'''		[mailto:plasma@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/StandardRecipes click here]'''
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	== Overview of the standard processes: Processes A, B, C, D and SOI ==		== Overview of the standard processes: Processes A, B, C, D and SOI ==

Jmli: /* Overview of the standard processes: Processes A, B, C, D and SOI */

2016-02-03T15:15:05Z

Overview of the standard processes: Processes A, B, C, D and SOI

@@ Line 38: / Line 38: @@
+|
 |-
-|}
+! [[Specific Process Knowledge/Etch/DRIE-Pegasus/processC|Process C]]
+| Continuous
+| Very slow etch
+| 50 nm posts
+| Aluminum
+| 99.9 % on 4" wafer
-{| border="2" cellspacing="0" cellpadding="2"
+|
 |-
-!style="background:silver; color:black;" align="center"|Purpose
+! [[Specific Process Knowledge/Etch/DRIE-Pegasus/processD|Process D]]
-|style="background:LightGrey; color:black"|
+| Bosch
-|style="background:WhiteSmoke; color:black"|
+| Smooth sidewall etch
-*Purpose 1
+| 10 µm trench
-*Purpose 2
+| Photo resist
-|style="background:WhiteSmoke; color:black"|
+| 50 % on 6" wafer
-*Purpose 1
-*Purpose 2
 |-
 |}

Jmli at 10:01, 22 October 2013

2013-10-22T10:01:18Z

← Older revision		Revision as of 12:01, 22 October 2013
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			'''Feedback to this page:
			[mailto:plasma@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/StandardRecipes click here]'''

	== Overview of the standard processes: Processes A, B, C, D and SOI ==		== Overview of the standard processes: Processes A, B, C, D and SOI ==

Jml: /* Overview of the standard processes: Processes A, B, C, D and SOI */

2012-11-26T10:56:19Z

Overview of the standard processes: Processes A, B, C, D and SOI

@@ Line 35: / Line 35: @@
+|
 |-
 |}

Jml: Created page with "== Overview of the standard processes: Processes A, B, C, D and SOI == The instrument was accepted on the basis of the performance of 5 processes. Below is a general compari..."

2012-11-26T10:54:41Z

Created page with "== Overview of the standard processes: Processes A, B, C, D and SOI == The instrument was accepted on the basis of the performance of 5 processes. Below is a general compari..."

New page

== Overview of the standard processes: Processes A, B, C, D and SOI ==

The instrument was accepted on the basis of the performance of 5 processes. Below is a general comparison - to find more detailed information, go the web page for each process

{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;"
|+ '''Standard processes on the DRIE-Pegasus'''
|-
! rowspan="2" | Process name
! rowspan="2" | Type
! rowspan="2" | Purpose
! colspan="4" | Conditions during original runs
! rowspan="2" | Best usage
|-
! width="120" | Feature
! width="120" | Mask material
! width="120" | Etch load
! width="120" | Comments
|-
! [[Specific Process Knowledge/Etch/DRIE-Pegasus/processA|Process A]]
| Bosch
| Fast etch
| 80 µm trench
| Photo resist
| 12-13 % on 6" wafer
|
|
|-
! [[Specific Process Knowledge/Etch/DRIE-Pegasus/processB|Process B]]
| Bosch
| Fast etch
| 30 µm diameter via
| Photo resist
| 12-13 % on 6" wafer
|
|
|-
|}