Specific Process Knowledge/Etch/DRIE-Pegasus/SOIetch - Revision history

Jmli at 08:25, 4 September 2025

2025-09-04T08:25:04Z

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2023-02-02T13:44:33Z

← Older revision		Revision as of 15:44, 2 February 2023
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	== SOI ==		== SOI ==
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2020-10-02T13:16:54Z

← Older revision		Revision as of 15:16, 2 October 2020
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	'''Feedback to this page''': '''[mailto:labadviser@~~danchip~~.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.~~danchip~~.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/SOIetch click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/SOIetch click here]'''
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2020-10-02T13:11:32Z

← Older revision		Revision as of 15:11, 2 October 2020
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	'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/SOIetch click here]'''		'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/SOIetch click here]'''
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	== SOI ==		== SOI ==

2018-05-14T08:57:41Z

← Older revision		Revision as of 10:57, 14 May 2018
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	'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/SOIetch click here]'''		'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/SOIetch click here]'''
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	== SOI ==		== SOI ==

2016-06-03T07:42:41Z

SOI etch

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 '''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/SOIetch click here]'''
-== SOI etch ==
+== SOI ==
 The SOI etch uses the Low frequency (LF) platen generator to minimize the notching at buried stop layers such as the BOX layer in a SOI wafer.

2014-04-30T11:57:53Z

SOI etch

← Older revision		Revision as of 13:57, 30 April 2014
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	The SOI etch uses the Low frequency (LF) platen generator to minimize the notching at buried stop layers such as the BOX layer in a SOI wafer.		The SOI etch uses the Low frequency (LF) platen generator to minimize the notching at buried stop layers such as the BOX layer in a SOI wafer.


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2014-04-30T11:57:28Z

SOI etch

← Older revision		Revision as of 13:57, 30 April 2014
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	The SOI etch uses the Low frequency (LF) platen generator to minimize the notching at buried stop layers such as the BOX layer in a SOI wafer.		The SOI etch uses the Low frequency (LF) platen generator to minimize the notching at buried stop layers such as the BOX layer in a SOI wafer.


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2013-10-03T14:30:35Z

← Older revision		Revision as of 16:30, 3 October 2013
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			'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/SOIetch click here]'''

	== SOI etch ==		== SOI etch ==

2012-11-26T11:03:10Z

← Older revision		Revision as of 13:03, 26 November 2012
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			== SOI etch ==

			The SOI etch uses the Low frequency (LF) platen generator to minimize the notching at buried stop layers such as the BOX layer in a SOI wafer.

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	\|+ '''SOI etch specifications'''		\|+ '''SOI etch specifications'''