Specific Process Knowledge/Etch/DRIE-Pegasus/DUVetch/polySOI10 - Revision history

Jmli at 09:58, 4 September 2025

2025-09-04T09:58:50Z

← Older revision		Revision as of 11:58, 4 September 2025
Line 4:		Line 4:
	<!--Checked for updates on 5/10-2020 - ok/jmli -->		<!--Checked for updates on 5/10-2020 - ok/jmli -->
	<!--Checked for updates on 28/6-2023 - ok/jmli -->		<!--Checked for updates on 28/6-2023 - ok/jmli -->
			<!--Checked for updates on 4/9-2025 - ok/jmli -->
	{{contentbydryetch}}		{{contentbydryetch}}

Jmli at 10:34, 28 June 2023

2023-06-28T10:34:15Z

← Older revision		Revision as of 12:34, 28 June 2023
Line 3:		Line 3:
	<!--Checked for updates on 30/7-2018 - ok/jmli -->		<!--Checked for updates on 30/7-2018 - ok/jmli -->
	<!--Checked for updates on 5/10-2020 - ok/jmli -->		<!--Checked for updates on 5/10-2020 - ok/jmli -->
			<!--Checked for updates on 28/6-2023 - ok/jmli -->

			{{contentbydryetch}}

	{\| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"		{\| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"

Jmli at 06:50, 5 October 2020

2020-10-05T06:50:19Z

← Older revision		Revision as of 08:50, 5 October 2020
Line 1:		Line 1:
			'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/nanoetch click here]'''

	<!--Checked for updates on 30/7-2018 - ok/jmli -->		<!--Checked for updates on 30/7-2018 - ok/jmli -->
			<!--Checked for updates on 5/10-2020 - ok/jmli -->

	{\| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"		{\| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"

Jmli at 11:50, 30 July 2018

2018-07-30T11:50:12Z

← Older revision		Revision as of 13:50, 30 July 2018
Line 1:		Line 1:
			<!--Checked for updates on 30/7-2018 - ok/jmli -->


	{\| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"		{\| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"

Jmli at 09:53, 2 June 2016

2016-06-02T09:53:36Z

@@ Line 90: / Line 90: @@
 [[file:S004031-02.jpg |120px|frameless ]]
 [[file:S004031-03.jpg |120px|frameless ]]
 |-
 | 28/8-2014

Jmli at 09:51, 2 June 2016

2016-06-02T09:51:18Z

← Older revision		Revision as of 11:51, 2 June 2016
Line 1:		Line 1:

			{\| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"
			\|+ '''Process runs'''
			\|-
			! rowspan="2" width="40"\| Date
			! colspan="4" width="120"\| Substrate Information
			! colspan="4" \| Process Information
			! rowspan="2" width="500" \|SEM Images
			\|-
			! width="30" \| Wafer info
			! width="40" \| Mask
			! width="40" \| Material/ Exposed area
			! width="40" \| Tool / Operator
			! width="40" \| Conditioning
			! width="40" \| Recipe
			! width="40" \| Wafer ID
			! width="40" \| Comments
			\|-
			\| 6/5-2013
			\| 1/4 1/4 6" ELK stitching 11/1-2013 CB on oxide carrier
			\| standard stepper mask (50 nm barc + 320 nm krf)
			\| Si / 50%+
			\| Pegasus / jmli
			\| 3min TDESC clean + 30 sec barc etch
			\| polySOI5 , 50 cycles or 6:15 minutes
			\| S003472
			\|
			\|
			[[File:S003472-1.jpg\|120px\|frameless ]]
			[[File:S003472-2.jpg\|120px\|frameless ]]
			[[File:S003472-3.jpg\|120px\|frameless ]]
			[[File:S003472-4.jpg\|120px\|frameless ]]
			[[File:S003472-5.jpg\|120px\|frameless ]]
			[[File:S003472-6.jpg\|120px\|frameless ]]
			[[File:S003472-7.jpg\|120px\|frameless ]]
			\|-
			\| 16/7-2013
			\| 1/4 6" ELK stitching 11/1-2013 CB on oxide carrier
			\| standard stepper mask (50 nm barc + 320 nm krf)
			\| Si / 50%+
			\| Pegasus/jmli
			\| 3 minute TDESC clean + 30 second barc etch
			\| jml/SOI3/polySOI-10: 50 cycles or 6:15 minutes
			\| S003614
			\| lsh: c4f8 etch -> 20
			\|
			[[file:Peg-S003614_06.jpg \|120px\|frameless ]]
			[[file:Peg-S003614_07.jpg \|120px\|frameless ]]
			[[file:Peg-S003614_08.jpg \|120px\|frameless ]]
			[[file:Peg-S003614_09.jpg \|120px\|frameless ]]
			[[file:Peg-S003614_10.jpg \|120px\|frameless ]]
			[[file:Peg-S003614_11.jpg \|120px\|frameless ]]
			\|-
			\| 23/8-2013
			\| 1/4 6" tigre 400 nm pitch pattern CB on oxide carrier
			\| standard stepper mask (50 nm barc + 320 nm krf)
			\| Si / 50 % in 20*20 mm squares
			\| Pegasus / jmli
			\| 10 minute TDESC clean + 30 second barc etch
			\| jml/SOI3/polySOI-10: 100 cycles or 12:30 minutes
			\| S003695
			\|
			\|
			[[file:S03695-01.jpg \|120px\|frameless ]]
			[[file:S03695-02.jpg \|120px\|frameless ]]
			[[file:S03695-03.jpg \|120px\|frameless ]]
			[[file:S03695-04.jpg \|120px\|frameless ]]
			[[file:S03695-05.jpg \|120px\|frameless ]]
			[[file:S03695-06.jpg \|120px\|frameless ]]
			[[file:S03695-07.jpg \|120px\|frameless ]]
			\|-
			\| 15/5-2014
			\| 6" DUV Lithography test pattern
			\| standard stepper mask (50 nm barc + 320 nm krf)
			\| Si / 50 % in 20*20 mm squares
			\| Pegasus / jmli
			\| 10 minute TDESC clean + 30 second barc etch
			\| jml/SOI3/polySOI-10: 50 cycles or 6:15 minutes + 2 mins gentle PR strip
			\| S004031
			\|
			\|

			[[file:S004031-04.jpg \|120px\|frameless ]]
			[[file:S004031-edge-05.jpg \|120px\|frameless ]]
			[[file:S004031-edge-06.jpg \|120px\|frameless ]]
			[[file:S004031-edge-07.jpg \|120px\|frameless ]]
			[[file:S004031-edge-08.jpg \|120px\|frameless ]]
			[[file:S004031-edge-09.jpg \|120px\|frameless ]]
			[[file:S004031-01.jpg \|120px\|frameless ]]
			[[file:S004031-02.jpg \|120px\|frameless ]]
			[[file:S004031-03.jpg \|120px\|frameless ]]
			\|-
			! colspan="10" \| [[Main Page/Process Logs/jmli/Pegasus/SOI/polySOI10-b \| Later runs of this recipe]]
			\|-
			\|}







	{\| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"		{\| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"
	\|+ '''Process runs'''		\|+ '''Process runs'''

Jmli at 09:43, 2 June 2016

2016-06-02T09:43:25Z

← Older revision		Revision as of 11:43, 2 June 2016
Line 15:		Line 15:
	! width="40" \| Wafer ID		! width="40" \| Wafer ID
	! width="40" \| Comments		! width="40" \| Comments
	\|-
	~~! colspan="10" \| [[Main Page/Process Logs/jmli/Pegasus/SOI/polySOI10 \| Previous runs of this recipe]]~~
	\|-		\|-
	\| 28/8-2014		\| 28/8-2014

Jmli: Created page with "{| border="2" cellpadding="0" cellspacing="0" style="text-align:center;" |+ '''Process runs''' |- ! rowspan="2" width="40"| Date ! colspan="4" width="120"| Substrate Informati..."

2016-06-02T09:43:08Z

Created page with "{| border="2" cellpadding="0" cellspacing="0" style="text-align:center;" |+ '''Process runs''' |- ! rowspan="2" width="40"| Date ! colspan="4" width="120"| Substrate Informati..."

New page

{| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"
|+ '''Process runs'''
|-
! rowspan="2" width="40"| Date
! colspan="4" width="120"| Substrate Information
! colspan="4" | Process Information
! rowspan="2" width="500" |SEM Images
|-
! width="30" | Wafer info
! width="40" | Mask
! width="40" | Material/ Exposed area
! width="40" | Tool / Operator
! width="40" | Conditioning
! width="40" | Recipe
! width="40" | Wafer ID
! width="40" | Comments
|-
! colspan="10" | [[Main Page/Process Logs/jmli/Pegasus/SOI/polySOI10 | Previous runs of this recipe]]
|-
| 28/8-2014
| 6" DUVboxA wafer
| standard stepper mask (50 nm barc + 320 nm krf)
| Si / 50%+
| Pegasus / jmli
| 30 sec barc etch
| SOI4\polySOI-10 , 70 cycles or 8:45 minutes
| S004289
|
|
[[File:pegS004283-03.jpg|120px|frameless ]]
[[File:pegS004283-04.jpg|120px|frameless ]]
[[File:pegS004283-05.jpg|120px|frameless ]]
[[File:pegS004283edge06.jpg|120px|frameless ]]
[[File:pegS004283edge07.jpg|120px|frameless ]]
[[File:pegS004283-01.jpg|120px|frameless ]]
[[File:pegS004283-02.jpg|120px|frameless ]]
|-
| 28/8-2014
| 6" DUVboxB wafer
| Si/200nm Oxide/1800 nm poly / standard stepper mask (50 nm barc + 320 nm krf)
| poly / 50%+
| Pegasus / jmli
| 75 sec barc etch
| SOI4\polySOI-10 , 20 cycles or 2:30 minutes
| S004289
|
|

[[File:pegS00428904.jpg|120px|frameless ]]
[[File:pegS00428905.jpg|120px|frameless ]]
[[File:pegS00428906.jpg|120px|frameless ]]
[[File:pegS00428901.jpg|120px|frameless ]]
[[File:pegS00428903.jpg|120px|frameless ]]

|-

| 28/8-2014
| 6" DUVboxB wafer
| Si/200nm Oxide/1800 nm poly / standard stepper mask (50 nm barc + 320 nm krf)
| poly / 50%+
| Pegasus / jmli
| 0 sec barc etch
| SOI4\polySOI-10 , 30 + 10 cycles or 5:00 minutes
| S004291 (two processes)
| S004289 reprocessed, probably overetched -> no spikes
|
[[File:S004291-03.jpg|120px|frameless ]]
[[File:S004291-04.jpg|120px|frameless ]]
[[File:S004291-05.jpg|120px|frameless ]]
[[File:S004291-06.jpg|120px|frameless ]]
[[File:S004291-07.jpg|120px|frameless ]]
[[File:S004291-01.jpg|120px|frameless ]]
[[File:S004291-02.jpg|120px|frameless ]]

|-

|}