Specific Process Knowledge/Etch/DRIE-Pegasus/DUVetch - Revision history

Jmli at 06:37, 4 April 2025

2025-04-04T06:37:25Z

← Older revision		Revision as of 08:37, 4 April 2025
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	<!--Checked for updates on 14/5-2018 - ok/jmli -->		<!--Checked for updates on 14/5-2018 - ok/jmli -->
	<!--Checked for updates on 24/8-2021. ok/ jmli-->		<!--Checked for updates on 24/8-2021. ok/ jmli-->
			<!--Checked for updates on 4/4-2025 - ok/jmli -->

	== Etch processes designed for stepper resists ==		== Etch processes designed for stepper resists ==

2021-08-24T14:14:10Z

← Older revision		Revision as of 16:14, 24 August 2021
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	'''Feedback to this page''': '''[mailto:labadviser@~~danchip~~.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.~~danchip~~.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/DUVetch click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/DUVetch click here]'''
	<!--Checked for updates on 14/5-2018 - ok/jmli -->		<!--Checked for updates on 14/5-2018 - ok/jmli -->
			<!--Checked for updates on 24/8-2021. ok/ jmli-->

	== Etch processes designed for stepper resists ==		== Etch processes designed for stepper resists ==

2019-06-25T13:26:48Z

With units

← Older revision		Revision as of 15:26, 25 June 2019
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	\| rowspan="2" \| [[Specific Process Knowledge/Etch/DRIE-Pegasus/Parameters#Hardware \| HW]]		\| rowspan="2" \| [[Specific Process Knowledge/Etch/DRIE-Pegasus/Parameters#Hardware \| HW]]
	! width="40" rowspan="2" \| Runs		! width="40" rowspan="2" \| Runs
	! width="300" \| Key words		! width="300" rowspan="2" \| Key words
	\|-		\|-
	\| degs		\| degs

2019-06-25T13:26:06Z

With units

← Older revision		Revision as of 15:26, 25 June 2019
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	\|+ '''Process parameters'''		\|+ '''Process parameters'''
	\|-		\|-
	! rowspan="2" width="100"\| Recipe		! rowspan="3" width="100"\| Recipe
	! rowspan="2" width="20"\| Step		! rowspan="3" width="20"\| Step
	! rowspan="2" width="20"\| Temp.		! rowspan="2" width="20"\| Temp.
	! colspan="6" \| Deposition step		! colspan="6" \| Deposition step
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	! width="40" \| Coil		! width="40" \| Coil
	\| [[Specific Process Knowledge/Etch/DRIE-Pegasus/Parameters#Platen power\|Platen]]		\| [[Specific Process Knowledge/Etch/DRIE-Pegasus/Parameters#Platen power\|Platen]]
	\| [[Specific Process Knowledge/Etch/DRIE-Pegasus/Parameters#Hardware \| HW]]		\| rowspan="2" \| [[Specific Process Knowledge/Etch/DRIE-Pegasus/Parameters#Hardware \| HW]]
	! width="40" \| Runs		! width="40" rowspan="2" \| Runs
	! width="300" \| Key words		! width="300" \| Key words
			\|-
			\| degs
			\| s
			\| mt
			\| sccm
			\| sccm
			\| sccm
			\| W
			\| s
			\| mt
			\| sccm
			\| sccm
			\| sccm
			\| W
			\| W
	\|-		\|-
	! polySOI-10 <!-- recipe name -->		! polySOI-10 <!-- recipe name -->

2019-06-25T13:20:40Z

dfasdf

← Older revision		Revision as of 15:20, 25 June 2019
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	= ~~dfasdf~~ =		= With units =

	{\| border="2" cellpadding="2" cellspacing="1" style="text-align:center;"		{\| border="2" cellpadding="2" cellspacing="1" style="text-align:center;"

2019-06-25T13:19:43Z

dfasdf

2019-06-25T13:19:11Z

dfasdf

← Older revision		Revision as of 15:19, 25 June 2019
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	\|+ '''Process parameters'''		\|+ '''Process parameters'''
	\|-		\|-
	! rowspan="3" width="100"\| Recipe		! rowspan="4" width="100"\| Recipe
	! rowspan="3" width="20"\| Step		! rowspan="4" width="20"\| Step
	! rowspan="3" width="20"\| Temp.		! rowspan="3" width="20"\| Temp.
	! colspan="6" \| Deposition step		! colspan="6" \| Deposition step
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	! width="40" colspan="2"\| Coil		! width="40" colspan="2"\| Coil
	! width="40" colspan="2"\| Platen		! width="40" colspan="2"\| Platen
	! width="40" rowspan="2"\| [[Specific Process Knowledge/Etch/DRIE-Pegasus/Parameters#Hardware \| HW]]		! width="40" rowspan="3"\| [[Specific Process Knowledge/Etch/DRIE-Pegasus/Parameters#Hardware \| HW]]
	! width="40" rowspan="2"\| Runs		! width="40" rowspan="3"\| Runs
	! width="300" rowspan="2"\| Keywords		! width="300" rowspan="3"\| Keywords
	\|-		\|-
	! width="20" \| B		! width="20" \| B
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	! width="20" \| B		! width="20" \| B
	! width="20" \| M		! width="20" \| M
			\|-
			\| degs
			\| s
			\| mt
			\| sccm
			\| sccm
			\| sccm
			\| W
			\| s
			\| s
			\| %
			\| mt
			\| sccm
			\| sccm
			\| sccm
			\| sccm
			\| sccm
			\| sccm
			\| W
			\| W\| W\| W

	\|-		\|-
	! NBoost04 <!--recipe name -->		! NBoost04 <!--recipe name -->

2019-06-25T13:13:46Z

Etch processes designed for stepper resists

2019-06-25T13:11:00Z

← Older revision		Revision as of 15:11, 25 June 2019
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	'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/~~nanoetch~~ click here]'''		'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/DUVetch click here]'''
	<!--Checked for updates on 14/5-2018 - ok/jmli -->		<!--Checked for updates on 14/5-2018 - ok/jmli -->

2018-05-14T08:57:00Z

← Older revision		Revision as of 10:57, 14 May 2018
Line 1:		Line 1:
			'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/nanoetch click here]'''
			<!--Checked for updates on 14/5-2018 - ok/jmli -->

	== Etch processes designed for stepper resists ==		== Etch processes designed for stepper resists ==