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Specific Process Knowledge/Etch/DRIE/Pegasus/DREM/DREM 3kW 100% a - Revision history
2026-04-17T11:53:37Z
Revision history for this page on the wiki
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Jmli at 06:40, 4 April 2025
2025-04-04T06:40:46Z
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Jmli
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Jmli at 09:29, 9 August 2022
2022-08-09T09:29:27Z
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Jmli
https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/DRIE/Pegasus/DREM/DREM_3kW_100%25_a&diff=34358&oldid=prev
Jmli: Created page with "{| border="2" cellpadding="0" cellspacing="0" style="text-align:center;" |- ! rowspan="2" width="40"| Date ! colspan="2" width="120"| Substrate Information ! colspan="4" | Pro..."
2020-03-20T09:41:27Z
<p>Created page with "{| border="2" cellpadding="0" cellspacing="0" style="text-align:center;" |- ! rowspan="2" width="40"| Date ! colspan="2" width="120"| Substrate Information ! colspan="4" | Pro..."</p>
<p><b>New page</b></p><div>{| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"<br />
|-<br />
! rowspan="2" width="40"| Date<br />
! colspan="2" width="120"| Substrate Information<br />
! colspan="4" | Process Information<br />
! colspan="3" width="200" | Results<br />
|-<br />
! width="30" | Wafer info<br />
! width="40" | Material/ Exposed area<br />
! width="40" | Condi- tioning<br />
! width="40" | Recipe<br />
! width="40" | Wafer ID<br />
! width="40" | Comments<br />
! width="400" |SEM images<br />
! width="400" |Picoscope <br />
! width="400" |Numbers <br />
|-<br />
|29/11-2019<br />
|Medusa One<br />
|Si / 10%<br />
|stab-19 chamber clean 20<br />
|nanolab/ jmli /DREM 3.0 kW 100% a<br />
|S018652<br />
|[http://labmanager.dtu.dk/function.php?module=Processlog&view=editlog&usageid=340452 Process log entry]<br />
| <br />
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| | [[file:S018652.gif |120px|frameless ]]<br />
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|<br />
{| {{table}} <br />
| align="center" style="background:#f0f0f0;"|'''SEM image:'''<br />
| align="center" style="background:#f0f0f0;"|'''[http://labintra.nanolab.dtu.dk/index.php/File:S018652a000.png a000]'''<br />
| align="center" style="background:#f0f0f0;"|'''[http://labintra.nanolab.dtu.dk/index.php/File:S018652a001.png a001]'''<br />
| align="center" style="background:#f0f0f0;"|'''[http://labintra.nanolab.dtu.dk/index.php/File:S018652a002.png a002]'''<br />
| align="center" style="background:#f0f0f0;"|'''[http://labintra.nanolab.dtu.dk/index.php/File:S018652a003.png a003]'''<br />
| align="center" style="background:#f0f0f0;"|'''[http://labintra.nanolab.dtu.dk/index.php/File:S018652a004.png a004]'''<br />
| align="center" style="background:#f0f0f0;"|'''[http://labintra.nanolab.dtu.dk/index.php/File:S018652a005.png a005]'''<br />
| align="center" style="background:#f0f0f0;"|'''[http://labintra.nanolab.dtu.dk/index.php/File:S018652a006.png a006]'''<br />
| align="center" style="background:#f0f0f0;"|'''[http://labintra.nanolab.dtu.dk/index.php/File:S018652a007.png a007]'''<br />
| align="center" style="background:#f0f0f0;"|'''[http://labintra.nanolab.dtu.dk/index.php/File:S018652a008.png a008]'''<br />
| align="center" style="background:#f0f0f0;"|'''[http://labintra.nanolab.dtu.dk/index.php/File:S018652a009.png a009]'''<br />
|- <br />
| Trench width (um)||400.14||400.65||249.77||161.15||81.37||41.79||20.28||9.84||4.27||2.71<br />
|- <br />
| Etched depth (um)||140.42||140.43||141.5||141.57||135.57||124.71||108.95||91.98||70.41||60.74<br />
|- <br />
| Etch rate (um/min)||14.04||14.04||14.15||14.16||13.56||12.47||10.89||9.2||7.04||6.07<br />
|- <br />
| <span title="The cycles will vary if the aspect ratio is large "> Etch rate (nm/cyc) </span>||1.17||1.17||1.18||1.18||1.13||1.04||0.91||0.77||0.59||0.51<br />
|- <br />
| Sidewall bowing (%)||-0.36||-0.8||-0.45||-0.31||-0.14||-0.04||0.28||0.64||0.44||0.76<br />
|- <br />
| Sidewall angle (degs)||93.28||93.18||93.1||92.33||91.82||91.58||91.53||91.37||91.12||90.66<br />
|- <br />
| Bottom bowing (%)||3.39||3.99||5.43||8.68||13.13||16.86||18.26||13.09||16.07||18.41<br />
|- <br />
|Aspect ratio||0.34||0.34||0.55||0.85||1.58||2.76||4.7||7.64||12.46||17.77<br />
|- <br />
|}<br />
|- <br />
|}</div>
Jmli