Specific Process Knowledge/Characterization/XRD/XRD SmartLab - Revision history

Reet: /* XRD SmartLab */

2026-04-15T15:00:44Z

XRD SmartLab

← Older revision		Revision as of 17:00, 15 April 2026
Line 26:		Line 26:
	[http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Characterization/XRD/Process_Info Process information]		[http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Characterization/XRD/Process_Info Process information]

			The basic optical components and the automatic optical alignment steps are described here:

			[https://www.youtube.com/watch?v=AbM1TwG5HyU Optical alignment video on Rigaku's Youtube channel]

	The measurement settings and results of the pre-acceptance test are described in this document, also found on the Lab Manager:		The measurement settings and results of the pre-acceptance test are described in this document, also found on the Lab Manager:

Reet: /* XRD SmartLab */

2025-07-04T08:55:23Z

XRD SmartLab

← Older revision		Revision as of 10:55, 4 July 2025
Line 16:		Line 16:

	[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=428 XRD SmartLab in LabManager] - requires login		[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=428 XRD SmartLab in LabManager] - requires login

			'''For XRD SmartLab Users at Nanolab:''' There's a bug in the software in the cleanroom, so the Parts Help doesn't show up with useful information about the optics used in Optical and Sample Alignment when you click the '?'. We copied the Parts Help from the newer XRD Rot Anode so you can the information:
			*On the Desktop of the Smartlab computer in the cleanroom
			*In the Cleanroom Drive under _Equipment/XRD/PartsHelp_fromXRDRotAnode_SLSII

Eves: /* Grazing Incidence X-ray Diffraction XRD (GiXRD) */

2024-07-31T07:39:06Z

Grazing Incidence X-ray Diffraction XRD (GiXRD)

← Older revision		Revision as of 09:39, 31 July 2024
Line 60:		Line 60:

	* Evaluation of [[Specific Process Knowledge/Characterization/XRD/XRD SmartLab/Instrumental broading in GiXRD\|Instrumental broading in GiXRD]].		* Evaluation of [[Specific Process Knowledge/Characterization/XRD/XRD SmartLab/Instrumental broading in GiXRD\|Instrumental broading in GiXRD]].


			==θ/2θ X-ray Diffraction==

			* Evaluation of [[Specific Process Knowledge/Characterization/XRD/XRD SmartLab/Instrumental broading in T2T\|Instrumental broadening in symmetrical θ/2θ measurements]].

	==Equipment performance and process related parameters==		==Equipment performance and process related parameters==

Eves: /* Characterization of thin films using X-ray reflectivity (XRR) */

2023-11-09T15:42:31Z

Characterization of thin films using X-ray reflectivity (XRR)

← Older revision		Revision as of 17:42, 9 November 2023
Line 50:		Line 50:

	* Characterization of [[Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_MgO#X-Ray_Reflectivity\|Sputtered deposited MgO thin films]].		* Characterization of [[Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_MgO#X-Ray_Reflectivity\|Sputtered deposited MgO thin films]].

			* Characterization of [[Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Scandium/Sc_Sputtering_in_Cluster_Lesker_PC3#X-ray_Reflectivity_(XRR)\|Sputtered deposited Sc thin films]].

			* Characterization of [[Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Scandium_Nitride/ScN_Reactive_Sputtering_in_Cluster_Lesker_PC3#X-ray_Reflectivity_(XRR)\|Sputtered deposited ScN thin films]].

	<!-- * Characterization of [[Specific_Process_Knowledge/Characterization/XRD/XRD_SmartLab/ALD_deposited_alumina_and_titania_XRR_and_SE_comparison\|ALD deposited Al<sub>2</sub>O<sub>3</sub> and TiO<sub>2</sub> ultrathin layers]].-->		<!-- * Characterization of [[Specific_Process_Knowledge/Characterization/XRD/XRD_SmartLab/ALD_deposited_alumina_and_titania_XRR_and_SE_comparison\|ALD deposited Al<sub>2</sub>O<sub>3</sub> and TiO<sub>2</sub> ultrathin layers]].-->


	==Grazing Incidence X-ray Diffraction XRD (GiXRD)==		==Grazing Incidence X-ray Diffraction XRD (GiXRD)==

Eves: /* Characterization of thin films using X-ray reflectivity (XRR) */

2023-11-09T12:11:53Z

Characterization of thin films using X-ray reflectivity (XRR)

← Older revision		Revision as of 14:11, 9 November 2023
Line 52:		Line 52:

	<!-- * Characterization of [[Specific_Process_Knowledge/Characterization/XRD/XRD_SmartLab/ALD_deposited_alumina_and_titania_XRR_and_SE_comparison\|ALD deposited Al<sub>2</sub>O<sub>3</sub> and TiO<sub>2</sub> ultrathin layers]].-->		<!-- * Characterization of [[Specific_Process_Knowledge/Characterization/XRD/XRD_SmartLab/ALD_deposited_alumina_and_titania_XRR_and_SE_comparison\|ALD deposited Al<sub>2</sub>O<sub>3</sub> and TiO<sub>2</sub> ultrathin layers]].-->


			==Grazing Incidence X-ray Diffraction XRD (GiXRD)==

			* Evaluation of [[Specific Process Knowledge/Characterization/XRD/XRD SmartLab/Instrumental broading in GiXRD\|Instrumental broading in GiXRD]].

	==Equipment performance and process related parameters==		==Equipment performance and process related parameters==

Reet: /* Equipment performance and process related parameters */

2023-05-11T12:46:56Z

Equipment performance and process related parameters

← Older revision		Revision as of 14:46, 11 May 2023
Line 108:		Line 108:
	0.4 mm x 8 mm (Line/Point)		0.4 mm x 8 mm (Line/Point)
	\|-		\|-
	!style="background:silver; color:black" align="center" valign="center" rowspan="5"\|Goniometer		!style="background:silver; color:black" align="center" valign="center" rowspan="4"\|Goniometer
	\|style="background:LightGrey; color:black"\|		\|style="background:LightGrey; color:black"\|
	Scanning mode		Scanning mode
Line 133:		Line 133:
	*Rx,Ry:-5~+5°		*Rx,Ry:-5~+5°
	\|-		\|-
	~~\|style="background:LightGrey; color:black"\|~~
	~~Sample size~~
	~~\|style="background:WhiteSmoke; color:black"\|~~
	~~Diameter: 150 mm~~
	~~Thickness: 0~21 mm~~
	\|-
	!style="background:silver; color:black" align="center" valign="center" rowspan="2"\|Optics		!style="background:silver; color:black" align="center" valign="center" rowspan="2"\|Optics
	\|style="background:LightGrey; color:black"\|Incident side		\|style="background:LightGrey; color:black"\|Incident side
Line 158:		Line 153:
	\|style="background:LightGrey; color:black"\|Substrate size		\|style="background:LightGrey; color:black"\|Substrate size
	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	up to 150 mm wafers		up to 150 mm wafers; thickness up to 21 mm
	\|-		\|-
	\| style="background:LightGrey; color:black"\|Allowed materials		\| style="background:LightGrey; color:black"\|Allowed materials
	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	All materials		All materials allowed in the cleanroom
	\|-		\|-
	\|}		\|}

	<br clear="all" />		<br clear="all" />

Eves at 12:23, 2 February 2023

2023-02-02T12:23:37Z

← Older revision		Revision as of 14:23, 2 February 2023
Line 2:		Line 2:

	<i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b><br>		<i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b><br>
	All images and photos on this page ~~belonges~~ to <b>DTU Nanolab</b></i>		All images and photos on this page belongs to <b>DTU Nanolab</b></i>

Eves at 20:00, 1 February 2023

2023-02-01T20:00:52Z

← Older revision		Revision as of 22:00, 1 February 2023
Line 3:		Line 3:
	<i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b><br>		<i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b><br>
	All images and photos on this page belonges to <b>DTU Nanolab</b></i>		All images and photos on this page belonges to <b>DTU Nanolab</b></i>



	= XRD SmartLab =		= XRD SmartLab =

Eves at 20:00, 1 February 2023

2023-02-01T20:00:41Z

← Older revision		Revision as of 22:00, 1 February 2023
Line 1:		Line 1:
	'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/XRD/XRD_SmartLab click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/XRD/XRD_SmartLab click here]'''

	<i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b></i>		<i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b><br>
			All images and photos on this page belonges to <b>DTU Nanolab</b></i>

	= XRD SmartLab =		= XRD SmartLab =

Eves: /* XRD SmartLab */

2023-02-01T19:59:26Z

XRD SmartLab

← Older revision		Revision as of 21:59, 1 February 2023
Line 7:		Line 7:
	The Rigaku SmartLab is an advanced XRD for measuring on thin films. All thin films can be measured without fixating the sample, as the system has a so called In-Plane arm.		The Rigaku SmartLab is an advanced XRD for measuring on thin films. All thin films can be measured without fixating the sample, as the system has a so called In-Plane arm.

	[[image:XRD_SmartLab.jpg\|~~200x200px~~\|right\|thumb\|The XRD SmartLab located in cleanroom F-2]]		[[image:XRD_SmartLab.jpg\|400x400px\|right\|thumb\|The XRD SmartLab located in cleanroom F-2]]