Specific Process Knowledge/Characterization/XRD/Process Info - Revision history

Reet: /* XRR */

2026-04-09T14:01:29Z

XRR

@@ Line 89: / Line 89: @@
 ==XRR==
-<gallery caption="XPS recordings. 10 nm SiC deposited on Si wafer" widths="700px" heights="150px" perrow="2">
+XRR is a special case of a Theta/2Theta measurement. You can see the optics used for the measurements and read more about the principles here: [[/The Principles of X-ray Reflectivity Analysis|The principles of X-ray reflectivity analysis (XRR)]]
 ==In-Plane Measurements 2θχ or 2θχ/φ scans ==

Eves: /* Texture (Pole figures) */

2025-07-28T11:55:08Z

Texture (Pole figures)

← Older revision		Revision as of 13:55, 28 July 2025
Line 113:		Line 113:
	Pole figures can be used to determine the orientation of a crystal. For polycrystalline materials, it is possible to determine if there is a preferred direction of the crystal grains. In a pole figure, a measurement of a predefined peek for the material is measured in the half sphere above the sample. This will result in a map of intensities in relation to the angles from the surface normal and along sample rotation. For instance if you have a single crystalline sample with a [0 0 1] surface and measure on the [1 1 1] lattice plane, you should find 4 peaks spaced 90° in beta and at 35.26° in alpha.		Pole figures can be used to determine the orientation of a crystal. For polycrystalline materials, it is possible to determine if there is a preferred direction of the crystal grains. In a pole figure, a measurement of a predefined peek for the material is measured in the half sphere above the sample. This will result in a map of intensities in relation to the angles from the surface normal and along sample rotation. For instance if you have a single crystalline sample with a [0 0 1] surface and measure on the [1 1 1] lattice plane, you should find 4 peaks spaced 90° in beta and at 35.26° in alpha.

	Peak angles can be calculated by simple vector calculations; however, We have made a		Peak angles can be calculated by simple vector calculations; however, we have made a [[Specific Process Knowledge/Characterization/XRD/Process Info/Pole Figure script\|small MATLAB script]] calculating them for you. To use the script, open MATLAB and call the program with two vectors as input. First vector should be your surface orientation, second input the plane you measure on. For a [1 1 1] substrate surface and a [3 1 1] plane and a [0 0 1] substrate surface and a [1 3 3] plane, where the measurement planes are dependent on the 2theta angle, the command looks like this:


	[[Specific Process Knowledge/Characterization/XRD/Process Info/Pole Figure script\|~~e-beam deposited Al thin films]].~~


	[[small MATLAB script]] calculating them for you. To use the script open MATLAB and call the program with two vectors as input. First vector should be your surface orientation, second input the plane you measure on. For a [1 1 1] substrate surface and a [3 1 1] plane and a [0 0 1] substrate surface and a [1 3 3] plane, where the measurement planes are dependent on the 2theta angle, the command looks like this:

	{\|style="margin:auto;"		{\|style="margin:auto;"

Eves: /* Texture (Pole figures) */

2025-07-28T11:53:50Z

Texture (Pole figures)

← Older revision		Revision as of 13:53, 28 July 2025
Line 113:		Line 113:
	Pole figures can be used to determine the orientation of a crystal. For polycrystalline materials, it is possible to determine if there is a preferred direction of the crystal grains. In a pole figure, a measurement of a predefined peek for the material is measured in the half sphere above the sample. This will result in a map of intensities in relation to the angles from the surface normal and along sample rotation. For instance if you have a single crystalline sample with a [0 0 1] surface and measure on the [1 1 1] lattice plane, you should find 4 peaks spaced 90° in beta and at 35.26° in alpha.		Pole figures can be used to determine the orientation of a crystal. For polycrystalline materials, it is possible to determine if there is a preferred direction of the crystal grains. In a pole figure, a measurement of a predefined peek for the material is measured in the half sphere above the sample. This will result in a map of intensities in relation to the angles from the surface normal and along sample rotation. For instance if you have a single crystalline sample with a [0 0 1] surface and measure on the [1 1 1] lattice plane, you should find 4 peaks spaced 90° in beta and at 35.26° in alpha.

	Peak angles can be calculated by simple vector calculations; however, We have made a [[small MATLAB script]] calculating them for you. To use the script open MATLAB and call the program with two vectors as input. First vector should be your surface orientation, second input the plane you measure on. For a [1 1 1] substrate surface and a [3 1 1] plane and a [0 0 1] substrate surface and a [1 3 3] plane, where the measurement planes are dependent on the 2theta angle, the command looks like this:		Peak angles can be calculated by simple vector calculations; however, We have made a


			[[Specific Process Knowledge/Characterization/XRD/Process Info/Pole Figure script\|e-beam deposited Al thin films]].


			[[small MATLAB script]] calculating them for you. To use the script open MATLAB and call the program with two vectors as input. First vector should be your surface orientation, second input the plane you measure on. For a [1 1 1] substrate surface and a [3 1 1] plane and a [0 0 1] substrate surface and a [1 3 3] plane, where the measurement planes are dependent on the 2theta angle, the command looks like this:

	{\|style="margin:auto;"		{\|style="margin:auto;"

Reet: /* 2θ scan. Graizing Incident X-ray Diffraction (GiXRD) */

2023-12-21T10:29:00Z

2θ scan. Graizing Incident X-ray Diffraction (GiXRD)

← Older revision		Revision as of 12:29, 21 December 2023
Line 74:		Line 74:
	image:eves_XRD_drawing_series_GiXRD_20230206.png\|<b>C 1s</b> signal.		image:eves_XRD_drawing_series_GiXRD_20230206.png\|<b>C 1s</b> signal.
	</gallery>		</gallery>

			For GIXRD you need a small incident slit (which is limited by the footprint on the wafer, so for a small incident angle and a small sample you will need even smaller incident slit size). However the receiving slits can be large / fully open as the PSA will anyway determine what diffraction angles are accepted into the detector.

			You can also use the 1D detector mode of the detector if you use an open PSA in the setup. This will speed up data collection.

	<gallery caption="XPS recordings. 10 nm SiC deposited on Si wafer" widths="500px" heights="300px" perrow="1">		<gallery caption="XPS recordings. 10 nm SiC deposited on Si wafer" widths="500px" heights="300px" perrow="1">

Reet: /* XRR */

2023-12-21T10:11:24Z

XRR

← Older revision		Revision as of 12:11, 21 December 2023
Line 98:		Line 98:
	With X-Ray Reflectivity measurements, it is possible to obtain information on thickness, density, and both surface and interface roughness on thin films. The technique does not depend on crystal structure and can be used on both amorphous, poly-, and single-crystalline materials.		With X-Ray Reflectivity measurements, it is possible to obtain information on thickness, density, and both surface and interface roughness on thin films. The technique does not depend on crystal structure and can be used on both amorphous, poly-, and single-crystalline materials.
	For film thickness measurement, films up to around 100 nm can be measured. You are welcome to try it on thicker films, but please confirm the measurement the first time by use of other equipment. XRR is a special case of a Theta/2Theta measurement.		For film thickness measurement, films up to around 100 nm can be measured. You are welcome to try it on thicker films, but please confirm the measurement the first time by use of other equipment. XRR is a special case of a Theta/2Theta measurement.
	Rigaku gives a good explanation of the principles behind the XRR in [https://labmanager.dtu.dk/view_binary.php?fileId=4937\|this paper] - requires login		Rigaku gives a good explanation of the principles behind the XRR in [https://labmanager.dtu.dk/view_binary.php?fileId=4937\|this paper] - requires login.

			It's a good idea to use a very small incident slit as suggested by default by the Rigaku software (0.05 mm) and also use very small receiving slits to reduce background noise, e.g., RS1 = IS and RS2 sligthly larger.

	==In-Plane Measurements 2θχ or 2θχ/φ scans ==		==In-Plane Measurements 2θχ or 2θχ/φ scans ==

Eves: /* XRR */

2023-11-22T18:01:24Z

XRR

← Older revision		Revision as of 20:01, 22 November 2023
Line 95:		Line 95:




	~~<gallery caption="XRR analysis concept." widths="800px" heights="300px" perrow="1">~~
	~~image:eves_XRR_concept_20230203.png\| Reflection and transmission from a thin film. Total reflectivity is the sum of the infinite number of reflections.~~
	~~</gallery>~~

	With X-Ray Reflectivity measurements, it is possible to obtain information on thickness, density, and both surface and interface roughness on thin films. The technique does not depend on crystal structure and can be used on both amorphous, poly-, and single-crystalline materials.		With X-Ray Reflectivity measurements, it is possible to obtain information on thickness, density, and both surface and interface roughness on thin films. The technique does not depend on crystal structure and can be used on both amorphous, poly-, and single-crystalline materials.

Eves: /* XRR */

2023-11-22T18:00:05Z

XRR

← Older revision		Revision as of 20:00, 22 November 2023
Line 89:		Line 89:
	image:eves_XRD_drawing_series_XRR1_20230206.png\|<b>C 1s</b> signal.		image:eves_XRD_drawing_series_XRR1_20230206.png\|<b>C 1s</b> signal.
	image:eves_XRD_drawing_series_XRR2_20230206.png\|<b>C 1s</b> signal.		image:eves_XRD_drawing_series_XRR2_20230206.png\|<b>C 1s</b> signal.
			</gallery>

			[[/The Principles of X-ray Reflectivity Analysis\|The principles of X-ray reflectivity analysis (XRR)]]

	~~[[/The Principles of X-ray Reflectivity Analysis\|The principles of X-ray reflectivity analysis (XRR)]]~~


	~~</gallery>~~

Eves: /* XRR */

2023-11-22T17:59:43Z

XRR

← Older revision		Revision as of 19:59, 22 November 2023
Line 104:		Line 104:
	For film thickness measurement, films up to around 100 nm can be measured. You are welcome to try it on thicker films, but please confirm the measurement the first time by use of other equipment. XRR is a special case of a Theta/2Theta measurement.		For film thickness measurement, films up to around 100 nm can be measured. You are welcome to try it on thicker films, but please confirm the measurement the first time by use of other equipment. XRR is a special case of a Theta/2Theta measurement.
	Rigaku gives a good explanation of the principles behind the XRR in [https://labmanager.dtu.dk/view_binary.php?fileId=4937\|this paper] - requires login		Rigaku gives a good explanation of the principles behind the XRR in [https://labmanager.dtu.dk/view_binary.php?fileId=4937\|this paper] - requires login

	~~[[File:XRR.png\|400px]]~~

	==In-Plane Measurements 2θχ or 2θχ/φ scans ==		==In-Plane Measurements 2θχ or 2θχ/φ scans ==

Eves: /* XRR */

2023-11-22T17:59:25Z

XRR

← Older revision		Revision as of 19:59, 22 November 2023
Line 89:		Line 89:
	image:eves_XRD_drawing_series_XRR1_20230206.png\|<b>C 1s</b> signal.		image:eves_XRD_drawing_series_XRR1_20230206.png\|<b>C 1s</b> signal.
	image:eves_XRD_drawing_series_XRR2_20230206.png\|<b>C 1s</b> signal.		image:eves_XRD_drawing_series_XRR2_20230206.png\|<b>C 1s</b> signal.


			[[/The Principles of X-ray Reflectivity Analysis\|The principles of X-ray reflectivity analysis (XRR)]]


	</gallery>		</gallery>

Reet: /* Texture (Pole figures) */

2023-05-11T12:09:15Z

Texture (Pole figures)

← Older revision		Revision as of 14:09, 11 May 2023
Line 194:		Line 194:


	Rigaku describes Pole figures [https://labmanager.dtu.dk/view_binary.php?fileId=4939\|this paper] - requires login		Rigaku describes Pole figures [https://labmanager.dtu.dk/view_binary.php?fileId=4939 in this paper] - requires login