Specific Process Knowledge/Characterization/XPS/Processing/Guidelines - Revision history

Jmli at 08:37, 4 September 2025

2025-09-04T08:37:13Z

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	= Data processing guidelines in Avantage =		= Data processing guidelines in Avantage =

Jmli at 07:16, 9 May 2023

2023-05-09T07:16:25Z

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	= Data processing guidelines in Avantage =		= Data processing guidelines in Avantage =

Jmli at 13:58, 24 August 2021

2021-08-24T13:58:46Z

← Older revision		Revision as of 15:58, 24 August 2021
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	= Data processing guidelines in Avantage =		= Data processing guidelines in Avantage =

Jmli: /* Data processing guidelines in Avantage */

2018-10-16T09:46:11Z

Data processing guidelines in Avantage

← Older revision		Revision as of 11:46, 16 October 2018
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	; Rename depth profiles		; Rename depth profiles
	: Sometimes when you analyse depth profiles, the information on the ion gun parameters are hard to find. This is why renaming the 'Depth profile' in the experiment tree to something like '2keVHigh20secs' when setting up the experiment is useful. In this way you will always know that the ion was etching for 20 seconds at 2 keV energy and with high current setting .		: Sometimes when you analyse depth profiles, the information on the ion gun parameters are hard to find. This is why renaming the 'Depth profile' in the experiment tree to something like '2keVHigh20secs' when setting up the experiment is useful. In this way you will always know that the ion gun was etching for 20 seconds at 2 keV energy and with high current setting between each level.

Jmli: /* Data processing guidelines in Avantage */

2018-10-16T09:45:39Z

Data processing guidelines in Avantage

← Older revision		Revision as of 11:45, 16 October 2018
Line 8:		Line 8:

	; Rename depth profiles		; Rename depth profiles
	: Sometimes when you analyse depth profiles, the information on the ion gun parameters are hard to find. This is why renaming the 'Depth profile' to something like '2keVHigh20secs' when setting up the experiment is useful. In this way you will always know that the ion was etching for 20 seconds at 2 keV energy and with high current setting .		: Sometimes when you analyse depth profiles, the information on the ion gun parameters are hard to find. This is why renaming the 'Depth profile' in the experiment tree to something like '2keVHigh20secs' when setting up the experiment is useful. In this way you will always know that the ion was etching for 20 seconds at 2 keV energy and with high current setting .

Jmli: /* Data processing guidelines in Avantage */

2018-10-16T09:45:07Z

Data processing guidelines in Avantage

← Older revision		Revision as of 11:45, 16 October 2018
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	; Do not mix snapshot and scanned spectra in processing grid		; Do not mix snapshot and scanned spectra in processing grid
	:		:

			; Rename depth profiles
			: Sometimes when you analyse depth profiles, the information on the ion gun parameters are hard to find. This is why renaming the 'Depth profile' to something like '2keVHigh20secs' when setting up the experiment is useful. In this way you will always know that the ion was etching for 20 seconds at 2 keV energy and with high current setting .

Jmli: Created page with "= Data processing guidelines in Avantage = ; Use one processing grid to hold all spectra to be fitted. : Each processing grid has a peak table that holds all the peaks for e..."

2018-10-16T07:46:43Z

Created page with "= Data processing guidelines in Avantage = ; Use one processing grid to hold all spectra to be fitted. : Each processing grid has a peak table that holds all the peaks for e..."

New page

= Data processing guidelines in Avantage =

; Use one processing grid to hold all spectra to be fitted.
: Each processing grid has a peak table that holds all the peaks for each level. Making depth profiles cannot be made across processing grids. Survey spectra must be kept in separate grids - if not the peak table of the survey spectrum will get mixed with the high resolution spectra.

; Do not mix snapshot and scanned spectra in processing grid
: