Specific Process Knowledge/Characterization/XPS/Processing/Basics/2highres - Revision history

Jmli at 08:36, 4 September 2025

2025-09-04T08:36:38Z

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	== Selecting high resolution spectra for peak fitting ==		== Selecting high resolution spectra for peak fitting ==

Jmli at 07:11, 9 May 2023

2023-05-09T07:11:28Z

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	== Selecting high resolution spectra for peak fitting ==		== Selecting high resolution spectra for peak fitting ==

Jmli at 14:09, 24 August 2021

2021-08-24T14:09:39Z

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Jmli: /* Change fitting constraints */

2018-10-22T09:19:35Z

Change fitting constraints

← Older revision		Revision as of 11:19, 22 October 2018
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	The result is that we have fitted all etch levels of the Si2p peak. Since silicon is not the only element in the sample, we need to apply the same procedures to the other core levels.		The result is that we have fitted all etch levels of the Si2p peak. Since silicon is not the only element in the sample, we need to apply the same procedures to the other core levels.

	The analysis continues <span>[[Specific_Process_Knowledge/Characterization/XPS/Processing/Basics/3fitting#top\|here]]</span>.		The analysis continues <span>[[Specific_Process_Knowledge/Characterization/XPS/Processing/Basics/3fitting#top\|'''here''']]</span>.

Jmli at 11:52, 30 July 2018

2018-07-30T11:52:16Z

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Jmli: /* Change fitting constraints */

2016-06-30T11:02:09Z

Change fitting constraints

← Older revision		Revision as of 13:02, 30 June 2016
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	[[File:XPS-basics19b.jpg\|300px]]		[[File:XPS-basics19b.jpg\|300px]]

	Before applying the constraints to the fitting of all the levels, it may be a good idea to rename the peaks. Here, it makes good sense to apply the names 'Bulk' and 'Oxide'.		Before applying the constraints to the fitting of all the levels, it may be a good idea to rename the peaks. Here, it makes good sense to apply the names 'Bulk' and 'Oxide'.

	[[File:Si2p fit1.jpg\|500px]]		[[File:Si2p fit1.jpg\|500px]]

Jmli: /* Change fitting constraints */

2016-06-30T10:11:49Z

Change fitting constraints

← Older revision		Revision as of 12:11, 30 June 2016
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	# Right click inside the table and select 'Propagate Selected Constraints/Values..' as shown below.		# Right click inside the table and select 'Propagate Selected Constraints/Values..' as shown below.
	# Select 'All Columns' and 'Constraints and Values'		# Select 'All Columns' and 'Constraints and Values'
	~~# Click the 'Peak Fitting' button, select 'Fit All Levels' in the 'Fit Peaks'.~~
	~~# Click 'Accept' when the fitting routine has completed.~~

	[[File:XPS-basics19a1.jpg\|500px]]		[[File:XPS-basics19a1.jpg\|500px]]
	[[File:XPS-basics19b.jpg\|300px]]		[[File:XPS-basics19b.jpg\|300px]]

			Before applying the constraints to the fitting of all the levels, it may be a good idea to rename the peaks. Here, it makes good sense to apply the names 'Bulk' and 'Oxide'.
			[[File:Si2p fit1.jpg\|500px]]

			Then,
			# Click the 'Peak Fitting' button, select 'Fit All Levels' in the 'Fit Peaks'.
			# Click 'Accept' when the fitting routine has completed.

	The result is that we have fitted all etch levels of the Si2p peak. Since silicon is not the only element in the sample, we need to apply the same procedures to the other core levels.		The result is that we have fitted all etch levels of the Si2p peak. Since silicon is not the only element in the sample, we need to apply the same procedures to the other core levels.

	The analysis continues <span>[[Specific_Process_Knowledge/Characterization/XPS/Processing/Basics/3fitting#top\|here]]</span>.		The analysis continues <span>[[Specific_Process_Knowledge/Characterization/XPS/Processing/Basics/3fitting#top\|here]]</span>.

Jmli: /* Selecting high resolution spectra for peak fitting */

2016-06-30T09:56:19Z

Selecting high resolution spectra for peak fitting

← Older revision		Revision as of 11:56, 30 June 2016
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	The analysis of the data from [[Specific Process Knowledge/Characterization/XPS/Processing/Basics/1intro#anchor_1introbottom\|here]] is continued.		The analysis of the data from [[Specific Process Knowledge/Characterization/XPS/Processing/Basics/1intro#anchor_1introbottom\|here]] is continued.

	Open a new data grid and drag the four sets of spectra into each quadrant as seen below.		Open a new data grid and drag the four sets of spectra into each quadrant as seen below. From these four sets of spectra a peak table will be made from which the quantification calculated. Each data grid contains a peak table and it is therefore essential that the peak table obtained from the survey spectra does not get mixed with the one from the high resolution spectra.

	[[File:XPS-basics10.jpg\|700px]]		[[File:XPS-basics10.jpg\|700px]]

Jmli: /* Change fitting constraints */

2016-06-28T08:19:38Z

Change fitting constraints

← Older revision		Revision as of 10:19, 28 June 2016
Line 115:		Line 115:
	[[File:XPS-basics19b.jpg\|300px]]		[[File:XPS-basics19b.jpg\|300px]]

	The result is that we have fitted all etch levels of the Si2p peak. Since silicon is not the only element in the sample, we need to apply the same procedures to the other core levels. The analysis continues <span>[[Specific_Process_Knowledge/Characterization/XPS/Processing/Basics/3fitting#top\|here]]</span>.		The result is that we have fitted all etch levels of the Si2p peak. Since silicon is not the only element in the sample, we need to apply the same procedures to the other core levels.

			The analysis continues <span>[[Specific_Process_Knowledge/Characterization/XPS/Processing/Basics/3fitting#top\|here]]</span>.

Jmli: /* Selecting high resolution spectra for peak fitting */

2016-06-28T08:16:57Z

Selecting high resolution spectra for peak fitting

← Older revision		Revision as of 10:16, 28 June 2016
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	Scroll up or down through the etch levels of one spectrum by using the scroll button (either etch level or etch time). If several spectra are selected simultaneously by pressing SHIFT or CTRL while clicking on the spectra in the four quadrant view, you watch the evolution of the spectra together.		Scroll up or down through the etch levels of one spectrum by using the scroll button (either etch level or etch time). If several spectra are selected simultaneously by pressing SHIFT or CTRL while clicking on the spectra in the four quadrant view, you watch the evolution of the spectra together.

	To analyze a single spectrum, select and maximize it. ~~Before~~ adding peaks to the spectrum, it is a good idea consider what you know about the sample. Here, we know that the sample has ALD deposited layers of ZnO and CuZn on top of a silicon substrate. One would therefore expect to see bulk silicon provided we sputter deep enough and oxidized silicon from the native oxide. Therefore, scroll to an etch level where, preferably, both the oxidized Si2p and the bulk silicon Si2p are visible. In this case, it is etch level 35.		To analyze a single spectrum, select and maximize it. If you are unfamiliar with what to expect in a spectrum of the element in question, open XPS Knowledge View and select the element from the Periodic Table. This will provide very useful information. Also, before adding peaks to the spectrum, it is a good idea consider what you know about the sample. Here, we know that the sample has ALD deposited layers of ZnO and CuZn on top of a silicon substrate. One would therefore expect to see bulk silicon provided we sputter deep enough and oxidized silicon from the native oxide. Therefore, scroll to an etch level where, preferably, both the oxidized Si2p and the bulk silicon Si2p are visible. In this case, it is etch level 35.

	<gallery widths="350" heights="250" perrow="3">		<gallery widths="350" heights="250" perrow="3">