Specific Process Knowledge/Characterization/XPS/Processing/Basics/1intro - Revision history

Jmli at 08:36, 4 September 2025

2025-09-04T08:36:48Z

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	== Open data and save the processing document ==		== Open data and save the processing document ==

Jmli at 07:11, 9 May 2023

2023-05-09T07:11:54Z

← Older revision		Revision as of 09:11, 9 May 2023
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	== Open data and save the processing document ==		== Open data and save the processing document ==

Jmli at 14:09, 24 August 2021

2021-08-24T14:09:21Z

← Older revision		Revision as of 16:09, 24 August 2021
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	'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Characterization/XPS/Processing/Basics/1intro click here]'''		'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Characterization/XPS/Processing/Basics/1intro click here]'''
	<!--Checked for updates on 14/5-2018 - ok/jmli -->		<!--Checked for updates on 14/5-2018 - ok/jmli -->
			<!--Checked for updates on 24/8-2021. ok/ jmli-->

	== Open data and save the processing document ==		== Open data and save the processing document ==

Jmli: /* Make a depth profile from survey spectrum */

2018-10-22T09:18:56Z

Make a depth profile from survey spectrum

← Older revision		Revision as of 11:18, 22 October 2018
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	The data may be exported to Excel or Word by using the options on the 'W Reporting' tab next to the 'Display Modes' in the upper right corner of the GUI.		The data may be exported to Excel or Word by using the options on the 'W Reporting' tab next to the 'Display Modes' in the upper right corner of the GUI.

	Click [[Specific Process Knowledge/Characterization/XPS/Processing/Basics/2highres\|here]] to continue the analysis on the high resolution spectra.		Click [[Specific Process Knowledge/Characterization/XPS/Processing/Basics/2highres\|'''here''']] to continue the analysis on the high resolution spectra.

	<span id="anchor_1introbottom"></span>		<span id="anchor_1introbottom"></span>

Jmli at 09:46, 14 May 2018

2018-05-14T09:46:06Z

← Older revision		Revision as of 11:46, 14 May 2018
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	'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Characterization/XPS/Processing/Basics/1intro click here]'''		'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Characterization/XPS/Processing/Basics/1intro click here]'''
			<!--Checked for updates on 14/5-2018 - ok/jmli -->

	== Open data and save the processing document ==		== Open data and save the processing document ==

Jmli at 09:43, 3 November 2015

2015-11-03T09:43:27Z

← Older revision		Revision as of 11:43, 3 November 2015
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			'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Characterization/XPS/Processing/Basics/1intro click here]'''

	== Open data and save the processing document ==		== Open data and save the processing document ==

Jmli: /* Make a depth profile from survey spectrum */

2015-09-14T10:12:48Z

Make a depth profile from survey spectrum

← Older revision		Revision as of 12:12, 14 September 2015
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	* '''Which peaks to add''': The two spin-orbit doublets Si2p and Cu2p should be treated differently. The Si2p doublet peak is treated as one peak because of the small spin-orbit splitting (the splitting is 0.63 eV less than the 1 eV step size of the survey spectrum, see [[Specific Process Knowledge/Characterization/XPS/Processing/Basics/2highres#anchor_peaktable1\|table in the next section]]). In contrast, the Cu2p doublet has some 20 eV's of spin-orbit splitting - as such the peaks may be fitted individually. The best way of fitting and quatinfying is to omit one of the peaks as is the case with the Zn2p doublet. This is easily done by removing the checkmark in the 'Q' column of one of the Cu2p peaks.		* '''Which peaks to add''': The two spin-orbit doublets Si2p and Cu2p should be treated differently. The Si2p doublet peak is treated as one peak because of the small spin-orbit splitting (the splitting is 0.63 eV less than the 1 eV step size of the survey spectrum, see [[Specific Process Knowledge/Characterization/XPS/Processing/Basics/2highres#anchor_peaktable1\|table in the next section]]). In contrast, the Cu2p doublet has some 20 eV's of spin-orbit splitting - as such the peaks may be fitted individually. The best way of fitting and quatinfying is to omit one of the peaks as is the case with the Zn2p doublet. This is easily done by removing the checkmark in the 'Q' column of one of the Cu2p peaks.
	* '''Etching through thin layers: Probe depth and etch rates''': It looks as if the copper layer is contaminated with ZnO - at least the signals of Zn and O are not zero. There are several explanations for this:		* '''Etching through thin layers: Probe depth and etch rates''': It looks as if the copper layer is contaminated with ZnO - at least the signals of Zn and O are not zero. There are several explanations for this:
	** The etching is too aggressive so the Cu layer is removed within too few levels. Lower the parameters of the ion bombardment to have more points.		** The etching is too aggressive so the Cu layer is removed within too few etch levels. Lower the parameters of the ion bombardment to have more points.
	** The etching is non-uniform across the area that is probed.		** The etching is non-uniform across the area that is probed.
	** The probing depth is long compared to the thickness of Cu layer.		** The probing depth is long compared to the thickness of Cu layer.

Jmli: /* Manually add peaks to identification of survey spectra */

2015-09-14T10:06:15Z

Manually add peaks to identification of survey spectra

← Older revision		Revision as of 12:06, 14 September 2015
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	<span style="font-size: 90%; text-align: right;">[[Specific_Process_Knowledge/Characterization/XPS/Processing/Basics/1intro#top\|Go to top of this page]]</span>		<span style="font-size: 90%; text-align: right;">[[Specific_Process_Knowledge/Characterization/XPS/Processing/Basics/1intro#top\|Go to top of this page]]</span>

	To add the peaks that are not present in current level (for copper and silicon), click 'Manual Peak ID' as shown below. A window called 'Manual Peak ID' opens - here select Cu and Si.		To add the peaks that are not present in current etch level (for copper and silicon), click 'Manual Peak ID' as shown below. A window called 'Manual Peak ID' opens - here select Cu and Si.

	[[File:XPS-basics06d.jpg\|700px]]		[[File:XPS-basics06d.jpg\|700px]]

Jmli: /* Automatic peak identification of survey spectra */

2015-09-14T10:05:40Z

Automatic peak identification of survey spectra

← Older revision		Revision as of 12:05, 14 September 2015
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	Several things are worth noting:		Several things are worth noting:
	* A peak table pops up above the spectrum. It contains information (which elements, fitted atomic percentages etc.) obtained in the automatic fitting routine. One can still scroll through the levels (if more levels in a depth profile are available) but the elements fitted will not change.		* A peak table pops up above the spectrum. It contains information (which elements, fitted atomic percentages etc.) obtained in the automatic fitting routine. One can still scroll through the etch levels (if more etch levels in a depth profile are available) but the elements fitted will not change.
	* Only a fraction of the peaks in the spectrum have labels. The reason is that only the peaks from the peak table have a label - the remaining peaks in the spectrum are NOT unidentified elements but peaks (core levels or Auger transitions) of the elements already identified in the peak table.		* Only a fraction of the peaks in the spectrum have labels. The reason is that only the peaks from the peak table have a label - the remaining peaks in the spectrum are NOT unidentified elements but peaks (core levels or Auger transitions) of the elements already identified in the peak table.

Jmli: /* Views of data with several etch levels */

2015-09-14T10:04:54Z

Views of data with several etch levels

← Older revision		Revision as of 12:04, 14 September 2015
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	<span style="font-size: 90%; text-align: right;">[[Specific_Process_Knowledge/Characterization/XPS/Processing/Basics/1intro#top\|Go to top of this page]]</span>		<span style="font-size: 90%; text-align: right;">[[Specific_Process_Knowledge/Characterization/XPS/Processing/Basics/1intro#top\|Go to top of this page]]</span>

	As shown (marked with a red square) in the bottom of the image below, some experiments hold several etch levels - the reason is that the exeriment is a depth profile in which a repeated set of spectra of a sample are recorded as the surface is gradually removed by an ion bombardment. Scroll through the individual etch levels, either by using the 'Etch time' or 'Etch Level' scroll buttons and see how the spectra change. ~~Level~~ 0 is the first spectrum.		As shown (marked with a red square) in the bottom of the image below, some experiments hold several etch levels - the reason is that the exeriment is a depth profile in which a repeated set of spectra of a sample are recorded as the surface is gradually removed by an ion bombardment. Scroll through the individual etch levels, either by using the 'Etch time' or 'Etch Level' scroll buttons and see how the spectra change. Etch level 0 is the first spectrum.

	[[File:XPS-basics03b.jpg\|700px]]		[[File:XPS-basics03b.jpg\|700px]]

	The view called 'Single Trace' displays only one level - this button is highlighted in the top red square above. Change the display mode to view the complete set of levels by clicking the other buttons in the red square:		The view called 'Single Trace' displays only one etch level - this button is highlighted in the top red square above. Change the display mode to view the complete set of etch levels by clicking the other buttons in the red square:

	<gallery caption="Different views of spectra in experiments with several levels" widths="350" heights="250" perrow="2">		<gallery caption="Different views of spectra in experiments with several etch levels" widths="350" heights="250" perrow="2">
	Image:XPS-basics03display1.jpg \| 2D Chart view		Image:XPS-basics03display1.jpg \| 2D Chart view
	Image:XPS-basics03display2.jpg \| Stacked Chart view		Image:XPS-basics03display2.jpg \| Stacked Chart view