Specific Process Knowledge/Characterization/XPS/Nexsa - Revision history

Mmat at 14:48, 2 June 2025

2025-06-02T14:48:31Z

← Older revision		Revision as of 16:48, 2 June 2025
Line 10:		Line 10:
	The XPS Nexsa offers a variety of surface analysis techniques in addition to its main XPS technique.		The XPS Nexsa offers a variety of surface analysis techniques in addition to its main XPS technique.

	[[Image:XPS Nexsa instrument.jpg \|~~frame~~\|300px\|The XPS Nexsa.]]		[[Image:XPS Nexsa instrument.jpg \|thumb\|300px\|The XPS Nexsa.]]

Jmli at 06:33, 28 April 2023

2023-04-28T06:33:18Z

← Older revision		Revision as of 08:33, 28 April 2023
Line 10:		Line 10:
	The XPS Nexsa offers a variety of surface analysis techniques in addition to its main XPS technique.		The XPS Nexsa offers a variety of surface analysis techniques in addition to its main XPS technique.

	[[Image:~~NexsaOverview~~.~~PNG~~ \|frame\|300px\|The XPS Nexsa.]]		[[Image:XPS Nexsa instrument.jpg \|frame\|300px\|The XPS Nexsa.]]

Jmli at 12:07, 31 January 2023

2023-01-31T12:07:52Z

← Older revision		Revision as of 14:07, 31 January 2023
Line 10:		Line 10:
	The XPS Nexsa offers a variety of surface analysis techniques in addition to its main XPS technique.		The XPS Nexsa offers a variety of surface analysis techniques in addition to its main XPS technique.

	[[Image:NexsaOverview.PNG \|frame\|~~x300px~~\|The XPS Nexsa.]]		[[Image:NexsaOverview.PNG \|frame\|300px\|The XPS Nexsa.]]

Jmli: /* Process information */

2020-11-20T09:33:53Z

Process information

← Older revision		Revision as of 11:33, 20 November 2020
Line 35:		Line 35:
	*[[Specific Process Knowledge/Characterization/XPS/Raman\|Raman spectroscopy]]		*[[Specific Process Knowledge/Characterization/XPS/Raman\|Raman spectroscopy]]
	*[[Specific Process Knowledge/Characterization/XPS/UPS technique\|Ultraviolet Photoelectron Spectroscopy or UPS]]		*[[Specific Process Knowledge/Characterization/XPS/UPS technique\|Ultraviolet Photoelectron Spectroscopy or UPS]]
			*[[Specific Process Knowledge/Characterization/XPS/NexsaOverview\|Table with a set of publications in which multiple techniques are used]]

	'''Specific measurements'''		'''Specific measurements'''

			The Nexsa will allow you to characterize the sample in many ways. The list of parameters that can be determined are:
	The Nexsa ~~is capable of measuring a lot~~ of		; Work function
	; Work function ~~measurements~~
	: Based on the measurements of the Fermi Level and the spectrum energy cut-off in a UPS spectrum, the work function may be measured. The Nexsa manual section 3.6.x has more information.		: Based on the measurements of the Fermi Level and the spectrum energy cut-off in a UPS spectrum, the work function may be measured. The Nexsa manual section 3.6.x has more information.
	; Band gap measurements		; Band gap measurements
	:		: Based on the REELS spectra the band gap may be determined.
	; ~~Mapping electronic bands using~~ Angle resolved XPS (ARXPS) and UPS (ARUPS)		; Electronic band structure
	~~: The Nexsa is capable of measuring~~ the ~~following~~		: Using Angle resolved XPS (ARXPS) and UPS (ARUPS) the electronic band structure may be mapped.


	*[[Specific Process Knowledge/Characterization/XPS/NexsaOverview\|Table with a set of publications in which multiple techniques are used]]

	== Getting access to the XPS ==		== Getting access to the XPS ==

Jmli: /* Process information */

2020-11-20T09:26:09Z

Process information

← Older revision		Revision as of 11:26, 20 November 2020
Line 27:		Line 27:
	'''Check out the alternative techniques!'''		'''Check out the alternative techniques!'''

	It is clearly in everybody's interest that the techniques are explored - that we throw all kinds of samples at them and that we investigate what kind of knowledge we can extract. Ideally, all this knowledge that we ~~require~~ should be shared among all the users. We therefore strongly urge you to take a look at the techniques on the pages listed below. Here, we will collect technical information and publications so that, hopefully, you will get inspired to explore the techniques with all kinds of samples.		It is clearly in everybody's interest that the techniques are explored - that we throw all kinds of samples at them and that we investigate what kind of knowledge we can extract. Ideally, all this knowledge that we acquire should be shared among all the users. We therefore strongly urge you to take a look at the techniques on the pages listed below. Here, we will collect technical information and publications so that, hopefully, you will get inspired to explore the techniques with all kinds of samples.

	*[https://xpssimplified.com/whatisxps.php XPSsimplified - The Thermofisher web page on all the Nexsa techniques]		*[https://xpssimplified.com/whatisxps.php XPSsimplified - The Thermofisher web page on all the Nexsa techniques]
Line 35:		Line 35:
	*[[Specific Process Knowledge/Characterization/XPS/Raman\|Raman spectroscopy]]		*[[Specific Process Knowledge/Characterization/XPS/Raman\|Raman spectroscopy]]
	*[[Specific Process Knowledge/Characterization/XPS/UPS technique\|Ultraviolet Photoelectron Spectroscopy or UPS]]		*[[Specific Process Knowledge/Characterization/XPS/UPS technique\|Ultraviolet Photoelectron Spectroscopy or UPS]]

			'''Specific measurements'''


			The Nexsa is capable of measuring a lot of
			; Work function measurements
			: Based on the measurements of the Fermi Level and the spectrum energy cut-off in a UPS spectrum, the work function may be measured. The Nexsa manual section 3.6.x has more information.
			; Band gap measurements
			:
			; Mapping electronic bands using Angle resolved XPS (ARXPS) and UPS (ARUPS)
			: The Nexsa is capable of measuring the following


	*[[Specific Process Knowledge/Characterization/XPS/NexsaOverview\|Table with a set of publications in which multiple techniques are used]]		*[[Specific Process Knowledge/Characterization/XPS/NexsaOverview\|Table with a set of publications in which multiple techniques are used]]

Jmli: /* Process information */

2020-10-05T07:55:56Z

Process information

← Older revision		Revision as of 09:55, 5 October 2020
Line 29:		Line 29:
	It is clearly in everybody's interest that the techniques are explored - that we throw all kinds of samples at them and that we investigate what kind of knowledge we can extract. Ideally, all this knowledge that we require should be shared among all the users. We therefore strongly urge you to take a look at the techniques on the pages listed below. Here, we will collect technical information and publications so that, hopefully, you will get inspired to explore the techniques with all kinds of samples.		It is clearly in everybody's interest that the techniques are explored - that we throw all kinds of samples at them and that we investigate what kind of knowledge we can extract. Ideally, all this knowledge that we require should be shared among all the users. We therefore strongly urge you to take a look at the techniques on the pages listed below. Here, we will collect technical information and publications so that, hopefully, you will get inspired to explore the techniques with all kinds of samples.

			*[https://xpssimplified.com/whatisxps.php XPSsimplified - The Thermofisher web page on all the Nexsa techniques]
	*[[Specific Process Knowledge/Characterization/XPS/XPS technique\|The XPS technique]]		*[[Specific Process Knowledge/Characterization/XPS/XPS technique\|The XPS technique]]
	*[[Specific Process Knowledge/Characterization/XPS/ISS\|Ion Scattering Spectroscopy or ISS]]		*[[Specific Process Knowledge/Characterization/XPS/ISS\|Ion Scattering Spectroscopy or ISS]]

Jmli: /* The XPS Nexsa */

2020-10-02T13:09:27Z

The XPS Nexsa

← Older revision		Revision as of 15:09, 2 October 2020
Line 10:		Line 10:
	The XPS Nexsa offers a variety of surface analysis techniques in addition to its main XPS technique.		The XPS Nexsa offers a variety of surface analysis techniques in addition to its main XPS technique.

	[[Image:NexsaOverview.PNG \|frame\|x300px\|The Nexsa .]]		[[Image:NexsaOverview.PNG \|frame\|x300px\|The XPS Nexsa.]]

Jmli: /* Process information */

2020-09-22T13:48:05Z

Process information

← Older revision		Revision as of 15:48, 22 September 2020
Line 34:		Line 34:
	*[[Specific Process Knowledge/Characterization/XPS/Raman\|Raman spectroscopy]]		*[[Specific Process Knowledge/Characterization/XPS/Raman\|Raman spectroscopy]]
	*[[Specific Process Knowledge/Characterization/XPS/UPS technique\|Ultraviolet Photoelectron Spectroscopy or UPS]]		*[[Specific Process Knowledge/Characterization/XPS/UPS technique\|Ultraviolet Photoelectron Spectroscopy or UPS]]
	*[[Specific Process Knowledge/Characterization/XPS/NexsaOverview\| ~~Comparison~~ with ~~all~~ techniques ~~and hardware options~~]]		*[[Specific Process Knowledge/Characterization/XPS/NexsaOverview\|Table with a set of publications in which multiple techniques are used]]

	== Getting access to the XPS ==		== Getting access to the XPS ==

Jmli: /* Process information */

2020-05-19T08:10:20Z

Process information

← Older revision		Revision as of 10:10, 19 May 2020
Line 21:		Line 21:
	== Process information ==		== Process information ==

	'''The XPS Nexsa with '''<span title="The only analytical option (~~that means excluded~~ chillers, factory training courses, ~~UPS~~ etc) not chosen is a vacuum transfer module " >''' ''all'' '''</span>''' but one options'''		'''The XPS Nexsa with '''<span title="The only analytical option (as opposed to hardware options such as chillers, factory training courses, uninterruptible power supplies etc.) not chosen is a vacuum transfer module " >''' ''all'' '''</span>''' but one options'''

	XPS is a well established technique at DTU Nanolab; we know what we can get from it and so do the users. Take a look at the page of the [[Specific Process Knowledge/Characterization/XPS/K-Alpha\|XPS K-Alpha]] to find more information. The situation is slightly different with the other analytical techniques that the Nexsa offers. These options were not added because we have an urgent need for them in some project - rather, we chose to add them because we got an irresistible offer. Also, should any need for them arise in the future, the price of adding them once the instrument left the factory would be a lot higher. As a result, we don't have any applications waiting to explore what they can offer.		XPS is a well established technique at DTU Nanolab; we know what we can get from it and so do the users. Take a look at the page of the [[Specific Process Knowledge/Characterization/XPS/K-Alpha\|XPS K-Alpha]] to find more information. The situation is slightly different with the other analytical techniques that the Nexsa offers. These options were not added because we have an urgent need for them in some project - rather, we chose to add them because we got an irresistible offer. Also, should any need for them arise in the future, the price of adding them once the instrument left the factory would be a lot higher. As a result, we don't have any applications waiting to explore what they can offer.

Jmli: /* Performance of XPS Nexsa */

2020-04-14T10:05:35Z

Performance of XPS Nexsa

@@ Line 39: / Line 39: @@
 Click [[Specific Process Knowledge/Characterization/XPS/Access | '''HERE''' ]] to see information on how to get access to the XPS.
 == Thermofisher sales documents ==
 *[https://assets.thermofisher.com/TFS-Assets/MSD/brochures/BR52913-EN-Nexsa-XPS-Brochure.pdf Nexsa Surface Analysis System]