Specific Process Knowledge/Characterization/XPS/K-Alpha - Revision history

Mmat at 14:47, 2 June 2025

2025-06-02T14:47:34Z

← Older revision		Revision as of 16:47, 2 June 2025
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			{{cc-nanolab}}

	'''Feedback to this page:		'''Feedback to this page:
	[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/XPS/K-Alpha click here]'''		[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/XPS/K-Alpha click here]'''
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	[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=276 XPS K-Alpha in LabManager]		[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=276 XPS K-Alpha in LabManager]

	[[Image:XPS K-Alpha.jpg \|~~frame~~\|x300px\|The K-Alpha has its back turned towards the [[Specific Process Knowledge/Characterization/XPS/Nexsa \| XPS Nexsa]] in room 904 in building 346.]]		[[Image:XPS K-Alpha.jpg \|thumb\|x300px\|The K-Alpha has its back turned towards the [[Specific Process Knowledge/Characterization/XPS/Nexsa \| XPS Nexsa]] in room 904 in building 346.]]

	==Process information==		==Process information==

Jmli at 06:33, 4 April 2025

2025-04-04T06:33:50Z

← Older revision		Revision as of 08:33, 4 April 2025
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	[[Category: Equipment \|Characterization chemical]]		[[Category: Equipment \|Characterization chemical]]
	[[Category: Characterization\|Chemical]]		[[Category: Characterization\|Chemical]]
			<!--Checked for updates on 4/4-2025 - ok/jmli -->

	== The XPS K-Alpha ==		== The XPS K-Alpha ==

Jmli at 07:37, 25 October 2021

2021-10-25T07:37:59Z

← Older revision		Revision as of 09:37, 25 October 2021
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	[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=276 XPS K-Alpha in LabManager]		[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=276 XPS K-Alpha in LabManager]

	[[Image:XPS K-Alpha.jpg \|frame\|x300px\|The ~~position of the~~ K-Alpha ~~had to be rotated 90 degrees to make room for~~ the [[Specific Process Knowledge/Characterization/XPS/Nexsa \| XPS Nexsa]] in ~~2019~~.]]		[[Image:XPS K-Alpha.jpg \|frame\|x300px\|The K-Alpha has its back turned towards the [[Specific Process Knowledge/Characterization/XPS/Nexsa \| XPS Nexsa]] in room 904 in building 346.]]

	==Process information==		==Process information==

Jmli: /* Elemental analysis */

2020-04-07T09:12:25Z

Elemental analysis

← Older revision		Revision as of 11:12, 7 April 2020
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	[[Image:XPS K-Alpha.jpg \|frame\|x300px\|The position of the K-Alpha had to be rotated 90 degrees to make room for the [[Specific Process Knowledge/Characterization/XPS/Nexsa \| XPS Nexsa]] in 2019.]]		[[Image:XPS K-Alpha.jpg \|frame\|x300px\|The position of the K-Alpha had to be rotated 90 degrees to make room for the [[Specific Process Knowledge/Characterization/XPS/Nexsa \| XPS Nexsa]] in 2019.]]

	==~~Elemental analysis~~==		==Process information==
	The XPS instrument enables elemental analysis, chemical state analysis on the sample surface or deeper down by a depth profiling. A comparison about techniques and instruments used for elemental analysis at DTU Nanolab can be found on the page [[Specific Process Knowledge/Characterization/Element analysis\|Element analysis]].		The XPS instrument enables elemental analysis, chemical state analysis on the sample surface or deeper down by a depth profiling. A comparison about techniques and instruments used for elemental analysis at DTU Nanolab can be found on the page [[Specific Process Knowledge/Characterization/Element analysis\|Element analysis]].

Jmli: /* The XPS K-Alpha */

2020-04-06T13:54:58Z

The XPS K-Alpha

← Older revision		Revision as of 15:54, 6 April 2020
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	[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=276 XPS K-Alpha in LabManager]		[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=276 XPS K-Alpha in LabManager]

	[[Image:XPS K-Alpha.jpg \|frame\|x300px\|The position of the K-Alpha had to be rotated 90 degrees to make room for the [[Specific Process Knowledge/Characterization/XPS/Nexsa \| XPS Nexsa]]] in 2019.]		[[Image:XPS K-Alpha.jpg \|frame\|x300px\|The position of the K-Alpha had to be rotated 90 degrees to make room for the [[Specific Process Knowledge/Characterization/XPS/Nexsa \| XPS Nexsa]] in 2019.]]

	==Elemental analysis==		==Elemental analysis==

Jmli: /* The XPS K-Alpha */

2020-04-06T13:53:56Z

The XPS K-Alpha

← Older revision		Revision as of 15:53, 6 April 2020
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	<!-- give the link to the equipment info page in LabManager: -->		<!-- give the link to the equipment info page in LabManager: -->
	[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=276 XPS K-Alpha in LabManager]		[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=276 XPS K-Alpha in LabManager]

			[[Image:XPS K-Alpha.jpg \|frame\|x300px\|The position of the K-Alpha had to be rotated 90 degrees to make room for the [[Specific Process Knowledge/Characterization/XPS/Nexsa \| XPS Nexsa]]] in 2019.]

	==Elemental analysis==		==Elemental analysis==

Jmli: /* Elemental analysis */

2020-04-06T13:50:51Z

Elemental analysis

← Older revision		Revision as of 15:50, 6 April 2020
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	*[[Specific Process Knowledge/Characterization/XPS/XPS Chemical states \|Chemical sensitivity]]		*[[Specific Process Knowledge/Characterization/XPS/XPS Chemical states \|Chemical sensitivity]]
	*[[Specific Process Knowledge/Characterization/XPS/XPS Depth profiling\|Depth profiling]]		*[[Specific Process Knowledge/Characterization/XPS/XPS Depth profiling\|Depth profiling]]
	*[[/Carbon contamination\|Carbon contamination]]		*[[Specific Process Knowledge/Characterization/XPS/Carbon contamination\|Carbon contamination]]

	*[[Specific Process Knowledge/Characterization/XPS/ExtDocs \| Links to external material ]]		*[[Specific Process Knowledge/Characterization/XPS/ExtDocs \| Links to external material ]]

Jmli at 13:49, 6 April 2020

2020-04-06T13:49:42Z

← Older revision		Revision as of 15:49, 6 April 2020
Line 15:		Line 15:
	<!-- give the link to the equipment info page in LabManager: -->		<!-- give the link to the equipment info page in LabManager: -->
	[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=276 XPS K-Alpha in LabManager]		[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=276 XPS K-Alpha in LabManager]

			==Elemental analysis==
			The XPS instrument enables elemental analysis, chemical state analysis on the sample surface or deeper down by a depth profiling. A comparison about techniques and instruments used for elemental analysis at DTU Nanolab can be found on the page [[Specific Process Knowledge/Characterization/Element analysis\|Element analysis]].

			More about the different possibilities of the XPS instrument is found here:

			*[[Specific Process Knowledge/Characterization/XPS/XPS technique\|The XPS technique]]
			*[[Specific Process Knowledge/Characterization/XPS/XPS elemental composition\|Elemental analysis]]
			*[[Specific Process Knowledge/Characterization/XPS/XPS Chemical states \|Chemical sensitivity]]
			*[[Specific Process Knowledge/Characterization/XPS/XPS Depth profiling\|Depth profiling]]
			*[[/Carbon contamination\|Carbon contamination]]

			*[[Specific Process Knowledge/Characterization/XPS/ExtDocs \| Links to external material ]]

			== Getting access to the XPS ==

			Click [[Specific Process Knowledge/Characterization/XPS/Access \| '''HERE''' ]] to see information on how to get access to the XPS.

			== Performance of XPS K-Alpha ==

			{\| border="2" cellspacing="0" cellpadding="1" \|-
			!style="background:silver; color:black;" align="left"\|Purpose
			\|style="background:LightGrey; color:black"\|Chemical analysis
			\|style="background:WhiteSmoke; color:black"\|
			* [[Specific Process Knowledge/Characterization/XPS/XPS elemental composition\|Probing elemental composition]]
			* [[Specific Process Knowledge/Characterization/XPS/XPS Chemical states \|Chemical state identification]]
			* Non destructive technique
			* Surface sensitive
			* [[Specific Process Knowledge/Characterization/XPS/XPS Depth profiling\|Depth profiling]] possible by ion beam etch of sample
			\|-
			!rowspan="5" style="background:silver; color:black" align="left"\| Performance
			\|style="background:LightGrey; color:black"\|Spot size
			\|style="background:WhiteSmoke; color:black"\|Can be set between 30µm - 400µm

			\|-
			\|style="background:LightGrey; color:black"\|Probing depth
			\|style="background:WhiteSmoke; color:black"\|Depending on probed element. Max probe depth lies within 10-200 Å.
			\|-
			\|style="background:LightGrey; color:black"\|Resolution
			\|style="background:WhiteSmoke; color:black"\|Dependent on probed elements. Concentrations down to about 0,5 atomic % can in some cases be detected.
			\|-
			\|style="background:LightGrey; color:black"\|Charge compensation
			\|style="background:WhiteSmoke; color:black"\|
			Flood gun can be used for charge compensation of non conductive samples
			\|-
			\|style="background:LightGrey; color:black"\|Finding structures
			\|style="background:WhiteSmoke; color:black"\|Choose measuring spot from camera image (magnified)
			\|-
			\|-
			\|-
			!rowspan="2" style="background:silver; color:black" align="left"\|Depth profiling
			\|style="background:LightGrey; color:black"\|Purpose
			\|style="background:WhiteSmoke; color:black"\|With ion beam etch the top layer of the material can be removed, to do a depth profiling
			\|-
			\|style="background:LightGrey; color:black"\|Ion beam size
			\|style="background:WhiteSmoke; color:black"\| About 3x1 mm

			\|-
			!rowspan="2" style="background:silver; color:black" align="left"\|Substrates
			\|style="background:LightGrey; color:black"\|Substrate size
			\|style="background:WhiteSmoke; color:black"\|
			Maximum 60x60 mm
			\|-
			\| style="background:LightGrey; color:black"\|Substrate thickness
			\|style="background:WhiteSmoke; color:black"\|
			Maximum height about 20 mm
			\|-
			\|}

Jmli at 11:40, 3 April 2020

2020-04-03T11:40:09Z

← Older revision		Revision as of 13:40, 3 April 2020
Line 4:		Line 4:
	[[Category: Characterization\|Chemical]]		[[Category: Characterization\|Chemical]]

	= The XPS K-Alpha =		== The XPS K-Alpha ==

			Name: XPS K-Alpha <br>
			Vendor: Thermofisher <br>
			The XPS K-Alpha allows you to analyse a broad range of samples with the XPS technique.

	'''The user manual(s), user APV(s), technical information and contact information are be found in LabManager:'''		'''The user manual(s), user APV(s), technical information and contact information are be found in LabManager:'''

Jmli at 09:04, 2 April 2020

2020-04-02T09:04:51Z

← Older revision		Revision as of 11:04, 2 April 2020
Line 10:		Line 10:

	<!-- give the link to the equipment info page in LabManager: -->		<!-- give the link to the equipment info page in LabManager: -->
	[http://labmanager.dtu.dk/function.php?module=Machine&view=view&~~page_id~~=276 XPS K-Alpha in LabManager]		[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=276 XPS K-Alpha in LabManager]

← Older revision		Revision as of 15:50, 6 April 2020
Line 25:		Line 25:
	*[[Specific Process Knowledge/Characterization/XPS/XPS Chemical states \|Chemical sensitivity]]		*[[Specific Process Knowledge/Characterization/XPS/XPS Chemical states \|Chemical sensitivity]]
	*[[Specific Process Knowledge/Characterization/XPS/XPS Depth profiling\|Depth profiling]]		*[[Specific Process Knowledge/Characterization/XPS/XPS Depth profiling\|Depth profiling]]
	*[[/Carbon contamination\|Carbon contamination]]		*[[Specific Process Knowledge/Characterization/XPS/Carbon contamination\|Carbon contamination]]

	*[[Specific Process Knowledge/Characterization/XPS/ExtDocs \| Links to external material ]]		*[[Specific Process Knowledge/Characterization/XPS/ExtDocs \| Links to external material ]]

← Older revision		Revision as of 15:49, 6 April 2020
Line 15:		Line 15:
	<!-- give the link to the equipment info page in LabManager: -->		<!-- give the link to the equipment info page in LabManager: -->
	[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=276 XPS K-Alpha in LabManager]		[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=276 XPS K-Alpha in LabManager]

			==Elemental analysis==
			The XPS instrument enables elemental analysis, chemical state analysis on the sample surface or deeper down by a depth profiling. A comparison about techniques and instruments used for elemental analysis at DTU Nanolab can be found on the page [[Specific Process Knowledge/Characterization/Element analysis\|Element analysis]].

			More about the different possibilities of the XPS instrument is found here:

			*[[Specific Process Knowledge/Characterization/XPS/XPS technique\|The XPS technique]]
			*[[Specific Process Knowledge/Characterization/XPS/XPS elemental composition\|Elemental analysis]]
			*[[Specific Process Knowledge/Characterization/XPS/XPS Chemical states \|Chemical sensitivity]]
			*[[Specific Process Knowledge/Characterization/XPS/XPS Depth profiling\|Depth profiling]]
			*[[/Carbon contamination\|Carbon contamination]]

			*[[Specific Process Knowledge/Characterization/XPS/ExtDocs \| Links to external material ]]

			== Getting access to the XPS ==

			Click [[Specific Process Knowledge/Characterization/XPS/Access \| '''HERE''' ]] to see information on how to get access to the XPS.

			== Performance of XPS K-Alpha ==

			{\| border="2" cellspacing="0" cellpadding="1" \|-
			!style="background:silver; color:black;" align="left"\|Purpose
			\|style="background:LightGrey; color:black"\|Chemical analysis
			\|style="background:WhiteSmoke; color:black"\|
			* [[Specific Process Knowledge/Characterization/XPS/XPS elemental composition\|Probing elemental composition]]
			* [[Specific Process Knowledge/Characterization/XPS/XPS Chemical states \|Chemical state identification]]
			* Non destructive technique
			* Surface sensitive
			* [[Specific Process Knowledge/Characterization/XPS/XPS Depth profiling\|Depth profiling]] possible by ion beam etch of sample
			\|-
			!rowspan="5" style="background:silver; color:black" align="left"\| Performance
			\|style="background:LightGrey; color:black"\|Spot size
			\|style="background:WhiteSmoke; color:black"\|Can be set between 30µm - 400µm

			\|-
			\|style="background:LightGrey; color:black"\|Probing depth
			\|style="background:WhiteSmoke; color:black"\|Depending on probed element. Max probe depth lies within 10-200 Å.
			\|-
			\|style="background:LightGrey; color:black"\|Resolution
			\|style="background:WhiteSmoke; color:black"\|Dependent on probed elements. Concentrations down to about 0,5 atomic % can in some cases be detected.
			\|-
			\|style="background:LightGrey; color:black"\|Charge compensation
			\|style="background:WhiteSmoke; color:black"\|
			Flood gun can be used for charge compensation of non conductive samples
			\|-
			\|style="background:LightGrey; color:black"\|Finding structures
			\|style="background:WhiteSmoke; color:black"\|Choose measuring spot from camera image (magnified)
			\|-
			\|-
			\|-
			!rowspan="2" style="background:silver; color:black" align="left"\|Depth profiling
			\|style="background:LightGrey; color:black"\|Purpose
			\|style="background:WhiteSmoke; color:black"\|With ion beam etch the top layer of the material can be removed, to do a depth profiling
			\|-
			\|style="background:LightGrey; color:black"\|Ion beam size
			\|style="background:WhiteSmoke; color:black"\| About 3x1 mm

			\|-
			!rowspan="2" style="background:silver; color:black" align="left"\|Substrates
			\|style="background:LightGrey; color:black"\|Substrate size
			\|style="background:WhiteSmoke; color:black"\|
			Maximum 60x60 mm
			\|-
			\| style="background:LightGrey; color:black"\|Substrate thickness
			\|style="background:WhiteSmoke; color:black"\|
			Maximum height about 20 mm
			\|-
			\|}