Specific Process Knowledge/Characterization/Topographic measurement - Revision history

Reet: /* Comparison of Stylus Profilers, Optical Profilers and AFMs at Nanolab */

2025-06-25T09:16:01Z

Comparison of Stylus Profilers, Optical Profilers and AFMs at Nanolab

← Older revision		Revision as of 11:16, 25 June 2025
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	!Allowed Materials		!Allowed Materials
	\|		\|
	*Almost any material that leaves no residuals; please ask responsible group about non-standard materials.		Almost any material that leaves no residuals; please ask responsible group about non-standard materials.
	\|		\|
	*Almost any material that leaves no residuals; please ask responsible group about non-standard materials.		Almost any material that leaves no residuals; please ask responsible group about non-standard materials.
	\|		\|
	*Almost any material that leaves no residuals; please ask responsible group about non-standard materials.		Almost any material that leaves no residuals; please ask responsible group about non-standard materials.
	\|		\|
	*Almost any material that leaves no residuals; please ask responsible group about non-standard materials.		Almost any material that leaves no residuals; please ask responsible group about non-standard materials.
	\|		\|
	*Almost any material that leaves no residuals; please ask responsible group about non-standard materials.		Almost any material that leaves no residuals; please ask responsible group about non-standard materials.
	\|		\|
	*Almost any material that leaves no residuals; please ask responsible group about non-standard materials.		Almost any material that leaves no residuals; please ask responsible group about non-standard materials.
	\|		\|
	*Almost any material that leaves no residuals; please ask responsible group about non-standard materials.		Almost any material that leaves no residuals; please ask responsible group about non-standard materials.
	\|-		\|-

Reet: /* Comparison of Stylus Profilers, Optical Profilers and AFMs at Nanolab */

2025-06-25T09:13:05Z

Comparison of Stylus Profilers, Optical Profilers and AFMs at Nanolab

← Older revision		Revision as of 11:13, 25 June 2025
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	\|Excellent capability		\|Excellent capability
	\|Can be done		\|Can be done
	\|-		\|
	\|-		\|
	\|No stress calculation capability		\|No stress calculation capability
	\|Cannot be done		\|Cannot be done
	\|Cannot be done		\|Cannot be done
	\|-		\|

	\|-		\|-
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	!Allowed Materials		!Allowed Materials
	\|		\|
	*Almost any material that ~~does not leave residual on the stage,~~ please ask ~~the~~ responsible group ~~for any~~ non-standard materials.		*Almost any material that leaves no residuals; please ask responsible group about non-standard materials.
	\|		\|
	*Almost any material that ~~does not leave residual on the stage,~~ please ask ~~the~~ responsible group ~~for any~~ non-standard materials.		*Almost any material that leaves no residuals; please ask responsible group about non-standard materials.
	\|		\|
	*Almost any material that ~~does not leave residual on the stage,~~ please ask ~~the~~ responsible group ~~for any~~ non-standard materials.		*Almost any material that leaves no residuals; please ask responsible group about non-standard materials.
	\|		\|
	*Almost any material that ~~does not leave residual on the stage,~~ please ask ~~the~~ responsible group ~~for any~~ non-standard materials.		*Almost any material that leaves no residuals; please ask responsible group about non-standard materials.
	\|		\|
	*Almost any material that ~~does not leave residual on the stage,~~ please ask ~~the~~ responsible group ~~for any~~ non-standard materials.		*Almost any material that leaves no residuals; please ask responsible group about non-standard materials.
	\|		\|
	*Almost any material that ~~does not leave residual on the stage,~~ please ask ~~the~~ responsible group ~~for any~~ non-standard materials.		*Almost any material that leaves no residuals; please ask responsible group about non-standard materials.
	\|		\|
	*Almost any material that ~~does not leave residual on the stage,~~ please ask ~~the~~ responsible group ~~for any~~ non-standard materials.		*Almost any material that leaves no residuals; please ask responsible group about non-standard materials.

	\|-		\|-

Reet: /* Comparison of Stylus Profilers, Optical Profilers and AFMs at Nanolab */

2025-06-25T09:09:30Z

Comparison of Stylus Profilers, Optical Profilers and AFMs at Nanolab

Show changes

Mmat: /* Comparison of stylus profilers, optical profilers and AFMs at Nanolab */

2025-05-27T20:05:19Z

Comparison of stylus profilers, optical profilers and AFMs at Nanolab

← Older revision		Revision as of 22:05, 27 May 2025
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	<br>		<br>

	=Comparison of ~~stylus profilers~~, ~~optical profilers~~ and AFMs at Nanolab=		=Comparison of Stylus Profilers, Optical Profilers and AFMs at Nanolab=

	{\|border="1" cellspacing="1" cellpadding="3" style="text-align:left;"		{\|border="1" cellspacing="1" cellpadding="3" style="text-align:left;"

Mmat at 20:01, 27 May 2025

2025-05-27T20:01:00Z

← Older revision		Revision as of 22:01, 27 May 2025
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			{{cc-nanolab}}

	'''Feedback to this page''': '''[mailto:Characterization@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/Topographic_measurement click here]'''		'''Feedback to this page''': '''[mailto:Characterization@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/Topographic_measurement click here]'''
			<br>
			<br>
	=Topographic measurements=		=Topographic measurements=
	Topographic measurements are measurements of height differences on your sample. If you measure many spots on the sample you can get a topographic image of the surface.		Topographic measurements are measurements of height differences on your sample. If you measure many spots on the sample you can get a topographic image of the surface.

Mmat: /* Comparison of stylus profilers, optical profilers and AFMs at Nanolab */

2025-05-27T20:00:23Z

Comparison of stylus profilers, optical profilers and AFMs at Nanolab

← Older revision		Revision as of 22:00, 27 May 2025
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	\|-		\|-
	\|-style="background:LightGrey; color:black"		\|-style="background:LightGrey; color:black"
	!~~'''~~Max. ~~scan range~~ xy~~'''~~		!Max. Scan Range xy
	\|Line scan x: 1 µm to 200mm.		\|Line scan x: 1 µm to 200mm.
	Map scan xy: up to the largest square that can be inscribed in an 8" wafer		Map scan xy: up to the largest square that can be inscribed in an 8" wafer
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	\|-		\|-
	\|-style="background:WhiteSmoke; color:black"		\|-style="background:WhiteSmoke; color:black"
	!~~'''~~Max. ~~scan range~~ z~~'''~~		!Max. Scan Range z
	\|up to 900 µm		\|up to 900 µm
	\|50 Å to 1 mm		\|50 Å to 1 mm
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	\|-		\|-
	\|-style="background:LightGrey; color:black"		\|-style="background:LightGrey; color:black"
	!~~'''~~Resolution xy~~'''~~		!Resolution xy
	\|down to 0.025 µm		\|down to 0.025 µm
	\|down to 0.003 µm		\|down to 0.003 µm
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	\|-		\|-
	\|-style="background:WhiteSmoke; color:black"		\|-style="background:WhiteSmoke; color:black"
	!~~'''~~Resolution z~~'''~~		!Resolution z
	\|0.01, 0.08 or 0.6 Å depending on range (note resolution much below 1 Å is not so useful since it is far below the noise level)		\|0.01, 0.08 or 0.6 Å depending on range (note resolution much below 1 Å is not so useful since it is far below the noise level)
	\|1 Å, 10 Å, 40 Å or 160 Å depending on range		\|1 Å, 10 Å, 40 Å or 160 Å depending on range
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	\|-		\|-
	\|-style="background:LightGrey; color:black"		\|-style="background:LightGrey; color:black"
	!~~'''~~Max. ~~scan depth~~ [µm] as a function of trench width W~~'''~~)		!Max. Scan Depth [µm] (as a function of trench width W)
	\|0.866*(W[µm]-2µm)		\|0.866*(W[µm]-2µm)
	\|1.2*(W[µm]-5µm)		\|1.2*(W[µm]-5µm)
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	\|-		\|-
	\|-style="background:WhiteSmoke; color:black"		\|-style="background:WhiteSmoke; color:black"
	!~~'''~~Standard ~~tip radius'''~~		!Standard Tip Radius
	\|2 µm 60<sup>o</sup> cone		\|2 µm 60<sup>o</sup> cone
	\|5 µm 45<sup>o</sup> cone		\|5 µm 45<sup>o</sup> cone
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	\|-style="background:LightGrey; color:black"		\|-style="background:LightGrey; color:black"
	!~~'''~~Stress ~~measurement'''~~		!Stress Measurement
	\|Excellent capability		\|Excellent capability
	\|Can be done		\|Can be done
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	\|-		\|-
	\|-style="background:WhiteSmoke; color:black"		\|-style="background:WhiteSmoke; color:black"
	!~~'''~~Surface ~~roughness'''~~		!Surface Rroughness
	\|Can be done on a line or map (parallel line scans)		\|Can be done on a line or map (parallel line scans)
	\|Can be done on a line scan		\|Can be done on a line scan
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	\|-		\|-
	\|-style="background:LightGrey; color:black"		\|-style="background:LightGrey; color:black"
	!~~'''~~Substrate ~~size'''~~		!Substrate Size
	\|up to 8"		\|up to 8"
	\|up to 6"		\|up to 6"
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	\|-		\|-
	\|-style="background:WhiteSmoke; color:black"		\|-style="background:WhiteSmoke; color:black"
	!~~'''~~Allowed ~~materials'''~~		!Allowed Materials
	\|		\|
	*Almost any material that does not leave residual on the stage, please check the responsible group for any non standard materials		*Almost any material that does not leave residual on the stage, please check the responsible group for any non standard materials
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	\|-		\|-
	\|-style="background:LightGrey; color:black"		\|-style="background:LightGrey; color:black"
	!~~'''~~Location~~'''~~		!Location
	\|Cleanroom F-2		\|Cleanroom F-2
	\|Cleanroom B-1		\|Cleanroom B-1

Mmat: /* Thin film thickness */

2025-05-27T19:46:57Z

Thin film thickness

← Older revision		Revision as of 21:46, 27 May 2025
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	<br>		<br>

	==Thin ~~film thickness~~==		==Thin Film Thickness==
	The profilers can be used to measure the thickness of optically transparent thin films or etched non-transparent thin films. There are also other options for measuring film thickness. All the methods are compared on the [[Specific Process Knowledge/Characterization/Measurement of film thickness and optical constants\| "Measurement of Thin Film Thickness and Optical Constants"]] page.		The profilers can be used to measure the thickness of optically transparent thin films or etched non-transparent thin films. There are also other options for measuring film thickness. All the methods are compared on the [[Specific Process Knowledge/Characterization/Measurement of film thickness and optical constants\| "Measurement of Thin Film Thickness and Optical Constants"]] page.
	<br>		<br>

Mmat: /* High aspect ratio structures */

2025-05-27T19:46:47Z

High aspect ratio structures

← Older revision		Revision as of 21:46, 27 May 2025
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	*AFMs (AFM Icon-PT1 and AFM Icon-PT2) - ''AFMs for "mechanically" measuring topography (nano-regime)''		*AFMs (AFM Icon-PT1 and AFM Icon-PT2) - ''AFMs for "mechanically" measuring topography (nano-regime)''
	<br>		<br>
	==High ~~aspect ratio structures~~==		==High Aspect Ratio Structures==
	The fact that the stylus tip of a stylus profiler or an AFM is shaped like a cone with some finite tip angle causes a problem when characterizing high aspect ratio structures. For instance, if a 20 µm wide trench is etched deeper than approximately 18 µm, the tip of the Dektak will not be able to reach the bottom. The optical profiler uses a light beam that is focused through an objective. Therefore it is able to measure higher aspect ratios. The aspect ratio is limited by the possibility for the light to reach the bottom and get back to the detector. On some samples we have been able to measure aspect ratios above 1:10. Otherwise the solution is to cleave the sample along a line that is perpendicular to the trench and then inspect the profile in a [[Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy\|scanning electron microscope]] or a microscope (for large structures).		The fact that the stylus tip of a stylus profiler or an AFM is shaped like a cone with some finite tip angle causes a problem when characterizing high aspect ratio structures. For instance, if a 20 µm wide trench is etched deeper than approximately 18 µm, the tip of the Dektak will not be able to reach the bottom. The optical profiler uses a light beam that is focused through an objective. Therefore it is able to measure higher aspect ratios. The aspect ratio is limited by the possibility for the light to reach the bottom and get back to the detector. On some samples we have been able to measure aspect ratios above 1:10. Otherwise the solution is to cleave the sample along a line that is perpendicular to the trench and then inspect the profile in a [[Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy\|scanning electron microscope]] or a microscope (for large structures).
	<br>		<br>

Mmat: /* High aspect ratio structures */

2025-05-27T19:46:29Z

High aspect ratio structures

← Older revision		Revision as of 21:46, 27 May 2025
Line 12:		Line 12:
	The fact that the stylus tip of a stylus profiler or an AFM is shaped like a cone with some finite tip angle causes a problem when characterizing high aspect ratio structures. For instance, if a 20 µm wide trench is etched deeper than approximately 18 µm, the tip of the Dektak will not be able to reach the bottom. The optical profiler uses a light beam that is focused through an objective. Therefore it is able to measure higher aspect ratios. The aspect ratio is limited by the possibility for the light to reach the bottom and get back to the detector. On some samples we have been able to measure aspect ratios above 1:10. Otherwise the solution is to cleave the sample along a line that is perpendicular to the trench and then inspect the profile in a [[Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy\|scanning electron microscope]] or a microscope (for large structures).		The fact that the stylus tip of a stylus profiler or an AFM is shaped like a cone with some finite tip angle causes a problem when characterizing high aspect ratio structures. For instance, if a 20 µm wide trench is etched deeper than approximately 18 µm, the tip of the Dektak will not be able to reach the bottom. The optical profiler uses a light beam that is focused through an objective. Therefore it is able to measure higher aspect ratios. The aspect ratio is limited by the possibility for the light to reach the bottom and get back to the detector. On some samples we have been able to measure aspect ratios above 1:10. Otherwise the solution is to cleave the sample along a line that is perpendicular to the trench and then inspect the profile in a [[Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy\|scanning electron microscope]] or a microscope (for large structures).
	<br>		<br>
			<br>

	==Thin film thickness==		==Thin film thickness==
	The profilers can be used to measure the thickness of optically transparent thin films or etched non-transparent thin films. There are also other options for measuring film thickness. All the methods are compared on the [[Specific Process Knowledge/Characterization/Measurement of film thickness and optical constants\| "Measurement of Thin Film Thickness and Optical Constants"]] page.		The profilers can be used to measure the thickness of optically transparent thin films or etched non-transparent thin films. There are also other options for measuring film thickness. All the methods are compared on the [[Specific Process Knowledge/Characterization/Measurement of film thickness and optical constants\| "Measurement of Thin Film Thickness and Optical Constants"]] page.

Mmat: /* Thin film thickness */

2025-05-27T19:46:21Z

Thin film thickness

← Older revision		Revision as of 21:46, 27 May 2025
Line 13:		Line 13:
	<br>		<br>
	==Thin film thickness==		==Thin film thickness==
	The profilers can be used to measure the thickness of optically transparent thin films or etched non-transparent thin films. There are also other options for measuring film thickness. All the methods are compared on the [[Specific Process Knowledge/Characterization/Measurement of ~~Film~~ thickness and optical constants\| "Measurement of Thin Film Thickness and Optical Constants"]] page.		The profilers can be used to measure the thickness of optically transparent thin films or etched non-transparent thin films. There are also other options for measuring film thickness. All the methods are compared on the [[Specific Process Knowledge/Characterization/Measurement of film thickness and optical constants\| "Measurement of Thin Film Thickness and Optical Constants"]] page.
	<br>		<br>
	<br>		<br>

	=Comparison of stylus profilers, optical profilers and AFMs at Nanolab=		=Comparison of stylus profilers, optical profilers and AFMs at Nanolab=