Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy - Revision history

Mmat: /* Comparison of the SEMs at DTU Nanolab - building 307/314 50px */

2025-06-02T13:58:38Z

Comparison of the SEMs at DTU Nanolab - building 307/314 50px

← Older revision		Revision as of 15:58, 2 June 2025
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	<br clear="all" />		<br clear="all" />

	==Comparison of the SEMs at DTU Nanolab - building 307/314 ~~[[image:Under_construction.png\|50px]]~~==		==Comparison of the SEMs at DTU Nanolab - building 307/314 ==
			Due to ongoing development of tools and processes, some information regarding available SEMs may be incomplete or not quite up-to-date.
	{{SEM comparison table 314}}		{{SEM comparison table 314}}

Mmat at 22:05, 24 February 2025

2025-02-24T22:05:50Z

← Older revision		Revision as of 00:05, 25 February 2025
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			{{cc-nanolab}}

	'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/SEM:_Scanning_Electron_Microscopy click here]'''		'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/SEM:_Scanning_Electron_Microscopy click here]'''
			<BR>
	~~''This page is written by DTU Nanolab internal''~~		<BR>

	=Scanning Electron Microscopy at Nanolab=		=Scanning Electron Microscopy at Nanolab=
	There is a large range of scanning electron microscopes (SEMs) at DTU Nanolab. The first couple of sections on this page are about the SEMs in and around the fabrication part of Nanolab in building 346 and 451. The last section is about the SEMs in building 314, which is our dedicated characterization facility.		There is a large range of scanning electron microscopes (SEMs) at DTU Nanolab. The first couple of sections on this page are about the SEMs in and around the fabrication part of Nanolab in building 346 and 451. The last section is about the SEMs in building 314, which is our dedicated characterization facility.

Jmli: /* Comparison of SEM's in building 346/451 */

2023-12-19T13:10:59Z

Comparison of SEM's in building 346/451

← Older revision		Revision as of 15:10, 19 December 2023
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	\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Supra_3\|SEM Supra 3]]		\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Supra_3\|SEM Supra 3]]
	\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Gemini_1\|SEM Gemini 1]]		\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Gemini_1\|SEM Gemini 1]]
	~~<i>Under installation (August 2023)</i>~~
	\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Tabletop_1\|SEM Tabletop 1]]		\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Tabletop_1\|SEM Tabletop 1]]
	<!--\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific Process Knowledge/Characterization/SEM FEI QUANTA 200 3D\|FEI Quanta 200 3D]]-->		<!--\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific Process Knowledge/Characterization/SEM FEI QUANTA 200 3D\|FEI Quanta 200 3D]]-->

Jmli: /* Scanning electron microscopy in and around the cleanroom */

2023-12-19T13:10:20Z

Scanning electron microscopy in and around the cleanroom

← Older revision		Revision as of 15:10, 19 December 2023
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	* The [[Specific_Process_Knowledge/Characterization/SEM_Supra_2\|SEM Supra 2]] and [[Specific_Process_Knowledge/Characterization/SEM_Supra_3\|SEM Supra 3]] are located in the cleanroom where they serve as general imaging tools for samples that have been fabricated in the cleanroom. Like SEM Supra 1, they are VP models from Carl Zeiss and will produce excellent images on any sample. The possibility of operating at higher chamber pressures in the VP mode makes imaging of bulk non-conducting samples possible. The [[Specific_Process_Knowledge/Characterization/SEM_Supra_2\|SEM Supra 2]] is also equipped with an airlock and an EDX detector.		* The [[Specific_Process_Knowledge/Characterization/SEM_Supra_2\|SEM Supra 2]] and [[Specific_Process_Knowledge/Characterization/SEM_Supra_3\|SEM Supra 3]] are located in the cleanroom where they serve as general imaging tools for samples that have been fabricated in the cleanroom. Like SEM Supra 1, they are VP models from Carl Zeiss and will produce excellent images on any sample. The possibility of operating at higher chamber pressures in the VP mode makes imaging of bulk non-conducting samples possible. The [[Specific_Process_Knowledge/Characterization/SEM_Supra_2\|SEM Supra 2]] is also equipped with an airlock and an EDX detector.

	* The [[Specific_Process_Knowledge/Characterization/SEM_Gemini_1\|SEM Gemini 1]] is is a ~~new~~ SEM ~~fra~~ Carl Zeiss that ~~is being~~ installed in the cleanroom at the ~~moment (August~~ 2023)		* The [[Specific_Process_Knowledge/Characterization/SEM_Gemini_1\|SEM Gemini 1]] is a state-of-the-art SEM from Carl Zeiss that was installed in the cleanroom in the autumn of 2023. It has an impressive range of detectors and modes that are intended to be used for the most demanding samples.

	* The [[Specific_Process_Knowledge/Characterization/SEM_Tabletop_1\|SEM Tabletop 1]] is a tabletop SEM that is located in the basement outside the cleanroom. It has a limited resolution, but it is fast and easy to use, also for non-conducting samples. Training in the others SEMs is not required to use this SEM.		* The [[Specific_Process_Knowledge/Characterization/SEM_Tabletop_1\|SEM Tabletop 1]] is a tabletop SEM that is located in the basement outside the cleanroom. It has a limited resolution, but it is fast and easy to use, also for non-conducting samples. Training in the others SEMs is not required to use this SEM.

Jmli: /* Comparison of SEM's in building 346/451 */

2023-09-28T13:24:45Z

Comparison of SEM's in building 346/451

← Older revision		Revision as of 15:24, 28 September 2023
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	\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Supra_2\|SEM Supra 2]]		\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Supra_2\|SEM Supra 2]]
	\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Supra_3\|SEM Supra 3]]		\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Supra_3\|SEM Supra 3]]
	\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Gemini_1\|SEM Gemini~~]][[Specific_Process_Knowledge/Characterization/SEM_Gemini_1/ma\|~~ 1]]		\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Gemini_1\|SEM Gemini 1]]
	<i>Under installation (August 2023)</i>		<i>Under installation (August 2023)</i>
	\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Tabletop_1\|SEM Tabletop 1]]		\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Tabletop_1\|SEM Tabletop 1]]

Jmli: /* Comparison of SEM's in building 346/451 */

2023-09-25T08:04:04Z

Comparison of SEM's in building 346/451

← Older revision		Revision as of 10:04, 25 September 2023
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	\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Supra_2\|SEM Supra 2]]		\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Supra_2\|SEM Supra 2]]
	\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Supra_3\|SEM Supra 3]]		\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Supra_3\|SEM Supra 3]]
	\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Gemini_1\|SEM Gemini 1]]		\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Gemini_1\|SEM Gemini]][[Specific_Process_Knowledge/Characterization/SEM_Gemini_1/ma\| 1]]
	<i>Under installation (August 2023)</i>		<i>Under installation (August 2023)</i>
	\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Tabletop_1\|SEM Tabletop 1]]		\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Tabletop_1\|SEM Tabletop 1]]

Pevo: /* Comparison of SEM's in building 346/451 */

2023-08-15T08:43:04Z

Comparison of SEM's in building 346/451

← Older revision		Revision as of 10:43, 15 August 2023
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	<i>Under installation (August 2023)</i>		<i>Under installation (August 2023)</i>
	\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Tabletop_1\|SEM Tabletop 1]]		\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Tabletop_1\|SEM Tabletop 1]]
	<!--\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific Process Knowledge/Characterization/SEM FEI QUANTA 200 3D\|FEI Quanta 200 3D]]		<!--\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific Process Knowledge/Characterization/SEM FEI QUANTA 200 3D\|FEI Quanta 200 3D]]-->
	\|-		\|-
	!colspan="2" border="none" style="background:silver; color:black;" align="center"\|Model		!colspan="2" border="none" style="background:silver; color:black;" align="center"\|Model

Pevo: /* Comparison of SEM's in building 346/451 */

2023-08-15T08:02:12Z

Comparison of SEM's in building 346/451

← Older revision		Revision as of 10:02, 15 August 2023
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	\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Supra_3\|SEM Supra 3]]		\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Supra_3\|SEM Supra 3]]
	\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Gemini_1\|SEM Gemini 1]]		\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Gemini_1\|SEM Gemini 1]]
	<i>Under installation</i>		<i>Under installation (August 2023)</i>
	\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Tabletop_1\|SEM Tabletop 1]]		\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Tabletop_1\|SEM Tabletop 1]]
	<!--\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific Process Knowledge/Characterization/SEM FEI QUANTA 200 3D\|FEI Quanta 200 3D]]		<!--\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific Process Knowledge/Characterization/SEM FEI QUANTA 200 3D\|FEI Quanta 200 3D]]
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	* Retractable, column mounted six segment backscatter electron (aBSD)		* Retractable, column mounted six segment backscatter electron (aBSD)
	* Variable pressure secondary electron (VPSE)		* Variable pressure secondary electron (VPSE)
	* Retractable, four segment ~~transitted~~ electron (aSTEM)		* Retractable, four segment tranmitted electron (aSTEM)
	<!--\|style="background:WhiteSmoke; color:black"\|		<!--\|style="background:WhiteSmoke; color:black"\|
	* Secondary electron (Everhart-Thornley (ETD))		* Secondary electron (Everhart-Thornley (ETD))
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	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	* Fixed at High vacuum (2 × 10<sup>-4</sup>mbar - 10<sup>-6</sup>mbar)		* Fixed at High vacuum (2 × 10<sup>-4</sup>mbar - 10<sup>-6</sup>mbar)
	* Variable at Low vacuum ~~(0.1 mbar-2 mbar)~~		* Variable at Low vacuum
	** Standard VP (variable pressure): 5-60 Pa		** Standard VP (variable pressure): 5-60 Pa
	** Nano VP, 350 um beamsleeve aperture: 5-150 PA		** Nano VP, 350 um beamsleeve aperture: 5-150 Pa
	** Nano VP, 800 um beamsleeve aperture: 5-40 PA		** Nano VP, 800 um beamsleeve aperture: 5-40 Pa
	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	* Conductor vacuum mode: 5 Pa		* Conductor vacuum mode: 5 Pa
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	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	* All software options available		* All software options available
	* ~~Spicer electron~~ magnetic noise cancellations system		* Electron magnetic noise cancellations system
	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	* Antivibration platform		* Antivibration platform
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	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	* Antivibration platform		* Antivibration platform
	* ~~Spicer electron~~ magnetic noise cancellations system		* Electron magnetic noise cancellations system
	* Zeiss airlock taking up to 6" wafers		* Zeiss airlock taking up to 6" wafers
	* Plasma cleaner		* Plasma cleaner

Pevo: /* Comparison of SEM's in building 346/451 */

2023-08-15T07:58:35Z

Comparison of SEM's in building 346/451

← Older revision		Revision as of 09:58, 15 August 2023
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	* Thick polymers, glass or quartz samples		* Thick polymers, glass or quartz samples
	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	*		* Conducting samples
			* Semi-conducting samples
			* Thin (~ 5 µm <) layers of non-conducting materials such as polymers
			* Thick polymers, glass or quartz samples
	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	* Conducting samples		* Conducting samples
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	*Cleanroom of DTU Nanolab in building 346		*Cleanroom of DTU Nanolab in building 346
	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	*Cleanroom of DTU Nanolab		*Cleanroom of DTU Nanolab in building 346
	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	*Building 451 - room 913		*Building 451 - room 913
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	* Secondary electron (Se2)		* Secondary electron (Se2)
	* Inlens secondary electron (Inlens)		* Inlens secondary electron (Inlens)
	*		* Inlens backscatter electron (Inlens ESB)
			* Retractable, column mounted six segment backscatter electron (aBSD)
	* Variable pressure secondary electron (VPSE)		* Variable pressure secondary electron (VPSE)
			* Retractable, four segment transitted electron (aSTEM)
	<!--\|style="background:WhiteSmoke; color:black"\|		<!--\|style="background:WhiteSmoke; color:black"\|
	* Secondary electron (Everhart-Thornley (ETD))		* Secondary electron (Everhart-Thornley (ETD))
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	* Fixed at High vacuum (2 × 10<sup>-4</sup>mbar - 10<sup>-6</sup>mbar)		* Fixed at High vacuum (2 × 10<sup>-4</sup>mbar - 10<sup>-6</sup>mbar)
	* Variable at Low vacuum (0.1 mbar-2 mbar)		* Variable at Low vacuum (0.1 mbar-2 mbar)
			** Standard VP (variable pressure): 5-60 Pa
			** Nano VP, 350 um beamsleeve aperture: 5-150 PA
			** Nano VP, 800 um beamsleeve aperture: 5-40 PA
	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	* Conductor vacuum mode: 5 Pa		* Conductor vacuum mode: 5 Pa
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	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	* All software options available		* All software options available
			* Spicer electron magnetic noise cancellations system
	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	* Antivibration platform		* Antivibration platform
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	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	* Antivibration platform		* Antivibration platform
	*		* Spicer electron magnetic noise cancellations system
			* Zeiss airlock taking up to 6" wafers
			* Plasma cleaner
			* Sample bias option
	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	<!--\|style="background:WhiteSmoke; color:black"\|		<!--\|style="background:WhiteSmoke; color:black"\|
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	\|style="background:LightGrey; color:black" align="center" \|Sample sizes		\|style="background:LightGrey; color:black" align="center" \|Sample sizes
	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	* Up to 6" wafer with full view		* Up to 6" wafer with full view
	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	* Up to 8" wafer with 6" view		* Up to 8" wafer with 6" view

Pevo: /* Comparison of SEM's in building 346/451 */

2023-08-15T07:34:06Z

Comparison of SEM's in building 346/451

← Older revision		Revision as of 09:34, 15 August 2023
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	\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Supra_2\|SEM Supra 2]]		\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Supra_2\|SEM Supra 2]]
	\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Supra_3\|SEM Supra 3]]		\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Supra_3\|SEM Supra 3]]
			\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Gemini_1\|SEM Gemini 1]]
			<i>Under installation</i>
	\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Tabletop_1\|SEM Tabletop 1]]		\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Tabletop_1\|SEM Tabletop 1]]
	<!--\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific Process Knowledge/Characterization/SEM FEI QUANTA 200 3D\|FEI Quanta 200 3D]]		<!--\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific Process Knowledge/Characterization/SEM FEI QUANTA 200 3D\|FEI Quanta 200 3D]]
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	\|style="background:WhiteSmoke; color:black" align="center"\| Zeiss Supra 60 VP		\|style="background:WhiteSmoke; color:black" align="center"\| Zeiss Supra 60 VP
	\|style="background:WhiteSmoke; color:black" align="center"\| Zeiss Supra 40 VP		\|style="background:WhiteSmoke; color:black" align="center"\| Zeiss Supra 40 VP
			\|style="background:WhiteSmoke; color:black" align="center"\| Zeiss GeminiSEM 560
	\|style="background:WhiteSmoke; color:black" align="center"\| SEM Tabletop 1		\|style="background:WhiteSmoke; color:black" align="center"\| SEM Tabletop 1
	<!--\|style="background:WhiteSmoke; color:black" align="center"\| FEI Quanta 200 3D-->		<!--\|style="background:WhiteSmoke; color:black" align="center"\| FEI Quanta 200 3D-->
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	* Thin (~ 5 µm <) layers of non-conducting materials such as polymers		* Thin (~ 5 µm <) layers of non-conducting materials such as polymers
	* Thick polymers, glass or quartz samples		* Thick polymers, glass or quartz samples
			\|style="background:WhiteSmoke; color:black"\|
			*
	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	* Conducting samples		* Conducting samples
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	* Surface material analysis using EDX		* Surface material analysis using EDX
	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
			\|style="background:WhiteSmoke; color:black"\|
	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	\|-		\|-
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	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	*Cleanroom of DTU Nanolab in building 346		*Cleanroom of DTU Nanolab in building 346
			\|style="background:WhiteSmoke; color:black"\|
			*Cleanroom of DTU Nanolab
	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	*Building 451 - room 913		*Building 451 - room 913
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	!style="background:silver; color:black" align="center" valign="center" rowspan="2"\|Performance		!style="background:silver; color:black" align="center" valign="center" rowspan="2"\|Performance
	\|style="background:LightGrey; color:black" rowspan="2" align="center" \|Resolution		\|style="background:LightGrey; color:black" rowspan="2" align="center" \|Resolution
	\|style="background:Whitesmoke; color:black" colspan="4" align="center"\| The resolution of a SEM is strongly dependent on the type of sample and the skills of the operator. The highest resolution is probably only achieved on special samples		\|style="background:Whitesmoke; color:black" colspan="5" align="center"\| The resolution of a SEM is strongly dependent on the type of sample and the skills of the operator. The highest resolution is probably only achieved on special samples
	\|-		\|-
			\|style="background:WhiteSmoke; color:black"\|
			* 1-2 nm (limited by vibrations)
	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	* 1-2 nm (limited by vibrations)		* 1-2 nm (limited by vibrations)
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	* Inlens secondary electron (Inlens)		* Inlens secondary electron (Inlens)
	* High Definition four quadrant Angular Selective Backscattered electron detector (HDAsB)		* High Definition four quadrant Angular Selective Backscattered electron detector (HDAsB)
			* Variable pressure secondary electron (VPSE)
			\|style="background:WhiteSmoke; color:black"\|
			* Secondary electron (Se2)
			* Inlens secondary electron (Inlens)
			*
	* Variable pressure secondary electron (VPSE)		* Variable pressure secondary electron (VPSE)
	<!--\|style="background:WhiteSmoke; color:black"\|		<!--\|style="background:WhiteSmoke; color:black"\|
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	* X, Y: 150 × 150 mm		* X, Y: 150 × 150 mm
	* T: -10 to 70<sup>o</sup>		* T: -10 to 70<sup>o</sup>
			* R: 360<sup>o</sup>
			* Z: 50 mm
			\|style="background:WhiteSmoke; color:black"\|
			* X, Y: 130 × 130 mm
			* T: -4 to 70<sup>o</sup>
	* R: 360<sup>o</sup>		* R: 360<sup>o</sup>
	* Z: 50 mm		* Z: 50 mm
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	\|-		\|-
	\|style="background:LightGrey; color:black" align="center" \|Electron source		\|style="background:LightGrey; color:black" align="center" \|Electron source
	\|style="background:Whitesmoke; color:black" colspan="3" align="center"\| FEG (Field Emission Gun) source		\|style="background:Whitesmoke; color:black" colspan="4" align="center"\| FEG (Field Emission Gun) source
	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	* Thermionic tungsten filament		* Thermionic tungsten filament
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	\|-		\|-
	\|style="background:LightGrey; color:black" align="center" \|Operating pressures		\|style="background:LightGrey; color:black" align="center" \|Operating pressures
			\|style="background:WhiteSmoke; color:black"\|
			* Fixed at High vacuum (2 × 10<sup>-4</sup>mbar - 10<sup>-6</sup>mbar)
			* Variable at Low vacuum (0.1 mbar-2 mbar)
	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	* Fixed at High vacuum (2 × 10<sup>-4</sup>mbar - 10<sup>-6</sup>mbar)		* Fixed at High vacuum (2 × 10<sup>-4</sup>mbar - 10<sup>-6</sup>mbar)
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	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	*High Definition four quadrant Angular Selective Backscattered electron detector (HDAsB)		*High Definition four quadrant Angular Selective Backscattered electron detector (HDAsB)
			\|style="background:WhiteSmoke; color:black"\|
			* Antivibration platform
			*
	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	<!--\|style="background:WhiteSmoke; color:black"\|		<!--\|style="background:WhiteSmoke; color:black"\|
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	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	* Up to 8" wafer with 6" view		* Up to 8" wafer with 6" view
			\|style="background:WhiteSmoke; color:black"\|
			* Up to 6" wafer with full view
	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	* Up to 6" wafer with full view		* Up to 6" wafer with full view
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	* Any standard cleanroom material and samples from the Laser Micromachining tool and the Polymer Injection Molding tool		* Any standard cleanroom material and samples from the Laser Micromachining tool and the Polymer Injection Molding tool
			\|style="background:WhiteSmoke; color:black"\|
			* Any standard cleanroom materials
	\|style="background:WhiteSmoke; color:black"\|		\|style="background:WhiteSmoke; color:black"\|
	* Any standard cleanroom materials		* Any standard cleanroom materials

← Older revision		Revision as of 15:10, 19 December 2023
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	\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Supra_3\|SEM Supra 3]]		\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Supra_3\|SEM Supra 3]]
	\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Gemini_1\|SEM Gemini 1]]		\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Gemini_1\|SEM Gemini 1]]
	~~<i>Under installation (August 2023)</i>~~
	\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Tabletop_1\|SEM Tabletop 1]]		\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Tabletop_1\|SEM Tabletop 1]]
	<!--\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific Process Knowledge/Characterization/SEM FEI QUANTA 200 3D\|FEI Quanta 200 3D]]-->		<!--\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific Process Knowledge/Characterization/SEM FEI QUANTA 200 3D\|FEI Quanta 200 3D]]-->

← Older revision		Revision as of 15:10, 19 December 2023
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	* The [[Specific_Process_Knowledge/Characterization/SEM_Supra_2\|SEM Supra 2]] and [[Specific_Process_Knowledge/Characterization/SEM_Supra_3\|SEM Supra 3]] are located in the cleanroom where they serve as general imaging tools for samples that have been fabricated in the cleanroom. Like SEM Supra 1, they are VP models from Carl Zeiss and will produce excellent images on any sample. The possibility of operating at higher chamber pressures in the VP mode makes imaging of bulk non-conducting samples possible. The [[Specific_Process_Knowledge/Characterization/SEM_Supra_2\|SEM Supra 2]] is also equipped with an airlock and an EDX detector.		* The [[Specific_Process_Knowledge/Characterization/SEM_Supra_2\|SEM Supra 2]] and [[Specific_Process_Knowledge/Characterization/SEM_Supra_3\|SEM Supra 3]] are located in the cleanroom where they serve as general imaging tools for samples that have been fabricated in the cleanroom. Like SEM Supra 1, they are VP models from Carl Zeiss and will produce excellent images on any sample. The possibility of operating at higher chamber pressures in the VP mode makes imaging of bulk non-conducting samples possible. The [[Specific_Process_Knowledge/Characterization/SEM_Supra_2\|SEM Supra 2]] is also equipped with an airlock and an EDX detector.

	* The [[Specific_Process_Knowledge/Characterization/SEM_Gemini_1\|SEM Gemini 1]] is is a ~~new~~ SEM ~~fra~~ Carl Zeiss that ~~is being~~ installed in the cleanroom at the ~~moment (August~~ 2023)		* The [[Specific_Process_Knowledge/Characterization/SEM_Gemini_1\|SEM Gemini 1]] is a state-of-the-art SEM from Carl Zeiss that was installed in the cleanroom in the autumn of 2023. It has an impressive range of detectors and modes that are intended to be used for the most demanding samples.

	* The [[Specific_Process_Knowledge/Characterization/SEM_Tabletop_1\|SEM Tabletop 1]] is a tabletop SEM that is located in the basement outside the cleanroom. It has a limited resolution, but it is fast and easy to use, also for non-conducting samples. Training in the others SEMs is not required to use this SEM.		* The [[Specific_Process_Knowledge/Characterization/SEM_Tabletop_1\|SEM Tabletop 1]] is a tabletop SEM that is located in the basement outside the cleanroom. It has a limited resolution, but it is fast and easy to use, also for non-conducting samples. Training in the others SEMs is not required to use this SEM.

← Older revision		Revision as of 15:24, 28 September 2023
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	\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Supra_2\|SEM Supra 2]]		\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Supra_2\|SEM Supra 2]]
	\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Supra_3\|SEM Supra 3]]		\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Supra_3\|SEM Supra 3]]
	\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Gemini_1\|SEM Gemini~~]][[Specific_Process_Knowledge/Characterization/SEM_Gemini_1/ma\|~~ 1]]		\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Gemini_1\|SEM Gemini 1]]
	<i>Under installation (August 2023)</i>		<i>Under installation (August 2023)</i>
	\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Tabletop_1\|SEM Tabletop 1]]		\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Tabletop_1\|SEM Tabletop 1]]

← Older revision		Revision as of 10:04, 25 September 2023
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	\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Supra_2\|SEM Supra 2]]		\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Supra_2\|SEM Supra 2]]
	\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Supra_3\|SEM Supra 3]]		\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Supra_3\|SEM Supra 3]]
	\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Gemini_1\|SEM Gemini 1]]		\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Gemini_1\|SEM Gemini]][[Specific_Process_Knowledge/Characterization/SEM_Gemini_1/ma\| 1]]
	<i>Under installation (August 2023)</i>		<i>Under installation (August 2023)</i>
	\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Tabletop_1\|SEM Tabletop 1]]		\|style="background:WhiteSmoke; color:black" align="center"\|[[Specific_Process_Knowledge/Characterization/SEM_Tabletop_1\|SEM Tabletop 1]]