Specific Process Knowledge/Characterization/Particle Scanner Takano - Revision history

Paphol: /* Takano WM-7SR Wafer Surface Analyzer */

2025-09-05T10:48:48Z

Takano WM-7SR Wafer Surface Analyzer

← Older revision		Revision as of 12:48, 5 September 2025
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	=Takano WM-7SR Wafer Surface Analyzer=		=Takano WM-7SR Wafer Surface Analyzer=
			<i> Unless otherwise stated, this page is written by Patama Pholprasit DTU Nanolab internal</b></i>

	The Takano WM-7SR wafer surface analyzer is being used to analyze unpatterned surfaces on wafers for particles.		The Takano WM-7SR wafer surface analyzer is being used to analyze unpatterned surfaces on wafers for particles.

Paphol at 12:51, 1 September 2025

2025-09-01T12:51:46Z

← Older revision		Revision as of 14:51, 1 September 2025
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	The instrument detects, counts and sizes defects on wafers with semiconductor substrate materials. The instrument uses a 405 nm laser beam which is scanning over the wafer surface to detect defect contamination, i.e. particles. When the laser beam hits a particle, it will scatter and be detected.		The instrument detects, counts and sizes defects on wafers with semiconductor substrate materials. The instrument uses a 405 nm laser beam which is scanning over the wafer surface to detect defect contamination, i.e. particles. When the laser beam hits a particle, it will scatter and be detected.
	The scan results are displayed in color-coded wafer maps, histograms and summaries.		The scan results are displayed in color-coded wafer maps, histograms and summaries.

			[[File:IMG 9822.JPG\|350px\|right\|thumb\|Takano tool at DTU Nanolab. Photo by Patama Pholprasit, DTU Nanolab.]]

	===Specifications===		===Specifications===

Paphol: /* Specifications */

2025-08-13T09:38:49Z

Specifications

← Older revision		Revision as of 11:38, 13 August 2025
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	'''[https://labmanager.dtu.dk/function.php?module=Machine&view=view&page_id=169 Particle Scanner Takano]'''		'''[https://labmanager.dtu.dk/function.php?module=Machine&view=view&page_id=169 Particle Scanner Takano]'''

	~~[[:File:Comparing Takano and SurfScan.pptx]]~~

	[[media:Comparing Takano and SurfScan.pptx\|'''Comparing Takano and SurfScan''']]		[[media:Comparing Takano and SurfScan.pptx\|'''Comparing Takano and SurfScan''']]

Paphol: /* Specifications */

2025-08-13T09:38:20Z

Specifications

← Older revision		Revision as of 11:38, 13 August 2025
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	[[:File:Comparing Takano and SurfScan.pptx]]		[[:File:Comparing Takano and SurfScan.pptx]]

			[[media:Comparing Takano and SurfScan.pptx\|'''Comparing Takano and SurfScan''']]

Paphol at 09:33, 13 August 2025

2025-08-13T09:33:15Z

← Older revision		Revision as of 11:33, 13 August 2025
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	'''[https://labmanager.dtu.dk/function.php?module=Machine&view=view&page_id=169 Particle Scanner Takano]'''		'''[https://labmanager.dtu.dk/function.php?module=Machine&view=view&page_id=169 Particle Scanner Takano]'''

			[[:File:Comparing Takano and SurfScan.pptx]]

Paphol: /* Takano WM-7SR Wafer Surface Analyzer */

2025-08-13T08:02:40Z

Takano WM-7SR Wafer Surface Analyzer

← Older revision		Revision as of 10:02, 13 August 2025
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	- The wafer thickness should be a standard wafer thickness +/- 200 nm. Wafers that thicker than 1 mm need to get an approval from a responsible person.<br />		- The wafer thickness should be a standard wafer thickness +/- 200 nm. Wafers that thicker than 1 mm need to get an approval from a responsible person.<br />
	- Area Count software function which helps to detect the larger particles (>11um) is not currently equipped but it is available for purchase.<br />		- Area Count software function which helps to detect the larger particles (>11um) is not currently equipped but it is available for purchase.<br />

			'''The user manual, technical information and contact information can be found in LabManager:'''

			'''[https://labmanager.dtu.dk/function.php?module=Machine&view=view&page_id=169 Particle Scanner Takano]'''

Mmat at 12:44, 9 August 2025

2025-08-09T12:44:33Z

← Older revision		Revision as of 14:44, 9 August 2025
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	~~== <span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png\|100px]] ==~~

	=Takano WM-7SR Wafer Surface Analyzer=		=Takano WM-7SR Wafer Surface Analyzer=

Mmat: /* THIS PAGE IS UNDER CONSTRUCTION100px */

2025-05-27T17:45:04Z

THIS PAGE IS UNDER CONSTRUCTION100px

← Older revision		Revision as of 19:45, 27 May 2025
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	== <span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png\|100px]] ==		== <span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png\|100px]] ==

			=Takano WM-7SR Wafer Surface Analyzer=

	The Takano WM-7SR wafer surface analyzer is being used to analyze unpatterned surfaces on wafers for particles.		The Takano WM-7SR wafer surface analyzer is being used to analyze unpatterned surfaces on wafers for particles.

Mmat: /* THIS PAGE IS UNDER CONSTRUCTION300px */

2025-05-27T17:44:37Z

THIS PAGE IS UNDER CONSTRUCTION300px

← Older revision		Revision as of 19:44, 27 May 2025
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	== <span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png\|~~300px~~]] ==		== <span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png\|100px]] ==

	The Takano WM-7SR wafer surface analyzer is being used to analyze unpatterned surfaces on wafers for particles.		The Takano WM-7SR wafer surface analyzer is being used to analyze unpatterned surfaces on wafers for particles.

Paphol: /* Specifications */

2025-01-23T09:52:05Z

Specifications

← Older revision		Revision as of 11:52, 23 January 2025
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	===Specifications===		===Specifications===
	- Particles having a size between 79 nm um and 5 um can be detected. The minimum particle size can only be detected on smooth surfaces such as bare silicon wafers or wafers with thermal SiO2.		- Particles having a size between 79 nm um and 5 um can be detected. The minimum particle size can only be detected on smooth surfaces such as bare silicon wafers or wafers with thermal SiO2.<br />
	- The detected particles sizes depends on the used gain setting.<br />		- The detected particles sizes depends on the used gain setting.<br />
	- Wafer cassettes are available for 4”, 6” and 8” wafers. For the 4” wafer cassette, an adapter has to be mounted on the indexer.<br />		- Wafer cassettes are available for 4”, 6” and 8” wafers. For the 4” wafer cassette, an adapter has to be mounted on the indexer.<br />
	- The wafer thickness should be a standard wafer thickness +/- 200 nm. Wafers that thicker than 1 mm need to get an approval from a responsible person.<br />		- The wafer thickness should be a standard wafer thickness +/- 200 nm. Wafers that thicker than 1 mm need to get an approval from a responsible person.<br />
	- Area Count software function which helps to detect the larger particles (>11um) is not currently equipped but it is available for purchase.<br />		- Area Count software function which helps to detect the larger particles (>11um) is not currently equipped but it is available for purchase.<br />