Specific Process Knowledge/Characterization/Filmetrics - Revision history

Mmat: /* Performance and Process Parameters */

2025-05-27T19:48:41Z

Performance and Process Parameters

← Older revision		Revision as of 21:48, 27 May 2025
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	!colspan="2" border="none" style="background:silver; color:black;" align="center"\|~~<b>~~Equipment~~</b>~~		!colspan="2" border="none" style="background:silver; color:black;" align="center"\|Equipment
	\|style="background:WhiteSmoke; color:black"\|<b>Optical profiler</b>		\|style="background:WhiteSmoke; color:black"\|<b>Optical profiler</b>
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Mmat: /* Optical Profiler (Filmetrics) */

2025-05-27T19:47:56Z

Optical Profiler (Filmetrics)

← Older revision		Revision as of 21:47, 27 May 2025
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	[[Category:Characterization\|Profiler]]		[[Category:Characterization\|Profiler]]

	=Optical Profiler ~~(Filmetrics~~)=		=Filmetrics (Optical Profiler)=
	{{CC-bghe2}} <br>		{{CC-bghe2}} <br>
	[[image:Scanner without anotation.jpg\|275x275px\|right\|thumb\|Optical Profiler (Filmetrics): positioned in the basement (346-904), {{photo1}}]]		[[image:Scanner without anotation.jpg\|275x275px\|right\|thumb\|Optical Profiler (Filmetrics): positioned in the basement (346-904), {{photo1}}]]

Mmat at 19:47, 27 May 2025

2025-05-27T19:47:38Z

← Older revision		Revision as of 21:47, 27 May 2025
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	[[Category:Equipment\|Characterization Profiler]]		[[Category:Equipment\|Characterization Profiler]]
	[[Category:Characterization\|Profiler]]		[[Category:Characterization\|Profiler]]
	==Optical Profiler (Filmetrics)==
			=Optical Profiler (Filmetrics)=
	{{CC-bghe2}} <br>		{{CC-bghe2}} <br>
	[[image:Scanner without anotation.jpg\|275x275px\|right\|thumb\|Optical Profiler (Filmetrics): positioned in the basement (346-904), {{photo1}}]]		[[image:Scanner without anotation.jpg\|275x275px\|right\|thumb\|Optical Profiler (Filmetrics): positioned in the basement (346-904), {{photo1}}]]

Mmat at 18:37, 27 May 2025

2025-05-27T18:37:12Z

← Older revision		Revision as of 20:37, 27 May 2025
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			{{cc-nanolab}}

			'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/Tencor_P17 click here]'''
			<br>
			<br>
			[[Category:Equipment\|Characterization Profiler]]
			[[Category:Characterization\|Profiler]]
	==Optical Profiler (Filmetrics)==		==Optical Profiler (Filmetrics)==
	{{CC-bghe2}} <br>		{{CC-bghe2}} <br>

Mmat: /* Equipment performance and process related parameters */

2025-05-27T18:35:21Z

Equipment performance and process related parameters

← Older revision		Revision as of 20:35, 27 May 2025
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	===~~Equipment performance~~ and ~~process related parameters~~===		===Performance and Process Parameters===

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Mmat at 18:35, 27 May 2025

2025-05-27T18:35:06Z

← Older revision		Revision as of 20:35, 27 May 2025
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	~~'''~~The user manual, technical information and contact information can be found in ~~LabManager (requires login):'''~~		The user manual, technical information and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=467 LabManager].

	[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=467 ~~Optical profiler (Filmetrics) info page in~~ LabManager]

Mmat: Created page with "==Optical Profiler (Filmetrics)== {{CC-bghe2}}
Optical Profiler (Filmetrics): positioned in the basement (346-904), {{photo1}} The Profilm3D optical profiler from Filmetrics uses white-light-interferometry (WLI) and phase-shifting-interferometry (PSI) to produce surface profiles and depth-of-field color images. The main purpose is 3D topographic imaging of surfaces, step height measurements and roughnes..."

2025-05-27T18:34:34Z

Created page with "==Optical Profiler (Filmetrics)== {{CC-bghe2}} 275x275px|right|thumb|Optical Profiler (Filmetrics): positioned in the basement (346-904), {{photo1}} The Profilm3D optical profiler from Filmetrics uses white-light-interferometry (WLI) and phase-shifting-interferometry (PSI) to produce surface profiles and depth-of-field color images. The main purpose is 3D topographic imaging of surfaces, step height measurements and roughnes..."

New page

==Optical Profiler (Filmetrics)==
{{CC-bghe2}} 
[[image:Scanner without anotation.jpg|275x275px|right|thumb|Optical Profiler (Filmetrics): positioned in the basement (346-904), {{photo1}}]]

The Profilm3D optical profiler from Filmetrics uses white-light-interferometry (WLI) and phase-shifting-interferometry (PSI) to produce surface profiles and depth-of-field color images.

The main purpose is 3D topographic imaging of surfaces, step height measurements and roughness measurements with larger FOV (Field Of View) than the AFM, but less horisontal resolution.

For most samples the optical profiler provides fast and easy information without any sample preparation. However, it can be necessary to cover thin transparent layers (< 2 µm) with a thin layer of metal.

The resolution is limited by the objective and the sampling resolution.

'''The user manual, technical information and contact information can be found in LabManager (requires login):'''

[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=467 Optical profiler (Filmetrics) info page in LabManager]

===Equipment performance and process related parameters===

{| border="2" cellspacing="0" cellpadding="10"

!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment
|style="background:WhiteSmoke; color:black"|Optical profiler
|-
!style="background:silver; color:black;" align="left"|Purpose
|style="background:LightGrey; color:black"|3D topographic imaging of surfaces.||style="background:WhiteSmoke; color:black"|
*3D imaging of surfaces
*Roughness measurements
*Step height measurements
*3D topographic measurements
|-
!style="background:silver; color:black;" align="left"|Posibilities
|style="background:LightGrey; color:black"|Interferometric profiling||style="background:WhiteSmoke; color:black"|
*Standard microscope imaging
*PSI (Phase Shift Interferometry)
*WLI (White light Interferometry)
*Stitched scans
*Wafer mapping
|-
!style="background:silver; color:black" align="left"|Performance
|style="background:LightGrey; color:black"|With the current 10x objective||style="background:WhiteSmoke; color:black"|
[https://labmanager.dtu.dk/view_binary.php?fileId=4174 See here the data sheet for this instrument (requires login)]]
|-
|-
!style="background:silver; color:black" align="left"|Substrates
|style="background:LightGrey; color:black"|Substrate size
|style="background:WhiteSmoke; color:black"|
*Substrates no bigger than 100 mm x 100mm
|-
|style="background:silver; color:black"|
| style="background:LightGrey; color:black"|Substrate materials allowed
|style="background:WhiteSmoke; color:black"|
*In principle all materials
|-
|}